JP4942657B2 - 液体凝固の酸素阻害を減衰させる重合技術及びそのための組成物 - Google Patents
液体凝固の酸素阻害を減衰させる重合技術及びそのための組成物 Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 36
- 239000007788 liquid Substances 0.000 title claims abstract description 27
- 238000006116 polymerization reaction Methods 0.000 title claims abstract description 22
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 13
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- 230000005855 radiation Effects 0.000 claims description 17
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 claims description 15
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- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 claims description 10
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- 125000003277 amino group Chemical group 0.000 claims description 8
- 150000001412 amines Chemical class 0.000 claims description 6
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- 125000002081 peroxide group Chemical group 0.000 claims description 6
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 claims description 5
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 claims description 4
- 238000007711 solidification Methods 0.000 claims description 4
- 230000008023 solidification Effects 0.000 claims description 4
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical group C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 claims description 3
- PUBNJSZGANKUGX-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C)C=C1 PUBNJSZGANKUGX-UHFFFAOYSA-N 0.000 claims description 2
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 claims description 2
- 229940123973 Oxygen scavenger Drugs 0.000 claims 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims 2
- 125000006181 4-methyl benzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])C([H])([H])* 0.000 claims 1
- -1 4-morpholinophenyl Chemical group 0.000 claims 1
- 125000004103 aminoalkyl group Chemical group 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 239000003999 initiator Substances 0.000 abstract description 13
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
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- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
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- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
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- 150000003512 tertiary amines Chemical class 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/02—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a matt or rough surface
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
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- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
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- General Health & Medical Sciences (AREA)
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- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Polymerisation Methods In General (AREA)
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Description
米国政府は、本発明における一括払いライセンス、及び米国標準局(NIST)ATP裁定によって裁定された70NANB4H3012の条項に規定される、特許権者に対し、他者に穏当な条件で使用許諾をすることを要求する、限定された状況における権利を有する。
イソボルニルアクリレート
n−ヘキシルアクリレート
エチレングリコールジアクリレート
2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン
R1R2
(R1R2は、界面活性剤である)。本発明の目的を達成するために、界面活性剤は、任意の分子と定義され、その一方の尾部は、疎水性である。界面活性剤は、フッ素含有であっても良く、例えばフッ素鎖を含むか、又は界面活性剤分子構造にいかなるフッ素も含まなくても良い。界面活性剤R1R2において、R1=F(CF2CF2)yであり、yは1から7(7を含む)の範囲にあり、かつR2=CH2CH2O(CH2CH2O)xHであり、xは0から15(15を含む)の範囲にある。代表的な界面活性剤は、DUPONT(商標)からの商品名ZONYL(登録商標)FS0−100で入手できる。重合反応中に、先行技術の組成物が、材料−ガス境界に近接する過酸化物基を形成すると考えられた。このことは、インプリント材料の重合を妨げないにせよ、その速度を落とす。その結果、所与の重合工程に関して、フィルム300は、その容積にわたって種々の凝固程度を与えられる。
イソボルニルアクリレート
n−ヘキシルアクリレート
エチレングリコールジアクリレート
2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン
N−メチルジエタノールアミン
R1R2
R・ + O2 → RO2・ (4)
(式中、RO2・は、基、すなわち過酸化物基の二次集団である)。過酸化物基は、式(2)の反応を容易にするためにその量を減少させる一次集団R・の基を効果的に消費するという点で望ましくなく、かつ過酸化物基自体は、低い重合開始確率を有する。このことは、式(4)によって定義されるような重合を阻害する。しかしながら組成物1のアミン基、DHは、基D・の三次集団や、ある種の残留分子RO2Hを生成するために、基RO2・の二次集団と次のように反応する:
