JP6807219B2 - 逆浸透膜処理システムおよび逆浸透膜処理方法 - Google Patents
逆浸透膜処理システムおよび逆浸透膜処理方法 Download PDFInfo
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- JP6807219B2 JP6807219B2 JP2016225188A JP2016225188A JP6807219B2 JP 6807219 B2 JP6807219 B2 JP 6807219B2 JP 2016225188 A JP2016225188 A JP 2016225188A JP 2016225188 A JP2016225188 A JP 2016225188A JP 6807219 B2 JP6807219 B2 JP 6807219B2
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- reverse osmosis
- osmosis membrane
- water
- membrane treatment
- mpa
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Images
Classifications
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- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
- B01D61/026—Reverse osmosis; Hyperfiltration comprising multiple reverse osmosis steps
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/08—Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/12—Controlling or regulating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/58—Multistep processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
- B01D63/02—Hollow fibre modules
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Description
R2NSO3H (1)
(式中、Rは独立して水素原子または炭素数1〜8のアルキル基である。)
平均操作圧=(運転圧力+濃縮水出口圧力)/2
本実施形態に係る逆浸透膜処理方法および処理システムにおいて、図2に示すように、被処理水は、予め、前処理において処理された前処理水であることが好ましい。
本実施形態に係る逆浸透膜用改質剤は、「臭素系酸化剤または塩素系酸化剤」と「スルファミン酸化合物」との混合物を含む安定化次亜臭素酸組成物または安定化次亜塩素酸組成物を含有するものであり、さらにアルカリを含有してもよい。
本実施形態に係る改質剤は、臭素系酸化剤または塩素系酸化剤とスルファミン酸化合物とを混合することにより得られ、さらにアルカリを混合してもよい。
窒素雰囲気下で、液体臭素:16.9重量%(wt%)、スルファミン酸:10.7重量%、水酸化ナトリウム:12.9重量%、水酸化カリウム:3.94重量%、水:残分を混合して、安定化次亜臭素酸組成物を調製した。安定化次亜臭素酸組成物のpHは14、全塩素濃度は7.5重量%であった。全塩素濃度は、HACH社の多項目水質分析計DR/4000を用いて、全塩素測定法(DPD(ジエチル−p−フェニレンジアミン)法)により測定した値(mg/L asCl2)である。安定化次亜臭素酸組成物の詳細な調製方法は以下の通りである。
電極タイプ:ガラス電極式
pH測定計:東亜ディーケーケー社製、IOL−30型
電極の校正:関東化学社製中性リン酸塩pH(6.86)標準液(第2種)、同社製ホウ酸塩pH(9.18)標準液(第2種)の2点校正で行った
測定温度:25℃
測定値:測定液に電極を浸漬し、安定後の値を測定値とし、3回測定の平均値
イソプロピルアルコール(IPA)3ppmを含む原水(20m3/h)を図1に示す逆浸透膜処理システムで処理した。1段目の逆浸透膜処理の回収率を75%、2段目の逆浸透膜処理の回収率を90%とした。逆浸透膜は、8インチのスパイラル膜を用い、1段目および2段目の膜本数は、それぞれ10本とした。1段目の逆浸透膜処理には、逆浸透膜として「ES20−D8」(日東電工社製、有効圧力1MPaあたりの透過流束:1.14m3/m2/d)を用い、2段目の逆浸透膜処理には、逆浸透膜として「SWC5MAX」(Hydranautics社製、有効圧力1MPaあたりの透過流束:0.32m3/m2/d)を用いた。結果を表1に示す。
