JP6076138B2 - カーボンブラックと金属との複合体 - Google Patents

カーボンブラックと金属との複合体 Download PDF

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Publication number
JP6076138B2
JP6076138B2 JP2013040946A JP2013040946A JP6076138B2 JP 6076138 B2 JP6076138 B2 JP 6076138B2 JP 2013040946 A JP2013040946 A JP 2013040946A JP 2013040946 A JP2013040946 A JP 2013040946A JP 6076138 B2 JP6076138 B2 JP 6076138B2
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carbon black
silver
metal
composite
asd
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JP2013040946A
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Japanese (ja)
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JP2013216971A (ja
Inventor
ワン・チャン−ベグリンガー
リンダ・スタッパース
ジャン・フランセル
マイケル・ピー．トーベン
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Rohm and Haas Electronic Materials LLC
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Rohm and Haas Electronic Materials LLC
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/46—Electroplating: Baths therefor from solutions of silver
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/48—Electroplating: Baths therefor from solutions of gold
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/10—Agitating of electrolytes; Moving of racks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/20—Electroplating using ultrasonics, vibrations

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Carbon And Carbon Compounds (AREA)
JP2013040946A 2012-03-02 2013-03-01 カーボンブラックと金属との複合体 Active JP6076138B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261606170P 2012-03-02 2012-03-02
US61/606,170 2012-03-02

Publications (2)

Publication Number Publication Date
JP2013216971A JP2013216971A (ja) 2013-10-24
JP6076138B2 true JP6076138B2 (ja) 2017-02-08

Family

ID=47779943

Family Applications (1)

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JP2013040946A Active JP6076138B2 (ja) 2012-03-02 2013-03-01 カーボンブラックと金属との複合体

Country Status (6)

Country Link
US (2) US20130228465A1 (fr)
EP (1) EP2634293B1 (fr)
JP (1) JP6076138B2 (fr)
KR (1) KR102079961B1 (fr)
CN (1) CN103290457B (fr)
TW (1) TWI539034B (fr)

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US20150176137A1 (en) * 2013-12-20 2015-06-25 University Of Connecticut Methods for preparing substrate cored-metal layer shelled metal alloys
WO2015172846A1 (fr) * 2014-05-16 2015-11-19 Ab Nanol Technologies Oy Composition d'additif pour lubrifiants
DE102014110651B3 (de) * 2014-07-29 2015-07-09 Harting Kgaa Galvanisches Bad zur Abscheidung einer Silberschicht mit Nanopartikeln und Kontaktelement für einen Steckverbinder
RU2656914C1 (ru) * 2017-09-19 2018-06-07 федеральное государственное автономное образовательное учреждение высшего образования "Южный федеральный университет" Способ получения наноструктурного материала оксида олова на углеродном носителе
KR102562279B1 (ko) * 2018-01-26 2023-07-31 삼성전자주식회사 도금액과 금속 복합 재료 및 그 제조 방법
CN110158132A (zh) * 2018-02-13 2019-08-23 华瑞墨石丹阳有限公司 一种绝缘材料的电镀方法
FR3078898B1 (fr) * 2018-03-16 2023-10-13 Nexans Procede de fabrication d'un materiau composite carbone-metal et son utilisation pour fabriquer un cable electrique
DE102018005348A1 (de) * 2018-07-05 2020-01-09 Dr.-Ing. Max Schlötter GmbH & Co KG Silberelektrolyt zur Abscheidung von Dispersions-Silberschichten und Kontaktoberflächen mit Dispersions-Silberschichten
DE102018005352A1 (de) * 2018-07-05 2020-01-09 Dr.-Ing. Max Schlötter GmbH & Co KG Silberelektrolyt zur Abscheidung von Dispersions-Silberschichten und Kontaktoberflächen mit Dispersions-Silberschichten
CN109222210B (zh) * 2018-08-13 2020-07-17 云南中烟工业有限责任公司 一种改性炭材料、其制备方法及用途
JP7405827B2 (ja) 2018-08-21 2023-12-26 ウミコレ・ガルファノテフニック・ゲーエムベーハー 銀の非シアン系析出用電解質
DE102018120357A1 (de) * 2018-08-21 2020-02-27 Umicore Galvanotechnik Gmbh Elektrolyt zur Abscheidung von Silber und Silberlegierungsüberzügen
EP3636804A1 (fr) * 2018-10-11 2020-04-15 ABB Schweiz AG Revêtement composite argent-graphène pour un contact coulissant et son procédé d'électrodéposition
JP6804574B2 (ja) * 2019-01-22 2020-12-23 Ｄｏｗａメタルテック株式会社 複合めっき材およびその製造方法
JP7233991B2 (ja) * 2019-03-18 2023-03-07 Ｄｏｗａメタルテック株式会社 複合めっき材およびその製造方法
CN111554430A (zh) * 2020-05-19 2020-08-18 东莞市硕美电子材料科技有限公司 一种新型复合导电涂浆组合物及其制作方法
EP4328933A1 (fr) * 2022-08-26 2024-02-28 TE Connectivity Solutions GmbH Revêtement sur une surface pour transmettre un courant électrique

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Also Published As

Publication number Publication date
EP2634293B1 (fr) 2018-07-18
JP2013216971A (ja) 2013-10-24
TWI539034B (zh) 2016-06-21
KR20130100756A (ko) 2013-09-11
EP2634293A2 (fr) 2013-09-04
US20150292105A1 (en) 2015-10-15
EP2634293A3 (fr) 2017-01-04
CN103290457A (zh) 2013-09-11
US20130228465A1 (en) 2013-09-05
CN103290457B (zh) 2016-03-16
TW201348519A (zh) 2013-12-01
KR102079961B1 (ko) 2020-02-21

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