JP5905101B2 - プラスチック基板を処理する方法及び処理溶液を少なくとも部分的に再生する装置 - Google Patents
プラスチック基板を処理する方法及び処理溶液を少なくとも部分的に再生する装置 Download PDFInfo
- Publication number
- JP5905101B2 JP5905101B2 JP2014527598A JP2014527598A JP5905101B2 JP 5905101 B2 JP5905101 B2 JP 5905101B2 JP 2014527598 A JP2014527598 A JP 2014527598A JP 2014527598 A JP2014527598 A JP 2014527598A JP 5905101 B2 JP5905101 B2 JP 5905101B2
- Authority
- JP
- Japan
- Prior art keywords
- solution
- tank
- processing
- filter
- treatment solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 31
- 239000000758 substrate Substances 0.000 title claims description 13
- 230000001172 regenerating effect Effects 0.000 title claims description 3
- 238000001816 cooling Methods 0.000 claims description 49
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 28
- 238000001914 filtration Methods 0.000 claims description 20
- -1 carbonate compound Chemical class 0.000 claims description 16
- 238000007710 freezing Methods 0.000 claims description 16
- 230000008014 freezing Effects 0.000 claims description 16
- JYLNVJYYQQXNEK-UHFFFAOYSA-N 3-amino-2-(4-chlorophenyl)-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(CN)C1=CC=C(Cl)C=C1 JYLNVJYYQQXNEK-UHFFFAOYSA-N 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- LBSANEJBGMCTBH-UHFFFAOYSA-N manganate Chemical compound [O-][Mn]([O-])(=O)=O LBSANEJBGMCTBH-UHFFFAOYSA-N 0.000 claims description 4
- 239000000243 solution Substances 0.000 description 80
- 239000013078 crystal Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000005530 etching Methods 0.000 description 10
- 239000012065 filter cake Substances 0.000 description 9
- 230000008929 regeneration Effects 0.000 description 6
- 238000011069 regeneration method Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 239000000706 filtrate Substances 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000011010 flushing procedure Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 238000013019 agitation Methods 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000009089 cytolysis Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011111294.8A DE102011111294B4 (de) | 2011-08-26 | 2011-08-26 | Verfahren zur Behandlung von Kunststoffsubstraten und Vorrichtung zur Regeneration einer Behandlungslösung |
| DE102011111294.8 | 2011-08-26 | ||
| PCT/EP2012/066475 WO2013030098A1 (en) | 2011-08-26 | 2012-08-24 | Method for treating of plastic substrates and a device for an at least partial regeneration of a treatment solution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014525680A JP2014525680A (ja) | 2014-09-29 |
| JP5905101B2 true JP5905101B2 (ja) | 2016-04-20 |
Family
ID=46875753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014527598A Active JP5905101B2 (ja) | 2011-08-26 | 2012-08-24 | プラスチック基板を処理する方法及び処理溶液を少なくとも部分的に再生する装置 |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JP5905101B2 (ko) |
| KR (1) | KR101640693B1 (ko) |
| CN (1) | CN103764871B (ko) |
| AT (1) | AT515575B1 (ko) |
| DE (1) | DE102011111294B4 (ko) |
| TW (1) | TWI550129B (ko) |
| WO (1) | WO2013030098A1 (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL3168326T5 (pl) * | 2014-07-10 | 2024-02-05 | Okuno Chemical Industries Co., Ltd. | Sposób powlekania żywicy |
| CN104357811A (zh) * | 2014-12-01 | 2015-02-18 | 中核(天津)科技发展有限公司 | 用于化学镀的装置 |
| MX2019007128A (es) * | 2016-12-21 | 2019-09-19 | Hso Herbert Schmidt Gmbh & Co Kg | Solucion de decapado para decapar materiales sinteticos. |
| MX2019015038A (es) * | 2017-07-10 | 2020-08-17 | Srg Global Llc | Sistema de recuperacion de manganeso de grabado libre de cromo hexavalente. |
| CN110438506A (zh) * | 2019-07-08 | 2019-11-12 | 深圳市裕展精密科技有限公司 | 退镀液的再生制备方法 |
| EP4105361A1 (en) | 2021-06-16 | 2022-12-21 | Atotech Deutschland GmbH & Co. KG | Method for oxidizing manganese species in a treatment device |
| EP4105362A1 (en) | 2021-06-16 | 2022-12-21 | Atotech Deutschland GmbH & Co. KG | Method for oxidizing manganese species in a treatment device and treatment device |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3843504A (en) | 1972-08-16 | 1974-10-22 | Western Electric Co | Method of continuously regenerating and recycling a spent etching solution |
| US4042729A (en) * | 1972-12-13 | 1977-08-16 | Kollmorgen Technologies Corporation | Process for the activation of resinous bodies for adherent metallization |