RO2・ + DH → RO2H + D・ (5)
D・ + M → DM・ (6)
D・ + O2 → DO2・ (7)
DO2・ + DH → DO2H + D・ (8)
アミン基が置換によって、又は三次アミン成分と共に、又はその代わりに含まれるアミン含有開始剤を2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン開始剤と併せて使用することによって組成物1に含まれるてもよいことが、理解されるべきである。アミン基が、開始剤の代わりに用いられるならば、アミン基が、紫外線暴露で基を発生させることにおいて光活性であることが望ましい。そのために、他の組成物は、次のものを含むことができる:
イソボルニルアクリレート
n−ヘキシルアクリレート
エチレングリコールジアクリレート
2−メチル−1[4−(メチルチオ)フェニル]−2−モルホリノプロパン−1−オン
R1R2
(式中、2−メチル−1[4−(メチルチオ)フェニル]−2−モルホリノプロパン−1−オンは、商品名IRGACURE(登録商標)907でTarrytown、New YorkのCiba Specialty Chemicals Corporationから入手できる);及び
イソボルニルアクリレート
n−ヘキシルアクリレート
エチレングリコールジアクリレート
2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−1−ブタノン
R1R2
(式中、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−1−ブタノンは、商品名IRGACURE(登録商標)369でTarrytown、New YorkのCiba Specialty Chemicals Corporationから入手できる);及び
イソボルニルアクリレート
n−ヘキシルアクリレート
エチレングリコールジアクリレート
2−(4−メチル−ベンジル)−2−ジメチルアミノ−1−(4−モルホリノフェニル)−1−ブタノン
R1R2
(式中、2−(4−メチル−ベンジル)−2−ジメチルアミノ−1−(4−モルホリノフェニル)−1−ブタノンは、商品名IRGACURE(登録商標)379でTarrytown、New YorkのCiba Specialty Chemicals Corporationから入手できる)。
Claims (9)
- インプリントリソグラフィ方法であって、
酸素含有大気中の基板(32)上に、重合可能な液体組成物の複数の離間した離散小滴(38)を配置するステップであって、前記小滴(38)は、前記大気との界面となる境界を有し、結果として、モールド(26)に接する基板(32)の表面(36)の一部分にインプリント層(34)を形成するステップと、
基板(32)とモールド(26)の間の距離dを、インプリント層(34)がモールド(26)に機械的に接触できるように減少させるステップと、
所望の距離に達した後、前記組成物を重合し、かつ架橋する化学線を放射線源(22)により生成し、それにより、記録されたパターン(134)を凝固させるステップであって、凝固されたインプリント層には、モールド(26)の表面(50)の形に合致する形を有する面が与えられるステップと、
記録されたパターン(134)の凝固後、モールド(26)と記録されたパターン(134)が離れるように距離dを増加させるステップと、
を含み、
前記重合可能な液体組成物は、酸素を消費し、かつ前記境界に近接する酸素による前記組成物の重合阻害を最小限に抑える追加の遊離基を発生させる酸素捕捉剤を含む
ことを特徴とする方法。 - 前記酸素捕捉剤は、重合を開始または継続するため、過酸化物基との反応または紫外線暴露でアルファアミノアルキル基を生成するアミン基を含むことを特徴とする請求項1に記載の方法。
- 前記酸素捕捉剤は、2−メチル−1[4−(メチルチオ)フェニル]−2−モルホリノプロパン−1−オン、N−メチルジエタノールアミン、及び2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−1−ブタノン、及び2−(4−メチル−ベンジル)−2−ジメチルアミノ−1−(4−モルホリノフェニル)−1−ブタノンからなるセットから選択されることを特徴とする請求項2に記載の方法。
- 前記重合可能な液体組成物は、さらに界面活性剤を含むことを特徴とする請求項3に記載の方法。
- 前記重合可能な液体組成物は、イソボルニルアクリレート、n−ヘキシルアクリレート、エチレングリコールジアクリレート、2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン、界面活性剤、アミン成分であるN−メチルジエタノールアミンを含むことを特徴とする請求項3に記載の方法。
- 前記重合可能な液体組成物は、イソボルニルアクリレート、n−ヘキシルアクリレート、エチレングリコールジアクリレート、2−メチル−1[4−(メチルチオ)フェニル]−2−モルホリノプロパン−1−オン、界面活性剤を含むことを特徴とする請求項3に記載の方法。
- 前記重合可能な液体組成物は、イソボルニルアクリレート、n−ヘキシルアクリレート、エチレングリコールジアクリレート、2−ベンジル−2−ジメチルアミノ−1−(4−モルホリノフェニル)−1−ブタノン、界面活性剤を含むことを特徴とする請求項3に記載の方法。
- 前記重合可能な液体組成物は、イソボルニルアクリレート、n−ヘキシルアクリレート、エチレングリコールジアクリレート、2−(4−メチル−ベンジル)−2−ジメチルアミノ−1−(4−モルホリノフェニル)−1−ブタノン、界面活性剤を含むことを特徴とする請求項3に記載の方法。
- 前記重合可能な液体組成物は、20乃至80重量%のイソボルニルアクリレート、0乃至50重量%のn−ヘキシルアクリレート、10乃至50重量%のエチレングリコールジアクリレート、1乃至5重量%の2−ヒドロキシ−2−メチル−1−フェニル−プロパン−1−オン、0.5乃至4重量%のアミン成分であるN−メチルジエタノールアミンを含むことを特徴とする請求項5に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/948,511 US20060062922A1 (en) | 2004-09-23 | 2004-09-23 | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
US10/948,511 | 2004-09-23 | ||
PCT/US2005/032804 WO2006036562A2 (en) | 2004-09-23 | 2005-09-13 | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
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JP2008513577A JP2008513577A (ja) | 2008-05-01 |
JP4942657B2 true JP4942657B2 (ja) | 2012-05-30 |
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EP1796851A4 (en) | 2009-05-06 |
ATE486666T1 (de) | 2010-11-15 |
KR101219354B1 (ko) | 2013-01-18 |
EP2272594A1 (en) | 2011-01-12 |
JP2008513577A (ja) | 2008-05-01 |
US20080085465A1 (en) | 2008-04-10 |
WO2006036562A3 (en) | 2007-03-29 |
US20070141271A1 (en) | 2007-06-21 |
US20060062922A1 (en) | 2006-03-23 |
US7845931B2 (en) | 2010-12-07 |
TW200613898A (en) | 2006-05-01 |
WO2006036562A2 (en) | 2006-04-06 |
KR20070085233A (ko) | 2007-08-27 |
US7981481B2 (en) | 2011-07-19 |
EP1796851A2 (en) | 2007-06-20 |
DE602005024589D1 (de) | 2010-12-16 |
CN101022894A (zh) | 2007-08-22 |
EP1796851B1 (en) | 2010-11-03 |
TWI319349B (en) | 2010-01-11 |
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