JPH11319547A5 - - Google Patents

Info

Publication number
JPH11319547A5
JPH11319547A5 JP1999066264A JP6626499A JPH11319547A5 JP H11319547 A5 JPH11319547 A5 JP H11319547A5 JP 1999066264 A JP1999066264 A JP 1999066264A JP 6626499 A JP6626499 A JP 6626499A JP H11319547 A5 JPH11319547 A5 JP H11319547A5
Authority
JP
Japan
Prior art keywords
sol
substrate
layer
metal
metal oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999066264A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11319547A (ja
JP4750237B2 (ja
Filing date
Publication date
Priority claimed from FR9803152A external-priority patent/FR2775914B1/fr
Application filed filed Critical
Publication of JPH11319547A publication Critical patent/JPH11319547A/ja
Publication of JPH11319547A5 publication Critical patent/JPH11319547A5/ja
Application granted granted Critical
Publication of JP4750237B2 publication Critical patent/JP4750237B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP06626499A 1998-03-13 1999-03-12 金属酸化物を主成分とする層の堆積方法 Expired - Fee Related JP4750237B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9803152 1998-03-13
FR9803152A FR2775914B1 (fr) 1998-03-13 1998-03-13 Procede de depot de couches a base d'oxyde(s) metallique(s)

Publications (3)

Publication Number Publication Date
JPH11319547A JPH11319547A (ja) 1999-11-24
JPH11319547A5 true JPH11319547A5 (enExample) 2006-03-30
JP4750237B2 JP4750237B2 (ja) 2011-08-17

Family

ID=9524051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP06626499A Expired - Fee Related JP4750237B2 (ja) 1998-03-13 1999-03-12 金属酸化物を主成分とする層の堆積方法

Country Status (7)

Country Link
US (1) US6517901B1 (enExample)
EP (1) EP0941773B1 (enExample)
JP (1) JP4750237B2 (enExample)
KR (1) KR100607595B1 (enExample)
DE (1) DE69912334T2 (enExample)
ES (1) ES2210996T3 (enExample)
FR (1) FR2775914B1 (enExample)

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WO2003072499A1 (en) * 2002-02-28 2003-09-04 Japan Science And Technology Agency Titania nanosheet alignment thin film, process for producing the same and article including the titania nanosheet alignment thin film
EP1580164A4 (en) 2002-11-13 2010-12-29 Nippon Soda Co M TAL-OXYGEN BINDING DISPERSO, M TALLIC OXIDE FILM AND MONOMOL CULAR FILM
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US7381633B2 (en) * 2005-01-27 2008-06-03 Hewlett-Packard Development Company, L.P. Method of making a patterned metal oxide film
US7695998B2 (en) * 2005-07-02 2010-04-13 Hewlett-Packard Development Company, L.P. Methods for making and using high-mobility inorganic semiconductive films
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CN100470735C (zh) * 2006-03-03 2009-03-18 台湾薄膜电晶体液晶显示器产业协会 氧化铝绝缘层的制作方法
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KR101043854B1 (ko) * 2009-07-17 2011-06-24 연세대학교 산학협력단 투명 박막 트랜지스터 및 그 제조 방법
US9252455B1 (en) * 2010-04-14 2016-02-02 Hrl Laboratories, Llc Lithium battery structures employing composite layers, and fabrication methods to produce composite layers
US8329772B2 (en) * 2010-05-20 2012-12-11 E I Du Pont De Nemours And Company UV-curable polymer thick film dielectric compositions with excellent adhesion to ITO
GB201108967D0 (en) 2011-05-27 2011-07-13 Element Six Ltd Superhard structure, tool element and method of making same
KR101387963B1 (ko) * 2012-08-23 2014-04-22 인제대학교 산학협력단 전자기파 보조 졸겔법에 의한 박막 제조 방법, 및 이에 의하여 제조된 박막
CN103922609B (zh) * 2014-03-27 2015-12-30 浙江大学 一种胶体ito纳米晶薄膜的制备方法及其产品
CN107114006B (zh) * 2017-03-29 2020-04-21 香港中文大学（深圳） 完美吸收体的制造方法
CN108118295A (zh) * 2017-12-21 2018-06-05 上海银之川金银线有限公司 一种非连续真空镀金属薄膜、金属丝及其制作方法
US10787466B2 (en) 2018-04-11 2020-09-29 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
CN112088335B (zh) * 2018-04-11 2025-03-14 因普利亚公司 具有低的多烷基污染的单烷基锡化合物、其组合物和方法
US11673903B2 (en) 2018-04-11 2023-06-13 Inpria Corporation Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
KR20240129107A (ko) 2018-06-21 2024-08-27 인프리아 코포레이션 모노알킬 주석 알콕사이드 및 이들의 가수분해 및 축합 생성물의 안정적인 용액
US11966158B2 (en) 2019-01-30 2024-04-23 Inpria Corporation Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods
US11498934B2 (en) 2019-01-30 2022-11-15 Inpria Corporation Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with particulate contamination and corresponding methods

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JPH07307444A (ja) * 1994-05-16 1995-11-21 Mitsubishi Materials Corp 不揮発性強誘電体薄膜メモリのパターン形成方法
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JPH0912305A (ja) * 1995-06-26 1997-01-14 Murata Mfg Co Ltd ペロブスカイト構造を有する金属酸化物膜の製造方法、及び薄膜コンデンサの製造方法
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JPH09157855A (ja) * 1995-12-06 1997-06-17 Kansai Shin Gijutsu Kenkyusho:Kk 金属酸化物薄膜の形成方法
FR2758550B1 (fr) 1997-01-17 1999-02-12 Saint Gobain Vitrage Compositions de verre silico-sodo-calcique et leurs applications
FR2759360B1 (fr) * 1997-02-10 1999-03-05 Commissariat Energie Atomique Materiau polymerique inorganique a base d'oxyde de tantale notamment a indice de refraction eleve, mecaniquement resistant a l'abrasion, son procede de fabrication et materiau optique comprenant ce materiau
DE69806714T2 (de) 1997-03-13 2003-04-03 Saint-Gobain Glass France, Courbevoie Kalknatron-silikatglaszusammensetzungen und deren anwendungen

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