JP5223193B2 - ポリカルボシラン及びその製造方法並びに絶縁性材料 - Google Patents
ポリカルボシラン及びその製造方法並びに絶縁性材料 Download PDFInfo
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- JP5223193B2 JP5223193B2 JP2006529199A JP2006529199A JP5223193B2 JP 5223193 B2 JP5223193 B2 JP 5223193B2 JP 2006529199 A JP2006529199 A JP 2006529199A JP 2006529199 A JP2006529199 A JP 2006529199A JP 5223193 B2 JP5223193 B2 JP 5223193B2
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- Prior art keywords
- repeating unit
- polycarbosilane
- mol
- formula
- alkyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 229920003257 polycarbosilane Polymers 0.000 title claims description 46
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 239000011810 insulating material Substances 0.000 title description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 27
- 238000006243 chemical reaction Methods 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 22
- 239000003960 organic solvent Substances 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 125000005843 halogen group Chemical group 0.000 claims description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 11
- 229910052708 sodium Inorganic materials 0.000 claims description 9
- 239000011734 sodium Substances 0.000 claims description 9
- 150000002500 ions Chemical class 0.000 claims description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 6
- 150000001502 aryl halides Chemical class 0.000 claims description 4
- 238000006467 substitution reaction Methods 0.000 claims description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 30
- 239000000243 solution Substances 0.000 description 20
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000011777 magnesium Substances 0.000 description 13
- 229910052749 magnesium Inorganic materials 0.000 description 13
- GNVPGBIHGALKRR-UHFFFAOYSA-N dichloro-methyl-propylsilane Chemical compound CCC[Si](C)(Cl)Cl GNVPGBIHGALKRR-UHFFFAOYSA-N 0.000 description 12
- 238000002474 experimental method Methods 0.000 description 12
- 239000012044 organic layer Substances 0.000 description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 10
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 8
- SWJPEBQEEAHIGZ-UHFFFAOYSA-N 1,4-dibromobenzene Chemical compound BrC1=CC=C(Br)C=C1 SWJPEBQEEAHIGZ-UHFFFAOYSA-N 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- -1 Poly (dimethylsilylenephenylene) Polymers 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 4
- 159000000003 magnesium salts Chemical class 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- PAAZPARNPHGIKF-UHFFFAOYSA-N 1,2-dibromoethane Chemical compound BrCCBr PAAZPARNPHGIKF-UHFFFAOYSA-N 0.000 description 3
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 3
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 230000020169 heat generation Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000003779 heat-resistant material Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011345 viscous material Substances 0.000 description 3
- WQONPSCCEXUXTQ-UHFFFAOYSA-N 1,2-dibromobenzene Chemical compound BrC1=CC=CC=C1Br WQONPSCCEXUXTQ-UHFFFAOYSA-N 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- QRKPLLLQZJCOLR-UHFFFAOYSA-N 6-[2-(4-carboxybut-2-enyl)-3-hydroxy-5-oxocyclopentyl]-4-oxohexanoic acid Chemical compound OC1CC(=O)C(CCC(=O)CCC(O)=O)C1CC=CCC(O)=O QRKPLLLQZJCOLR-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 238000003760 magnetic stirring Methods 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000002411 thermogravimetry Methods 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- APQIUTYORBAGEZ-UHFFFAOYSA-N 1,1-dibromoethane Chemical compound CC(Br)Br APQIUTYORBAGEZ-UHFFFAOYSA-N 0.000 description 1
- BBOLNFYSRZVALD-UHFFFAOYSA-N 1,2-diiodobenzene Chemical compound IC1=CC=CC=C1I BBOLNFYSRZVALD-UHFFFAOYSA-N 0.000 description 1
- JSRLURSZEMLAFO-UHFFFAOYSA-N 1,3-dibromobenzene Chemical compound BrC1=CC=CC(Br)=C1 JSRLURSZEMLAFO-UHFFFAOYSA-N 0.000 description 1
- ZPQOPVIELGIULI-UHFFFAOYSA-N 1,3-dichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1 ZPQOPVIELGIULI-UHFFFAOYSA-N 0.000 description 1
- SFPQFQUXAJOWNF-UHFFFAOYSA-N 1,3-diiodobenzene Chemical compound IC1=CC=CC(I)=C1 SFPQFQUXAJOWNF-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- LFMWZTSOMGDDJU-UHFFFAOYSA-N 1,4-diiodobenzene Chemical compound IC1=CC=C(I)C=C1 LFMWZTSOMGDDJU-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 238000003747 Grignard reaction Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UACGRVDRVCFSEA-UHFFFAOYSA-N butyl-dichloro-methylsilane Chemical compound CCCC[Si](C)(Cl)Cl UACGRVDRVCFSEA-UHFFFAOYSA-N 0.000 description 1
- 238000004807 desolvation Methods 0.000 description 1
- LIQOCGKQCFXKLF-UHFFFAOYSA-N dibromo(dimethyl)silane Chemical compound C[Si](C)(Br)Br LIQOCGKQCFXKLF-UHFFFAOYSA-N 0.000 description 1
- NHMQRYSIVYJFPU-UHFFFAOYSA-N dichloro-(2-ethylbutyl)-methylsilane Chemical compound CCC(CC)C[Si](C)(Cl)Cl NHMQRYSIVYJFPU-UHFFFAOYSA-N 0.000 description 1
- PXNYLTFCGWKPFT-UHFFFAOYSA-N dichloro-ethyl-(2-ethylbutyl)silane Chemical compound CCC(CC)C[Si](Cl)(Cl)CC PXNYLTFCGWKPFT-UHFFFAOYSA-N 0.000 description 1
- KKRMHVJQWMXYBZ-UHFFFAOYSA-N dichloro-hexyl-methylsilane Chemical compound CCCCCC[Si](C)(Cl)Cl KKRMHVJQWMXYBZ-UHFFFAOYSA-N 0.000 description 1
- IVTVESXHEBLYHG-UHFFFAOYSA-N dichloro-methyl-(2-methylbutan-2-yl)silane Chemical compound CCC(C)(C)[Si](C)(Cl)Cl IVTVESXHEBLYHG-UHFFFAOYSA-N 0.000 description 1
- APGQQLCRLIBICD-UHFFFAOYSA-N dichloro-methyl-pentylsilane Chemical compound CCCCC[Si](C)(Cl)Cl APGQQLCRLIBICD-UHFFFAOYSA-N 0.000 description 1
- IPIWUBVZCIGHAC-UHFFFAOYSA-N dichloro-methyl-propan-2-ylsilane Chemical compound CC(C)[Si](C)(Cl)Cl IPIWUBVZCIGHAC-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
- C08G77/52—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages containing aromatic rings
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006529199A JP5223193B2 (ja) | 2004-07-16 | 2005-07-15 | ポリカルボシラン及びその製造方法並びに絶縁性材料 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004210428 | 2004-07-16 | ||
| JP2004210428 | 2004-07-16 | ||
| JP2006529199A JP5223193B2 (ja) | 2004-07-16 | 2005-07-15 | ポリカルボシラン及びその製造方法並びに絶縁性材料 |
| PCT/JP2005/013184 WO2006009123A1 (ja) | 2004-07-16 | 2005-07-15 | ポリカルボシラン及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2006009123A1 JPWO2006009123A1 (ja) | 2008-05-01 |
| JP5223193B2 true JP5223193B2 (ja) | 2013-06-26 |
Family
ID=35785233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006529199A Expired - Fee Related JP5223193B2 (ja) | 2004-07-16 | 2005-07-15 | ポリカルボシラン及びその製造方法並びに絶縁性材料 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7652118B2 (enExample) |
| EP (1) | EP1770111A4 (enExample) |
| JP (1) | JP5223193B2 (enExample) |
| KR (1) | KR101156314B1 (enExample) |
| CN (1) | CN100535032C (enExample) |
| TW (1) | TW200611925A (enExample) |
| WO (1) | WO2006009123A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1867674A1 (en) * | 2005-04-08 | 2007-12-19 | Toagosei Co., Ltd. | Polycarbosilane and method for producing same |
| EP2824130B1 (en) * | 2012-03-07 | 2018-02-07 | Nippon Soda Co., Ltd. | Method for producing polydialkylsilane |
| EP2880082A4 (en) * | 2012-08-02 | 2016-03-02 | Henkel China Co Ltd | POLYCARBOSILAN AND HARDENABLE COMPOSITIONS FOR LED PACKAGING THEREOF |
| JP7366421B2 (ja) * | 2020-03-27 | 2023-10-23 | 国立研究開発法人産業技術総合研究所 | ポリカルボシランの合成法 |
| CN112062967B (zh) * | 2020-08-05 | 2022-08-30 | 福建立亚化学有限公司 | 一种聚碳硅烷陶瓷先驱体材料制备方法 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6225744A (ja) * | 1985-07-26 | 1987-02-03 | Hitachi Ltd | 複合レジスト層の形成方法 |
| JPH03198061A (ja) * | 1989-12-27 | 1991-08-29 | Konica Corp | 電子写真感光体 |
| JPH04318821A (ja) * | 1991-04-18 | 1992-11-10 | Mitsui Petrochem Ind Ltd | 非線形光学材料、非線形光学素子、透明光学材料および薄膜 |
| JPH04342726A (ja) * | 1991-05-20 | 1992-11-30 | Showa Denko Kk | シリコン含有重合体およびその製造方法 |
| JPH05323330A (ja) * | 1992-05-20 | 1993-12-07 | Showa Denko Kk | 液晶配向膜 |
| JPH08125249A (ja) * | 1994-10-27 | 1996-05-17 | Sumitomo Electric Ind Ltd | 有機光伝導体および素子 |
| JPH1180362A (ja) * | 1997-08-29 | 1999-03-26 | Toray Dow Corning Silicone Co Ltd | シルフェニレンシルアルキレンポリマーの製造方法 |
| JPH11131023A (ja) * | 1997-10-31 | 1999-05-18 | Dow Corning Toray Silicone Co Ltd | コーティング材 |
| JPH11199778A (ja) * | 1997-12-29 | 1999-07-27 | Dow Corning Toray Silicone Co Ltd | 硬化性シルフェニレン系ポリマー組成物 |
| JPH11199676A (ja) * | 1997-12-29 | 1999-07-27 | Dow Corning Toray Silicone Co Ltd | シルフェニレン系ポリマーおよびその製造方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2628243A (en) * | 1950-01-09 | 1953-02-10 | Dow Corning | Preparation of organochlorosilanes |
| US4100233A (en) * | 1975-04-25 | 1978-07-11 | The Research Institute For Iron, Steel And Other Metals Of The Tohoku University | Silicon carbide fibers having a high strength and a method for producing said fibers |
| JPS5929095B2 (ja) * | 1975-12-29 | 1984-07-18 | トウホクダイガクキンゾクザイリヨウケンキユウシヨチヨウ | 耐熱性超硬複合材料およびその製造方法 |
| JPS5855007A (ja) | 1981-09-29 | 1983-04-01 | Mitsubishi Chem Ind Ltd | 気体分離膜 |
| US5039593A (en) * | 1986-10-31 | 1991-08-13 | Zeigler John K | Poly(silyl silane) homo and copolymers |
| US4820788A (en) * | 1986-10-31 | 1989-04-11 | John M. Zeigler | Poly(silyl silane)homo and copolymers |
| FR2617854B1 (fr) * | 1987-07-10 | 1989-10-27 | Rhone Poulenc Chimie | Composition a base d'un nouveau polycarbosilane, sa preparation et son application a la fabrication de produits et articles ceramiques a base de carbure de silicium |
| DE4313130C1 (de) * | 1993-04-22 | 1994-05-26 | Goldschmidt Ag Th | Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide |
| JP2970391B2 (ja) * | 1994-03-08 | 1999-11-02 | 信越化学工業株式会社 | 導電性重合体組成物 |
| US5500127A (en) * | 1994-03-14 | 1996-03-19 | Rohm And Haas Company | Purification process |
| US5578103A (en) * | 1994-08-17 | 1996-11-26 | Corning Incorporated | Alkali metal ion migration control |
| US6072016A (en) * | 1997-12-29 | 2000-06-06 | Dow Corning Toray Silicone Co., Ltd. | Silphenylene polymer and composition containing same |
| US6225238B1 (en) * | 1999-06-07 | 2001-05-01 | Allied Signal Inc | Low dielectric constant polyorganosilicon coatings generated from polycarbosilanes |
| US6761975B1 (en) * | 1999-12-23 | 2004-07-13 | Honeywell International Inc. | Polycarbosilane adhesion promoters for low dielectric constant polymeric materials |
| JP3715500B2 (ja) | 2000-03-09 | 2005-11-09 | 株式会社東芝 | 自動改札システムと自動復帰方法 |
| US6596833B2 (en) * | 2000-03-14 | 2003-07-22 | Chisso Corporation | Carbosilane and polycarbosilane |
| JP3886779B2 (ja) * | 2001-11-02 | 2007-02-28 | 富士通株式会社 | 絶縁膜形成用材料及び絶縁膜の形成方法 |
| JP2006002125A (ja) * | 2004-06-21 | 2006-01-05 | Tokyo Ohka Kogyo Co Ltd | カルボシラン系ポリマーを含んでなる被膜形成用組成物、および該組成物から得られた被膜 |
| JP2006323180A (ja) * | 2005-05-19 | 2006-11-30 | Tokyo Ohka Kogyo Co Ltd | シリルフェニレン系ポリマー含有中間層形成用組成物およびそれを用いたパターン形成方法 |
-
2005
- 2005-07-15 EP EP05766379A patent/EP1770111A4/en not_active Withdrawn
- 2005-07-15 US US11/572,178 patent/US7652118B2/en not_active Expired - Fee Related
- 2005-07-15 JP JP2006529199A patent/JP5223193B2/ja not_active Expired - Fee Related
- 2005-07-15 WO PCT/JP2005/013184 patent/WO2006009123A1/ja not_active Ceased
- 2005-07-15 KR KR1020077003677A patent/KR101156314B1/ko not_active Expired - Fee Related
- 2005-07-15 TW TW094124134A patent/TW200611925A/zh not_active IP Right Cessation
- 2005-07-15 CN CNB200580024070XA patent/CN100535032C/zh not_active Expired - Fee Related
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6225744A (ja) * | 1985-07-26 | 1987-02-03 | Hitachi Ltd | 複合レジスト層の形成方法 |
| JPH03198061A (ja) * | 1989-12-27 | 1991-08-29 | Konica Corp | 電子写真感光体 |
| JPH04318821A (ja) * | 1991-04-18 | 1992-11-10 | Mitsui Petrochem Ind Ltd | 非線形光学材料、非線形光学素子、透明光学材料および薄膜 |
| JPH04342726A (ja) * | 1991-05-20 | 1992-11-30 | Showa Denko Kk | シリコン含有重合体およびその製造方法 |
| JPH05323330A (ja) * | 1992-05-20 | 1993-12-07 | Showa Denko Kk | 液晶配向膜 |
| JPH08125249A (ja) * | 1994-10-27 | 1996-05-17 | Sumitomo Electric Ind Ltd | 有機光伝導体および素子 |
| JPH1180362A (ja) * | 1997-08-29 | 1999-03-26 | Toray Dow Corning Silicone Co Ltd | シルフェニレンシルアルキレンポリマーの製造方法 |
| JPH11131023A (ja) * | 1997-10-31 | 1999-05-18 | Dow Corning Toray Silicone Co Ltd | コーティング材 |
| JPH11199778A (ja) * | 1997-12-29 | 1999-07-27 | Dow Corning Toray Silicone Co Ltd | 硬化性シルフェニレン系ポリマー組成物 |
| JPH11199676A (ja) * | 1997-12-29 | 1999-07-27 | Dow Corning Toray Silicone Co Ltd | シルフェニレン系ポリマーおよびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100535032C (zh) | 2009-09-02 |
| KR20070032820A (ko) | 2007-03-22 |
| WO2006009123A1 (ja) | 2006-01-26 |
| TWI374902B (enExample) | 2012-10-21 |
| US7652118B2 (en) | 2010-01-26 |
| US20070299232A1 (en) | 2007-12-27 |
| TW200611925A (en) | 2006-04-16 |
| CN1984943A (zh) | 2007-06-20 |
| EP1770111A1 (en) | 2007-04-04 |
| KR101156314B1 (ko) | 2012-06-13 |
| JPWO2006009123A1 (ja) | 2008-05-01 |
| EP1770111A4 (en) | 2011-08-17 |
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