JP4472011B2 - 複数のチャックを用いる基板パターニング - Google Patents

複数のチャックを用いる基板パターニング Download PDF

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Publication number
JP4472011B2
JP4472011B2 JP2008551459A JP2008551459A JP4472011B2 JP 4472011 B2 JP4472011 B2 JP 4472011B2 JP 2008551459 A JP2008551459 A JP 2008551459A JP 2008551459 A JP2008551459 A JP 2008551459A JP 4472011 B2 JP4472011 B2 JP 4472011B2
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Prior art keywords
substrate
chuck
mold assembly
nanoimprint
disposed
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Japanese (ja)
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JP2009524249A (ja
JP2009524249A5 (enExample
Inventor
チョイ，ビュン−ジン
スリニーヴァッサン，シトルガタ・ヴイ
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モレキュラー・インプリンツ・インコーポレーテッド
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Priority claimed from US11/565,350 external-priority patent/US7670529B2/en
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Publication of JP2009524249A5 publication Critical patent/JP2009524249A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP2008551459A 2006-01-20 2007-01-20 複数のチャックを用いる基板パターニング Active JP4472011B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US76073806P 2006-01-20 2006-01-20
US78880806P 2006-04-03 2006-04-03
US82712506P 2006-09-27 2006-09-27
US11/565,350 US7670529B2 (en) 2005-12-08 2006-11-30 Method and system for double-sided patterning of substrates
PCT/US2007/001670 WO2007084774A2 (en) 2006-01-20 2007-01-20 Patterning substrates employing multiple chucks

Publications (3)

Publication Number Publication Date
JP2009524249A JP2009524249A (ja) 2009-06-25
JP2009524249A5 JP2009524249A5 (enExample) 2010-03-04
JP4472011B2 true JP4472011B2 (ja) 2010-06-02

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008551459A Active JP4472011B2 (ja) 2006-01-20 2007-01-20 複数のチャックを用いる基板パターニング

Country Status (6)

Country Link
US (2) US7670530B2 (enExample)
EP (1) EP1973719A4 (enExample)
JP (1) JP4472011B2 (enExample)
KR (1) KR101324544B1 (enExample)
TW (1) TWI341935B (enExample)
WO (1) WO2007084774A2 (enExample)

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US8109753B2 (en) 2012-02-07
US20070170617A1 (en) 2007-07-26
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KR101324544B1 (ko) 2013-11-01
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