JP5937006B2 - 単一またはいくつかの層のグラフェン・ベースの光検出デバイスおよびその形成方法 - Google Patents
単一またはいくつかの層のグラフェン・ベースの光検出デバイスおよびその形成方法 Download PDFInfo
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- JP5937006B2 JP5937006B2 JP2012526004A JP2012526004A JP5937006B2 JP 5937006 B2 JP5937006 B2 JP 5937006B2 JP 2012526004 A JP2012526004 A JP 2012526004A JP 2012526004 A JP2012526004 A JP 2012526004A JP 5937006 B2 JP5937006 B2 JP 5937006B2
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- 229910021389 graphene Inorganic materials 0.000 title claims description 59
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 58
- 238000000034 method Methods 0.000 title claims description 9
- 239000010410 layer Substances 0.000 claims description 60
- 238000001514 detection method Methods 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 8
- 230000003287 optical effect Effects 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 230000005684 electric field Effects 0.000 claims description 4
- 239000002356 single layer Substances 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 4
- 238000000059 patterning Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/881—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being a two-dimensional material
- H10D62/882—Graphene
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
- H10F77/143—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies comprising quantum structures
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/413—Optical elements or arrangements directly associated or integrated with the devices, e.g. back reflectors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/60—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation in which radiation controls flow of current through the devices, e.g. photoresistors
- H10K30/65—Light-sensitive field-effect devices, e.g. phototransistors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Light Receiving Elements (AREA)
- Thin Film Transistor (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Carbon And Carbon Compounds (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/546,097 US8053782B2 (en) | 2009-08-24 | 2009-08-24 | Single and few-layer graphene based photodetecting devices |
| US12/546,097 | 2009-08-24 | ||
| PCT/EP2010/061986 WO2011023603A2 (en) | 2009-08-24 | 2010-08-17 | Single and few-layer graphene based photodetecting devices |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013502735A JP2013502735A (ja) | 2013-01-24 |
| JP2013502735A5 JP2013502735A5 (enExample) | 2013-10-03 |
| JP5937006B2 true JP5937006B2 (ja) | 2016-06-22 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012526004A Expired - Fee Related JP5937006B2 (ja) | 2009-08-24 | 2010-08-17 | 単一またはいくつかの層のグラフェン・ベースの光検出デバイスおよびその形成方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8053782B2 (enExample) |
| EP (1) | EP2438635B1 (enExample) |
| JP (1) | JP5937006B2 (enExample) |
| CN (1) | CN102473844B (enExample) |
| TW (1) | TWI496310B (enExample) |
| WO (1) | WO2011023603A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11833815B2 (en) | 2019-06-08 | 2023-12-05 | Hewlett-Packard Development Company, L.P. | Coatings for optical drop detectors |
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| WO2012145247A1 (en) | 2011-04-14 | 2012-10-26 | Regents Of The University Of Minnesota | An ultra-compact, passive, varactor-based wireless sensor using quantum capacitance effect in graphene |
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| WO2013066447A1 (en) | 2011-08-01 | 2013-05-10 | The Trustees Of Columbia University In The City Of New York | Lens-free planar imager and wireless transmitter |
| KR101819980B1 (ko) | 2011-09-09 | 2018-01-19 | 삼성전자주식회사 | 광센싱 장치 및 그 구동 방법, 광센싱 장치를 포함하는 광터치 스크린 장치 |
| WO2013059665A1 (en) | 2011-10-19 | 2013-04-25 | The Trustees Of Columbia University In The City Of New York | Ultracompact fabry-perot array for ultracompact hyperspectral imaging |
| KR101871295B1 (ko) | 2011-10-19 | 2018-08-03 | 삼성전자 주식회사 | 그래핀을 이용한 광 변조기 |
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| US11833815B2 (en) | 2019-06-08 | 2023-12-05 | Hewlett-Packard Development Company, L.P. | Coatings for optical drop detectors |
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| TWI496310B (zh) | 2015-08-11 |
| CN102473844B (zh) | 2014-12-24 |
| EP2438635A2 (en) | 2012-04-11 |
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| WO2011023603A3 (en) | 2011-11-03 |
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| WO2011023603A2 (en) | 2011-03-03 |
| EP2438635B1 (en) | 2020-02-12 |
| US8053782B2 (en) | 2011-11-08 |
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