1段目の逆浸透膜処理には、逆浸透膜として「ES20−D8」を用い、2段目の逆浸透膜処理には、逆浸透膜として「SWC5MAX」を用いた。2段目の逆浸透膜には、以下の方法により阻止率向上処理(改質処理)を施した。それ以外は、実施例1と同様にして、逆浸透膜処理を行った。結果を表1に示す。
阻止率向上剤(改質剤)として上記安定化次亜臭素酸組成物10ppmを含む水を、操作圧2.0MPa、pH4、水温25±1℃で通水した。処理後の膜の有効圧力1MPaあたりの透過流束が0.2m3/m2/dとなったところで、処理を終了した。
1段目の逆浸透膜処理、2段目の逆浸透膜処理ともに、「ES20−D8」を用いた。2段目の逆浸透膜には、以下の方法により阻止率向上処理(改質処理)を施した。それ以外は、実施例1と同様にして、逆浸透膜処理を行った。結果を表1に示す。
阻止率向上剤(改質剤)としてポリエチレングリコール(重量平均分子量MW=5000)1ppmを含む水を用い、操作圧1MPa、pH7、水温25℃で、濃縮水および透過水を全量供給水に戻す全循環運転を12時間行った。処理後の膜の有効圧力1MPaあたりの透過流束は1.0m3/m2/dであった。
2段目の逆浸透膜として「ES20」(日東電工社製、有効圧力1MPaあたりの透過流束1.14m3/m2/d)を用いた以外は、実施例1と同様にして、逆浸透膜処理を行った。結果を表1に示す。
2段目の逆浸透膜として「LFC3−LD」(Hydranautics製、有効圧力1MPaあたりの透過流束0.79m3/m2/d)を用いた以外は、実施例1と同様にして、逆浸透膜処理を行った。結果を表1に示す。
実施例2の方法で改質した逆浸透膜を2段目の逆浸透膜処理に用いて、2段目逆浸透膜処理の入口において上記安定化次亜臭素酸組成物を添加しながら1000時間通水した。安定化次亜臭素酸組成物は、2段目逆浸透膜処理の濃縮水において全塩素濃度が1.0(mg/L asCl2)となるように、添加した。その他の通水条件は、実施例2と同じとした。結果を表2に示す。
改質剤として次亜塩素酸を使用して改質した逆浸透膜を用いて、実施例3と同様に通水した。改質条件は、改質剤を次亜塩素酸に変更した以外は実施例2と同じとした。処理後の膜の有効圧力1MPaあたりの透過流束は0.2m3/m2/dであった。この次亜塩素酸により改質した逆浸透膜を2段目の逆浸透膜処理に用いて、2段目逆浸透膜処理の入口において次亜塩素酸を添加しながら1000時間通水した。次亜塩素酸は、2段目逆浸透膜処理の濃縮水において全塩素濃度が1.0(mg/L asCl2)となるように、添加した。その他の通水条件は、実施例2と同じとした。結果を表2に示す。
Claims (8)
- 被処理水を第1逆浸透膜に通水して第1透過水および第1濃縮水を得る第1の逆浸透膜処理手段と、
少なくとも、前記第1透過水を第2逆浸透膜に通水して第2透過水および第2濃縮水を得る第2の逆浸透膜処理手段と、
を備え、
前記第2逆浸透膜の有効圧力1MPaあたりの透過流束が前記第1逆浸透膜の有効圧力1MPaあたりの透過流束より低く、かつ、前記第2逆浸透膜の有効圧力1MPaあたりの透過流束が0.5m3/m2/d以下であることを特徴とする逆浸透膜処理システム。 - 請求項1に記載の逆浸透膜処理システムであって、
前記第2逆浸透膜が、酸化剤により改質された膜であることを特徴とする逆浸透膜処理システム。 - 請求項1に記載の逆浸透膜処理システムであって、
前記第2逆浸透膜が、臭素系酸化剤とスルファミン酸化合物とを含む安定化次亜臭素酸組成物および塩素系酸化剤とスルファミン酸化合物とを含む安定化次亜塩素酸組成物のうち少なくとも1つにより改質された膜であることを特徴とする逆浸透膜処理システム。 - 請求項1〜3の少なくとも1項に記載の逆浸透膜処理システムであって、
前記被処理水は、ホウ素および分子量200以下の低分子有機物の少なくともいずれかを含むことを特徴とする逆浸透膜処理システム。 - 被処理水を第1逆浸透膜に通水して第1透過水および第1濃縮水を得る第1の逆浸透膜処理工程と、
少なくとも、前記第1透過水を第2逆浸透膜に通水して第2透過水および第2濃縮水を得る第2の逆浸透膜処理工程と、
を含み、
前記第2逆浸透膜の有効圧力1MPaあたりの透過流束が前記第1逆浸透膜の有効圧力1MPaあたりの透過流束より低く、かつ、前記第2逆浸透膜の有効圧力1MPaあたりの透過流束が0.5m3/m2/d以下であることを特徴とする逆浸透膜処理方法。 - 請求項5に記載の逆浸透膜処理方法であって、
前記第2逆浸透膜が、酸化剤により改質された膜であることを特徴とする逆浸透膜処理方法。 - 請求項5に記載の逆浸透膜処理方法であって、
前記第2逆浸透膜が、臭素系酸化剤とスルファミン酸化合物とを含む安定化次亜臭素酸組成物および塩素系酸化剤とスルファミン酸化合物とを含む安定化次亜塩素酸組成物のうち少なくとも1つにより改質された膜であることを特徴とする逆浸透膜処理方法。 - 請求項5〜7の少なくとも1項に記載の逆浸透膜処理方法であって、
前記被処理水は、ホウ素および分子量200以下の低分子有機物の少なくともいずれかを含むことを特徴とする逆浸透膜処理方法。
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