MX2011007229A - Mezcla de fotoiniciador liquido. - Google Patents

Mezcla de fotoiniciador liquido.

Info

Publication number
MX2011007229A
MX2011007229A MX2011007229A MX2011007229A MX2011007229A MX 2011007229 A MX2011007229 A MX 2011007229A MX 2011007229 A MX2011007229 A MX 2011007229A MX 2011007229 A MX2011007229 A MX 2011007229A MX 2011007229 A MX2011007229 A MX 2011007229A
Authority
MX
Mexico
Prior art keywords
blend
liquid
weight
relates
photoinitiator
Prior art date
Application number
MX2011007229A
Other languages
English (en)
Inventor
Clemens Auschra
Wolfgang Peter
Steffen Onclin
Svetozar Lucic
Karin Powell
Frank Oliver Heinrich Pirrung
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Publication of MX2011007229A publication Critical patent/MX2011007229A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Paints Or Removers (AREA)

Abstract

La presente invención se refiere a una mezcla líquida homogénea que comprende un fotoiniciador y un agente t.ensioactivo de alcoxilato para incorporación en sistemas curables por radiación con base acuosa y basados en solventes. En particular la invención se refiere a una mezcla liquida homogénea que es líquida a temperatura ambiente que comprende por lo menos 30% en peso con respecto a la mezcla completa de un fotoinciador sólido del tipo de radicales y 1-70% en peso de por lo menos un agente de superficie activa líquida alcoxilada y opcionalmente un diluyente orgánico.
MX2011007229A 2009-01-14 2010-01-04 Mezcla de fotoiniciador liquido. MX2011007229A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP09150509 2009-01-14
PCT/EP2010/050003 WO2010081749A1 (en) 2009-01-14 2010-01-04 Liquid photoinitiator blend

Publications (1)

Publication Number Publication Date
MX2011007229A true MX2011007229A (es) 2011-08-03

Family

ID=40846969

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2011007229A MX2011007229A (es) 2009-01-14 2010-01-04 Mezcla de fotoiniciador liquido.

Country Status (11)

Country Link
US (1) US8426484B2 (es)
EP (1) EP2387589B1 (es)
JP (1) JP5701221B2 (es)
KR (1) KR101734588B1 (es)
CN (1) CN102282178B (es)
AU (1) AU2010205793A1 (es)
BR (1) BRPI1006180A2 (es)
ES (1) ES2556341T3 (es)
MX (1) MX2011007229A (es)
PL (1) PL2387589T3 (es)
WO (1) WO2010081749A1 (es)

Families Citing this family (18)

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Publication number Priority date Publication date Assignee Title
CN102532966A (zh) * 2010-12-28 2012-07-04 汪宏伟 紫外光固化uv油制备方法
JP2013182174A (ja) * 2012-03-02 2013-09-12 Toyo Ink Sc Holdings Co Ltd 感光性樹脂組成物
EP3019508B1 (en) * 2013-07-08 2019-01-30 IGM Group B.V. Liquid bisacylphosphine oxide photoinitiator
EP2942361A1 (en) * 2014-05-06 2015-11-11 Basf Se Grain enhancement with surfactants in water-based uv-radiation curable polyurethane dispersions
JP2017514964A (ja) * 2014-05-07 2017-06-08 チュビタック （ターキー ビリムセル ヴィ テクノロジク アラスティルマ クルム）Ｔｕｂｉｔａｋ （Ｔｕｒｋｉｙｅ Ｂｉｌｉｍｓｅｌ Ｖｅ Ｔｅｋｎｏｌｏｊｉｋ Ａｒａｓｔｉｒｍａ Ｋｕｒｕｍｕ） 眼内レンズ（ｉｏｌ）を生産するための組成物及びレンズ製造方法
KR102408921B1 (ko) 2015-01-07 2022-06-14 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 블랙 매트릭스의 제조방법
JP6497131B2 (ja) * 2015-03-02 2019-04-10 富士ゼロックス株式会社 三次元造形物用の硬化剤、三次元造形物の製造装置、及び三次元造形物の製造プログラム
CN104761662B (zh) * 2015-03-31 2017-01-04 北京化工大学 一种水溶性二苯甲酮光引发剂及其制备方法
US9988539B2 (en) * 2015-11-12 2018-06-05 Ricoh Company, Ltd. Active-energy-ray-curable composition, active-energy-ray-curable ink, composition stored container, two-dimensional or three-dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured material, and structure
US10324058B2 (en) 2016-04-28 2019-06-18 Medtronic Minimed, Inc. In-situ chemistry stack for continuous glucose sensors
CN108948232B (zh) * 2017-05-24 2022-03-15 深圳有为技术控股集团有限公司 新型光引发剂混合物
US11236101B2 (en) 2017-12-19 2022-02-01 Basf Se Cyanoaryl substituted benz(othi)oxanthene compounds
WO2019243286A1 (en) 2018-06-22 2019-12-26 Basf Se Photostable cyano-substituted boron-dipyrromethene dye as green emitter for display and illumination applications
US11279838B2 (en) 2018-07-13 2022-03-22 Sun Chemical Corporation Electron beam curable compositions comprising polyols
AU2019401274A1 (en) 2018-12-17 2021-07-08 Dow Global Technologies Llc Method for preparing a benzophenone derivative
BR112021009350A2 (pt) * 2018-12-17 2021-08-10 Dow Global Technologies Llc composto, e, composição de revestimento
CN113549167B (zh) * 2021-07-22 2022-12-09 浙江东海新材料科技股份有限公司 一种高效通用型紫外光引发剂的制备工艺
WO2023161049A1 (en) * 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators

Family Cites Families (17)

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Publication number Priority date Publication date Assignee Title
US4186108A (en) * 1978-02-08 1980-01-29 Minnesota Mining And Manufacturing Company Liquid compositions containing triarylsulfonium complex salts and oxyethylene material
JPS59197401A (ja) 1983-04-26 1984-11-09 Nippon Oil & Fats Co Ltd 光重合開始剤
US4563438A (en) 1983-05-06 1986-01-07 Ciba Geigy Corporation Liquid mixture of photoinitiators
DE3815622A1 (de) * 1988-05-07 1989-11-16 Merck Patent Gmbh Fotoinitiator-dispersionen
IT1228982B (it) * 1989-03-07 1991-07-11 Lamberti Flli Spa Dispersioni acquose di fotoiniziatori e loro impiego.
JP3154257B2 (ja) * 1990-09-06 2001-04-09 フラテッリ ランベルティ エス ピー エイ 光重合開始剤の水性分散系及びそれらの用途
US5362605A (en) * 1993-05-10 1994-11-08 W. R. Grace & Co.-Conn. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
EP1100772B1 (en) * 1998-07-31 2004-04-14 Ciba SC Holding AG Open chain alkoxyamine compounds and their use as polymerization regulators
EP1230276B1 (en) 1999-10-20 2005-12-14 Ciba SC Holding AG Photoinitiator formulations
JP2002128815A (ja) * 2000-10-20 2002-05-09 Toyobo Co Ltd 光硬化性組成物およびその硬化方法
CN1511166A (zh) * 2001-04-27 2004-07-07 Ucb公司 光敏引发剂组合物
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
DE602004011919T2 (de) * 2004-07-15 2009-02-26 Agfa Graphics N.V. Neue Polymerisationsinitiatoren
EP1940982A1 (en) * 2005-10-21 2008-07-09 Agfa Graphics Nv Curable inkjet ink set and methods for inkjet printing
JP5506662B2 (ja) 2007-04-25 2014-05-28 ビーエーエスエフ ソシエタス・ヨーロピア 木材用着色クリアコーティング
WO2009103613A1 (en) 2008-02-22 2009-08-27 Basf Se Fluoro levelling agents
CN102027077B (zh) 2008-05-15 2013-10-16 巴斯夫欧洲公司 用于溶剂型涂料的无硅消泡剂

Also Published As

Publication number Publication date
WO2010081749A1 (en) 2010-07-22
PL2387589T3 (pl) 2016-02-29
US8426484B2 (en) 2013-04-23
KR101734588B1 (ko) 2017-05-11
JP5701221B2 (ja) 2015-04-15
EP2387589A1 (en) 2011-11-23
AU2010205793A1 (en) 2011-07-28
US20120035292A1 (en) 2012-02-09
EP2387589B1 (en) 2015-09-23
BRPI1006180A2 (pt) 2019-09-24
CN102282178B (zh) 2014-03-19
CN102282178A (zh) 2011-12-14
KR20110119701A (ko) 2011-11-02
ES2556341T3 (es) 2016-01-15
JP2012515238A (ja) 2012-07-05

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