JP4904034B2 - レチクル・レイアウト・データを評価するための方法、システム及び搬送媒体 - Google Patents
レチクル・レイアウト・データを評価するための方法、システム及び搬送媒体 Download PDFInfo
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- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
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Description
Claims (31)
- レチクル・レイアウト・データを評価するためのコンピュータ実施方法であって、
前記レチクル・レイアウト・データをレチクル製造プロセスのモデルに対する入力として使用して、前記レチクル・レイアウト・データのフィーチャを前記レチクル製造プロセスを使用してレチクル上に形成する方法を示すシミュレーション画像を生成するステップと、
前記シミュレーション画像と前記レチクル・レイアウト・データを比較するステップと、
前記フィーチャを前記レチクル上に適切に作成することができない前記レチクル・レイアウト・データ内の領域を識別するステップとを含む方法。 - 前記シミュレーション画像に設計ルール・チェックを適用するステップをさらに含む請求項1に記載の方法。
- 設計者が意図する前記様々な部分に関連するデータに基づいて前記シミュレーション画像の様々な部分を解析するステップをさらに含む請求項1に記載の方法。
- 前記生成ステップに先立って前記レチクル・レイアウト・データをレチクル処理バイアスを使用して変更するステップをさらに含む請求項1に記載の方法。
- 前記モデルが前記レチクル製造プロセスを実行するために使用されるレチクル作成ツールに特化された請求項1に記載の方法。
- 前記レチクル製造プロセスを使用して製造されたレチクル上で測定されたデータを使用して前記モデルを変更するステップをさらに含む請求項1に記載の方法。
- 前記シミュレーション画像を使用して前記レチクル・レイアウト・データの検査可能性を決定するステップをさらに含む請求項1に記載の方法。
- 前記検査可能性を決定するステップが、前記レチクルの検査によって生成されるデータが有する近似信号対雑音比を決定するステップを含む請求項7に記載の方法。
- 前記検査可能性を決定するステップが、検査ツールが前記レチクル上で検出することができる最も小さい欠陥のサイズを決定するステップを含む請求項7に記載の方法。
- 前記検査可能性を決定するステップが、前記シミュレーション画像の様々な部分を、設計者が意図する前記様々な部分に関連するデータに基づいて解析するステップを含む請求項7に記載の方法。
- 前記生成ステップを前記レチクル製造プロセスの異なるパラメータに対して実行するステップをさらに含み、前記検査可能性を決定するステップが、前記異なるパラメータを使用して生成された異なるシミュレーション画像に対して実行される請求項7に記載の方法。
- 前記異なるパラメータが複数の異なるレチクル作成ツールを含む請求項11に記載の方法。
- 他の前記異なるレチクル作成ツールより高い検査可能性でレチクルを製造することができる異なるレチクル作成ツールの1つを選択するステップをさらに含む請求項12に記載の方法。
- 前記シミュレーション画像を使用して前記レチクル・レイアウト・データの印刷可能性を決定するステップをさらに含む請求項1に記載の方法。
- 前記印刷可能性を決定するステップが、前記レチクルの前記フィーチャをリソグラフィ・プロセスを使用してウェハ上に印刷する方法を示す追加シミュレーション画像を生成するステップを含む請求項14に記載の方法。
- 前記印刷可能性を決定するステップが、前記追加シミュレーション画像に設計ルール・チェックを適用するステップをさらに含む請求項15に記載の方法。
- 前記印刷可能性を決定するステップが、前記追加シミュレーション画像に光学ルール・チェックを適用するステップをさらに含む請求項15に記載の方法。
- 前記印刷可能性を決定するステップが、前記追加シミュレーション画像と前記フィーチャの理想画像を比較するステップ、及び前記追加シミュレーション画像中の個々のフィーチャのエッジ配置と前記理想画像中の対応するフィーチャのエッジ配置を比較することによって前記追加シミュレーション画像中のエラーを突き止めるステップをさらに含む請求項15に記載の方法。
- 前記印刷可能性を決定するステップが、設計者が意図する前記様々な部分に関連するデータに基づいて前記追加シミュレーション画像の様々な部分を解析するステップをさらに含む請求項15に記載の方法。
- 前記印刷可能性を決定するステップが、前記レチクルの前記フィーチャをリソグラフィ・プロセスを使用してウェハ上に印刷する方法を示す追加シミュレーション画像を異なるプロセス・パラメータで生成するステップを含む請求項15に記載の方法。
- 前記異なるプロセス・パラメータが異なるタイプのリソグラフィ露光ツールを含む請求項20に記載の方法。
- 前記印刷可能性を決定するステップが、前記レチクルの前記フィーチャをリソグラフィ・プロセスを使用してウェハ上に印刷する方法を示す追加シミュレーション画像を、前記シミュレーション画像をリソグラフィ・プロセス・モデルの入力として使用して生成するステップを含み、前記方法が、前記リソグラフィ・プロセスを使用して印刷されたウェハ上で測定されたデータを使用して前記リソグラフィ・プロセス・モデルを変更するステップをさらに含む請求項15に記載の方法。
- 前記シミュレーション画像が、前記レチクル・レイアウト・データのすべてのフィーチャを前記レチクル上に形成する方法をさらに示す請求項1に記載の方法。
- 前記レチクル・レイアウト・データが、光近接修正フィーチャ・データ、収差修正フィーチャ・データ、移相フィーチャ・データもしくはそれらの組合せを含む請求項1に記載の方法。
- 1つ又は複数の改訂レチクル製造プロセスを生成するために、前記レチクル製造プロセスの1つ又は複数のパラメータを変更するステップと、前記1つ又は複数の改訂レチクル製造プロセスに対して前記生成ステップ、前記比較ステップ、前記識別ステップを実行するステップと、前記1つ又は複数の改訂レチクル製造プロセスの中から、前記レチクル・レイアウト・データの製造可能性を最も著しく改善する改訂レチクル製造プロセスを決定するステップとをさらに含む請求項1に記載の方法。
- 前記1つ又は複数のパラメータが異なるタイプのマスク作成ツールを含む請求項25に記載の方法。
- 前記比較ステップに基づいて前記レチクル・レイアウト・データ中の欠陥を識別するステップをさらに含む請求項1に記載の方法。
- ユーザによる前記欠陥の調査と前記欠陥を修正するための前記レチクル・レイアウト・データの変更を許容するステップをさらに含む請求項27に記載の方法。
- 前記欠陥を修正するために前記レチクル・レイアウト・データを変更するステップをさらに含む請求項27に記載の方法。
- レチクル・レイアウト・データを評価するための方法を実行するコンピュータ・システム上で実行可能なプログラム命令を備えた搬送媒体であって、前記方法が、
前記レチクル・レイアウト・データをレチクル製造プロセスのモデルに対する入力として使用して、前記レチクル・レイアウト・データのフィーチャを前記レチクル製造プロセスを使用してレチクル上に形成する方法を示すシミュレーション画像を生成するステップと、
前記シミュレーション画像と前記レチクル・レイアウト・データを比較するステップと、
前記フィーチャを前記レチクル上に適切に作成することができない前記レチクル・レイアウト・データ内の領域を識別するステップとを含む搬送媒体。 - レチクル・レイアウト・データを評価するように構成されたシステムであって、
コンピュータ・システムと、
搬送媒体とを備え、その搬送媒体が
前記コンピュータ・システム上で実行可能な、
前記レチクル・レイアウト・データをレチクル製造プロセスのモデルに対する入力として使用して、前記レチクル・レイアウト・データのフィーチャを前記レチクル製造プロセスを使用してレチクル上に形成する方法を示すシミュレーション画像を生成するステップと、
前記シミュレーション画像と前記レチクル・レイアウト・データを比較するステップと、
前記フィーチャを前記レチクル上に適切に作成することができない前記レチクル・レイアウト・データ内の領域を識別するステップと
を実行するためのプログラム命令を備えたシステム。
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