JP4643630B2 - 処理装置 - Google Patents

処理装置 Download PDF

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Publication number
JP4643630B2
JP4643630B2 JP2007305683A JP2007305683A JP4643630B2 JP 4643630 B2 JP4643630 B2 JP 4643630B2 JP 2007305683 A JP2007305683 A JP 2007305683A JP 2007305683 A JP2007305683 A JP 2007305683A JP 4643630 B2 JP4643630 B2 JP 4643630B2
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JP
Japan
Prior art keywords
processing unit
substrate
unit
processed
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007305683A
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English (en)
Japanese (ja)
Other versions
JP2008124482A5 (enrdf_load_stackoverflow
JP2008124482A (ja
Inventor
公男 元田
義治 太田
光弘 坂井
清久 立山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
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Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2007305683A priority Critical patent/JP4643630B2/ja
Publication of JP2008124482A publication Critical patent/JP2008124482A/ja
Publication of JP2008124482A5 publication Critical patent/JP2008124482A5/ja
Application granted granted Critical
Publication of JP4643630B2 publication Critical patent/JP4643630B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
JP2007305683A 2007-11-27 2007-11-27 処理装置 Expired - Fee Related JP4643630B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007305683A JP4643630B2 (ja) 2007-11-27 2007-11-27 処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007305683A JP4643630B2 (ja) 2007-11-27 2007-11-27 処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001089847A Division JP4619562B2 (ja) 2001-03-27 2001-03-27 処理装置

Publications (3)

Publication Number Publication Date
JP2008124482A JP2008124482A (ja) 2008-05-29
JP2008124482A5 JP2008124482A5 (enrdf_load_stackoverflow) 2010-04-02
JP4643630B2 true JP4643630B2 (ja) 2011-03-02

Family

ID=39508832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007305683A Expired - Fee Related JP4643630B2 (ja) 2007-11-27 2007-11-27 処理装置

Country Status (1)

Country Link
JP (1) JP4643630B2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5274148B2 (ja) * 2008-08-19 2013-08-28 東京エレクトロン株式会社 処理システム

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2877998B2 (ja) * 1991-09-03 1999-04-05 キヤノン株式会社 半導体製造装置
JP3338343B2 (ja) * 1992-12-21 2002-10-28 大日本スクリーン製造株式会社 基板処理装置
JPH07175223A (ja) * 1993-12-21 1995-07-14 Dainippon Screen Mfg Co Ltd 基板現像装置
JP3734095B2 (ja) * 1994-09-12 2006-01-11 株式会社ニコン 基板処理装置
JPH08153767A (ja) * 1994-11-29 1996-06-11 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3597639B2 (ja) * 1996-06-05 2004-12-08 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JPH1031316A (ja) * 1996-07-17 1998-02-03 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3202929B2 (ja) * 1996-09-13 2001-08-27 東京エレクトロン株式会社 処理システム
JP3450138B2 (ja) * 1996-11-26 2003-09-22 大日本スクリーン製造株式会社 基板処理装置
JP3441321B2 (ja) * 1996-12-05 2003-09-02 大日本スクリーン製造株式会社 基板処理方法及び装置
JPH1126547A (ja) * 1997-06-30 1999-01-29 Sumitomo Precision Prod Co Ltd ウエット処理装置
JPH11251399A (ja) * 1998-02-27 1999-09-17 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11260883A (ja) * 1998-03-09 1999-09-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3499145B2 (ja) * 1998-10-28 2004-02-23 東京エレクトロン株式会社 加熱処理方法、加熱処理装置及び処理システム
JP3456919B2 (ja) * 1998-07-29 2003-10-14 東京エレクトロン株式会社 基板処理方法および基板処理装置
JP3576831B2 (ja) * 1998-09-18 2004-10-13 東京エレクトロン株式会社 処理装置
JP2000195775A (ja) * 1998-12-25 2000-07-14 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2000294616A (ja) * 1999-04-06 2000-10-20 Ebara Corp 仮置台付位置合わせ機構及びポリッシング装置

Also Published As

Publication number Publication date
JP2008124482A (ja) 2008-05-29

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