DE3462141D1 - Photopolymerization initiator and method of photopolymerization by use of said initiator - Google Patents

Photopolymerization initiator and method of photopolymerization by use of said initiator

Info

Publication number
DE3462141D1
DE3462141D1 DE8484302473T DE3462141T DE3462141D1 DE 3462141 D1 DE3462141 D1 DE 3462141D1 DE 8484302473 T DE8484302473 T DE 8484302473T DE 3462141 T DE3462141 T DE 3462141T DE 3462141 D1 DE3462141 D1 DE 3462141D1
Authority
DE
Germany
Prior art keywords
photopolymerization
initiator
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484302473T
Other languages
English (en)
Inventor
Komai Takeshi
Shimizu Mamoru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Application granted granted Critical
Publication of DE3462141D1 publication Critical patent/DE3462141D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C409/00—Peroxy compounds
    • C07C409/38—Peroxy compounds the —O—O— group being bound between a >C=O group and a carbon atom, not further substituted by oxygen atoms, i.e. esters of peroxy acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
DE8484302473T 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator Expired DE3462141D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58072277A JPS59197401A (ja) 1983-04-26 1983-04-26 光重合開始剤

Publications (1)

Publication Number Publication Date
DE3462141D1 true DE3462141D1 (en) 1987-02-26

Family

ID=13484625

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484302473T Expired DE3462141D1 (en) 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator

Country Status (4)

Country Link
US (2) US4970244A (de)
EP (1) EP0126541B1 (de)
JP (1) JPS59197401A (de)
DE (1) DE3462141D1 (de)

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KR101712683B1 (ko) 2009-03-23 2017-03-06 바스프 에스이 포토레지스트 조성물
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US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
JP5659189B2 (ja) * 2011-05-13 2015-01-28 富士フイルム株式会社 非共鳴２光子吸収材料、非共鳴２光子吸収記録材料、記録媒体、記録再生方法及び非共鳴２光子吸収化合物
KR102006041B1 (ko) 2011-12-07 2019-07-31 바스프 에스이 옥심 에스테르 광개시제
CN105198793B (zh) 2012-05-09 2019-08-13 巴斯夫欧洲公司 肟酯光敏引发剂
EP2909165B1 (de) 2012-10-19 2018-05-30 IGM Group B.V. Hybride photoinitiatoren
CN114181249A (zh) 2012-12-19 2022-03-15 Igm集团公司 双酰基次膦酸的衍生物、其制备及其作为光敏引发剂的用途
JP6469669B2 (ja) 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
US9796740B2 (en) 2013-07-08 2017-10-24 Basf Se Liquid bisacylphosphine oxide photoinitiator
JP6530410B2 (ja) 2013-09-10 2019-06-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
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US10487050B2 (en) 2014-08-29 2019-11-26 Basf Se Oxime sulfonate derivatives
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WO2016124493A1 (en) 2015-02-02 2016-08-11 Basf Se Latent acids and their use
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JP7031605B2 (ja) * 2016-12-13 2022-03-08 日油株式会社 ペルオキシシンナメート誘導体、該化合物を含有する重合性組成物
JP7021668B2 (ja) * 2017-06-01 2022-02-17 日油株式会社 トリアジンペルオキシド誘導体、該化合物を含有する重合性組成物
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KR20200125934A (ko) 2018-02-23 2020-11-05 바스프 에스이 유기 개질 금속 산화물 또는 준금속 산화물 중합체 필름
CN112673012A (zh) 2018-09-07 2021-04-16 意大利艾坚蒙树脂有限公司 多官能双酰基氧化膦光引发剂
TWI818087B (zh) * 2018-09-26 2023-10-11 日商日油股份有限公司 具有噻噸酮骨架的二烷基過氧化物、含有該具有噻噸酮骨架的二烷基過氧化物的聚合性組合物、由該聚合性組合物形成的固化物及該固化物的製備方法
US11834532B2 (en) 2018-12-28 2023-12-05 Igh Resins Italia S.R.L. Photoinitiators
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
CN114829348A (zh) 2019-10-11 2022-07-29 意大利艾坚蒙树脂有限公司 用于led光固化的香豆素乙醛酸酯
CN115210219A (zh) 2020-03-04 2022-10-18 巴斯夫欧洲公司 肟酯光引发剂
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
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Also Published As

Publication number Publication date
US4970244A (en) 1990-11-13
JPH0360322B2 (de) 1991-09-13
EP0126541B1 (de) 1987-01-21
US4777191A (en) 1988-10-11
EP0126541A1 (de) 1984-11-28
JPS59197401A (ja) 1984-11-09

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee