WO1999054363A1 - Novel photoinitiators and applications therefor - Google Patents
Novel photoinitiators and applications therefor Download PDFInfo
- Publication number
- WO1999054363A1 WO1999054363A1 PCT/US1999/008527 US9908527W WO9954363A1 WO 1999054363 A1 WO1999054363 A1 WO 1999054363A1 US 9908527 W US9908527 W US 9908527W WO 9954363 A1 WO9954363 A1 WO 9954363A1
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- WO
- WIPO (PCT)
- Prior art keywords
- photoinitiator
- photoinitiators
- present
- radiation
- admixture
- Prior art date
Links
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- GLNWILHOFOBOFD-UHFFFAOYSA-N lithium sulfide Chemical class [Li+].[Li+].[S-2] GLNWILHOFOBOFD-UHFFFAOYSA-N 0.000 description 6
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- PGRNEGLBSNLPNP-UHFFFAOYSA-N 1,6-dichloro-3-methylhex-1-ene Chemical compound ClC=CC(C)CCCCl PGRNEGLBSNLPNP-UHFFFAOYSA-N 0.000 description 1
- ILBBNQMSDGAAPF-UHFFFAOYSA-N 1-(6-hydroxy-6-methylcyclohexa-2,4-dien-1-yl)propan-1-one Chemical compound CCC(=O)C1C=CC=CC1(C)O ILBBNQMSDGAAPF-UHFFFAOYSA-N 0.000 description 1
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- YDIYEOMDOWUDTJ-UHFFFAOYSA-N 4-(dimethylamino)benzoic acid Chemical compound CN(C)C1=CC=C(C(O)=O)C=C1 YDIYEOMDOWUDTJ-UHFFFAOYSA-N 0.000 description 1
- UGJDXRVQCYBXAJ-UHFFFAOYSA-N 4-(dimethylamino)benzoyl chloride Chemical compound CN(C)C1=CC=C(C(Cl)=O)C=C1 UGJDXRVQCYBXAJ-UHFFFAOYSA-N 0.000 description 1
- ANHQLUBMNSSPBV-UHFFFAOYSA-N 4h-pyrido[3,2-b][1,4]oxazin-3-one Chemical group C1=CN=C2NC(=O)COC2=C1 ANHQLUBMNSSPBV-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000012958 Amine synergist Substances 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- JYFJWESOSHFPGV-UHFFFAOYSA-N C1=CC(N(C)C)=CC=C1C(=O)SSSC(=O)C1=CC=C(N(C)C)C=C1 Chemical compound C1=CC(N(C)C)=CC=C1C(=O)SSSC(=O)C1=CC=C(N(C)C)C=C1 JYFJWESOSHFPGV-UHFFFAOYSA-N 0.000 description 1
- YQHHCMVUMULAPZ-UHFFFAOYSA-N C[CH2+] Chemical compound C[CH2+] YQHHCMVUMULAPZ-UHFFFAOYSA-N 0.000 description 1
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- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 229910001216 Li2S Inorganic materials 0.000 description 1
- 229910007352 Li2Sy Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GEOWGJXFGBPARF-UHFFFAOYSA-N O=C(C[IH]1)c2ccccc2C1=O Chemical compound O=C(C[IH]1)c2ccccc2C1=O GEOWGJXFGBPARF-UHFFFAOYSA-N 0.000 description 1
- 0 O=C([*+]1)c2ccccc2C1=O Chemical compound O=C([*+]1)c2ccccc2C1=O 0.000 description 1
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical class ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
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- 125000003118 aryl group Chemical group 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical class ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- QNRGPBPLQNCURB-UHFFFAOYSA-N bis(2-carboxybenzoyl)-(carboxymethyl)-sulfidoazanium Chemical class C(C=1C(C(=O)O)=CC=CC=1)(=O)[N+](CC(=O)O)(C(C=1C(C(=O)O)=CC=CC=1)=O)[S-] QNRGPBPLQNCURB-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
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- 125000004386 diacrylate group Chemical group 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical class OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
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- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical compound [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 description 1
- JUHDUIDUEUEQND-UHFFFAOYSA-N methylium Chemical compound [CH3+] JUHDUIDUEUEQND-UHFFFAOYSA-N 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000003211 polymerization photoinitiator Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- WTXMTPLATLKWQS-UHFFFAOYSA-N propane Chemical compound CC[CH2+] WTXMTPLATLKWQS-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 238000006462 rearrangement reaction Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- SEVGYWQZALKSOZ-UHFFFAOYSA-N s-(2-morpholin-4-ylbenzoyl) 2-morpholin-4-ylbenzenecarbothioate Chemical class C=1C=CC=C(N2CCOCC2)C=1C(=O)SC(=O)C1=CC=CC=C1N1CCOCC1 SEVGYWQZALKSOZ-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229940080262 sodium tetrachloroaurate Drugs 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- JTJFQBNJBPPZRI-UHFFFAOYSA-J vanadium tetrachloride Chemical compound Cl[V](Cl)(Cl)Cl JTJFQBNJBPPZRI-UHFFFAOYSA-J 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
Definitions
- the present invention relates to a novel photoinitiators and methods for generating a reactive species using the photoinitiators.
- the present invention further relates to methods of polymerizing or photocuring polymerizable unsaturated material using the above- mentioned photoinitiators.
- Polymers have served essential needs in society. For many years, these needs were filled by natural polymers. More recently, synthetic polymers have played an increasingly greater role, particularly since the beginning of the 20th century. Especially useful polymers are those prepared by an addition polymerization mechanism, i.e., free radical chain polymerization of unsaturated monomers, and include, by way of example only, coatings and adhesives. In fact, the majority of commercially significant processes is based on free-radical chemistry. That is, chain polymerization is initiated by a reactive species which often is a free radical. The source of the free radicals is termed an initiator or photoinitiator. Improvements in free radical chain polymerization have focused both on the polymer being produced and the photoinitiator.
- Whether a particular unsaturated monomer can be converted to a polymer requires structural, thermodynamic, and kinetic feasibility. Even when all three exist, kinetic feasibility is achieved in many cases only with a specific type of photoinitiator. Moreover, the photoinitiator can have a significant effect on reaction rate which, in turn, may determine the commercial success or failure of a particular polymerization process or product.
- a free radical-generating photoinitiator may generate free radicals in several different ways. For example, the thermal, homolytic dissociation of an initiator typically directly yields two free radicals per initiator molecule.
- a photoinitiator i.e., an initiator which absorbs light energy, may produce free radicals by either of two pathways:
- the photoinitiator undergoes excitation by energy absorption with subsequent decomposition into one or more radicals
- the photoinitiator undergoes excitation and the excited species interacts with a second compound (by either energy transfer or a redox reaction) to form free radicals from the latter and/or former compound(s).
- x is an integer from 1 to 4, and R and R2 each independently
- O N— represent H- ; ⁇ ' ; (R)2N- where R is an alkyl group having from one to six carbon atoms; a chalcone; HSO3-; and NaSC»3- .
- the present invention is directed to photoinitiators having the following formula:
- x is an integer from 1 to 4.
- the present invention is directed to the above-described photoinitiators, compositions containing the same, and methods for generating a reactive species which includes providing one or more of the photoinitiators and irradiating the one or more photoinitiators.
- One of the main advantages of the photoinitiators of the present invention is that they efficiently generate one or more reactive species under extremely low energy lamps, such as excimer lamps, as compared to prior art photoinitiators.
- the present invention is further directed to methods of using the above-described photoinitiators to polymerize and/or photocure a polymerizable material.
- the photoinitiators of the present invention result in rapid curing times in comparison to the curing times of prior art photoinitiators, even with relatively low output lamps.
- the present invention includes a method of polymerizing an unsaturated monomer by exposing the unsaturated monomer to radiation in the presence of the efficacious wavelength specific photoinitiator composition described above. When an unsaturated oligomer/ monomer mixture is employed in place of the unsaturated monomer, curing is accomplished.
- the present invention further includes a film and a method for producing a film, by drawing an admixture of unsaturated polymerizable material and one or more photoinitiators of the present invention, into a film and irradiating the film with an amount of radiation sufficient to polymerize the composition.
- the admixture may be drawn into a film on a nonwoven web or on a fiber, thereby providing a polymer-coated nonwoven web or fiber, and a method for producing the same.
- the present invention is also directed to an adhesive composition comprising an unsaturated polymerizable material admixed with one or more photoinitiators of the present invention.
- the present invention includes a laminated structure comprising at least two layers bonded together with the above- described adhesive composition, in which at least one layer is a nonwoven web or film. Accordingly, the present invention provides a method of laminating a structure wherein a structure having at least two layers with the above-described adhesive composition between the layers is irradiated to polymerize the adhesive composition.
- the present invention is directed to energy-efficient reactive photoinitiators and methods for utilizing the same. More particularly, the present invention is directed to new photoinitiators having the following general formula:
- x is an integer from 1 to 4, and Ri and R2 each independently
- the photoinitiator comprises bis-phthaloylglycine sulfide compounds having the following formula: O O C(S) X C CH 2 O
- x is an integer from 1 to 4.
- the present invention also includes a method of polymerizing an unsaturated polymerizable material by exposing the unsaturated material to radiation in the presence of one or more of the photoinitiators described above. Further, the present invention is directed to a film and a method for producing a film, by drawing an admixture of unsaturated polymerizable material and one or more of the photoinitiators described above, into a film and irradiating the film with an amount of radiation sufficient to polymerize the admixture.
- the present invention is further directed to an adhesive composition comprising an unsaturated polymerizable material admixed and one or more photoinitiators of the present invention.
- the present invention includes a laminated structure comprising at least two layers bonded together with the above- described adhesive composition.
- the present invention further provides a method of laminating a structure wherein a structure having at least two layers with the above-described adhesive composition between the layers is irradiated to polymerize the adhesive composition.
- reactive species is used herein to mean any chemically reactive species including, but not limited to, free-radicals, cations, anions, nitrenes, and carbenes. Illustrated below are examples of several of such species.
- carbenes include, for example, methylene or carbene, dichlorocarbene, diphenylcarbene, alkylcarbonylcarbenes, siloxycarbenes, and dicarbenes.
- nitrenes include, also by way of example, nitrene, alkyl nitrenes, and aryl nitrenes. Cations (sometimes referred to as carbocations or
- 5 carbonium ions include, by way of illustration, primary, secondary, and tertiary alkyl carbocations, such as methyl cation, ethyl cation, propyl cation, /--butyl cation, f-pentyl cation, £-hexyl cation; allylic cations; benzylic cations; aryl cations, such as triphenyl cation; cyclopropylmethyl cations; methoxymethyl cation; triarylsulphonium cations; and acyl cations.
- primary, secondary, and tertiary alkyl carbocations such as methyl cation, ethyl cation, propyl cation, /--butyl cation, f-pentyl cation, £-hexyl cation
- allylic cations such as methyl cation, ethyl cation, prop
- Cations also include those formed from various metal salts, such as tetra-n-butylammonium tetrahaloaurate(III) salts; sodium tetrachloroaurate(III); vanadium tetrachloride; and silver, copper(I) and (II), and thallium(I) triflates.
- metal salts such as tetra-n-butylammonium tetrahaloaurate(III) salts; sodium tetrachloroaurate(III); vanadium tetrachloride; and silver, copper(I) and (II), and thallium(I) triflates.
- anions include, by way of example, alkyl anions, such as ethyl anion, npropyl anion, isobutyl anion, and neopentyl anion; cycloalkyl anions, such as cyclopropyl anion, cyclobutyl anion, and cyclopentyl anion; allylic anions; benzylic anions; aryl cations; and sulfur- or phosphorus-containing alkyl anions.
- alkyl anions such as ethyl anion, npropyl anion, isobutyl anion, and neopentyl anion
- cycloalkyl anions such as cyclopropyl anion, cyclobutyl anion, and cyclopentyl anion
- allylic anions such as cyclopropyl anion, cyclobutyl anion, and cyclopentyl anion
- benzylic anions such as
- organometallic photoinitiators include titanocenes, fluorinated diaryltitanocenes, iron arene complexes, manganese decacarbonyl, and methyl cyclopentadienyl manganese tricarbonyl.
- Organometallic photoinitiators generally produce free radicals or cations.
- quantum yield is used herein to indicate the efficiency of a photochemical process. More particularly quantum yield is a measure of the probability that a particular molecule will absorb a quantum of light during its interaction with a photon. The term expresses the number of photochemical events per photon absorbed. Thus, quantum yields may vary from zero (no absorption) to 1.
- polymerization is used herein to mean the combining, e.g. covalent bonding, of large numbers of smaller molecules, such as monomers, to form very large molecules, i.e., macromolecules or polymers.
- the monomers may be combined to form only linear macromolecules or they may be combined to form three-dimensional macromolecules, commonly referred to as crosslinked polymers.
- curing means the polymerization of functional oligomers and monomers, or even polymers, into a crosslinked polymer network.
- curing is the polymerization of unsaturated monomers or oligomers in the presence of crosslinking agents.
- unsaturated monomer “functional oligomer”
- crosslinking agent is used herein with their usual meanings and are well understood by those having ordinary skill in the art. The singular form of each is intended to include both the singular and the plural, i.e., one or more of each respective material.
- unsaturated polymerizable material is meant to include any unsaturated material capable of undergoing polymerization.
- the term encompasses unsaturated monomers, oligomers, and crosslinking agents.
- the singular form of the term is intended to include both the singular and the plural.
- the term "fiber” as used herein denotes a threadlike structure.
- the fibers used in the present invention may be any fibers known in the art.
- the term "nonwoven web” as used herein denotes a web-like matter comprised of one or more overlapping or interconnected fibers in a nonwoven manner. It is to be understood that any nonwoven fibers known in the art may be used in the present invention.
- Photoinitiators of the Present Invention The present invention is directed to new photoinitiators having the following general formula:
- x is an integer from 1 to 4, and Ri and R2 each independently
- O N— represent H- ; ⁇ ' ; (R)2N- where R is an alkyl group having from one to six carbon atoms; a chalcone; HSO3-; and NaS ⁇ 3- .
- the photoinitiator comprises bis- m-morpholinobenzoyl trisulfide having the following formula:
- the photoinitiator comprises a bis-dialkylaminobenzoyl trisulfide having the following formula:
- the photoinitiator comprises bis-m-dimethylaminobenzoyl trisulfide having the following formula:
- the photoinitiator comprises a water-soluble photoinitiator having the following structure:
- the photoinitiator comprises bis-phthaloylglycine trisulfide having the following formula:
- the photoinitiators of the present invention may be prepared by any reaction mechanism known to those of ordinary skill in the art.
- special reagents, used to prepare the photoinitiators of the present invention are produced by reacting sulfur with a desired amount of lithium triethylborohydride to produce lithium sulfide compounds. The above-described reaction is shown by the following mechanism:
- lithium sulfide compounds may be produced by the above- described reaction including, but not limited to, Li2S, Li2S2, and U2S3.
- y is an integer from 1 to 4.
- y is an integer from 1 to 4.
- the above-described reaction results in a variety of lithium sulfide compounds wherein y varies from 1 to 3.
- these compounds may be separated using separation techniques known to those of ordinary skill in the art if desired.
- the lithium sulfide compounds may be further reacted with a substituted benzoyl chloride, a phthaloylglycine chloride or other carbonyl chloride compounds to produce one or more photoinitiators of the present invention.
- a substituted benzoyl chloride a phthaloylglycine chloride or other carbonyl chloride compounds to produce one or more photoinitiators of the present invention.
- a morpholinobenzoyl chloride is reacted with one or more lithium sulfide compounds to produce one or more morpholinobenzoyl sulfide compounds.
- phthaloylglycine chloride is reacted with one or more lithium sulfide compounds to produce one or more phthaloylglycine sulfide compounds.
- the resulting photoinitiators are stable at room temperature (from about 15 C to 25°C) and normal room humidity (from about 30% to 60%). However, upon exposure to radiation, the photoinitiators efficiently produce one or more free radicals.
- the photoinitiators of the present invention have a high intensity of absorption.
- the photoinitiators of the present invention may have a molar extinction coefficient greater than about 2,000 liters per mole per cm (1 mole " lcm " l) at an absorption maximum.
- the photoinitiators of the present invention may have a molar extinction coefficient (absorptivity) greater than about 5,000 1 mole ' lcm ' l.
- the photoinitiators of the present invention may have a molar extinction coefficient (absorptivity) greater than about 10,000 l mole ' lcm "1 .
- the photoinitiators of the present invention will have a molar extinction coefficient greater than about 20,000 1 mole " 1 1 cm -1.
- the present invention is also directed to a method of generating a reactive species.
- the method of generating a reactive species involves generating a reactive species by exposing one or more of the above-described photoinitiators to radiation. The exposure of the photoinitiators to a radiation source triggers a photochemical process.
- quantum yield is used herein to indicate the efficiency of a photochemical process. More particularly, quantum yield is a measure of the probability that a particular molecule (photoinitiator) will absorb a quantum of light during its interaction with a photon. The term expresses the number of photochemical events per photon absorbed. Thus, quantum yields may vary from zero (no absorption) to 1.
- the photoinitiators of the present invention absorb photons having a specific wavelength and transfers the absorbed energy to one or more excitable portions of the molecule.
- the excitable portion of the molecule absorbs enough energy to cause a bond breakage, which
- the photoinitiators of the present invention desirably will have a quantum yield greater than about 0.5. More desirably, the quantum yield of the photoinitiators of the present invention will be greater than about 0.6. Even more desirably, the quantum yield of the photoinitiators of the present invention will be greater than about 0.7. Still more desirably, the quantum yield of the photoinitiators of the present invention will be greater than about 0.8, with the most desirable quantum yield being greater than about 0.9.
- the photoinitiators of the present invention may be employed in any situation where reactive species are required, such as for the polymerization of an unsaturated monomer and the curing of an unsaturated oligomer/ monomer mixture.
- the unsaturated monomers and oligomers may be any of those known to one having ordinary skill in the art.
- the polymerization and curing media also may contain other materials as desired, such as pigments, extenders, amine synergists, and such other additives as are well known to those having ordinary skill in the art.
- examples of unsaturated monomers and oligomers include ethylene, propylene, vinyl chloride, isobutylene, styrene, isoprene, acrylonitrile, acrylic acid, methacylic acid, ethyl acrylate, methyl methacrylate, vinyl acrylate, allyl methacrylate, tripropylene glycol diacrylate, trimethylol propane ethoxylate acrylate, epoxy acrylates, such as the reaction product of a bisphenol A epoxide with acrylic acid; polyester acrylates, such as the reaction product of acrylic acid with an adipic acid/ hexanediol-based polyester, urethane acrylates, such as the reaction product of hydroxypropyl acrylate with diphenylmethane-4,4'-diisocyanate, and polybutadiene diacrylate oligomer.
- the types of reactions that various reactive species enter into include, but are not limited to, addition reactions, including poly
- the present invention also comprehends a method of polymerizing an unsaturated monomer by exposing the unsaturated monomer to radiation in the presence of the efficacious photoinitiators of the present invention described above.
- an unsaturated oligomer /monomer mixture is employed in place of the unsaturated monomer, curing is accomplished.
- the polymerizable material admixed with the photoinitiators of the present invention is to be admixed by means known in the art, and that the mixture will be irradiated with an amount of radiation sufficient to polymerize the material.
- the amount of radiation sufficient to polymerize the material is readily determinable by one of ordinary skill in the art, and depends upon the identity and amount of photoinitiators, the identity and amount of the polymerizable material, the intensity and wavelength of the radiation, and the duration of exposure to the radiation.
- radiation exposure results in the generation of free radicals from the photoinitiators of the present invention by one or more of the following: cleavage of a sulfur-sulfur bond resulting in two sulfur-terminated free radicals; and cleavage of a carbon-sulfur bond resulting in a carbon-terminated free radical and a sulfur- terminated free radical.
- the present invention further includes a film and a method for producing a film, by drawing an admixture of unsaturated polymerizable material and one or more photoinitiators of the present invention, into a film and irradiating the film with an amount of radiation sufficient to polymerize the composition.
- the unsaturated polymerizable material is an unsaturated oligomer /monomer mixture
- curing is accomplished.
- Any film thickness may be produced, as per the thickness of the admixture formed, so long as the admixture sufficiently polymerizes upon exposure to radiation.
- the admixture may be drawn into a film on a nonwoven web or on a fiber, thereby providing a polymer-coated nonwoven web or fiber, and a method for producing the same. Any method known in the art of drawing the admixture into a film may be used in the present invention.
- the present invention also includes an adhesive composition comprising an unsaturated polymerizable material admixed with one or more photoinitiators of the present invention.
- the present invention includes a laminated structure comprising at least two layers bonded together with the above-described adhesive composition.
- a laminate is produced wherein at least one layer is a cellulosic or polyolefin nonwoven web or film. Accordingly, the present invention provides a method of laminating a structure wherein a structure having at least two layers with the above-described adhesive composition between the layers is irradiated to polymerize the adhesive composition.
- the adhesive is irradiated to cure the composition.
- any layers may be used in the laminates of the present invention, on the condition that at least one of the layers allows sufficient radiation to penetrate through the layer to enable the admixture to polymerize sufficiently.
- any cellulosic or polyolefin nonwoven web or film known in the art may be used as one of the layers so long as they allow radiation to pass through.
- the amount of radiation sufficient to polymerize the admixture is readily determinable by one of ordinary skill in the art, and depends upon the identity and amount of photoinitiator, the identity and amount of the polymerizable material, the thickness of the admixture, the identity and thickness of the layer, the intensity and wavelength of the radiation, and the duration of exposure to the radiation.
- the radiation to which the photoinitiators of the present invention may be exposed generally will have a wavelength of from about 4 to about 1,000 nanometers.
- the radiation may be ultraviolet radiation, including near ultraviolet and far or vacuum ultraviolet radiation; visible radiation; and near infrared radiation.
- the radiation will have a wavelength of from about 100 to about 900 nanometers. More desirably, the radiation will have a
- the radiation will be ultraviolet radiation having a wavelength of from about 4 to about 400 nanometers. More desirably, the radiation will have a wavelength of from about 100 to about 390 nanometers, and even more desirably will have a wavelength of from 200 to about 380 nanometers. For example, the radiation may have a wavelength of from about 222 to about 370 nanometers.
- the radiation desirably will be incoherent, pulsed ultraviolet radiation from a dielectric barrier discharge excimer lamp or radiation from a mercury lamp.
- Excimers are unstable excited-state molecular complexes which occur only under extreme conditions, such as those temporarily existing in special types of gas discharge.
- Typical examples are the molecular bonds between two rare gaseous atoms or between a rare gas atom and a halogen atom.
- Excimer complexes dissociate within less than a microsecond and, while they are dissociating, release their binding energy in the form of ultraviolet radiation.
- the dielectric barrier excimers in general emit in the range of from about 125 nm to about 500 nm, depending upon the excimer gas mixture.
- Dielectric barrier discharge excimer lamps (also referred to hereinafter as “excimer lamp”) are described, for example, by U.
- Lenzburg, Switzerland, and at the present time are available from Heraeus ⁇ oblelight GmbH, Kleinostheim, Germany.
- the excimer lamp emits incoherent, pulsed ultraviolet radiation.
- Such radiation has a relatively narrow bandwidth, i.e., the half width is of the order of approximately 5 to 100 nanometers.
- the radiation will have a half width of the order of approximately 5 to 50 nanometers, and more desirably will have a half width of the order of 5 to 25 nanometers. Most desirably, the half width will be of the order of approximately 5 to 15 nanometers.
