JP5291607B2 - 発光装置の作製方法 - Google Patents
発光装置の作製方法 Download PDFInfo
- Publication number
- JP5291607B2 JP5291607B2 JP2009279029A JP2009279029A JP5291607B2 JP 5291607 B2 JP5291607 B2 JP 5291607B2 JP 2009279029 A JP2009279029 A JP 2009279029A JP 2009279029 A JP2009279029 A JP 2009279029A JP 5291607 B2 JP5291607 B2 JP 5291607B2
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- JP
- Japan
- Prior art keywords
- layer
- abbreviation
- light
- substrate
- organic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
Description
本実施の形態を、図1(A)〜図1(C)、図2、図3(A)〜図3(B)、図4(A)〜図4(C)を用いて説明する。
103 吸収層
104 反射層
105 マスク層
105R マスク層
105G マスク層
105B マスク層
106 有機物層
107 ドナー基板
108 光
111 基板
112 転写層
115 画素
115R 画素
115G 画素
115B 画素
Claims (1)
- 第1の吸収層と第1の反射層を有する第1のマスク層と、第2の吸収層と第2の反射層を有する第2のマスク層を有し、前記第1のマスク層と前記第2のマスク層上に有機物層が形成された第1の基板を、
陽極あるいは陰極の一方である第1の電極を形成した第2の基板の被成膜面が対向するように配置し、
前記第1の基板の、前記有機物層を形成した面と反対側から光を照射することにより、前記第1の吸収層及び第2の吸収層の上の前記有機物層を昇華させ、
前記第1の吸収層及び第2の吸収層の上の有機物層を昇華させることにより、前記第2の基板上に、前記第1のマスク層に対応する第1の画素に第1の転写層、及び、前記第2のマスク層に対応する第2の画素に第2の転写層を成膜する発光装置の作製方法であって、
前記第1の転写層は、前記第2の転写層と接する領域を有し、
前記第1の転写層の膜厚は、前記第2の転写層の膜厚より厚く、
前記第1の吸収層の面積は、前記第2の吸収層の面積より大きいことを特徴とする発光装置の作製方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009279029A JP5291607B2 (ja) | 2008-12-15 | 2009-12-09 | 発光装置の作製方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008318365 | 2008-12-15 | ||
JP2008318365 | 2008-12-15 | ||
JP2009279029A JP5291607B2 (ja) | 2008-12-15 | 2009-12-09 | 発光装置の作製方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010165669A JP2010165669A (ja) | 2010-07-29 |
JP2010165669A5 JP2010165669A5 (ja) | 2012-11-08 |
JP5291607B2 true JP5291607B2 (ja) | 2013-09-18 |
Family
ID=42241088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009279029A Expired - Fee Related JP5291607B2 (ja) | 2008-12-15 | 2009-12-09 | 発光装置の作製方法 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8241700B2 (ja) |
JP (1) | JP5291607B2 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9337428B2 (en) | 2014-05-23 | 2016-05-10 | Samsung Display Co., Ltd. | Donor mask and method of manufacturing organic light emitting display apparatus using the same |
US9362503B2 (en) | 2014-06-30 | 2016-06-07 | Samsung Display Co., Ltd. | Donor mask and method of manufacturing organic light-emitting display apparatus |
US9583709B2 (en) | 2014-03-18 | 2017-02-28 | Samsung Display Co., Ltd. | Mask for forming organic layer pattern, forming method of organic layer pattern, and manufacturing method of organic light emitting diode display using the same |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010153813A (ja) | 2008-11-18 | 2010-07-08 | Semiconductor Energy Lab Co Ltd | 発光装置及びその作製方法、並びに、携帯電話機 |
US8576209B2 (en) | 2009-07-07 | 2013-11-05 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
JP5425242B2 (ja) * | 2012-01-31 | 2014-02-26 | キヤノン株式会社 | 有機el素子及びこれを用いた表示装置 |
KR102081209B1 (ko) * | 2013-03-26 | 2020-02-26 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법, 및 그 유기 발광 표시 장치의 제조에 사용되는 도너 기판 및 도너 기판 세트 |
KR102159644B1 (ko) * | 2013-05-30 | 2020-09-25 | 삼성디스플레이 주식회사 | 줄히팅 증착장치 및 이를 이용한 증착방법 |
KR20150056112A (ko) * | 2013-11-14 | 2015-05-26 | 삼성디스플레이 주식회사 | 막 형성용 마스크, 이를 이용한 막 형성 방법 및 유기 발광 표시 장치의 제조 방법 |
US9601559B2 (en) * | 2015-07-22 | 2017-03-21 | Grantwood Limited | Structure of an organic device, method and apparatus for patterning the same |
CN105238391B (zh) * | 2015-11-04 | 2017-04-26 | 西安建筑科技大学 | 多光源钒基介孔有机-无机杂化发光材料的制备方法 |
WO2021070236A1 (ja) * | 2019-10-08 | 2021-04-15 | シャープ株式会社 | 発光デバイス |
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JP3801730B2 (ja) | 1997-05-09 | 2006-07-26 | 株式会社半導体エネルギー研究所 | プラズマcvd装置及びそれを用いた薄膜形成方法 |
US5937272A (en) | 1997-06-06 | 1999-08-10 | Eastman Kodak Company | Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate |
US6165543A (en) | 1998-06-17 | 2000-12-26 | Nec Corporation | Method of making organic EL device and organic EL transfer base plate |
JP3740557B2 (ja) | 1999-03-09 | 2006-02-01 | 独立行政法人産業技術総合研究所 | 有機薄膜作製方法および有機薄膜作製装置 |
TW527735B (en) | 1999-06-04 | 2003-04-11 | Semiconductor Energy Lab | Electro-optical device |
US8853696B1 (en) | 1999-06-04 | 2014-10-07 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and electronic device |
SG114589A1 (en) | 2001-12-12 | 2005-09-28 | Semiconductor Energy Lab | Film formation apparatus and film formation method and cleaning method |
JP4294305B2 (ja) | 2001-12-12 | 2009-07-08 | 株式会社半導体エネルギー研究所 | 成膜装置および成膜方法 |
US6953735B2 (en) | 2001-12-28 | 2005-10-11 | Semiconductor Energy Laboratory Co., Ltd. | Method for fabricating a semiconductor device by transferring a layer to a support with curvature |
JP4567941B2 (ja) | 2001-12-28 | 2010-10-27 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法及び表示装置の作製方法 |
US6703179B2 (en) | 2002-03-13 | 2004-03-09 | Eastman Kodak Company | Transfer of organic material from a donor to form a layer in an OLED device |
JP2004103406A (ja) | 2002-09-10 | 2004-04-02 | Sony Corp | 薄膜パターン形成方法および装置並びに有機el表示装置の製造方法 |
JP4493926B2 (ja) | 2003-04-25 | 2010-06-30 | 株式会社半導体エネルギー研究所 | 製造装置 |
US20050145326A1 (en) | 2004-01-05 | 2005-07-07 | Eastman Kodak Company | Method of making an OLED device |
KR100635056B1 (ko) * | 2004-02-19 | 2006-10-16 | 삼성에스디아이 주식회사 | 유기전계 발광표시장치의 제조방법 |
JP2006309995A (ja) * | 2005-04-27 | 2006-11-09 | Sony Corp | 転写用基板および表示装置の製造方法ならびに表示装置 |
JP2006344459A (ja) | 2005-06-08 | 2006-12-21 | Sony Corp | 転写方法および転写装置 |
TWI307612B (en) | 2005-04-27 | 2009-03-11 | Sony Corp | Transfer method and transfer apparatus |
JP2007005123A (ja) * | 2005-06-23 | 2007-01-11 | Toshiba Matsushita Display Technology Co Ltd | 表示装置の製造方法及び表示装置の製造装置 |
US8138502B2 (en) | 2005-08-05 | 2012-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting device and manufacturing method thereof |
JP4449890B2 (ja) * | 2005-11-21 | 2010-04-14 | ソニー株式会社 | 転写用基板および転写方法ならびに表示装置の製造方法 |
KR101563237B1 (ko) | 2007-06-01 | 2015-10-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 제조장치 및 발광장치 제작방법 |
KR20090028413A (ko) | 2007-09-13 | 2009-03-18 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광장치 제작방법 및 증착용 기판 |
JP5490393B2 (ja) | 2007-10-10 | 2014-05-14 | 株式会社半導体エネルギー研究所 | 半導体基板の製造方法 |
US8153201B2 (en) | 2007-10-23 | 2012-04-10 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing light-emitting device, and evaporation donor substrate |
KR20090041314A (ko) | 2007-10-23 | 2009-04-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판 및 발광장치의 제조방법 |
JP2009280909A (ja) * | 2008-04-25 | 2009-12-03 | Semiconductor Energy Lab Co Ltd | 成膜方法および発光装置の作製方法 |
JP2010153813A (ja) | 2008-11-18 | 2010-07-08 | Semiconductor Energy Lab Co Ltd | 発光装置及びその作製方法、並びに、携帯電話機 |
-
2009
- 2009-12-09 JP JP2009279029A patent/JP5291607B2/ja not_active Expired - Fee Related
- 2009-12-10 US US12/635,048 patent/US8241700B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9583709B2 (en) | 2014-03-18 | 2017-02-28 | Samsung Display Co., Ltd. | Mask for forming organic layer pattern, forming method of organic layer pattern, and manufacturing method of organic light emitting diode display using the same |
US9337428B2 (en) | 2014-05-23 | 2016-05-10 | Samsung Display Co., Ltd. | Donor mask and method of manufacturing organic light emitting display apparatus using the same |
US9362503B2 (en) | 2014-06-30 | 2016-06-07 | Samsung Display Co., Ltd. | Donor mask and method of manufacturing organic light-emitting display apparatus |
Also Published As
Publication number | Publication date |
---|---|
US8241700B2 (en) | 2012-08-14 |
US20100151762A1 (en) | 2010-06-17 |
JP2010165669A (ja) | 2010-07-29 |
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