JP2008078681A5 - - Google Patents
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- JP2008078681A5 JP2008078681A5 JP2007305684A JP2007305684A JP2008078681A5 JP 2008078681 A5 JP2008078681 A5 JP 2008078681A5 JP 2007305684 A JP2007305684 A JP 2007305684A JP 2007305684 A JP2007305684 A JP 2007305684A JP 2008078681 A5 JP2008078681 A5 JP 2008078681A5
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- 238000012545 processing Methods 0.000 claims description 523
- 239000000758 substrate Substances 0.000 claims description 437
- 230000007723 transport mechanism Effects 0.000 claims description 142
- 230000032258 transport Effects 0.000 claims description 124
- 238000010438 heat treatment Methods 0.000 claims description 83
- 238000011161 development Methods 0.000 claims description 77
- 238000000576 coating method Methods 0.000 claims description 59
- 239000011248 coating agent Substances 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 44
- 238000004140 cleaning Methods 0.000 claims description 43
- 238000001816 cooling Methods 0.000 claims description 40
- 230000007246 mechanism Effects 0.000 claims description 30
- 230000008569 process Effects 0.000 claims description 29
- 239000007788 liquid Substances 0.000 claims description 21
- 238000005096 rolling process Methods 0.000 claims description 14
- 238000010030 laminating Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000003672 processing method Methods 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 238000012546 transfer Methods 0.000 description 75
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 15
- 238000001035 drying Methods 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 230000002093 peripheral effect Effects 0.000 description 9
- 238000011282 treatment Methods 0.000 description 8
- 230000018044 dehydration Effects 0.000 description 5
- 238000006297 dehydration reaction Methods 0.000 description 5
- 238000001291 vacuum drying Methods 0.000 description 3
- 238000004042 decolorization Methods 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007305684A JP4796040B2 (ja) | 2001-03-09 | 2007-11-27 | 基板処理装置、基板処理方法、および基板製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001066020 | 2001-03-09 | ||
| JP2001066020 | 2001-03-09 | ||
| JP2007305684A JP4796040B2 (ja) | 2001-03-09 | 2007-11-27 | 基板処理装置、基板処理方法、および基板製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002057303A Division JP4114737B2 (ja) | 2001-03-09 | 2002-03-04 | 処理装置 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008314264A Division JP4813540B2 (ja) | 2001-03-09 | 2008-12-10 | 処理装置 |
| JP2011120646A Division JP2011187987A (ja) | 2001-03-09 | 2011-05-30 | 基板処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008078681A JP2008078681A (ja) | 2008-04-03 |
| JP2008078681A5 true JP2008078681A5 (enrdf_load_stackoverflow) | 2008-05-22 |
| JP4796040B2 JP4796040B2 (ja) | 2011-10-19 |
Family
ID=39350347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007305684A Expired - Lifetime JP4796040B2 (ja) | 2001-03-09 | 2007-11-27 | 基板処理装置、基板処理方法、および基板製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4796040B2 (enrdf_load_stackoverflow) |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2877998B2 (ja) * | 1991-09-03 | 1999-04-05 | キヤノン株式会社 | 半導体製造装置 |
| JP3338343B2 (ja) * | 1992-12-21 | 2002-10-28 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JPH07175223A (ja) * | 1993-12-21 | 1995-07-14 | Dainippon Screen Mfg Co Ltd | 基板現像装置 |
| JP3734095B2 (ja) * | 1994-09-12 | 2006-01-11 | 株式会社ニコン | 基板処理装置 |
| JPH08153767A (ja) * | 1994-11-29 | 1996-06-11 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| JP3597639B2 (ja) * | 1996-06-05 | 2004-12-08 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
| JPH1031316A (ja) * | 1996-07-17 | 1998-02-03 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| JP3202929B2 (ja) * | 1996-09-13 | 2001-08-27 | 東京エレクトロン株式会社 | 処理システム |
| JP3450138B2 (ja) * | 1996-11-26 | 2003-09-22 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP3441321B2 (ja) * | 1996-12-05 | 2003-09-02 | 大日本スクリーン製造株式会社 | 基板処理方法及び装置 |
| JPH1126547A (ja) * | 1997-06-30 | 1999-01-29 | Sumitomo Precision Prod Co Ltd | ウエット処理装置 |
| JPH11251399A (ja) * | 1998-02-27 | 1999-09-17 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| JPH11260883A (ja) * | 1998-03-09 | 1999-09-24 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| JP3499145B2 (ja) * | 1998-10-28 | 2004-02-23 | 東京エレクトロン株式会社 | 加熱処理方法、加熱処理装置及び処理システム |
| JP3456919B2 (ja) * | 1998-07-29 | 2003-10-14 | 東京エレクトロン株式会社 | 基板処理方法および基板処理装置 |
| JP3576831B2 (ja) * | 1998-09-18 | 2004-10-13 | 東京エレクトロン株式会社 | 処理装置 |
| JP2000195775A (ja) * | 1998-12-25 | 2000-07-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| JP2000294616A (ja) * | 1999-04-06 | 2000-10-20 | Ebara Corp | 仮置台付位置合わせ機構及びポリッシング装置 |
-
2007
- 2007-11-27 JP JP2007305684A patent/JP4796040B2/ja not_active Expired - Lifetime
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