JP4750237B2 - 金属酸化物を主成分とする層の堆積方法 - Google Patents

金属酸化物を主成分とする層の堆積方法 Download PDF

Info

Publication number
JP4750237B2
JP4750237B2 JP06626499A JP6626499A JP4750237B2 JP 4750237 B2 JP4750237 B2 JP 4750237B2 JP 06626499 A JP06626499 A JP 06626499A JP 6626499 A JP6626499 A JP 6626499A JP 4750237 B2 JP4750237 B2 JP 4750237B2
Authority
JP
Japan
Prior art keywords
layer
sol
substrate
metal oxide
irradiation step
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP06626499A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11319547A5 (enExample
JPH11319547A (ja
Inventor
努 南
清治 忠永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Original Assignee
Saint Gobain Glass France SAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS filed Critical Saint Gobain Glass France SAS
Publication of JPH11319547A publication Critical patent/JPH11319547A/ja
Publication of JPH11319547A5 publication Critical patent/JPH11319547A5/ja
Application granted granted Critical
Publication of JP4750237B2 publication Critical patent/JP4750237B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C03C17/253—Coating containing SnO2
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
    • C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/211—SnO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/241—Doped oxides with halides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides
    • C03C2217/244—Doped oxides with Sb
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/328—Partly or completely removing a coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/328—Partly or completely removing a coating
    • C03C2218/33—Partly or completely removing a coating by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP06626499A 1998-03-13 1999-03-12 金属酸化物を主成分とする層の堆積方法 Expired - Fee Related JP4750237B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9803152 1998-03-13
FR9803152A FR2775914B1 (fr) 1998-03-13 1998-03-13 Procede de depot de couches a base d'oxyde(s) metallique(s)

Publications (3)

Publication Number Publication Date
JPH11319547A JPH11319547A (ja) 1999-11-24
JPH11319547A5 JPH11319547A5 (enExample) 2006-03-30
JP4750237B2 true JP4750237B2 (ja) 2011-08-17

Family

ID=9524051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06626499A Expired - Fee Related JP4750237B2 (ja) 1998-03-13 1999-03-12 金属酸化物を主成分とする層の堆積方法

Country Status (7)

Country Link
US (1) US6517901B1 (enExample)
EP (1) EP0941773B1 (enExample)
JP (1) JP4750237B2 (enExample)
KR (1) KR100607595B1 (enExample)
DE (1) DE69912334T2 (enExample)
ES (1) ES2210996T3 (enExample)
FR (1) FR2775914B1 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI20010523A0 (fi) * 2001-03-16 2001-03-16 Yli Urpo Antti Soolien, geelien ja niiden seosten käsittely
US20030017371A1 (en) * 2001-06-20 2003-01-23 E.L. Specialists, Inc. Method for increasing conductivity of conductive translucent layer
US20030044517A1 (en) * 2001-08-31 2003-03-06 Ryuji Nishikawa Method for manufacturing electroluminescence element and evaporation mask
KR20030059872A (ko) * 2002-01-03 2003-07-12 삼성전자주식회사 금속 또는 금속산화물 미세 패턴의 제조방법
WO2003072499A1 (en) * 2002-02-28 2003-09-04 Japan Science And Technology Agency Titania nanosheet alignment thin film, process for producing the same and article including the titania nanosheet alignment thin film
EP1580164A4 (en) 2002-11-13 2010-12-29 Nippon Soda Co M TAL-OXYGEN BINDING DISPERSO, M TALLIC OXIDE FILM AND MONOMOL CULAR FILM
KR100974778B1 (ko) * 2003-06-30 2010-08-06 삼성전자주식회사 유기금속 전구체 조성물 및 이를 이용한 금속 필름 또는패턴 형성방법
US7381633B2 (en) * 2005-01-27 2008-06-03 Hewlett-Packard Development Company, L.P. Method of making a patterned metal oxide film
US7695998B2 (en) * 2005-07-02 2010-04-13 Hewlett-Packard Development Company, L.P. Methods for making and using high-mobility inorganic semiconductive films
KR100665263B1 (ko) * 2005-07-22 2007-01-09 삼성전기주식회사 복합금속산화물 유전체막 제조방법 및 복합금속산화물유전체막
DE102005036427A1 (de) * 2005-08-03 2007-02-08 Schott Ag Substrat, umfassend zumindest eine voll- oder teilflächige makrostrukturierte Schicht, Verfahren zu deren Herstellung und deren Verwendung
CN100470735C (zh) * 2006-03-03 2009-03-18 台湾薄膜电晶体液晶显示器产业协会 氧化铝绝缘层的制作方法
DE102010021648A1 (de) 2009-05-26 2011-01-05 Auth, Matthias, Dr. Verfahren zur Beschichtung von Glasfasern oder Halbzeugen für die optische Industrie
KR101043854B1 (ko) * 2009-07-17 2011-06-24 연세대학교 산학협력단 투명 박막 트랜지스터 및 그 제조 방법
US9252455B1 (en) * 2010-04-14 2016-02-02 Hrl Laboratories, Llc Lithium battery structures employing composite layers, and fabrication methods to produce composite layers
US8329772B2 (en) * 2010-05-20 2012-12-11 E I Du Pont De Nemours And Company UV-curable polymer thick film dielectric compositions with excellent adhesion to ITO
GB201108967D0 (en) 2011-05-27 2011-07-13 Element Six Ltd Superhard structure, tool element and method of making same
KR101387963B1 (ko) * 2012-08-23 2014-04-22 인제대학교 산학협력단 전자기파 보조 졸겔법에 의한 박막 제조 방법, 및 이에 의하여 제조된 박막
CN103922609B (zh) * 2014-03-27 2015-12-30 浙江大学 一种胶体ito纳米晶薄膜的制备方法及其产品
CN107114006B (zh) * 2017-03-29 2020-04-21 香港中文大学（深圳） 完美吸收体的制造方法
CN108118295A (zh) * 2017-12-21 2018-06-05 上海银之川金银线有限公司 一种非连续真空镀金属薄膜、金属丝及其制作方法
US10787466B2 (en) 2018-04-11 2020-09-29 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
CN112088335B (zh) * 2018-04-11 2025-03-14 因普利亚公司 具有低的多烷基污染的单烷基锡化合物、其组合物和方法
US11673903B2 (en) 2018-04-11 2023-06-13 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
KR20240129107A (ko) 2018-06-21 2024-08-27 인프리아 코포레이션 모노알킬 주석 알콕사이드 및 이들의 가수분해 및 축합 생성물의 안정적인 용액
US11966158B2 (en) 2019-01-30 2024-04-23 Inpria Corporation Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods
US11498934B2 (en) 2019-01-30 2022-11-15 Inpria Corporation Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3791340A (en) 1972-05-15 1974-02-12 Western Electric Co Method of depositing a metal pattern on a surface
FR2184653B1 (enExample) * 1972-05-15 1976-05-28 Western Electric Co
US3964906A (en) 1973-12-12 1976-06-22 Western Electric Company, Inc. Method of forming a hydrophobic surface by exposing a colloidal sol to UV radiation
US3949121A (en) * 1973-12-12 1976-04-06 Western Electric Company, Inc. Method of forming a hydrophobic surface
US4505021A (en) * 1981-10-22 1985-03-19 Sharp Kabushiki Kaisha Method for manufacturing an electrochromic display device
US4590117A (en) * 1983-03-10 1986-05-20 Toray Industries, Inc. Transparent material having antireflective coating
US4946710A (en) * 1987-06-02 1990-08-07 National Semiconductor Corporation Method for preparing PLZT, PZT and PLT sol-gels and fabricating ferroelectric thin films
JP2639537B2 (ja) * 1987-10-23 1997-08-13 東京応化工業株式会社 絶縁性金属酸化膜の形成方法
US5156884A (en) * 1987-10-23 1992-10-20 Tokyo Ohka Kogyo Co., Ltd. Method for forming a film of oxidized metal
EP0423337B1 (en) * 1988-08-24 1995-06-07 CATALYSTS & CHEMICALS INDUSTRIES CO., LTD. Coating fluid for forming transparent conductive ceramic coating, base material coated with transparent conductive ceramic and production thereof, and application of base material coated with transparent conductive ceramic
JPH05114127A (ja) * 1991-10-23 1993-05-07 Hitachi Ltd 磁気デイスク及びその製造方法並びに磁気デイスク装置
JPH05166423A (ja) * 1991-12-11 1993-07-02 Asahi Glass Co Ltd 導電膜及び低反射導電膜の製造方法
JP3105340B2 (ja) * 1992-03-05 2000-10-30 日本写真印刷株式会社 複合金属酸化物皮膜を有する基板の製造法
US5900275A (en) * 1992-07-15 1999-05-04 Donnelly Corporation Method for reducing haze in tin oxide transparent conductive coatings
JPH06202092A (ja) * 1992-12-26 1994-07-22 Canon Inc 液晶装置及びそれに用いられる絶縁膜の製造方法
US6013334A (en) * 1993-05-27 2000-01-11 Rohm Co. Ltd. Method for forming a thin film of a complex compound
JP3544687B2 (ja) * 1993-06-30 2004-07-21 旭硝子株式会社 塗布液、着色膜およびその製造方法
JPH07307444A (ja) * 1994-05-16 1995-11-21 Mitsubishi Materials Corp 不揮発性強誘電体薄膜メモリのパターン形成方法
FR2727399B1 (fr) 1994-10-13 1997-01-31 Saint Gobain Vitrage Compositions de verre silico-sodo-calciques et leurs applications
US5776425A (en) * 1995-04-26 1998-07-07 National Science Council Method for preparing porous tin oxide monolith with high specific surface area and controlled degree of transparency
JPH0912305A (ja) * 1995-06-26 1997-01-14 Murata Mfg Co Ltd ペロブスカイト構造を有する金属酸化物膜の製造方法、及び薄膜コンデンサの製造方法
WO1997010185A1 (fr) * 1995-09-15 1997-03-20 Rhodia Chimie Substrat a revetement photocatalytique a base de dioxyde de titane et dispersions organiques a base de dioxyde de titane
JPH09157855A (ja) * 1995-12-06 1997-06-17 Kansai Shin Gijutsu Kenkyusho:Kk 金属酸化物薄膜の形成方法
FR2758550B1 (fr) 1997-01-17 1999-02-12 Saint Gobain Vitrage Compositions de verre silico-sodo-calcique et leurs applications
FR2759360B1 (fr) * 1997-02-10 1999-03-05 Commissariat Energie Atomique Materiau polymerique inorganique a base d'oxyde de tantale notamment a indice de refraction eleve, mecaniquement resistant a l'abrasion, son procede de fabrication et materiau optique comprenant ce materiau
DE69806714T2 (de) 1997-03-13 2003-04-03 Saint-Gobain Glass France, Courbevoie Kalknatron-silikatglaszusammensetzungen und deren anwendungen

