MX2019015038A - Sistema de recuperacion de manganeso de grabado libre de cromo hexavalente. - Google Patents
Sistema de recuperacion de manganeso de grabado libre de cromo hexavalente.Info
- Publication number
- MX2019015038A MX2019015038A MX2019015038A MX2019015038A MX2019015038A MX 2019015038 A MX2019015038 A MX 2019015038A MX 2019015038 A MX2019015038 A MX 2019015038A MX 2019015038 A MX2019015038 A MX 2019015038A MX 2019015038 A MX2019015038 A MX 2019015038A
- Authority
- MX
- Mexico
- Prior art keywords
- recovery system
- hexavalent chromium
- chromium free
- manganese recovery
- free etch
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/14—Evaporating with heated gases or vapours or liquids in contact with the liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/26—Multiple-effect evaporating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/08—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping in rotating vessels; Atomisation on rotating discs
- B01D3/085—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping in rotating vessels; Atomisation on rotating discs using a rotary evaporator
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/10—Vacuum distillation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1893—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D13/00—Electrophoretic coating characterised by the process
- C25D13/12—Electrophoretic coating characterised by the process characterised by the article coated
- C25D13/16—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Removal Of Specific Substances (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Se proporcionan métodos para recuperar soluciones de grabado de manganeso, en donde una solución de proceso usada para enjuagar o neutralizar un sustrato no conductor después de grabar el sustrato es recolectada y evaporada para proporcionar una solución de proceso concentrada que se devuelve a la solución de grabado de manganeso o al enjuague ácido.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762530473P | 2017-07-10 | 2017-07-10 | |
PCT/IB2018/055067 WO2019012416A1 (en) | 2017-07-10 | 2018-07-10 | RECOVERY SYSTEM OF MANGANESE ENGRAVING WITHOUT HEXAVALENT CHROME |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2019015038A true MX2019015038A (es) | 2020-08-17 |
Family
ID=63143298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2019015038A MX2019015038A (es) | 2017-07-10 | 2018-07-10 | Sistema de recuperacion de manganeso de grabado libre de cromo hexavalente. |
Country Status (7)
Country | Link |
---|---|
US (2) | US10569186B2 (es) |
EP (1) | EP3652360A1 (es) |
JP (1) | JP2020526638A (es) |
CN (2) | CN113481490A (es) |
BR (1) | BR112020000505A2 (es) |
MX (1) | MX2019015038A (es) |
WO (1) | WO2019012416A1 (es) |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2903008A1 (de) * | 1979-01-25 | 1980-07-31 | Schering Ag | Verfahren zur verdunstung und gegebenenfalls wiedergewinnung von wasser aus waessrigen loesungen |
US4853095A (en) * | 1988-03-09 | 1989-08-01 | Macdermid, Incorporated | Conversion of manganese dioxide to permanganate |
US4952290A (en) | 1989-03-16 | 1990-08-28 | Amp Incorporated | Waste water treatment and recovery system |
JP3674553B2 (ja) * | 2000-09-01 | 2005-07-20 | トヨタ自動車株式会社 | 燃料中の硫黄含有成分除去装置 |
KR101008133B1 (ko) * | 2002-12-20 | 2011-01-13 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 폴리아세탈 물품의 표면 처리 |
JP5403535B2 (ja) * | 2008-12-10 | 2014-01-29 | 奥野製薬工業株式会社 | エッチング液の電解処理方法 |
EP2287357B1 (en) * | 2009-08-18 | 2016-04-13 | Rohm and Haas Electronic Materials, L.L.C. | Preparing substrates containing polymers for metallization |
US20110311433A1 (en) * | 2010-06-17 | 2011-12-22 | Mads Lykke | Process and system for production of concentrated sulphuric acid from off-gas |
DE102011111294B4 (de) * | 2011-08-26 | 2018-12-20 | Atotech Deutschland Gmbh | Verfahren zur Behandlung von Kunststoffsubstraten und Vorrichtung zur Regeneration einer Behandlungslösung |
US9534306B2 (en) * | 2012-01-23 | 2017-01-03 | Macdermid Acumen, Inc. | Electrolytic generation of manganese (III) ions in strong sulfuric acid |
EP2639333A1 (de) * | 2012-03-15 | 2013-09-18 | Atotech Deutschland GmbH | Verfahren zum Metallisieren nichtleitender Kunststoffoberflächen |
ES2745071T3 (es) * | 2013-03-12 | 2020-02-27 | Macdermid Acumen Inc | Generación electrolítica de iones manganeso (III) en ácido sulfúrico fuerte |
MY164331A (en) * | 2013-10-22 | 2017-12-15 | Okuno Chem Ind Co | Composition for etching treatment of resin material |
JP6406841B2 (ja) * | 2014-03-24 | 2018-10-17 | アトテック・ドイチュラント・ゲーエムベーハーAtotech Deutschland Gmbh | 金属層形成方法およびプリント回路基板製造方法 |
BR112016017812B1 (pt) * | 2014-04-01 | 2021-08-17 | Atotech Deutschland Gmbh | Solução corrosiva e processos para polir e metalizar superfícies de plástico não condutoras |
US20170088971A1 (en) * | 2015-09-30 | 2017-03-30 | Macdermid Acumen, Inc. | Treatment of Etch Baths |
-
2018
- 2018-07-10 JP JP2020501200A patent/JP2020526638A/ja not_active Abandoned
- 2018-07-10 BR BR112020000505-3A patent/BR112020000505A2/pt not_active Application Discontinuation
- 2018-07-10 EP EP18752265.1A patent/EP3652360A1/en not_active Withdrawn
- 2018-07-10 CN CN202110688903.3A patent/CN113481490A/zh active Pending
- 2018-07-10 WO PCT/IB2018/055067 patent/WO2019012416A1/en unknown
- 2018-07-10 US US16/030,880 patent/US10569186B2/en not_active Expired - Fee Related
- 2018-07-10 CN CN201880044537.4A patent/CN110869529B/zh not_active Expired - Fee Related
- 2018-07-10 MX MX2019015038A patent/MX2019015038A/es unknown
-
2020
- 2020-01-20 US US16/747,105 patent/US20200222825A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN110869529B (zh) | 2021-07-06 |
US20190009184A1 (en) | 2019-01-10 |
US20200222825A1 (en) | 2020-07-16 |
EP3652360A1 (en) | 2020-05-20 |
CN113481490A (zh) | 2021-10-08 |
BR112020000505A2 (pt) | 2020-07-14 |
WO2019012416A1 (en) | 2019-01-17 |
US10569186B2 (en) | 2020-02-25 |
CN110869529A (zh) | 2020-03-06 |
JP2020526638A (ja) | 2020-08-31 |
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