- the ultraviolet radiation emitted from an excimer lamp can be emitted in a plurality of wavelengths, wherein one or more of the wavelengths within the band are emitted at a maximum intensity. Accordingly, a plot of the wavelengths in the band against the intensity for each wavelength in the band produces a bell curve. The "half
- width of the range of ultraviolet radiation emitted by an excimer lamp is defined as the width of the bell curve at 50% of the maximum height of the bell curve.
- the emitted radiation of an excimer lamp is incoherent and pulsed, the frequency of the pulses being dependent upon the frequency of the alternating current power supply which typically is in the range of from about 20 to about 300 kHz.
- An excimer lamp typically is identified or referred to by the wavelength at which the maximum intensity of the radiation occurs, which convention is followed throughout this specification and the claims.
- excimer lamp radiation is essentially monochromatic.
- the source of radiation used with the photoinitiators of the present invention may be any radiation source known to those of ordinary skill in the art.
- a mercury lamp with a D-bulb which produces radiation having an emission peak of 350 nm is used to produce free radicals from the above-described photoinitiators.
- This radiation source is particularly useful when matched with one or more photoinitiators of the present invention having an absorption maximum of 350 nanometers, corresponding to the emission peak of the mercury lamp.
- the photoinitiators of the present invention absorbing radiation in the range of about 250 to about 350 nanometers, the photoinitiators of the present invention will generate one or more reactive species upon exposure to sunlight. Accordingly, these photoinitiators of the present invention provides a method for the generation of reactive species that does not require the presence of a special light source.
- the photoinitiators of the present invention enable the production of adhesive and coating compositions that consumers can apply to a desired object and polymerize or cure upon exposure to sunlight. These photoinitiators also enable numerous industry applications wherein unsaturated polymerizable materials may be polymerized merely upon exposure to sunlight. Therefore, depending upon how the photoinitiator is designed, the photoinitiator of the present invention can eliminate the cost of purchasing and maintaining light sources in numerous industries wherein such light
- the effective tuning of the photoinitiators of the present invention for a specific wavelength band permits the photoinitiators of the present invention to more efficiently utilize the target radiation in the emission spectrum of the radiating source corresponding to the "tuned" wavelength band, even though the intensity of such radiation may be much lower than, for example, radiation from a narrow band emitter, such as an excimer lamp.
- a narrow band emitter such as an excimer lamp.
- the photoinitiators of the present invention may be desirable to utilize a mercury lamp that emits radiation having a wavelength of approximately 350 nm with the substituted benzoyl-containing photoinitiators of the present invention.
- the effectiveness of the photoinitiators of the present invention is not necessarily dependent upon the availability or use of a narrow wavelength band radiation source.
- a major advantage of the photoinitiators of the present invention is that they have rapid curing times in comparison to the curing times of the prior art.
- Another advantage of the present invention is that the photoinitiators of the present invention are highly sensitive photoinitiators and are beneficially used in situations having lower light levels.
- the above reagents including 25 g of 3-morpholinobenzoic acid and 15.2 g of oxalyl chloride, were mixed in dioxane at 0°C under argon gas. The reaction proceeded for about 2 hours, one hour at 0°C and one hour at room temperature. The solvent was then removed under reduced pressure to yield 22.1 g of 3-morpholinobenzoyl chloride, which was used without further purification.
- the reaction product was filtered to yield a yellow solid which was washed with water, benzene, and subsequently dried under vacuum.
- the reaction yielded 3.4 g of bis-m-morpholinobenzoyl trisulfide.
- the reaction HPLC showed complete reaction after about 30 minutes, yielding two products with retention times respectively of about 10 and about 15 minutes in a ratio of about 25:75.
- the 75% peak was the bis-m-morpholinobenzoyl trisulfide solid while the 25% peak was in the filtrated liquid.
- EXAMPLE 9 Photocuring bis-p -morpholinobenzoyl trisulfide in red ⁇ exo resin
- a 2% wt/wt mixture of bis-p-morpholinobenzoyl trisulfide and 1.0 g of red flexo resin (Gamma Graphics) was mixed for about 5 minutes while stirring at a temperature of about 30 to 40°C.
- a drop of the mixture was placed on a metal plate and drawn down with a 0 bar.
- the resulting film was exposed to radiation from a medium pressure mercury lamp for approximately 0.1 seconds to fully cure the film.
Abstract
Description
Claims
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EP99916703A EP1080118A1 (en) | 1998-04-17 | 1999-04-16 | Novel photoinitiators and applications therefor |
AU34961/99A AU3496199A (en) | 1998-04-17 | 1999-04-16 | Novel photoinitiators and applications therefor |
JP2000544701A JP2002512273A (en) | 1998-04-17 | 1999-04-16 | Novel photopolymerization initiator and its use |
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US8214398P | 1998-04-17 | 1998-04-17 | |
US60/082,143 | 1998-04-17 |
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WO2019068182A1 (en) * | 2017-10-02 | 2019-04-11 | HYDRO-QUéBEC | Sulfur-containing compounds and polymers and the use thereof in electrochemical cells |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4245033A (en) * | 1974-12-28 | 1981-01-13 | Canon Kabushiki Kaisha | Heat developable photosensitive composition and a heat developable photosensitive member having a layer comprising the composition |
EP0209831A2 (en) * | 1985-07-23 | 1987-01-28 | FRATELLI LAMBERTI S.p.A. | Substituted benzophenones and their liquid mixtures suitable for use as photopolymerisation initiators |
US5230982A (en) * | 1989-03-09 | 1993-07-27 | The Mead Corporation | Photoinitiator compositions containing disulfides and photohardenable compositions containing the same |
EP0805152A2 (en) * | 1996-05-03 | 1997-11-05 | Ciba SC Holding AG | Cyclic amine substituted phenyl-alkyl-ketone and process for its preparation |
-
1999
- 1999-04-16 JP JP2000544701A patent/JP2002512273A/en active Pending
- 1999-04-16 AU AU34961/99A patent/AU3496199A/en not_active Abandoned
- 1999-04-16 WO PCT/US1999/008527 patent/WO1999054363A1/en not_active Application Discontinuation
- 1999-04-16 EP EP99916703A patent/EP1080118A1/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4245033A (en) * | 1974-12-28 | 1981-01-13 | Canon Kabushiki Kaisha | Heat developable photosensitive composition and a heat developable photosensitive member having a layer comprising the composition |
EP0209831A2 (en) * | 1985-07-23 | 1987-01-28 | FRATELLI LAMBERTI S.p.A. | Substituted benzophenones and their liquid mixtures suitable for use as photopolymerisation initiators |
US5230982A (en) * | 1989-03-09 | 1993-07-27 | The Mead Corporation | Photoinitiator compositions containing disulfides and photohardenable compositions containing the same |
EP0805152A2 (en) * | 1996-05-03 | 1997-11-05 | Ciba SC Holding AG | Cyclic amine substituted phenyl-alkyl-ketone and process for its preparation |
Non-Patent Citations (2)
Title |
---|
BULL. CHEM. SOC. JPN. (1966), 39(10), 2206-11 * |
DATABASE CHEMABS [online] CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US; TSUDA, KAZUICHI ET AL: "Vinyl polymerization. CXLVI. The influence of dibenzoyl disulfide derivatives on radical polymerizations", XP002112116, retrieved from STN Database accession no. 66:29198 * |
Cited By (3)
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WO2019068182A1 (en) * | 2017-10-02 | 2019-04-11 | HYDRO-QUéBEC | Sulfur-containing compounds and polymers and the use thereof in electrochemical cells |
CN111164073A (en) * | 2017-10-02 | 2020-05-15 | 魁北克电力公司 | Sulfur-containing compounds and polymers and their use in electrochemical cells |
US11469419B2 (en) | 2017-10-02 | 2022-10-11 | Hydro-Quebec | Sulfur-containing compounds and polymers and the use thereof in electrochemical cells |
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