JP5111427B2 - 成膜用基板および成膜方法 - Google Patents
成膜用基板および成膜方法 Download PDFInfo
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- JP5111427B2 JP5111427B2 JP2009099803A JP2009099803A JP5111427B2 JP 5111427 B2 JP5111427 B2 JP 5111427B2 JP 2009099803 A JP2009099803 A JP 2009099803A JP 2009099803 A JP2009099803 A JP 2009099803A JP 5111427 B2 JP5111427 B2 JP 5111427B2
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- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229950005499 carbon tetrachloride Drugs 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- BHQBDOOJEZXHPS-UHFFFAOYSA-N ctk3i0272 Chemical group C1=CC=CC=C1C(C(=C(C=1C=CC=CC=1)C(=C1C=2C=CC=CC=2)C=2C3=CC=CC=C3C(C=3C4=CC=CC=C4C(C=4C(=C(C=5C=CC=CC=5)C(C=5C=CC=CC=5)=C(C=5C=CC=CC=5)C=4C=4C=CC=CC=4)C=4C=CC=CC=4)=C4C=CC=CC4=3)=C3C=CC=CC3=2)C=2C=CC=CC=2)=C1C1=CC=CC=C1 BHQBDOOJEZXHPS-UHFFFAOYSA-N 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000001989 lithium alloy Substances 0.000 description 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- WOYDRSOIBHFMGB-UHFFFAOYSA-N n,9-diphenyl-n-(9-phenylcarbazol-3-yl)carbazol-3-amine Chemical compound C1=CC=CC=C1N(C=1C=C2C3=CC=CC=C3N(C=3C=CC=CC=3)C2=CC=1)C1=CC=C(N(C=2C=CC=CC=2)C=2C3=CC=CC=2)C3=C1 WOYDRSOIBHFMGB-UHFFFAOYSA-N 0.000 description 1
- AJNJGJDDJIBTBP-UHFFFAOYSA-N n-(9,10-diphenylanthracen-2-yl)-n,9-diphenylcarbazol-3-amine Chemical compound C1=CC=CC=C1N(C=1C=C2C(C=3C=CC=CC=3)=C3C=CC=CC3=C(C=3C=CC=CC=3)C2=CC=1)C1=CC=C(N(C=2C=CC=CC=2)C=2C3=CC=CC=2)C3=C1 AJNJGJDDJIBTBP-UHFFFAOYSA-N 0.000 description 1
- UMFJAHHVKNCGLG-UHFFFAOYSA-N n-Nitrosodimethylamine Chemical compound CN(C)N=O UMFJAHHVKNCGLG-UHFFFAOYSA-N 0.000 description 1
- VZYZZKOUCVXTOJ-UHFFFAOYSA-N n-[4-[4-(n-(9,9-dimethylfluoren-2-yl)anilino)phenyl]phenyl]-9,9-dimethyl-n-phenylfluoren-2-amine Chemical group C1=C2C(C)(C)C3=CC=CC=C3C2=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=C2C(C)(C)C3=CC=CC=C3C2=CC=1)C1=CC=CC=C1 VZYZZKOUCVXTOJ-UHFFFAOYSA-N 0.000 description 1
- COVCYOMDZRYBNM-UHFFFAOYSA-N n-naphthalen-1-yl-9-phenyl-n-(9-phenylcarbazol-3-yl)carbazol-3-amine Chemical compound C1=CC=CC=C1N1C2=CC=C(N(C=3C=C4C5=CC=CC=C5N(C=5C=CC=CC=5)C4=CC=3)C=3C4=CC=CC=C4C=CC=3)C=C2C2=CC=CC=C21 COVCYOMDZRYBNM-UHFFFAOYSA-N 0.000 description 1
- CRLLGLJOPXYTLX-UHFFFAOYSA-N neodymium silver Chemical compound [Ag].[Nd] CRLLGLJOPXYTLX-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- HCIIFBHDBOCSAF-UHFFFAOYSA-N octaethylporphyrin Chemical compound N1C(C=C2C(=C(CC)C(C=C3C(=C(CC)C(=C4)N3)CC)=N2)CC)=C(CC)C(CC)=C1C=C1C(CC)=C(CC)C4=N1 HCIIFBHDBOCSAF-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- DYIZHKNUQPHNJY-UHFFFAOYSA-N oxorhenium Chemical compound [Re]=O DYIZHKNUQPHNJY-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- HRGDZIGMBDGFTC-UHFFFAOYSA-N platinum(2+) Chemical compound [Pt+2] HRGDZIGMBDGFTC-UHFFFAOYSA-N 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- VLRICFVOGGIMKK-UHFFFAOYSA-N pyrazol-1-yloxyboronic acid Chemical compound OB(O)ON1C=CC=N1 VLRICFVOGGIMKK-UHFFFAOYSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229910003449 rhenium oxide Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- OYQCBJZGELKKPM-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O-2].[Zn+2].[O-2].[In+3] OYQCBJZGELKKPM-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- GWDUZCIBPDVBJM-UHFFFAOYSA-L zinc;2-(2-hydroxyphenyl)-3h-1,3-benzothiazole-2-carboxylate Chemical compound [Zn+2].OC1=CC=CC=C1C1(C([O-])=O)SC2=CC=CC=C2N1.OC1=CC=CC=C1C1(C([O-])=O)SC2=CC=CC=C2N1 GWDUZCIBPDVBJM-UHFFFAOYSA-L 0.000 description 1
- QEPMORHSGFRDLW-UHFFFAOYSA-L zinc;2-(2-hydroxyphenyl)-3h-1,3-benzoxazole-2-carboxylate Chemical compound [Zn+2].OC1=CC=CC=C1C1(C([O-])=O)OC2=CC=CC=C2N1.OC1=CC=CC=C1C1(C([O-])=O)OC2=CC=CC=C2N1 QEPMORHSGFRDLW-UHFFFAOYSA-L 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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Description
本実施の形態では、成膜用基板およびそれを用いた成膜方法について説明する。
本実施の形態では、上記実施の形態で説明した成膜用基板を用いてフルカラー表示装置を作製する方法の一態様について図7(A)および(B)を用いて説明する。ここでは、3色の発光素子を繰り返し配置する発光装置の例を説明する。なお、本実施の形態の赤色EL層、緑色EL層および青色EL層はEL層の一態様であり、それぞれ、第1の電極層と第2の電極層の間に設けて発光素子を形成すると、赤色の発光素子、緑色の発光素子または青色の発光素子となる。また、赤色EL層、緑色EL層および青色EL層は単一の層であっても、複数の層が積層された層であってもよい。
本実施の形態では、発光装置の作製を可能とする成膜装置の例について説明する。本実施の形態に係る成膜装置の断面の模式図を図8、図9に示す。
本実施の形態では、発光装置の作製を可能とする成膜装置の一態様として、レーザを用いて成膜用基板の光吸収層を加熱する成膜装置について説明する。
本実施の形態では、本発明の一態様の成膜用基板を用いて発光素子および発光装置を作製する方法について説明する。
本実施の形態では、上記実施の形態で説明した発光装置を用いて完成させた様々な電子機器について、図17、図18を用いて説明する。
111 光反射層
112 断熱層
113 光吸収層
114 剥離層
150 成膜用基板
150B 成膜用基板
150G 成膜用基板
150R 成膜用基板
151 領域
151a 領域
152 領域
152a 領域
153 領域
153a 領域
154 余白
160 材料層
160B EL層(B)
160G EL層(G)
160R EL層(R)
161 材料層
161a 材料層
162 材料層
162a 材料層
163 材料層
200 メタルマスク
210 被成膜基板
211 被成膜領域
211a 被成膜領域
220 被成膜基板
221 被成膜領域
221a 被成膜領域
230 被成膜基板
231 被成膜領域
231a 被成膜領域
300 基板
302 電極層
304 発光層
306 電極層
308 EL層
322 正孔注入層
324 正孔輸送層
326 電子輸送層
328 電子注入層
801 成膜室
802 ゲート弁
803 ゲート弁
804 成膜用基板支持手段
805 被成膜基板支持手段
806 成膜用基板加熱手段
807 成膜用基板
808 材料層
809 被成膜基板
809a 被成膜基板
809b 被成膜基板
809c 被成膜基板
810 光源
811 チューブ
1103 レーザ発振装置
1104 光学系
1105 光学系
1106 光学系
1107 反射ミラー
1108 位置アライメント機構
1109 機構
1117 制御装置
1501 基板
1504 絶縁層
1513 電極層
1514 隔壁
1515B EL層
1515G EL層
1515R EL層
1516 電極層
1521 発光領域
1522 隔壁
1601 画素部
1602 データ線
1603 走査線
1604 隔壁
1605 領域
1606 入力端子
1607 入力端子
1608 接続配線
1609a FPC
1609b FPC
1700 EL層
1701 駆動回路部
1702 画素部
1703 駆動回路部
1704 封止基板
1705 シール材
1707 空間
1708 配線
1709 FPC
1710 素子基板
1711 スイッチング用TFT
1712 電流制御用TFT
1713 電極層
1714 絶縁物
1715 発光素子
1716 電極層
1723 nチャネル型TFT
1724 pチャネル型TFT
8001 筐体
8002 支持台
8003 表示部
8004 スピーカ部
8005 ビデオ入力端子
8101 本体
8102 筐体
8103 表示部
8104 キーボード
8105 外部接続ポート
8106 マウス
8201 本体
8202 表示部
8203 筐体
8204 外部接続ポート
8205 リモコン受信部
8206 受像部
8207 バッテリー
8208 音声入力部
8209 操作キー
8210 接眼部
8301 照明部
8302 傘
8303 可変アーム
8304 支柱
8305 台
8306 電源スイッチ
8401 本体
8402 筐体
8403 表示部
8404 音声入力部
8405 音声出力部
8406 操作キー
8407 外部接続ポート
8408 アンテナ
8500 携帯電話
8501 筐体
8502 筐体
8511 表示部
8512 スピーカ
8513 マイクロフォン
8514 操作キー
8515 ポインティングデバイス
8516 カメラ用レンズ
8517 外部接続端子
8518 イヤホン端子
8521 キーボード
8522 外部メモリスロット
8523 カメラ用レンズ
8524 ライト
Claims (6)
- 第1の面に、第1の領域、第2の領域、及び第3の領域を有し、
前記第1の領域には、前記第1の面上に設けられた光反射層に重畳して剥離層が設けられ、
前記第2の領域には、前記第1の面上に光吸収層が設けられ、
前記第3の領域には、前記第1の面上に前記光反射層が設けられていることを特徴とする成膜用基板。 - 第1の面に、第1の領域、第2の領域、及び第3の領域を有し、
前記第1の領域には、前記第1の面上に設けられた光反射層に重畳する断熱層と、前記断熱層に重畳する剥離層とが設けられ、
前記第2の領域には、前記第1の面上に設けられた前記断熱層に重畳して光吸収層が設けられ、
前記第3の領域には、前記第1の面上に設けられた前記光反射層に重畳して前記断熱層が設けられていることを特徴とする成膜用基板。 - 第1の面に、第1の領域、第2の領域、及び第3の領域を有し、
前記第1の領域には、前記第1の面上に設けられた光反射層に重畳して剥離層が設けられ、
前記第2の領域には、前記第1の面上に光吸収層が設けられ、
前記第3の領域には、前記第1の面上に前記光反射層が設けられた成膜用基板を準備し、
前記成膜用基板の第1の面に成膜材料を成膜し、
前記成膜用基板の第1の面と第1の被成膜基板の被成膜面とを互いに向かい合わせて圧着し、前記成膜用基板と前記第1の被成膜基板を引きはがして、前記第1の領域上の前記成膜材料を前記第1の被成膜基板に成膜し、
前記成膜用基板の第1の面と第2の被成膜基板の被成膜面とを互いに向かい合わせて近接して配置し、前記成膜用基板の第2の面の側から光を照射して、前記第2の領域上の前記成膜材料を前記第2の被成膜基板に成膜し、
前記成膜用基板の第1の面と第3の被成膜基板の被成膜面とを互いに向かい合わせて近接して配置し、前記成膜用基板を加熱して、前記第3の領域上の前記成膜材料を前記第3の被成膜基板に成膜する成膜方法。 - 第1の面に、第1の領域、第2の領域、及び第3の領域を有し、
前記第1の領域には、前記第1の面上に設けられた光反射層に重畳して剥離層が設けられ、
前記第2の領域には、前記第1の面上に光吸収層が設けられ、
前記第3の領域には、前記第1の面上に前記光反射層が設けられた成膜用基板を準備し、
前記成膜用基板の第1の面に成膜材料を成膜し、
前記成膜用基板の第1の面と第2の被成膜基板の被成膜面とを互いに向かい合わせて近接して配置し、前記成膜用基板の第2の面の側から光を照射して、前記第2の領域上の前記成膜材料を前記第2の被成膜基板に成膜し、
前記成膜用基板の第1の面と第1の被成膜基板の被成膜面とを互いに向かい合わせて圧着し、前記成膜用基板と前記第1の被成膜基板を引きはがして、前記第1の領域上の前記成膜材料を前記第1の被成膜基板に成膜し、
前記成膜用基板の第1の面と第3の被成膜基板の被成膜面とを互いに向かい合わせて近接して配置し、前記成膜用基板を加熱して、前記第3の領域上の前記成膜材料を前記第3の被成膜基板に成膜する成膜方法。 - 第1の面に、第1の領域、第2の領域、及び第3の領域を有し、
前記第1の領域には、前記第1の面上に設けられた光反射層に重畳する断熱層と、前記断熱層に重畳する剥離層とが設けられ、
前記第2の領域には、前記第1の面上に設けられた前記断熱層に重畳して光吸収層が設けられ、
前記第3の領域には、前記第1の面上に設けられた前記光反射層に重畳して前記断熱層が設けられた成膜用基板を準備し、
前記成膜用基板の第1の面に成膜材料を成膜し、
前記成膜用基板の第1の面と第1の被成膜基板の被成膜面とを互いに向かい合わせて圧着し、前記成膜用基板と前記第1の被成膜基板を引きはがして、前記第1の領域上の前記成膜材料を前記第1の被成膜基板に成膜し、
前記成膜用基板の第1の面と第2の被成膜基板の被成膜面とを互いに向かい合わせて近接して配置し、前記成膜用基板の第2の面の側から光を照射して、前記第2の領域上の前記成膜材料を前記第2の被成膜基板に成膜し、
前記成膜用基板の第1の面と第3の被成膜基板の被成膜面とを互いに向かい合わせて近接して配置し、前記成膜用基板を加熱して、前記第3の領域上の前記成膜材料を前記第3の被成膜基板に成膜する成膜方法。 - 第1の面に、第1の領域、第2の領域、及び第3の領域を有し、
前記第1の領域には、前記第1の面上に設けられた光反射層に重畳する断熱層と、前記断熱層に重畳する剥離層とが設けられ、
前記第2の領域には、前記第1の面上に設けられた前記断熱層に重畳して光吸収層が設けられ、
前記第3の領域には、前記第1の面上に設けられた前記光反射層に重畳して前記断熱層が設けられた成膜用基板を準備し、
前記成膜用基板の第1の面に成膜材料を成膜し、
前記成膜用基板の第1の面と第2の被成膜基板の被成膜面とを互いに向かい合わせて近接して配置し、前記成膜用基板の第2の面の側から光を照射して、前記第2の領域上の前記成膜材料を前記第2の被成膜基板に成膜し、
前記成膜用基板の第1の面と第1の被成膜基板の被成膜面とを互いに向かい合わせて圧着し、前記成膜用基板と前記第1の被成膜基板を引きはがして、前記第1の領域上の前記成膜材料を前記第1の被成膜基板に成膜し、
前記成膜用基板の第1の面と第3の被成膜基板の被成膜面とを互いに向かい合わせて近接して配置し、前記成膜用基板を加熱して、前記第3の領域上の前記成膜材料を前記第3の被成膜基板に成膜する成膜方法。
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