JP5838114B2 - Ｘ線トポグラフィ装置 - Google Patents

Ｘ線トポグラフィ装置 Download PDF

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Publication number
JP5838114B2
JP5838114B2 JP2012083680A JP2012083680A JP5838114B2 JP 5838114 B2 JP5838114 B2 JP 5838114B2 JP 2012083680 A JP2012083680 A JP 2012083680A JP 2012083680 A JP2012083680 A JP 2012083680A JP 5838114 B2 JP5838114 B2 JP 5838114B2
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ray
sample
rays
multilayer mirror
topography apparatus
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JP2012083680A
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Japanese (ja)
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JP2013213720A (ja
JP2013213720A5 (enExample
Inventor
表　和彦
和彦 表
義徳 上ヱ地
義徳 上ヱ地
松尾　隆二
隆二 松尾
菊池　哲夫
哲夫 菊池
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Rigaku Corp
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Rigaku Corp
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Priority to JP2012083680A priority Critical patent/JP5838114B2/ja
Priority to DE102013004503.7A priority patent/DE102013004503B4/de
Priority to US13/845,744 priority patent/US9335282B2/en
Priority to KR1020130035372A priority patent/KR101912907B1/ko
Publication of JP2013213720A publication Critical patent/JP2013213720A/ja
Publication of JP2013213720A5 publication Critical patent/JP2013213720A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Nanotechnology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2012083680A 2012-04-02 2012-04-02 Ｘ線トポグラフィ装置 Active JP5838114B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012083680A JP5838114B2 (ja) 2012-04-02 2012-04-02 Ｘ線トポグラフィ装置
DE102013004503.7A DE102013004503B4 (de) 2012-04-02 2013-03-14 Verwendung einer Röntgenstrahlvorrichtung zur Untersuchung von Kristalldefekten
US13/845,744 US9335282B2 (en) 2012-04-02 2013-03-18 X-ray topography apparatus
KR1020130035372A KR101912907B1 (ko) 2012-04-02 2013-04-01 X선 토포그래피 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012083680A JP5838114B2 (ja) 2012-04-02 2012-04-02 Ｘ線トポグラフィ装置

Publications (3)

Publication Number Publication Date
JP2013213720A JP2013213720A (ja) 2013-10-17
JP2013213720A5 JP2013213720A5 (enExample) 2014-07-24
JP5838114B2 true JP5838114B2 (ja) 2015-12-24

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Family Applications (1)

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JP2012083680A Active JP5838114B2 (ja) 2012-04-02 2012-04-02 Ｘ線トポグラフィ装置

Country Status (4)

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US (1) US9335282B2 (enExample)
JP (1) JP5838114B2 (enExample)
KR (1) KR101912907B1 (enExample)
DE (1) DE102013004503B4 (enExample)

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Publication number Priority date Publication date Assignee Title
JP6025211B2 (ja) * 2013-11-28 2016-11-16 株式会社リガク Ｘ線トポグラフィ装置
JP6202684B2 (ja) * 2014-06-05 2017-09-27 株式会社リガク Ｘ線回折装置
US10161887B2 (en) * 2015-01-20 2018-12-25 United Technologies Corporation Systems and methods for materials analysis
US10684238B2 (en) 2016-01-11 2020-06-16 Bruker Technologies Ltd. Method and apparatus for X-ray scatterometry
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
US9859029B2 (en) * 2016-07-23 2018-01-02 Rising Star Pathway, a California Corporation X-ray laser microscopy sample analysis system and method
JP6978928B2 (ja) * 2017-12-25 2021-12-08 グローバルウェーハズ・ジャパン株式会社 シリコンウェーハの評価方法
US10816487B2 (en) 2018-04-12 2020-10-27 Bruker Technologies Ltd. Image contrast in X-ray topography imaging for defect inspection
JP2019191168A (ja) 2018-04-23 2019-10-31 ブルカー ジェイヴィ イスラエル リミテッドＢｒｕｋｅｒ Ｊｖ Ｉｓｒａｅｌ Ｌｔｄ． 小角ｘ線散乱測定用のｘ線源光学系
JP7308233B2 (ja) 2018-07-05 2023-07-13 ブルカー テクノロジーズ リミテッド 小角ｘ線散乱計測計
RU197307U1 (ru) * 2019-12-23 2020-04-21 Федеральное государственное автономное образовательное учреждение высшего образования "Балтийский федеральный университет имени Иммануила Канта" Многослойное зеркало для монохроматизации жесткого рентгеновского излучения
CN113030139B (zh) * 2021-05-31 2021-08-13 中国工程物理研究院激光聚变研究中心 一种新型晶体及紧凑型成像装置
US11781999B2 (en) 2021-09-05 2023-10-10 Bruker Technologies Ltd. Spot-size control in reflection-based and scatterometry-based X-ray metrology systems
US12249059B2 (en) 2022-03-31 2025-03-11 Bruker Technologies Ltd. Navigation accuracy using camera coupled with detector assembly
US12339239B2 (en) 2023-04-27 2025-06-24 Bruker Technologies Ltd. X-ray diffraction imaging detector having multiple angled input faces

Family Cites Families (27)

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Publication number Priority date Publication date Assignee Title
JPS4944151A (enExample) 1972-08-31 1974-04-25
AT330150B (de) 1973-02-28 1976-06-10 Boehringer Sohn Ingelheim Verfahren zur herstellung von neuen 1-phenoxy-2-hydroxy -3- propargylaminopropanen und von deren saureadditionssalzen
DE3442061A1 (de) * 1984-11-17 1986-05-28 Erno Raumfahrttechnik Gmbh, 2800 Bremen Verfahren zum zerstoerungsfreien pruefen inhomogener werkstoffe
JP2919598B2 (ja) * 1990-11-07 1999-07-12 理学電機株式会社 Ｘ線トポグラフィ装置
JPH0524232A (ja) 1991-07-19 1993-02-02 Graphtec Corp サーマルヘツドの温度検出構造
JP2940757B2 (ja) * 1992-04-09 1999-08-25 理学電機工業株式会社 Ｘ線回折分析装置
DE4407278A1 (de) 1994-03-04 1995-09-07 Siemens Ag Röntgen-Analysegerät
JP3644620B2 (ja) * 1997-06-18 2005-05-11 株式会社リガク Ｘ線トポグラフィック装置
DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
JP2002530671A (ja) * 1998-11-25 2002-09-17 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 放物状のｘ線ミラーと水晶モノクロメータを含むｘ線分析装置
JP2001021507A (ja) * 1999-07-05 2001-01-26 Rigaku Corp Ｘａｆｓ測定装置
US6278764B1 (en) * 1999-07-22 2001-08-21 The Regents Of The Unviersity Of California High efficiency replicated x-ray optics and fabrication method
JP3741411B2 (ja) * 1999-10-01 2006-02-01 株式会社リガク Ｘ線集光装置及びｘ線装置
DE10107914A1 (de) * 2001-02-14 2002-09-05 Fraunhofer Ges Forschung Anordnung für röntgenanalytische Anwendungen
JP4447801B2 (ja) * 2001-04-06 2010-04-07 株式会社リガク Ｘ線トポグラフ装置およびｘ線トポグラフ方法
US6782076B2 (en) 2001-12-07 2004-08-24 Bede Scientific Instruments Limited X-ray topographic system
US6917667B2 (en) * 2002-09-03 2005-07-12 Rigaku Corporation Method and apparatus for making parallel X-ray beam and X-ray diffraction apparatus
JP3919775B2 (ja) * 2004-07-15 2007-05-30 株式会社リガク Ｘ線反射率測定方法及び装置
JP5232373B2 (ja) 2006-09-28 2013-07-10 株式会社リガク ２結晶法ｘ線トポグラフィ装置
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
JP4861283B2 (ja) * 2007-09-28 2012-01-25 株式会社リガク Ｘ線回折装置およびｘ線回折方法
DE602008002143D1 (de) * 2008-02-15 2010-09-23 Panalytical Bv Erkennung von gefälschten Medikamenten in Blisterpackungen durch winkeldispersive Röntgenbeugung
JP5024232B2 (ja) 2008-08-19 2012-09-12 富士ゼロックス株式会社 信号記憶装置、通信制御装置及び画像形成装置
DE102008049163A1 (de) * 2008-09-24 2010-04-08 BAM Bundesanstalt für Materialforschung und -prüfung Vorrichtung zum Bestrahlen mit Röntgenstrahlung
JP4944151B2 (ja) 2009-04-27 2012-05-30 関戸機鋼株式会社 ツールプリセッタ
DE112010006114A5 (de) * 2009-07-01 2016-03-17 Rigaku Corp. Röntgenvorrichtung, verfahren zum verwenden der röntgenvorrichtung und röntgenbestrahlungsverfahren
US8687766B2 (en) * 2010-07-13 2014-04-01 Jordan Valley Semiconductors Ltd. Enhancing accuracy of fast high-resolution X-ray diffractometry

Also Published As

Publication number Publication date
KR101912907B1 (ko) 2018-10-29
DE102013004503B4 (de) 2017-08-03
US20130259200A1 (en) 2013-10-03
KR20130112001A (ko) 2013-10-11
DE102013004503A1 (de) 2013-10-02
JP2013213720A (ja) 2013-10-17
US9335282B2 (en) 2016-05-10

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