JPH0360322B2 - - Google Patents

Info

Publication number
JPH0360322B2
JPH0360322B2 JP58072277A JP7227783A JPH0360322B2 JP H0360322 B2 JPH0360322 B2 JP H0360322B2 JP 58072277 A JP58072277 A JP 58072277A JP 7227783 A JP7227783 A JP 7227783A JP H0360322 B2 JPH0360322 B2 JP H0360322B2
Authority
JP
Japan
Prior art keywords
group
photopolymerization initiator
carbon atoms
tertiary
benzophenone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58072277A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59197401A (ja
Inventor
Takeshi Komai
Mamoru Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Priority to JP58072277A priority Critical patent/JPS59197401A/ja
Priority to DE8484302473T priority patent/DE3462141D1/de
Priority to EP84302473A priority patent/EP0126541B1/en
Publication of JPS59197401A publication Critical patent/JPS59197401A/ja
Priority to US06/740,278 priority patent/US4970244A/en
Priority to US07/117,920 priority patent/US4777191A/en
Publication of JPH0360322B2 publication Critical patent/JPH0360322B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C409/00Peroxy compounds
    • C07C409/38Peroxy compounds the —O—O— group being bound between a >C=O group and a carbon atom, not further substituted by oxygen atoms, i.e. esters of peroxy acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP58072277A 1983-04-26 1983-04-26 光重合開始剤 Granted JPS59197401A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58072277A JPS59197401A (ja) 1983-04-26 1983-04-26 光重合開始剤
DE8484302473T DE3462141D1 (en) 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator
EP84302473A EP0126541B1 (en) 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator
US06/740,278 US4970244A (en) 1983-04-26 1985-06-03 Photopolymerization initiator and method of photopolymerization by use of said initiator
US07/117,920 US4777191A (en) 1983-04-26 1987-11-05 Photopolymerization initiator and method of photopolymerization by use of said initiator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58072277A JPS59197401A (ja) 1983-04-26 1983-04-26 光重合開始剤

Publications (2)

Publication Number Publication Date
JPS59197401A JPS59197401A (ja) 1984-11-09
JPH0360322B2 true JPH0360322B2 (enExample) 1991-09-13

Family

ID=13484625

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58072277A Granted JPS59197401A (ja) 1983-04-26 1983-04-26 光重合開始剤

Country Status (4)

Country Link
US (2) US4970244A (enExample)
EP (1) EP0126541B1 (enExample)
JP (1) JPS59197401A (enExample)
DE (1) DE3462141D1 (enExample)

Families Citing this family (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59197401A (ja) * 1983-04-26 1984-11-09 Nippon Oil & Fats Co Ltd 光重合開始剤
JPS6076503A (ja) * 1983-10-03 1985-05-01 Nippon Oil & Fats Co Ltd 高感度光開始剤組成物
US4746685A (en) * 1984-08-31 1988-05-24 Nippon Oil And Fats Co., Ltd. Light curable dental composition
JPS61174276A (ja) * 1985-01-29 1986-08-05 Toyobo Co Ltd 紫外線硬化型インキ組成物
JPS61213838A (ja) * 1985-03-20 1986-09-22 Nippon Oil & Fats Co Ltd 感光性平版印刷版
US4940648A (en) * 1988-02-12 1990-07-10 Hoechst Celanese Corporation Increased sensitivity photoinitiation compositions
JP2604453B2 (ja) * 1988-12-14 1997-04-30 積水化学工業株式会社 アクリル系粘着テープ
JP2745602B2 (ja) * 1988-12-22 1998-04-28 日本油脂株式会社 塩化ビニルの重合方法
US5091586A (en) * 1989-07-19 1992-02-25 Nippon Oil And Fats Company, Limited Novel dialkyl peroxides, production method and use thereof
US5492733A (en) * 1990-03-05 1996-02-20 International Paper Company High gloss ultraviolet curable coating
US5527921A (en) * 1995-03-21 1996-06-18 Minnesota Mining And Manufacturing Company Peroxycarboxylic ester initiators derived from nitrogen heterocycles
JP4213792B2 (ja) * 1998-09-24 2009-01-21 日東電工株式会社 熱硬化型感圧性接着剤とその接着シ―ト類
JP4164919B2 (ja) * 1998-11-30 2008-10-15 チッソ株式会社 光重合開始剤および光重合性開始剤組成物
EP1805255A1 (en) 2004-10-25 2007-07-11 Ciba Specialty Chemicals Holding Inc. Functionalized nanoparticles
US7781493B2 (en) 2005-06-20 2010-08-24 Dow Global Technologies Inc. Protective coating for window glass
US7786183B2 (en) * 2005-06-20 2010-08-31 Dow Global Technologies Inc. Coated glass articles
US7939161B2 (en) 2006-12-19 2011-05-10 Dow Global Technologies Llc Encapsulated panel assemblies and methods for making same
BRPI0719411B1 (pt) 2006-12-19 2018-07-31 Dow Global Technologies Inc. Aditivo para uma composição de revestimento, método para melhorar o desempenho de uma composição de revestimento, método para revestir um substrato, artigo, composição de revestimento e kit para preparar uma composição de revestimento
CN101558456B (zh) 2006-12-19 2013-07-24 陶氏环球技术公司 经改善的用于导电透明基材的复合材料和方法
EP2116527A4 (en) 2007-01-23 2011-09-14 Fujifilm Corp OXIME COMPOUND, PHOTOSENSITIVE COMPOSITION, COLOR FILTER, METHOD FOR MANUFACTURING THE COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT
CA2629952C (en) * 2007-04-26 2015-10-06 Finishes Unlimited, Inc. Radiation-curable coating compositions, composite and plastic materials coated with said compositions and methods for their preparation
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2402315A1 (en) 2007-05-11 2012-01-04 Basf Se Oxime ester photoinitiators
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
JP5255369B2 (ja) 2007-09-25 2013-08-07 富士フイルム株式会社 光硬化性コーティング組成物、オーバープリント及びその製造方法
US8147974B2 (en) * 2007-12-18 2012-04-03 Dow Global Technologies Llc Protective coating for window glass having enhanced adhesion to glass bonding adhesives
JP5252964B2 (ja) * 2008-03-25 2013-07-31 富士フイルム株式会社 インク組成物、インクジェット用インク及びそれを用いたインクセット
FR2935705B1 (fr) * 2008-09-05 2010-10-29 Univ De Technologie De Compiegne Procede de preparation de polymeres a empreintes moleculaires (pem) par polymerisation radicalaire
ES2556341T3 (es) 2009-01-14 2016-01-15 Basf Se Combinación líquida de fotoiniciador
JP5642150B2 (ja) 2009-03-23 2014-12-17 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se フォトレジスト組成物
JP5650196B2 (ja) 2009-03-24 2015-01-07 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 新規なオリゴ官能性の光開始剤
WO2011012560A1 (en) 2009-07-30 2011-02-03 Basf Se Macrophotoinitiators
US9310676B2 (en) 2009-08-21 2016-04-12 Basf Se Apparatus and method for a sub microscopic and optically variable image carrying device
US8413607B2 (en) 2009-09-11 2013-04-09 Gilberto Gamez Wildlife watering troughs and related structures and methods
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
TWI520940B (zh) 2010-10-05 2016-02-11 巴地斯顏料化工廠 肟酯
US9365980B2 (en) 2010-11-05 2016-06-14 International Paper Company Packaging material having moisture barrier and methods for preparing same
US9358576B2 (en) 2010-11-05 2016-06-07 International Paper Company Packaging material having moisture barrier and methods for preparing same
EP2668156B1 (en) 2011-01-28 2018-10-31 Basf Se Polymerizable composition comprising an oxime sulfonate as thermal curing agent
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
JP5659189B2 (ja) * 2011-05-13 2015-01-28 富士フイルム株式会社 非共鳴2光子吸収材料、非共鳴2光子吸収記録材料、記録媒体、記録再生方法及び非共鳴2光子吸収化合物
US9365515B2 (en) 2011-12-07 2016-06-14 Basf Se Oxime ester photoinitiators
EP2963015B1 (en) 2012-05-09 2018-07-11 Basf Se Oxime ester photoinitiators
JP6053942B2 (ja) 2012-10-19 2016-12-27 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se ハイブリッド光開始剤
CN104870456A (zh) 2012-12-19 2015-08-26 巴斯夫欧洲公司 双酰基次膦酸的衍生物、其制备及其作为光敏引发剂的用途
EP3019508B1 (en) 2013-07-08 2019-01-30 IGM Group B.V. Liquid bisacylphosphine oxide photoinitiator
EP3019473B1 (en) 2013-07-08 2020-02-19 Basf Se Oxime ester photoinitiators
WO2015036910A1 (en) 2013-09-10 2015-03-19 Basf Se Oxime ester photoinitiators
CN106164206B (zh) 2014-03-27 2019-12-10 3M创新有限公司 填充的包含聚二有机硅氧烷的组合物及其使用方法
JP6664383B2 (ja) 2014-08-29 2020-03-13 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se オキシムスルホネート誘導体
JP6449445B2 (ja) 2014-09-04 2019-01-09 アイ ジー エム マルタ リミテッド 多環式光開始剤
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
WO2018041935A1 (en) 2016-09-02 2018-03-08 Igm Group B.V. Polycyclic glyoxylates as photoinitiators
KR20190091439A (ko) 2016-12-13 2019-08-06 니치유 가부시키가이샤 퍼옥시신나메이트 유도체, 그 화합물을 함유하는 중합성 조성물
KR102542689B1 (ko) 2017-06-01 2023-06-12 니치유 가부시키가이샤 트리아진퍼옥사이드 유도체, 그 화합물을 함유하는 중합성 조성물
JP6923130B2 (ja) * 2017-08-31 2021-08-18 学校法人東京理科大学 ペルオキシエステル基を有するベンゾフェノン誘導体、該化合物を含有する重合性組成物およびその硬化物、当該硬化物の製造方法
US12240989B2 (en) 2018-02-23 2025-03-04 Basf Se Organomodified metal oxide or metalloid oxide polymer film
WO2020049378A1 (en) 2018-09-07 2020-03-12 Igm Resins Italia S.R.L. Multifunctional bisacylphosphine oxide photoinitiators
WO2020067118A1 (ja) * 2018-09-26 2020-04-02 日油株式会社 チオキサントン骨格を有するジアルキルペルオキシド、該化合物を含有する重合性組成物
US11834532B2 (en) 2018-12-28 2023-12-05 Igh Resins Italia S.R.L. Photoinitiators
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
GB2582002B (en) * 2019-03-07 2022-12-28 Henkel Ag & Co Kgaa One-part anaerobically curable compositions
EP4041719A1 (en) 2019-10-11 2022-08-17 IGM Resins Italia S.r.l. Coumarin glyoxylates for led photocuring
WO2021175855A1 (en) 2020-03-04 2021-09-10 Basf Se Oxime ester photoinitiators
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
CN119072499A (zh) 2022-02-24 2024-12-03 意大利艾坚蒙树脂有限公司 光引发剂
EP4273200A1 (en) 2022-05-06 2023-11-08 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
CN120187765A (zh) 2022-10-05 2025-06-20 意大利艾坚蒙树脂有限公司 聚合物型(甲基)丙烯酸酯光引发剂
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
WO2025011754A1 (en) 2023-07-10 2025-01-16 Basf Se Photocurable as well as thermally curable compositions suitable for low temperature curing
WO2025027517A1 (en) 2023-08-03 2025-02-06 Igm Resins Italia S.R.L. 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions
EP4534614A1 (en) 2023-10-02 2025-04-09 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
WO2025140854A2 (en) 2023-12-28 2025-07-03 Igm Resins Italia S.R.L. NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3671651A (en) * 1968-05-07 1972-06-20 Pennwalt Corp Peroxy compounds containing a haloformate group
US4171252A (en) * 1976-06-25 1979-10-16 Armstrong Cork Company Peroxy photoinitiator system for photopolymerizable compositions
US4338171A (en) * 1980-06-16 1982-07-06 Gulf Oil Corporation Photopolymerizable compositions
JPS5723602A (en) * 1980-07-17 1982-02-06 Nippon Kayaku Co Ltd Method for curing photosetting resin composition
US4416826A (en) * 1980-10-29 1983-11-22 Neckers Douglas C Peresters and use thereof
JPS59197401A (ja) * 1983-04-26 1984-11-09 Nippon Oil & Fats Co Ltd 光重合開始剤
JPS59204837A (ja) * 1983-05-09 1984-11-20 Asahi Chem Ind Co Ltd 光重合性積層体及びそれを用いたレジスト像形成方法
US4604295A (en) * 1983-12-22 1986-08-05 Loctite Corporation Visible light absorbing peroxy-esters
US4746685A (en) * 1984-08-31 1988-05-24 Nippon Oil And Fats Co., Ltd. Light curable dental composition
JPS6147727A (ja) * 1984-10-29 1986-03-08 Toyobo Co Ltd 硬化型樹脂組成物

Also Published As

Publication number Publication date
JPS59197401A (ja) 1984-11-09
EP0126541A1 (en) 1984-11-28
EP0126541B1 (en) 1987-01-21
US4970244A (en) 1990-11-13
DE3462141D1 (en) 1987-02-26
US4777191A (en) 1988-10-11

Similar Documents

Publication Publication Date Title
JPH0360322B2 (enExample)
FI86412B (fi) Fotoinitiatorer foer fotopolymerisation av omaettade system.
JPH10175908A (ja) 光反応性光重合開始剤
JPH0780927B2 (ja) 光重合性組成物
JPH0611765B2 (ja) 光重合開始剤組成物
JP2734101B2 (ja) ジアルキルペルオキシドおよびその用途
EP2190887B1 (en) Photoinitiators for energy curing
US6294698B1 (en) Photoinitiators and applications therefor
JPH0572898B2 (enExample)
JP2797501B2 (ja) ジアルキルペルオキシド
JP2797550B2 (ja) ジアルキルペルオキシドを有効成分とする光分解型ラジカル発生剤
JP2734113B2 (ja) ジアルキルペルオキシドおよびその用途
JPH05271321A (ja) ジアルキルペルオキシド及びその用途
JPH02279702A (ja) 光重合開始剤組成物
JPH04173804A (ja) 光重合開始剤
JPH0344287B2 (enExample)
JPH0386859A (ja) 有機過酸化物及びその用途
JPH06321895A (ja) ペルオキシケタールおよびその用途
JPH10251226A (ja) ベンゾフェノン骨格含有ペルオキシド、その製造方法及び用途
JPH1087566A (ja) ヒドロキシアルキルフェノン誘導体及びその重合体並びに光重合開始剤
JPH0554842B2 (enExample)
WO1999054363A1 (en) Novel photoinitiators and applications therefor
JPH03130260A (ja) ジアルキルペルオキシド、その製造方法および用途
JPH04225002A (ja) 光重合開始剤
JPH0463882B2 (enExample)