EP1023639A4 - Procede et dispositif servant a maintenir une hierarchie de donnees dans un systeme de description de masque - Google Patents
Procede et dispositif servant a maintenir une hierarchie de donnees dans un systeme de description de masqueInfo
- Publication number
- EP1023639A4 EP1023639A4 EP98947103A EP98947103A EP1023639A4 EP 1023639 A4 EP1023639 A4 EP 1023639A4 EP 98947103 A EP98947103 A EP 98947103A EP 98947103 A EP98947103 A EP 98947103A EP 1023639 A4 EP1023639 A4 EP 1023639A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- data hierarchy
- mask description
- hierarchy maintenance
- maintenance
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000012423 maintenance Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70681—Metrology strategies
- G03F7/70683—Mark designs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5930697P | 1997-09-17 | 1997-09-17 | |
US59306P | 1997-09-17 | ||
US08/931,921 US5858580A (en) | 1997-09-17 | 1997-09-17 | Phase shifting circuit manufacture method and apparatus |
US931921 | 1997-09-17 | ||
US6954997P | 1997-12-12 | 1997-12-12 | |
US69549P | 1997-12-12 | ||
US09/130,996 US6757645B2 (en) | 1997-09-17 | 1998-08-07 | Visual inspection and verification system |
US130996 | 1998-08-07 | ||
US09/153,783 US6470489B1 (en) | 1997-09-17 | 1998-09-16 | Design rule checking system and method |
US09/154,397 US6453452B1 (en) | 1997-12-12 | 1998-09-16 | Method and apparatus for data hierarchy maintenance in a system for mask description |
PCT/US1998/019438 WO1999014636A1 (fr) | 1997-09-17 | 1998-09-17 | Procede et dispositif servant a maintenir une hierarchie de donnees dans un systeme de description de masque |
2003-05-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1023639A1 EP1023639A1 (fr) | 2000-08-02 |
EP1023639A4 true EP1023639A4 (fr) | 2009-04-29 |
Family
ID=27556793
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98947103A Withdrawn EP1023639A4 (fr) | 1997-09-17 | 1998-09-17 | Procede et dispositif servant a maintenir une hierarchie de donnees dans un systeme de description de masque |
EP98951922A Withdrawn EP1023641A4 (fr) | 1997-09-17 | 1998-09-17 | Procede et systeme de controle de regles de conception |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98951922A Withdrawn EP1023641A4 (fr) | 1997-09-17 | 1998-09-17 | Procede et systeme de controle de regles de conception |
Country Status (5)
Country | Link |
---|---|
EP (2) | EP1023639A4 (fr) |
JP (2) | JP4624550B2 (fr) |
KR (2) | KR20010024113A (fr) |
AU (3) | AU9396098A (fr) |
WO (1) | WO1999014638A1 (fr) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6453452B1 (en) | 1997-12-12 | 2002-09-17 | Numerical Technologies, Inc. | Method and apparatus for data hierarchy maintenance in a system for mask description |
US7412676B2 (en) | 2000-06-13 | 2008-08-12 | Nicolas B Cobb | Integrated OPC verification tool |
JP2004503879A (ja) * | 2000-06-13 | 2004-02-05 | メンター グラフィックス コーポレイション | 集積化検証および製造適応ツール |
US6425113B1 (en) | 2000-06-13 | 2002-07-23 | Leigh C. Anderson | Integrated verification and manufacturability tool |
US6978436B2 (en) | 2000-07-05 | 2005-12-20 | Synopsys, Inc. | Design data format and hierarchy management for phase processing |
US6430737B1 (en) | 2000-07-10 | 2002-08-06 | Mentor Graphics Corp. | Convergence technique for model-based optical and process correction |
JP2002122977A (ja) * | 2000-10-17 | 2002-04-26 | Sony Corp | フォトマスクの作成法、フォトマスク、並びに露光方法 |
KR100649969B1 (ko) * | 2000-12-26 | 2006-11-27 | 주식회사 하이닉스반도체 | 마스크 제작방법 |
US6395438B1 (en) | 2001-01-08 | 2002-05-28 | International Business Machines Corporation | Method of etch bias proximity correction |
US6505327B2 (en) | 2001-04-13 | 2003-01-07 | Numerical Technologies, Inc. | Generating an instance-based representation of a design hierarchy |
JP3572053B2 (ja) * | 2001-05-31 | 2004-09-29 | 株式会社東芝 | 露光マスクの製造方法、マスク基板情報生成方法、半導体装置の製造方法およびサーバー |
US6560766B2 (en) | 2001-07-26 | 2003-05-06 | Numerical Technologies, Inc. | Method and apparatus for analyzing a layout using an instance-based representation |
US6721928B2 (en) | 2001-07-26 | 2004-04-13 | Numerical Technologies, Inc. | Verification utilizing instance-based hierarchy management |
US6738958B2 (en) | 2001-09-10 | 2004-05-18 | Numerical Technologies, Inc. | Modifying a hierarchical representation of a circuit to process composite gates |
US6735752B2 (en) | 2001-09-10 | 2004-05-11 | Numerical Technologies, Inc. | Modifying a hierarchical representation of a circuit to process features created by interactions between cells |
US6880135B2 (en) | 2001-11-07 | 2005-04-12 | Synopsys, Inc. | Method of incorporating lens aberration information into various process flows |
US7085698B2 (en) | 2001-12-18 | 2006-08-01 | Synopsys, Inc. | Method for providing flexible and dynamic reporting capability using simulation tools |
US7159197B2 (en) | 2001-12-31 | 2007-01-02 | Synopsys, Inc. | Shape-based geometry engine to perform smoothing and other layout beautification operations |
JP4138318B2 (ja) * | 2002-01-08 | 2008-08-27 | 株式会社ルネサステクノロジ | リソグラフィプロセスマージン評価装置、リソグラフィプロセスマージン評価方法およびリソグラフィプロセスマージン評価プログラム |
US7293249B2 (en) | 2002-01-31 | 2007-11-06 | Juan Andres Torres Robles | Contrast based resolution enhancement for photolithographic processing |
US7386433B2 (en) | 2002-03-15 | 2008-06-10 | Synopsys, Inc. | Using a suggested solution to speed up a process for simulating and correcting an integrated circuit layout |
US6944844B2 (en) | 2002-04-03 | 2005-09-13 | Synopsys, Inc. | System and method to determine impact of line end shortening |
US6931613B2 (en) | 2002-06-24 | 2005-08-16 | Thomas H. Kauth | Hierarchical feature extraction for electrical interaction calculations |
US6687895B2 (en) | 2002-07-03 | 2004-02-03 | Numerical Technologies Inc. | Method and apparatus for reducing optical proximity correction output file size |
US7069534B2 (en) | 2003-12-17 | 2006-06-27 | Sahouria Emile Y | Mask creation with hierarchy management using cover cells |
US7861207B2 (en) | 2004-02-25 | 2010-12-28 | Mentor Graphics Corporation | Fragmentation point and simulation site adjustment for resolution enhancement techniques |
US7448012B1 (en) | 2004-04-21 | 2008-11-04 | Qi-De Qian | Methods and system for improving integrated circuit layout |
EP1747520B1 (fr) | 2004-05-07 | 2018-10-24 | Mentor Graphics Corporation | Procede de conception d'un agencement de circuit integre et bandes de variation de procede |
US7240305B2 (en) | 2004-06-02 | 2007-07-03 | Lippincott George P | OPC conflict identification and edge priority system |
JP4266189B2 (ja) | 2004-07-09 | 2009-05-20 | 株式会社東芝 | 半導体集積回路パターンの検証方法、フォトマスクの作成方法、半導体集積回路装置の製造方法、及び半導体集積回路パターンの検証方法を実現するためのプログラム |
JP4904034B2 (ja) * | 2004-09-14 | 2012-03-28 | ケーエルエー−テンカー コーポレイション | レチクル・レイアウト・データを評価するための方法、システム及び搬送媒体 |
US7617473B2 (en) * | 2005-01-21 | 2009-11-10 | International Business Machines Corporation | Differential alternating phase shift mask optimization |
US7506285B2 (en) | 2006-02-17 | 2009-03-17 | Mohamed Al-Imam | Multi-dimensional analysis for predicting RET model accuracy |
US7739650B2 (en) | 2007-02-09 | 2010-06-15 | Juan Andres Torres Robles | Pre-bias optical proximity correction |
US8230371B2 (en) | 2007-05-23 | 2012-07-24 | Nxp B.V. | Process-window aware detection and correction of lithographic printing issues at mask level |
US7805699B2 (en) | 2007-10-11 | 2010-09-28 | Mentor Graphics Corporation | Shape-based photolithographic model calibration |
JP5100405B2 (ja) | 2008-01-16 | 2012-12-19 | 株式会社東芝 | データベースの作成方法およびデータベース装置 |
US7975244B2 (en) | 2008-01-24 | 2011-07-05 | International Business Machines Corporation | Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks |
US10008422B2 (en) * | 2015-08-17 | 2018-06-26 | Qoniac Gmbh | Method for assessing the usability of an exposed and developed semiconductor wafer |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0608657A1 (fr) * | 1993-01-29 | 1994-08-03 | International Business Machines Corporation | Appareil et procédé de traitement de données de forme pour la correction de l'effet de proximity |
US5553274A (en) * | 1995-04-17 | 1996-09-03 | International Business Machines Corporation | Vertex minimization in a smart optical proximity correction system |
JPH08272075A (ja) * | 1995-03-06 | 1996-10-18 | Lsi Logic Corp | マクロセルライブラリ上での光学近接修正のためのシステム及び方法 |
DE19818440A1 (de) * | 1998-04-24 | 1999-10-28 | Applied Integrated Systems & S | Verfahren zur Erzeugung von Daten für die Herstellung einer durch Entwurfsdaten definierten Struktur |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2291219B (en) * | 1994-07-05 | 1998-07-01 | Nec Corp | Photo-mask fabrication and use |
JPH08297692A (ja) * | 1994-09-16 | 1996-11-12 | Mitsubishi Electric Corp | 光近接補正装置及び方法並びにパタン形成方法 |
JP3409493B2 (ja) * | 1995-03-13 | 2003-05-26 | ソニー株式会社 | マスクパターンの補正方法および補正装置 |
JP2917879B2 (ja) * | 1995-10-31 | 1999-07-12 | 日本電気株式会社 | フォトマスク及びその製造方法 |
US5705301A (en) * | 1996-02-27 | 1998-01-06 | Lsi Logic Corporation | Performing optical proximity correction with the aid of design rule checkers |
US5801954A (en) * | 1996-04-24 | 1998-09-01 | Micron Technology, Inc. | Process for designing and checking a mask layout |
US5707765A (en) * | 1996-05-28 | 1998-01-13 | Microunity Systems Engineering, Inc. | Photolithography mask using serifs and method thereof |
-
1998
- 1998-09-17 EP EP98947103A patent/EP1023639A4/fr not_active Withdrawn
- 1998-09-17 AU AU93960/98A patent/AU9396098A/en not_active Abandoned
- 1998-09-17 EP EP98951922A patent/EP1023641A4/fr not_active Withdrawn
- 1998-09-17 WO PCT/US1998/019510 patent/WO1999014638A1/fr not_active Application Discontinuation
- 1998-09-17 KR KR1020007002869A patent/KR20010024113A/ko not_active Application Discontinuation
- 1998-09-17 KR KR1020007002873A patent/KR20010024117A/ko not_active Application Discontinuation
- 1998-09-17 JP JP2000512110A patent/JP4624550B2/ja not_active Expired - Lifetime
- 1998-09-17 AU AU97751/98A patent/AU9775198A/en not_active Abandoned
- 1998-09-17 AU AU93961/98A patent/AU9396198A/en not_active Abandoned
- 1998-09-17 JP JP2000512112A patent/JP2003526110A/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0608657A1 (fr) * | 1993-01-29 | 1994-08-03 | International Business Machines Corporation | Appareil et procédé de traitement de données de forme pour la correction de l'effet de proximity |
JPH08272075A (ja) * | 1995-03-06 | 1996-10-18 | Lsi Logic Corp | マクロセルライブラリ上での光学近接修正のためのシステム及び方法 |
US5682323A (en) * | 1995-03-06 | 1997-10-28 | Lsi Logic Corporation | System and method for performing optical proximity correction on macrocell libraries |
US5553274A (en) * | 1995-04-17 | 1996-09-03 | International Business Machines Corporation | Vertex minimization in a smart optical proximity correction system |
DE19818440A1 (de) * | 1998-04-24 | 1999-10-28 | Applied Integrated Systems & S | Verfahren zur Erzeugung von Daten für die Herstellung einer durch Entwurfsdaten definierten Struktur |
Non-Patent Citations (2)
Title |
---|
HARAFUJI K ET AL: "A NOVEL HIERARCHICAL APPROACH FOR PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY", IEEE TRANSACTIONS ON COMPUTER AIDED DESIGN OF INTEGRATEDCIRCUITS AND SYSTEMS, IEEE SERVICE CENTER, PISCATAWAY, NJ, US, vol. 12, no. 10, 1 October 1993 (1993-10-01), pages 1508 - 1514, XP000452154, ISSN: 0278-0070 * |
See also references of WO9914636A1 * |
Also Published As
Publication number | Publication date |
---|---|
JP4624550B2 (ja) | 2011-02-02 |
EP1023641A1 (fr) | 2000-08-02 |
AU9775198A (en) | 1999-04-05 |
EP1023641A4 (fr) | 2009-04-22 |
KR20010024117A (ko) | 2001-03-26 |
JP2003526110A (ja) | 2003-09-02 |
WO1999014638A1 (fr) | 1999-03-25 |
JP2003523545A (ja) | 2003-08-05 |
AU9396098A (en) | 1999-04-05 |
AU9396198A (en) | 1999-04-05 |
KR20010024113A (ko) | 2001-03-26 |
EP1023639A1 (fr) | 2000-08-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20000403 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): DE FR GB IT |
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RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: NUMERICAL TECHNOLOGIES, INC. |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SYNOPSYS MERGER HOLDINGS LLC |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SYNOPSYS, INC. |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20090401 |
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17Q | First examination report despatched |
Effective date: 20090925 |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
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18D | Application deemed to be withdrawn |
Effective date: 20150609 |