MX2019015038A - Sistema de recuperacion de manganeso de grabado libre de cromo hexavalente. - Google Patents

Sistema de recuperacion de manganeso de grabado libre de cromo hexavalente.

Info

Publication number
MX2019015038A
MX2019015038A MX2019015038A MX2019015038A MX2019015038A MX 2019015038 A MX2019015038 A MX 2019015038A MX 2019015038 A MX2019015038 A MX 2019015038A MX 2019015038 A MX2019015038 A MX 2019015038A MX 2019015038 A MX2019015038 A MX 2019015038A
Authority
MX
Mexico
Prior art keywords
recovery system
hexavalent chromium
chromium free
manganese recovery
free etch
Prior art date
Application number
MX2019015038A
Other languages
English (en)
Inventor
Mark Bauman
Daniel Lacey
Gerry Vogelpohl
Original Assignee
Srg Global Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Srg Global Llc filed Critical Srg Global Llc
Publication of MX2019015038A publication Critical patent/MX2019015038A/es

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D1/00Evaporating
    • B01D1/14Evaporating with heated gases or vapours or liquids in contact with the liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D1/00Evaporating
    • B01D1/22Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D1/00Evaporating
    • B01D1/26Multiple-effect evaporating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/08Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping in rotating vessels; Atomisation on rotating discs
    • B01D3/085Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping in rotating vessels; Atomisation on rotating discs using a rotary evaporator
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/10Vacuum distillation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/1851Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
    • C23C18/1872Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
    • C23C18/1886Multistep pretreatment
    • C23C18/1893Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • C23C18/24Roughening, e.g. by etching using acid aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00Electrophoretic coating characterised by the process
    • C25D13/12Electrophoretic coating characterised by the process characterised by the article coated
    • C25D13/16Wires; Strips; Foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Removal Of Specific Substances (AREA)

Abstract

Se proporcionan métodos para recuperar soluciones de grabado de manganeso, en donde una solución de proceso usada para enjuagar o neutralizar un sustrato no conductor después de grabar el sustrato es recolectada y evaporada para proporcionar una solución de proceso concentrada que se devuelve a la solución de grabado de manganeso o al enjuague ácido.
MX2019015038A 2017-07-10 2018-07-10 Sistema de recuperacion de manganeso de grabado libre de cromo hexavalente. MX2019015038A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762530473P 2017-07-10 2017-07-10
PCT/IB2018/055067 WO2019012416A1 (en) 2017-07-10 2018-07-10 RECOVERY SYSTEM OF MANGANESE ENGRAVING WITHOUT HEXAVALENT CHROME

Publications (1)

Publication Number Publication Date
MX2019015038A true MX2019015038A (es) 2020-08-17

Family

ID=63143298

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2019015038A MX2019015038A (es) 2017-07-10 2018-07-10 Sistema de recuperacion de manganeso de grabado libre de cromo hexavalente.

Country Status (7)

Country Link
US (2) US10569186B2 (es)
EP (1) EP3652360A1 (es)
JP (1) JP2020526638A (es)
CN (2) CN113481490A (es)
BR (1) BR112020000505A2 (es)
MX (1) MX2019015038A (es)
WO (1) WO2019012416A1 (es)

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2903008A1 (de) 1979-01-25 1980-07-31 Schering Ag Verfahren zur verdunstung und gegebenenfalls wiedergewinnung von wasser aus waessrigen loesungen
US4853095A (en) * 1988-03-09 1989-08-01 Macdermid, Incorporated Conversion of manganese dioxide to permanganate
US4952290A (en) * 1989-03-16 1990-08-28 Amp Incorporated Waste water treatment and recovery system
JP3674553B2 (ja) * 2000-09-01 2005-07-20 トヨタ自動車株式会社 燃料中の硫黄含有成分除去装置
EP1572788B1 (en) * 2002-12-20 2011-11-09 E.I. Du Pont De Nemours And Company Surface treatment of polyacetal articles
JP5403535B2 (ja) * 2008-12-10 2014-01-29 奥野製薬工業株式会社 エッチング液の電解処理方法
EP2287357B1 (en) * 2009-08-18 2016-04-13 Rohm and Haas Electronic Materials, L.L.C. Preparing substrates containing polymers for metallization
US20110311433A1 (en) * 2010-06-17 2011-12-22 Mads Lykke Process and system for production of concentrated sulphuric acid from off-gas
DE102011111294B4 (de) * 2011-08-26 2018-12-20 Atotech Deutschland Gmbh Verfahren zur Behandlung von Kunststoffsubstraten und Vorrichtung zur Regeneration einer Behandlungslösung
US9534306B2 (en) * 2012-01-23 2017-01-03 Macdermid Acumen, Inc. Electrolytic generation of manganese (III) ions in strong sulfuric acid
EP2639333A1 (de) * 2012-03-15 2013-09-18 Atotech Deutschland GmbH Verfahren zum Metallisieren nichtleitender Kunststoffoberflächen
JP6167222B2 (ja) * 2013-03-12 2017-07-19 マクダーミッド アキューメン インコーポレーテッド 濃硫酸中でのマンガン(iii)イオンの電解生成
EP2937446B1 (en) * 2013-10-22 2018-06-13 Okuno Chemical Industries Co., Ltd. Composition for etching treatment of resin material
JP6406841B2 (ja) * 2014-03-24 2018-10-17 アトテック・ドイチュラント・ゲーエムベーハーAtotech Deutschland Gmbh 金属層形成方法およびプリント回路基板製造方法
PT3660189T (pt) * 2014-04-01 2024-02-14 Atotech Deutschland Gmbh & Co Kg Composição e processo para metalizar superfícies plásticas não condutoras
US20170088971A1 (en) * 2015-09-30 2017-03-30 Macdermid Acumen, Inc. Treatment of Etch Baths

Also Published As

Publication number Publication date
CN110869529A (zh) 2020-03-06
CN113481490A (zh) 2021-10-08
US20190009184A1 (en) 2019-01-10
US10569186B2 (en) 2020-02-25
US20200222825A1 (en) 2020-07-16
CN110869529B (zh) 2021-07-06
BR112020000505A2 (pt) 2020-07-14
WO2019012416A1 (en) 2019-01-17
JP2020526638A (ja) 2020-08-31
EP3652360A1 (en) 2020-05-20

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