Also Published As

Publication number Publication date
KR19990077817A (ko) 1999-10-25
ES2210996T3 (es) 2004-07-01
EP0941773A1 (fr) 1999-09-15
FR2775914B1 (fr) 2000-04-21
KR100607595B1 (ko) 2006-08-02
US6517901B1 (en) 2003-02-11
JPH11319547A (ja) 1999-11-24
DE69912334T2 (de) 2004-07-29
EP0941773B1 (fr) 2003-10-29
FR2775914A1 (fr) 1999-09-17
DE69912334D1 (de) 2003-12-04

Similar Documents

Publication Publication Date Title
JP4750237B2 (ja) 金属酸化物を主成分とする層の堆積方法
JPH11319547A5 (enExample)
Mattox Sol-gel derived, air-baked indium and tin oxide films
JP4237322B2 (ja) 導電性層のエッチング法
JP4631011B2 (ja) 導電性酸化スズ膜のパターニング方法
JPH0160548B2 (enExample)
JP2961350B2 (ja) 微細パターンを有するネサ膜の製造方法
JP2001340757A (ja) 二酸化チタン光触媒担持体とその製造方法
JP7545251B2 (ja) 撥水膜付きガラス物品及びその製造方法
JP2002533902A (ja) 光透過性の低抵抗コーティングを有する光透過性基板
JPH11111082A (ja) 導電性酸化スズ膜のパターニング方法
JPH1083718A (ja) 透明導電膜の形成方法
US4798782A (en) Poly(acetylene) films having localized zones of a low conductivity material
JPH10226535A (ja) 高電導性の透明導電膜の製造方法
JP2861716B2 (ja) 透明電極、その製造方法及びその応用装置
JP4290780B2 (ja) 透明導電膜の製造方法
KR100432647B1 (ko) 투명 도전막의 보호막 형성용 조성물 및 이로부터 보호막을 제조하는 방법
JPH05270865A (ja) 透明導電膜を有するガラス基板
JP2003167101A (ja) 光学素子の製造方法
JPH01249171A (ja) 無機酸化物膜を有する基体の製造方法
JPH0779008B2 (ja) パターン化した酸化錫系透明導電性薄膜の製法およびそれに用いる組成物
JPH11246239A (ja) 微細パターンを有するネサ膜の製造方法
JPH0558678A (ja) 着色パターンの形成方法
JPH11263638A (ja) 微細パターンを有するネサ膜の製造方法
JPH0779009B2 (ja) パターン化した酸化錫系透明導電性薄膜の製法およびそれに用いる組成物

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060215

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060215

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080227

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080304

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080603

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080606

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080903

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091201

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20100226

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20100303

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101221

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110218

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110419

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110519

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140527

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees