EP1023639A4 - Method and apparatus for data hierarchy maintenance in a system for mask description - Google Patents
Method and apparatus for data hierarchy maintenance in a system for mask descriptionInfo
- Publication number
- EP1023639A4 EP1023639A4 EP98947103A EP98947103A EP1023639A4 EP 1023639 A4 EP1023639 A4 EP 1023639A4 EP 98947103 A EP98947103 A EP 98947103A EP 98947103 A EP98947103 A EP 98947103A EP 1023639 A4 EP1023639 A4 EP 1023639A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- data hierarchy
- mask description
- hierarchy maintenance
- maintenance
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000012423 maintenance Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70681—Metrology strategies
- G03F7/70683—Mark designs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5930697P | 1997-09-17 | 1997-09-17 | |
US931921 | 1997-09-17 | ||
US08/931,921 US5858580A (en) | 1997-09-17 | 1997-09-17 | Phase shifting circuit manufacture method and apparatus |
US59306P | 1997-09-17 | ||
US6954997P | 1997-12-12 | 1997-12-12 | |
US69549P | 1997-12-12 | ||
US130996 | 1998-08-07 | ||
US09/130,996 US6757645B2 (en) | 1997-09-17 | 1998-08-07 | Visual inspection and verification system |
US09/154,397 US6453452B1 (en) | 1997-12-12 | 1998-09-16 | Method and apparatus for data hierarchy maintenance in a system for mask description |
US09/153,783 US6470489B1 (en) | 1997-09-17 | 1998-09-16 | Design rule checking system and method |
PCT/US1998/019438 WO1999014636A1 (en) | 1997-09-17 | 1998-09-17 | Method and apparatus for data hierarchy maintenance in a system for mask description |
2003-05-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1023639A1 EP1023639A1 (en) | 2000-08-02 |
EP1023639A4 true EP1023639A4 (en) | 2009-04-29 |
Family
ID=27556793
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98947103A Withdrawn EP1023639A4 (en) | 1997-09-17 | 1998-09-17 | Method and apparatus for data hierarchy maintenance in a system for mask description |
EP98951922A Withdrawn EP1023641A4 (en) | 1997-09-17 | 1998-09-17 | Design rule checking system and method |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98951922A Withdrawn EP1023641A4 (en) | 1997-09-17 | 1998-09-17 | Design rule checking system and method |
Country Status (5)
Country | Link |
---|---|
EP (2) | EP1023639A4 (en) |
JP (2) | JP2003526110A (en) |
KR (2) | KR20010024117A (en) |
AU (3) | AU9396198A (en) |
WO (1) | WO1999014638A1 (en) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6453452B1 (en) | 1997-12-12 | 2002-09-17 | Numerical Technologies, Inc. | Method and apparatus for data hierarchy maintenance in a system for mask description |
US6425113B1 (en) | 2000-06-13 | 2002-07-23 | Leigh C. Anderson | Integrated verification and manufacturability tool |
US7412676B2 (en) | 2000-06-13 | 2008-08-12 | Nicolas B Cobb | Integrated OPC verification tool |
JP2004503879A (en) * | 2000-06-13 | 2004-02-05 | メンター グラフィックス コーポレイション | Integrated verification and manufacturing adaptation tools |
US6978436B2 (en) | 2000-07-05 | 2005-12-20 | Synopsys, Inc. | Design data format and hierarchy management for phase processing |
US6430737B1 (en) * | 2000-07-10 | 2002-08-06 | Mentor Graphics Corp. | Convergence technique for model-based optical and process correction |
JP2002122977A (en) * | 2000-10-17 | 2002-04-26 | Sony Corp | Method for producing photomask, photomask and exposure method |
KR100649969B1 (en) * | 2000-12-26 | 2006-11-27 | 주식회사 하이닉스반도체 | Method for fabricating mask |
US6395438B1 (en) | 2001-01-08 | 2002-05-28 | International Business Machines Corporation | Method of etch bias proximity correction |
US6505327B2 (en) | 2001-04-13 | 2003-01-07 | Numerical Technologies, Inc. | Generating an instance-based representation of a design hierarchy |
JP3572053B2 (en) * | 2001-05-31 | 2004-09-29 | 株式会社東芝 | Method of manufacturing exposure mask, method of generating mask substrate information, method of manufacturing semiconductor device, and server |
US6721928B2 (en) | 2001-07-26 | 2004-04-13 | Numerical Technologies, Inc. | Verification utilizing instance-based hierarchy management |
US6560766B2 (en) | 2001-07-26 | 2003-05-06 | Numerical Technologies, Inc. | Method and apparatus for analyzing a layout using an instance-based representation |
US6735752B2 (en) | 2001-09-10 | 2004-05-11 | Numerical Technologies, Inc. | Modifying a hierarchical representation of a circuit to process features created by interactions between cells |
US6738958B2 (en) | 2001-09-10 | 2004-05-18 | Numerical Technologies, Inc. | Modifying a hierarchical representation of a circuit to process composite gates |
US6880135B2 (en) | 2001-11-07 | 2005-04-12 | Synopsys, Inc. | Method of incorporating lens aberration information into various process flows |
US7085698B2 (en) | 2001-12-18 | 2006-08-01 | Synopsys, Inc. | Method for providing flexible and dynamic reporting capability using simulation tools |
US7159197B2 (en) | 2001-12-31 | 2007-01-02 | Synopsys, Inc. | Shape-based geometry engine to perform smoothing and other layout beautification operations |
JP4138318B2 (en) * | 2002-01-08 | 2008-08-27 | 株式会社ルネサステクノロジ | Lithography process margin evaluation apparatus, lithography process margin evaluation method, and lithography process margin evaluation program |
US7293249B2 (en) | 2002-01-31 | 2007-11-06 | Juan Andres Torres Robles | Contrast based resolution enhancement for photolithographic processing |
US7386433B2 (en) | 2002-03-15 | 2008-06-10 | Synopsys, Inc. | Using a suggested solution to speed up a process for simulating and correcting an integrated circuit layout |
US6944844B2 (en) | 2002-04-03 | 2005-09-13 | Synopsys, Inc. | System and method to determine impact of line end shortening |
US6931613B2 (en) | 2002-06-24 | 2005-08-16 | Thomas H. Kauth | Hierarchical feature extraction for electrical interaction calculations |
US6687895B2 (en) | 2002-07-03 | 2004-02-03 | Numerical Technologies Inc. | Method and apparatus for reducing optical proximity correction output file size |
US7069534B2 (en) | 2003-12-17 | 2006-06-27 | Sahouria Emile Y | Mask creation with hierarchy management using cover cells |
US7861207B2 (en) | 2004-02-25 | 2010-12-28 | Mentor Graphics Corporation | Fragmentation point and simulation site adjustment for resolution enhancement techniques |
US7448012B1 (en) | 2004-04-21 | 2008-11-04 | Qi-De Qian | Methods and system for improving integrated circuit layout |
US8799830B2 (en) | 2004-05-07 | 2014-08-05 | Mentor Graphics Corporation | Integrated circuit layout design methodology with process variation bands |
US7240305B2 (en) | 2004-06-02 | 2007-07-03 | Lippincott George P | OPC conflict identification and edge priority system |
JP4266189B2 (en) | 2004-07-09 | 2009-05-20 | 株式会社東芝 | Semiconductor integrated circuit pattern verification method, photomask creation method, semiconductor integrated circuit device manufacturing method, and program for realizing semiconductor integrated circuit pattern verification method |
JP4904034B2 (en) * | 2004-09-14 | 2012-03-28 | ケーエルエー−テンカー コーポレイション | Method, system and carrier medium for evaluating reticle layout data |
US7617473B2 (en) * | 2005-01-21 | 2009-11-10 | International Business Machines Corporation | Differential alternating phase shift mask optimization |
US7506285B2 (en) | 2006-02-17 | 2009-03-17 | Mohamed Al-Imam | Multi-dimensional analysis for predicting RET model accuracy |
US7739650B2 (en) | 2007-02-09 | 2010-06-15 | Juan Andres Torres Robles | Pre-bias optical proximity correction |
EP2153376B1 (en) | 2007-05-23 | 2011-10-19 | Nxp B.V. | Process-window aware detection and correction of lithographic printing issues at mask level |
US7805699B2 (en) | 2007-10-11 | 2010-09-28 | Mentor Graphics Corporation | Shape-based photolithographic model calibration |
JP5100405B2 (en) | 2008-01-16 | 2012-12-19 | 株式会社東芝 | Database creation method and database apparatus |
US7975244B2 (en) | 2008-01-24 | 2011-07-05 | International Business Machines Corporation | Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks |
US10008422B2 (en) * | 2015-08-17 | 2018-06-26 | Qoniac Gmbh | Method for assessing the usability of an exposed and developed semiconductor wafer |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0608657A1 (en) * | 1993-01-29 | 1994-08-03 | International Business Machines Corporation | Apparatus and method for preparing shape data for proximity correction |
US5553274A (en) * | 1995-04-17 | 1996-09-03 | International Business Machines Corporation | Vertex minimization in a smart optical proximity correction system |
JPH08272075A (en) * | 1995-03-06 | 1996-10-18 | Lsi Logic Corp | System and method for optical proximity correction on macrocell library |
DE19818440A1 (en) * | 1998-04-24 | 1999-10-28 | Applied Integrated Systems & S | Method of generating data for the production of a structure defined by design data, e.g. for electron beam lithography, overcomes some disadvantages with respect to increase in layout complexity and data quantity to be processed |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5631110A (en) * | 1994-07-05 | 1997-05-20 | Nec Corporation | Process of fabricating photo-mask used for modified illumination, projection aligner using the photo-mask and method of transferring pattern image from the photo-mask to photo-sensitive layer |
JPH08297692A (en) * | 1994-09-16 | 1996-11-12 | Mitsubishi Electric Corp | Device and method for correcting optical proximity, and pattern forming method |
JP3409493B2 (en) * | 1995-03-13 | 2003-05-26 | ソニー株式会社 | Mask pattern correction method and correction device |
JP2917879B2 (en) * | 1995-10-31 | 1999-07-12 | 日本電気株式会社 | Photomask and manufacturing method thereof |
US5705301A (en) * | 1996-02-27 | 1998-01-06 | Lsi Logic Corporation | Performing optical proximity correction with the aid of design rule checkers |
US5801954A (en) * | 1996-04-24 | 1998-09-01 | Micron Technology, Inc. | Process for designing and checking a mask layout |
US5707765A (en) * | 1996-05-28 | 1998-01-13 | Microunity Systems Engineering, Inc. | Photolithography mask using serifs and method thereof |
-
1998
- 1998-09-17 WO PCT/US1998/019510 patent/WO1999014638A1/en not_active Application Discontinuation
- 1998-09-17 JP JP2000512112A patent/JP2003526110A/en active Pending
- 1998-09-17 KR KR1020007002873A patent/KR20010024117A/en not_active Application Discontinuation
- 1998-09-17 AU AU93961/98A patent/AU9396198A/en not_active Abandoned
- 1998-09-17 EP EP98947103A patent/EP1023639A4/en not_active Withdrawn
- 1998-09-17 AU AU93960/98A patent/AU9396098A/en not_active Abandoned
- 1998-09-17 KR KR1020007002869A patent/KR20010024113A/en not_active Application Discontinuation
- 1998-09-17 AU AU97751/98A patent/AU9775198A/en not_active Abandoned
- 1998-09-17 EP EP98951922A patent/EP1023641A4/en not_active Withdrawn
- 1998-09-17 JP JP2000512110A patent/JP4624550B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0608657A1 (en) * | 1993-01-29 | 1994-08-03 | International Business Machines Corporation | Apparatus and method for preparing shape data for proximity correction |
JPH08272075A (en) * | 1995-03-06 | 1996-10-18 | Lsi Logic Corp | System and method for optical proximity correction on macrocell library |
US5682323A (en) * | 1995-03-06 | 1997-10-28 | Lsi Logic Corporation | System and method for performing optical proximity correction on macrocell libraries |
US5553274A (en) * | 1995-04-17 | 1996-09-03 | International Business Machines Corporation | Vertex minimization in a smart optical proximity correction system |
DE19818440A1 (en) * | 1998-04-24 | 1999-10-28 | Applied Integrated Systems & S | Method of generating data for the production of a structure defined by design data, e.g. for electron beam lithography, overcomes some disadvantages with respect to increase in layout complexity and data quantity to be processed |
Non-Patent Citations (2)
Title |
---|
HARAFUJI K ET AL: "A NOVEL HIERARCHICAL APPROACH FOR PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY", IEEE TRANSACTIONS ON COMPUTER AIDED DESIGN OF INTEGRATEDCIRCUITS AND SYSTEMS, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, vol. 12, no. 10, 1 October 1993 (1993-10-01), pages 1508 - 1514, XP000452154, ISSN: 0278-0070 * |
See also references of WO9914636A1 * |
Also Published As
Publication number | Publication date |
---|---|
EP1023641A4 (en) | 2009-04-22 |
AU9396198A (en) | 1999-04-05 |
JP2003523545A (en) | 2003-08-05 |
AU9775198A (en) | 1999-04-05 |
EP1023641A1 (en) | 2000-08-02 |
EP1023639A1 (en) | 2000-08-02 |
AU9396098A (en) | 1999-04-05 |
JP2003526110A (en) | 2003-09-02 |
KR20010024113A (en) | 2001-03-26 |
JP4624550B2 (en) | 2011-02-02 |
KR20010024117A (en) | 2001-03-26 |
WO1999014638A1 (en) | 1999-03-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20000403 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): DE FR GB IT |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: NUMERICAL TECHNOLOGIES, INC. |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SYNOPSYS MERGER HOLDINGS LLC |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SYNOPSYS, INC. |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20090401 |
|
17Q | First examination report despatched |
Effective date: 20090925 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20150609 |