| US4054693A (en) * | 1974-11-07 | 1977-10-18 | Kollmorgen Technologies Corporation | Processes for the preparation of resinous bodies for adherent metallization comprising treatment with manganate/permanganate composition |
| US4601784A (en) * | 1985-05-31 | 1986-07-22 | Morton Thiokol, Inc. | Sodium permanganate etch baths containing a co-ion for permanganate and their use in desmearing and/or etching printed circuit boards |
| NZ215546A (en) * | 1985-05-31 | 1988-10-28 | Thiokol Morton Inc | Method of regenerating permanganate etching solution |
| US4859300A (en) * | 1987-07-13 | 1989-08-22 | Enthone, Incorporated | Process for treating plastics with alkaline permanganate solutions |
| JPH0253967U (ko) * | 1988-10-11 | 1990-04-18 | ||
| MXPA01004811A (es) * | 1998-11-13 | 2002-09-18 | Enthone Omi Inc | Proceso para metalizar una superficie de plastico. |
| JP2001156428A (ja) * | 1999-11-26 | 2001-06-08 | Hitachi Ltd | エッチング処理装置及びエッチング処理方法 |
| JP2001234368A (ja) * | 2000-02-18 | 2001-08-31 | Hitachi Ltd | 回路基板の製造方法、エッチング方法及びエッチング装置 |
| DE10025551C2 (de) | 2000-05-19 | 2002-04-18 | Atotech Deutschland Gmbh | Kathode für die elektrochemische Regenerierung von Permanganat-Ätzlösungen, Verfahren zu deren Herstellung sowie elektrochemische Regeneriervorrichtung |
| EP1657324B1 (en) | 2004-11-10 | 2007-10-31 | ATOTECH Deutschland GmbH | Method for metallizing insulating substrates wherein the roughening and etching processes are controlled by means of gloss measurement |
| JP4275157B2 (ja) * | 2006-07-27 | 2009-06-10 | 荏原ユージライト株式会社 | プラスチック表面の金属化方法 |
| US7695638B2 (en) * | 2006-11-24 | 2010-04-13 | Shinko Electric Industries Co., Ltd. | Regeneration process of alkaline permanganate etching solution and unit therefor |
| JP5403535B2 (ja) * | 2008-12-10 | 2014-01-29 | 奥野製薬工業株式会社 | エッチング液の電解処理方法 |
| JP5238854B2 (ja) * | 2010-08-27 | 2013-07-17 | 上村工業株式会社 | 電解再生処理装置 |
-
2011
- 2011-08-26 DE DE102011111294.8A patent/DE102011111294B4/de active Active
-
2012
- 2012-08-24 WO PCT/EP2012/066475 patent/WO2013030098A1/en active Application Filing
- 2012-08-24 KR KR1020147004929A patent/KR101640693B1/ko active IP Right Grant
- 2012-08-24 TW TW101130875A patent/TWI550129B/zh active
- 2012-08-24 CN CN201280041619.6A patent/CN103764871B/zh active Active
- 2012-08-24 JP JP2014527598A patent/JP5905101B2/ja active Active
- 2012-08-24 AT ATA9312/2012A patent/AT515575B1/de active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140058577A (ko) | 2014-05-14 |
| KR101640693B1 (ko) | 2016-07-18 |
| DE102011111294B4 (de) | 2018-12-20 |
| TWI550129B (zh) | 2016-09-21 |
| CN103764871A (zh) | 2014-04-30 |
| TW201323653A (zh) | 2013-06-16 |
| AT515575A5 (de) | 2015-10-15 |
| WO2013030098A1 (en) | 2013-03-07 |
| AT515575B1 (de) | 2015-12-15 |
| DE102011111294A1 (de) | 2013-02-28 |
| CN103764871B (zh) | 2016-08-17 |
| JP2014525680A (ja) | 2014-09-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5905101B2 (ja) | プラスチック基板を処理する方法及び処理溶液を少なくとも部分的に再生する装置 | |
| KR20080033865A (ko) | 에칭액의 재생방법, 에칭방법 및 에칭장치 | |
| JP4377393B2 (ja) | 多結晶シリコンの純水洗浄方法および純水洗浄装置 | |
| JP2008081777A (ja) | めっき方法及び装置 | |
| CN208071809U (zh) | 一种pcb化学镍金生产线 | |
| WO2009110549A1 (ja) | 電子部品の洗浄方法および洗浄システム | |
| CN109604238A (zh) | 一种多晶硅清洗方法及清洗装置 | |
| JP2005200697A (ja) | 連続酸洗設備 | |
| JP3967479B2 (ja) | めっき装置 | |
| JP2007050368A (ja) | 洗米装置及び洗米方法並びに洗米機能付き炊飯装置 | |
| JP3301341B2 (ja) | 表面粗化装置 | |
| CN108118385A (zh) | 一种水洗连续电镀线材的系统 | |
| KR100753977B1 (ko) | 도금액 폐수재생장치 | |
| JP3985546B2 (ja) | 洗浄装置および洗浄方法 | |
| JP6970884B2 (ja) | アルミニウム箔の製造方法およびアルミニウム箔の製造装置 | |
| KR102313925B1 (ko) | 과황산 용액 제조 공급 장치 및 방법 | |
| JP4143235B2 (ja) | 塩化銅エッチング液電解再生システム | |
| CN215542474U (zh) | 一种电解铜箔含铜冲洗水铜回收系统 | |
| WO2018006914A1 (en) | Method for restoring damaged electronic devices by cleaning and apparatus therefor | |
| JP2005305097A (ja) | 食器洗浄方法及びその方法を実施する食器洗浄システム | |
| JP2001115281A (ja) | 電解槽 | |
| JP3909041B2 (ja) | 電気めっき用溶性電極の鉄系スラッジ除去方法および除去装置 | |
| JP2010105053A (ja) | 複合加工装置 | |
| JP2005280280A (ja) | 金型洗浄装置 | |
| JP2004066130A (ja) | 廃液処理方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20141211 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151005 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20151124 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160307 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160315 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5905101 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |