JP5223193B2 - ポリカルボシラン及びその製造方法並びに絶縁性材料 - Google Patents

ポリカルボシラン及びその製造方法並びに絶縁性材料 Download PDF

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Publication number
JP5223193B2
JP5223193B2 JP2006529199A JP2006529199A JP5223193B2 JP 5223193 B2 JP5223193 B2 JP 5223193B2 JP 2006529199 A JP2006529199 A JP 2006529199A JP 2006529199 A JP2006529199 A JP 2006529199A JP 5223193 B2 JP5223193 B2 JP 5223193B2
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repeating unit
polycarbosilane
mol
formula
alkyl group
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JP2006529199A
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Japanese (ja)
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JPWO2006009123A1 (ja
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勝彦 小室
浩 鈴木
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Toagosei Co Ltd
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Toagosei Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/06Preparatory processes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/12Polysiloxanes containing silicon bound to hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • C08G77/52Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages containing aromatic rings

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
JP2006529199A 2004-07-16 2005-07-15 ポリカルボシラン及びその製造方法並びに絶縁性材料 Expired - Fee Related JP5223193B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006529199A JP5223193B2 (ja) 2004-07-16 2005-07-15 ポリカルボシラン及びその製造方法並びに絶縁性材料

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004210428 2004-07-16
JP2004210428 2004-07-16
JP2006529199A JP5223193B2 (ja) 2004-07-16 2005-07-15 ポリカルボシラン及びその製造方法並びに絶縁性材料
PCT/JP2005/013184 WO2006009123A1 (ja) 2004-07-16 2005-07-15 ポリカルボシラン及びその製造方法

Publications (2)

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JPWO2006009123A1 JPWO2006009123A1 (ja) 2008-05-01
JP5223193B2 true JP5223193B2 (ja) 2013-06-26

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JP2006529199A Expired - Fee Related JP5223193B2 (ja) 2004-07-16 2005-07-15 ポリカルボシラン及びその製造方法並びに絶縁性材料

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US (1) US7652118B2 (enExample)
EP (1) EP1770111A4 (enExample)
JP (1) JP5223193B2 (enExample)
KR (1) KR101156314B1 (enExample)
CN (1) CN100535032C (enExample)
TW (1) TW200611925A (enExample)
WO (1) WO2006009123A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1867674A1 (en) * 2005-04-08 2007-12-19 Toagosei Co., Ltd. Polycarbosilane and method for producing same
EP2824130B1 (en) * 2012-03-07 2018-02-07 Nippon Soda Co., Ltd. Method for producing polydialkylsilane
EP2880082A4 (en) * 2012-08-02 2016-03-02 Henkel China Co Ltd POLYCARBOSILAN AND HARDENABLE COMPOSITIONS FOR LED PACKAGING THEREOF
JP7366421B2 (ja) * 2020-03-27 2023-10-23 国立研究開発法人産業技術総合研究所 ポリカルボシランの合成法
CN112062967B (zh) * 2020-08-05 2022-08-30 福建立亚化学有限公司 一种聚碳硅烷陶瓷先驱体材料制备方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6225744A (ja) * 1985-07-26 1987-02-03 Hitachi Ltd 複合レジスト層の形成方法
JPH03198061A (ja) * 1989-12-27 1991-08-29 Konica Corp 電子写真感光体
JPH04318821A (ja) * 1991-04-18 1992-11-10 Mitsui Petrochem Ind Ltd 非線形光学材料、非線形光学素子、透明光学材料および薄膜
JPH04342726A (ja) * 1991-05-20 1992-11-30 Showa Denko Kk シリコン含有重合体およびその製造方法
JPH05323330A (ja) * 1992-05-20 1993-12-07 Showa Denko Kk 液晶配向膜
JPH08125249A (ja) * 1994-10-27 1996-05-17 Sumitomo Electric Ind Ltd 有機光伝導体および素子
JPH1180362A (ja) * 1997-08-29 1999-03-26 Toray Dow Corning Silicone Co Ltd シルフェニレンシルアルキレンポリマーの製造方法
JPH11131023A (ja) * 1997-10-31 1999-05-18 Dow Corning Toray Silicone Co Ltd コーティング材
JPH11199778A (ja) * 1997-12-29 1999-07-27 Dow Corning Toray Silicone Co Ltd 硬化性シルフェニレン系ポリマー組成物
JPH11199676A (ja) * 1997-12-29 1999-07-27 Dow Corning Toray Silicone Co Ltd シルフェニレン系ポリマーおよびその製造方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2628243A (en) * 1950-01-09 1953-02-10 Dow Corning Preparation of organochlorosilanes
US4100233A (en) * 1975-04-25 1978-07-11 The Research Institute For Iron, Steel And Other Metals Of The Tohoku University Silicon carbide fibers having a high strength and a method for producing said fibers
JPS5929095B2 (ja) * 1975-12-29 1984-07-18 トウホクダイガクキンゾクザイリヨウケンキユウシヨチヨウ 耐熱性超硬複合材料およびその製造方法
JPS5855007A (ja) 1981-09-29 1983-04-01 Mitsubishi Chem Ind Ltd 気体分離膜
US5039593A (en) * 1986-10-31 1991-08-13 Zeigler John K Poly(silyl silane) homo and copolymers
US4820788A (en) * 1986-10-31 1989-04-11 John M. Zeigler Poly(silyl silane)homo and copolymers
FR2617854B1 (fr) * 1987-07-10 1989-10-27 Rhone Poulenc Chimie Composition a base d'un nouveau polycarbosilane, sa preparation et son application a la fabrication de produits et articles ceramiques a base de carbure de silicium
DE4313130C1 (de) * 1993-04-22 1994-05-26 Goldschmidt Ag Th Verfahren zur Herstellung von Silanen bzw. Organosiliciumhydriden durch Reduktion der entsprechenden Siliciumhalogenide bzw. Organosiliciumhalogenide
JP2970391B2 (ja) * 1994-03-08 1999-11-02 信越化学工業株式会社 導電性重合体組成物
US5500127A (en) * 1994-03-14 1996-03-19 Rohm And Haas Company Purification process
US5578103A (en) * 1994-08-17 1996-11-26 Corning Incorporated Alkali metal ion migration control
US6072016A (en) * 1997-12-29 2000-06-06 Dow Corning Toray Silicone Co., Ltd. Silphenylene polymer and composition containing same
US6225238B1 (en) * 1999-06-07 2001-05-01 Allied Signal Inc Low dielectric constant polyorganosilicon coatings generated from polycarbosilanes
US6761975B1 (en) * 1999-12-23 2004-07-13 Honeywell International Inc. Polycarbosilane adhesion promoters for low dielectric constant polymeric materials
JP3715500B2 (ja) 2000-03-09 2005-11-09 株式会社東芝 自動改札システムと自動復帰方法
US6596833B2 (en) * 2000-03-14 2003-07-22 Chisso Corporation Carbosilane and polycarbosilane
JP3886779B2 (ja) * 2001-11-02 2007-02-28 富士通株式会社 絶縁膜形成用材料及び絶縁膜の形成方法
JP2006002125A (ja) * 2004-06-21 2006-01-05 Tokyo Ohka Kogyo Co Ltd カルボシラン系ポリマーを含んでなる被膜形成用組成物、および該組成物から得られた被膜
JP2006323180A (ja) * 2005-05-19 2006-11-30 Tokyo Ohka Kogyo Co Ltd シリルフェニレン系ポリマー含有中間層形成用組成物およびそれを用いたパターン形成方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6225744A (ja) * 1985-07-26 1987-02-03 Hitachi Ltd 複合レジスト層の形成方法
JPH03198061A (ja) * 1989-12-27 1991-08-29 Konica Corp 電子写真感光体
JPH04318821A (ja) * 1991-04-18 1992-11-10 Mitsui Petrochem Ind Ltd 非線形光学材料、非線形光学素子、透明光学材料および薄膜
JPH04342726A (ja) * 1991-05-20 1992-11-30 Showa Denko Kk シリコン含有重合体およびその製造方法
JPH05323330A (ja) * 1992-05-20 1993-12-07 Showa Denko Kk 液晶配向膜
JPH08125249A (ja) * 1994-10-27 1996-05-17 Sumitomo Electric Ind Ltd 有機光伝導体および素子
JPH1180362A (ja) * 1997-08-29 1999-03-26 Toray Dow Corning Silicone Co Ltd シルフェニレンシルアルキレンポリマーの製造方法
JPH11131023A (ja) * 1997-10-31 1999-05-18 Dow Corning Toray Silicone Co Ltd コーティング材
JPH11199778A (ja) * 1997-12-29 1999-07-27 Dow Corning Toray Silicone Co Ltd 硬化性シルフェニレン系ポリマー組成物
JPH11199676A (ja) * 1997-12-29 1999-07-27 Dow Corning Toray Silicone Co Ltd シルフェニレン系ポリマーおよびその製造方法

Also Published As

Publication number Publication date
CN100535032C (zh) 2009-09-02
KR20070032820A (ko) 2007-03-22
WO2006009123A1 (ja) 2006-01-26
TWI374902B (enExample) 2012-10-21
US7652118B2 (en) 2010-01-26
US20070299232A1 (en) 2007-12-27
TW200611925A (en) 2006-04-16
CN1984943A (zh) 2007-06-20
EP1770111A1 (en) 2007-04-04
KR101156314B1 (ko) 2012-06-13
JPWO2006009123A1 (ja) 2008-05-01
EP1770111A4 (en) 2011-08-17

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