JPH0588891B2 - - Google Patents

Info

Publication number
JPH0588891B2
JPH0588891B2 JP63307578A JP30757888A JPH0588891B2 JP H0588891 B2 JPH0588891 B2 JP H0588891B2 JP 63307578 A JP63307578 A JP 63307578A JP 30757888 A JP30757888 A JP 30757888A JP H0588891 B2 JPH0588891 B2 JP H0588891B2
Authority
JP
Japan
Prior art keywords
crown
organometallic
yield
silicon
germanium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63307578A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01252637A (ja
Inventor
Masaya Fujino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP63307578A priority Critical patent/JPH01252637A/ja
Priority to DE3841598A priority patent/DE3841598C2/de
Publication of JPH01252637A publication Critical patent/JPH01252637A/ja
Priority to US07/488,424 priority patent/US4997899A/en
Publication of JPH0588891B2 publication Critical patent/JPH0588891B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
    • G03G5/07—Polymeric photoconductive materials
    • G03G5/078—Polymeric photoconductive materials comprising silicon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0754—Non-macromolecular compounds containing silicon-to-silicon bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Polymers (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP63307578A 1987-12-11 1988-12-05 有機金属高分子化合物の製造方法 Granted JPH01252637A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP63307578A JPH01252637A (ja) 1987-12-11 1988-12-05 有機金属高分子化合物の製造方法
DE3841598A DE3841598C2 (de) 1987-12-11 1988-12-09 Verfahren zur Herstellung von organometallischen Hochpolymeren
US07/488,424 US4997899A (en) 1987-12-11 1990-02-27 Process for preparing organometallic high polymer

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP62-312307 1987-12-11
JP31230787 1987-12-11
JP63307578A JPH01252637A (ja) 1987-12-11 1988-12-05 有機金属高分子化合物の製造方法

Publications (2)

Publication Number Publication Date
JPH01252637A JPH01252637A (ja) 1989-10-09
JPH0588891B2 true JPH0588891B2 (enExample) 1993-12-24

Family

ID=26565167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63307578A Granted JPH01252637A (ja) 1987-12-11 1988-12-05 有機金属高分子化合物の製造方法

Country Status (3)

Country Link
US (1) US4997899A (enExample)
JP (1) JPH01252637A (enExample)
DE (1) DE3841598C2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2657614A1 (fr) * 1990-02-01 1991-08-02 Rhone Poulenc Chimie Procede de preparation de polycarbosilanes en presence de sodium metallique fondu et d'agents sequestrants.
DE4102315A1 (de) * 1991-01-26 1992-07-30 Solvay Deutschland Heteroelement enthaltende polycarbosilane
KR100604751B1 (ko) * 2001-08-24 2006-07-26 주식회사 하이닉스반도체 산 확산 방지용 포토레지스트 공중합체 및 이를 함유하는포토레지스트 조성물
WO2007044429A2 (en) * 2005-10-05 2007-04-19 Nanogram Corporation Linear and cross-linked high molecular weight polysilanes, polygermanes, and copolymers thereof, compositions containing the same, and methods of making and using such compounds and compositions
JP6704577B2 (ja) * 2015-02-23 2020-06-03 国立大学法人 奈良先端科学技術大学院大学 カーボンナノチューブ−ドーパント組成物複合体の製造方法およびカーボンナノチューブ−ドーパント組成物複合体

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1426747A (en) * 1972-10-03 1976-03-03 Poudres & Explosifs Ste Nale Anionic polymerization
US4618551A (en) * 1985-01-25 1986-10-21 Xerox Corporation Photoresponsive imaging members with polysilylenes hole transporting compositions

Also Published As

Publication number Publication date
DE3841598C2 (de) 1994-03-24
JPH01252637A (ja) 1989-10-09
US4997899A (en) 1991-03-05
DE3841598A1 (de) 1989-06-22

Similar Documents

Publication Publication Date Title
WO2000032609A1 (en) Silyl-functional initiator for living cationic polymerization
EP2859002A2 (en) Silicon-based cross coupling agents and methods of their use
JPH0588891B2 (enExample)
US20030096934A1 (en) Oligomeric silasesquioxanes and a process for preparing oligomeric silasesquioxanes
EP1135422A1 (en) Silyl-functional living cationic polymers
US5229481A (en) High-molecular weight, silicon-containing polymers and methods for the preparation and use thereof
US5599892A (en) Preparation of polysilanes
JPH0224284B2 (enExample)
JPH0827275A (ja) Ｎ−カルバゾリルポリシランおよびオルガノ−ｎ−カルバゾリルジハロゲノシラン化合物
JP2634430B2 (ja) はしご状ポリシラン類及びその製造方法
JP3277770B2 (ja) ポリシランの製造方法
JPS6151599B2 (enExample)
JP4408718B2 (ja) 有機ケイ素化合物およびその製造方法
JP3083614B2 (ja) 有機ポリゲルマンの製法
JPH0475898B2 (enExample)
JP3631213B2 (ja) 官能基を有するフェロセニレンシリレンポリマー及びその製造方法
JPH0762105A (ja) フラーレン−オルガノシラン共重合体
JPH0539358A (ja) ポリシラン
JPH0639493B2 (ja) ハロメチル化芳香族ビニル化合物ポリマーの製造法
JPH0341123A (ja) ポリ（ジシレン―エチレン）類の製造方法
JP3511345B2 (ja) チオフェン環含有ポリオルガノシランの製造方法
JPS58201821A (ja) 有機ケイ素重合体の製造方法
JPS58444B2 (ja) 大環状ビス↓−１，３↓−ジケトンを有するスチレン系重合体およびその製造方法
JP3701147B2 (ja) 架橋ハフノセン化合物の製造方法
JP3114556B2 (ja) ２，５−ピロール含有シロール化合物、シロール−ピロール共重合体及びそれらの製造方法