JP6349257B2 - ハイブリッドパルス化プラズマ処理システム - Google Patents

ハイブリッドパルス化プラズマ処理システム Download PDF

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Publication number
JP6349257B2
JP6349257B2 JP2014540630A JP2014540630A JP6349257B2 JP 6349257 B2 JP6349257 B2 JP 6349257B2 JP 2014540630 A JP2014540630 A JP 2014540630A JP 2014540630 A JP2014540630 A JP 2014540630A JP 6349257 B2 JP6349257 B2 JP 6349257B2
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gas
pulsing
source
signal
pulse
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JP2015503223A5 (enExample
JP2015503223A (ja
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カナリク・ケレン ジェイコブス
カナリク・ケレン ジェイコブス
グーハ・ジョイディープ
リー・ウォンチュル
フー・チエン
エップラー・アーロン・スコット
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Lam Research Corp
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Lam Research Corp
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/24—Radiofrequency or microwave generators

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
JP2014540630A 2011-11-15 2012-11-12 ハイブリッドパルス化プラズマ処理システム Active JP6349257B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161560001P 2011-11-15 2011-11-15
US61/560,001 2011-11-15
US13/550,546 2012-07-16
US13/550,546 US20130119018A1 (en) 2011-11-15 2012-07-16 Hybrid pulsing plasma processing systems
PCT/IB2012/056341 WO2013072831A1 (en) 2011-11-15 2012-11-12 Hybrid pulsing plasma processing systems

Publications (3)

Publication Number Publication Date
JP2015503223A JP2015503223A (ja) 2015-01-29
JP2015503223A5 JP2015503223A5 (enExample) 2015-12-24
JP6349257B2 true JP6349257B2 (ja) 2018-06-27

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JP2014540630A Active JP6349257B2 (ja) 2011-11-15 2012-11-12 ハイブリッドパルス化プラズマ処理システム

Country Status (7)

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US (1) US20130119018A1 (enExample)
JP (1) JP6349257B2 (enExample)
KR (1) KR102215308B1 (enExample)
CN (2) CN107706077A (enExample)
SG (1) SG11201401750SA (enExample)
TW (1) TWI620831B (enExample)
WO (1) WO2013072831A1 (enExample)

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