JP5180012B2 - 発光装置の作製方法 - Google Patents
発光装置の作製方法 Download PDFInfo
- Publication number
- JP5180012B2 JP5180012B2 JP2008226583A JP2008226583A JP5180012B2 JP 5180012 B2 JP5180012 B2 JP 5180012B2 JP 2008226583 A JP2008226583 A JP 2008226583A JP 2008226583 A JP2008226583 A JP 2008226583A JP 5180012 B2 JP5180012 B2 JP 5180012B2
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- Prior art keywords
- substrate
- light
- layer
- emitting device
- vapor deposition
- Prior art date
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
- H10K71/421—Thermal treatment, e.g. annealing in the presence of a solvent vapour using coherent electromagnetic radiation, e.g. laser annealing
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
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- Metallurgy (AREA)
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- Electroluminescent Light Sources (AREA)
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| JP2008226583A JP5180012B2 (ja) | 2007-09-13 | 2008-09-04 | 発光装置の作製方法 |
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| JP2007237493 | 2007-09-13 | ||
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| JP2008226583A JP5180012B2 (ja) | 2007-09-13 | 2008-09-04 | 発光装置の作製方法 |
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| JP2012107224A Division JP5244996B2 (ja) | 2007-09-13 | 2012-05-09 | 照明装置の作製方法 |
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| JP2009087930A JP2009087930A (ja) | 2009-04-23 |
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| JP2012107224A Expired - Fee Related JP5244996B2 (ja) | 2007-09-13 | 2012-05-09 | 照明装置の作製方法 |
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| US8153201B2 (en) | 2007-10-23 | 2012-04-10 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing light-emitting device, and evaporation donor substrate |
| KR20090041314A (ko) * | 2007-10-23 | 2009-04-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판 및 발광장치의 제조방법 |
| US8425974B2 (en) * | 2007-11-29 | 2013-04-23 | Semiconductor Energy Laboratory Co., Ltd. | Evaporation donor substrate and method for manufacturing light-emitting device |
| KR101689519B1 (ko) * | 2007-12-26 | 2016-12-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판, 증착용 기판의 제조방법, 및 발광장치의 제조방법 |
| US8080811B2 (en) | 2007-12-28 | 2011-12-20 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing evaporation donor substrate and light-emitting device |
| WO2009099002A1 (en) * | 2008-02-04 | 2009-08-13 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and method for manufacturing light-emitting device |
| JP5416987B2 (ja) * | 2008-02-29 | 2014-02-12 | 株式会社半導体エネルギー研究所 | 成膜方法及び発光装置の作製方法 |
| WO2009107548A1 (en) * | 2008-02-29 | 2009-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and manufacturing method of light-emitting device |
| JP5079722B2 (ja) * | 2008-03-07 | 2012-11-21 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| US8182863B2 (en) * | 2008-03-17 | 2012-05-22 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and manufacturing method of light-emitting device |
| JP5244680B2 (ja) * | 2008-04-14 | 2013-07-24 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| JP5159689B2 (ja) * | 2008-04-25 | 2013-03-06 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| KR101629637B1 (ko) * | 2008-05-29 | 2016-06-13 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 성막방법 및 발광장치의 제조방법 |
| JP5292032B2 (ja) * | 2008-09-16 | 2013-09-18 | 東京エレクトロン株式会社 | 重合膜の成膜方法および成膜装置 |
| US8486736B2 (en) * | 2008-10-20 | 2013-07-16 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
| JP5291607B2 (ja) * | 2008-12-15 | 2013-09-18 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| JP5024348B2 (ja) * | 2009-03-23 | 2012-09-12 | 株式会社デンソー | 基板の表面に樹脂絶縁膜のパターンを形成する方法及び半導体装置 |
| JP5258669B2 (ja) * | 2009-05-12 | 2013-08-07 | 株式会社半導体エネルギー研究所 | 成膜方法及び転写用基板 |
| EP2509396A1 (en) * | 2009-12-03 | 2012-10-10 | Toray Industries, Inc. | Donor substrate, patterning method, and method for producing device |
| JP6174307B2 (ja) * | 2012-08-10 | 2017-08-02 | 株式会社三共 | 遊技機 |
| KR20150003570A (ko) * | 2013-07-01 | 2015-01-09 | 삼성디스플레이 주식회사 | 전사용 도너 기판 및 유기 발광 표시 장치의 제조 방법 |
| KR20150007740A (ko) * | 2013-07-12 | 2015-01-21 | 삼성디스플레이 주식회사 | 전사용 도너 기판 및 유기 발광 표시 장치의 제조 방법 |
| KR20150056112A (ko) * | 2013-11-14 | 2015-05-26 | 삼성디스플레이 주식회사 | 막 형성용 마스크, 이를 이용한 막 형성 방법 및 유기 발광 표시 장치의 제조 방법 |
| EP2884553A1 (en) * | 2013-12-11 | 2015-06-17 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Method and system for providing a carrier with an embedded patterned metal structure |
| KR20150109013A (ko) * | 2014-03-18 | 2015-10-01 | 삼성디스플레이 주식회사 | 유기막 패턴 형성용 마스크, 이를 이용한 유기막 패턴 형성 방법 및 유기 발광 표시 장치의 제조 방법 |
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-
2008
- 2008-08-29 KR KR20080085219A patent/KR20090028413A/ko not_active Ceased
- 2008-09-03 US US12/203,424 patent/US20090075214A1/en not_active Abandoned
- 2008-09-04 JP JP2008226583A patent/JP5180012B2/ja not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2009087930A (ja) | 2009-04-23 |
| KR20090028413A (ko) | 2009-03-18 |
| US20090075214A1 (en) | 2009-03-19 |
| JP2012178357A (ja) | 2012-09-13 |
| JP5244996B2 (ja) | 2013-07-24 |
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