DE3462141D1 - Photopolymerization initiator and method of photopolymerization by use of said initiator - Google Patents

Photopolymerization initiator and method of photopolymerization by use of said initiator

Info

Publication number
DE3462141D1
DE3462141D1 DE8484302473T DE3462141T DE3462141D1 DE 3462141 D1 DE3462141 D1 DE 3462141D1 DE 8484302473 T DE8484302473 T DE 8484302473T DE 3462141 T DE3462141 T DE 3462141T DE 3462141 D1 DE3462141 D1 DE 3462141D1
Authority
DE
Germany
Prior art keywords
photopolymerization
initiator
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484302473T
Other languages
German (de)
English (en)
Inventor
Komai Takeshi
Shimizu Mamoru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Application granted granted Critical
Publication of DE3462141D1 publication Critical patent/DE3462141D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C409/00—Peroxy compounds
    • C07C409/38—Peroxy compounds the —O—O— group being bound between a >C=O group and a carbon atom, not further substituted by oxygen atoms, i.e. esters of peroxy acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE8484302473T 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator Expired DE3462141D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58072277A JPS59197401A (ja) 1983-04-26 1983-04-26 光重合開始剤

Publications (1)

Publication Number Publication Date
DE3462141D1 true DE3462141D1 (en) 1987-02-26

Family

ID=13484625

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484302473T Expired DE3462141D1 (en) 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator

Country Status (4)

Country Link
US (2) US4970244A (enExample)
EP (1) EP0126541B1 (enExample)
JP (1) JPS59197401A (enExample)
DE (1) DE3462141D1 (enExample)

Families Citing this family (79)

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JP2604453B2 (ja) * 1988-12-14 1997-04-30 積水化学工業株式会社 アクリル系粘着テープ
JP2745602B2 (ja) * 1988-12-22 1998-04-28 日本油脂株式会社 塩化ビニルの重合方法
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JP4213792B2 (ja) * 1998-09-24 2009-01-21 日東電工株式会社 熱硬化型感圧性接着剤とその接着シ―ト類
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JP5524449B2 (ja) 2004-10-25 2014-06-18 チバ ホールディング インコーポレーテッド 機能性ナノ粒子
US7786183B2 (en) * 2005-06-20 2010-08-31 Dow Global Technologies Inc. Coated glass articles
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WO2008077042A1 (en) 2006-12-19 2008-06-26 Dow Global Technologies, Inc. Encapsulated panel assemblies and method for making same
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JP5535064B2 (ja) 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア オキシムエステル光重合開始剤
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KR101587666B1 (ko) * 2007-12-18 2016-01-21 다우 글로벌 테크놀로지스 엘엘씨 유리 결합용 접착제에 대한 접착성이 개선된 창 유리용 보호 코팅
JP5252964B2 (ja) * 2008-03-25 2013-07-31 富士フイルム株式会社 インク組成物、インクジェット用インク及びそれを用いたインクセット
FR2935705B1 (fr) * 2008-09-05 2010-10-29 Univ De Technologie De Compiegne Procede de preparation de polymeres a empreintes moleculaires (pem) par polymerisation radicalaire
KR101734588B1 (ko) 2009-01-14 2017-05-11 바스프 에스이 액체 광개시제 혼합물
KR101712683B1 (ko) 2009-03-23 2017-03-06 바스프 에스이 포토레지스트 조성물
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US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
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US8816211B2 (en) 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
US20120207935A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photocurable inks and methods of use
JP5659189B2 (ja) * 2011-05-13 2015-01-28 富士フイルム株式会社 非共鳴２光子吸収材料、非共鳴２光子吸収記録材料、記録媒体、記録再生方法及び非共鳴２光子吸収化合物
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
EP3354641B1 (en) 2012-05-09 2019-07-17 Basf Se Oxime ester photoinitiators
WO2014060450A1 (en) 2012-10-19 2014-04-24 Basf Se Hybrid photoinitiators
WO2014095724A1 (en) 2012-12-19 2014-06-26 Basf Se Derivatives of bisacylphosphinic acid, their preparation and use as photoinitiators
JP6469669B2 (ja) 2013-07-08 2019-02-13 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
CN111116777A (zh) 2013-07-08 2020-05-08 Igm集团公司 液态双酰基氧化膦光引发剂
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
US9994754B2 (en) 2014-03-27 2018-06-12 3M Innovative Properties Company Filled polydiorganosiloxane-containing compositions, and methods of using same
US10487050B2 (en) 2014-08-29 2019-11-26 Basf Se Oxime sulfonate derivatives
WO2016034963A1 (en) 2014-09-04 2016-03-10 Basf Se Polycyclic photoinitiators
EP3253735B1 (en) 2015-02-02 2021-03-31 Basf Se Latent acids and their use
WO2018041935A1 (en) 2016-09-02 2018-03-08 Igm Group B.V. Polycyclic glyoxylates as photoinitiators
KR20190091439A (ko) 2016-12-13 2019-08-06 니치유 가부시키가이샤 퍼옥시신나메이트 유도체, 그 화합물을 함유하는 중합성 조성물
JP7021668B2 (ja) 2017-06-01 2022-02-17 日油株式会社 トリアジンペルオキシド誘導体、該化合物を含有する重合性組成物
JP6923130B2 (ja) * 2017-08-31 2021-08-18 学校法人東京理科大学 ペルオキシエステル基を有するベンゾフェノン誘導体、該化合物を含有する重合性組成物およびその硬化物、当該硬化物の製造方法
EP3755672B1 (en) 2018-02-23 2024-08-07 Basf Se Organomodified metal oxide or metalloid oxide polymer film
EP3847179A1 (en) 2018-09-07 2021-07-14 IGM Resins Italia S.r.l. Multifunctional bisacylphosphine oxide photoinitiators
WO2020067118A1 (ja) * 2018-09-26 2020-04-02 日油株式会社 チオキサントン骨格を有するジアルキルペルオキシド、該化合物を含有する重合性組成物
EP3902878B1 (en) 2018-12-28 2026-05-06 IGM Resins Italia S.r.l. Photoinitiators
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
GB2582002B (en) * 2019-03-07 2022-12-28 Henkel Ag & Co Kgaa One-part anaerobically curable compositions
EP4041719A1 (en) 2019-10-11 2022-08-17 IGM Resins Italia S.r.l. Coumarin glyoxylates for led photocuring
EP4114825B1 (en) 2020-03-04 2024-11-20 Basf Se Oxime ester photoinitiators
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
EP4482881B1 (en) 2022-02-24 2026-08-12 IGM Resins Italia S.r.l. Photoinitiators
ES3071453T3 (es) 2022-05-06 2026-06-23 Igm Group B V Envase fotoiniciador que comprende fotoiniciadores especializados de óxido de bisacilfosfina y sensibilizadores de abrillantadores ópticos
WO2024074945A1 (en) 2022-10-05 2024-04-11 Igm Resins Italia S.R.L. Polymeric (meth)acrylate photoinitiators
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
JP2026525927A (ja) 2023-07-10 2026-08-04 ベーアーエスエフ・エスエー 低温硬化に適した光硬化性および熱硬化性の組成物
CN121646581A (zh) 2023-08-03 2026-03-10 意大利艾坚蒙树脂有限公司 10,11-二氢-5h-二苯并[b,f]氮杂䓬衍生物作为光聚合中的光引发剂用于光固化组合物
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IT202300028218A1 (it) 2023-12-28 2025-06-28 Igm Resins Italia Srl Nuova forma solida di bis(2,4,6-trimetilbenzoil)-n-ottilfosfina ossido
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US4171252A (en) * 1976-06-25 1979-10-16 Armstrong Cork Company Peroxy photoinitiator system for photopolymerizable compositions
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JPS6147727A (ja) * 1984-10-29 1986-03-08 Toyobo Co Ltd 硬化型樹脂組成物

Also Published As

Publication number Publication date
US4970244A (en) 1990-11-13
EP0126541A1 (en) 1984-11-28
US4777191A (en) 1988-10-11
JPH0360322B2 (enExample) 1991-09-13
JPS59197401A (ja) 1984-11-09
EP0126541B1 (en) 1987-01-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee