JP4346602B2 - リソグラフィ装置及びデバイス製造方法 - Google Patents

リソグラフィ装置及びデバイス製造方法 Download PDF

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JP4346602B2
JP4346602B2 JP2005326781A JP2005326781A JP4346602B2 JP 4346602 B2 JP4346602 B2 JP 4346602B2 JP 2005326781 A JP2005326781 A JP 2005326781A JP 2005326781 A JP2005326781 A JP 2005326781A JP 4346602 B2 JP4346602 B2 JP 4346602B2
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substrate
liquid
space
plan
shape
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JP2006140494A (ja
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ヨハネス レオナルデュス ヘンドリクス フェルシュパイ ヤコブス
ヤンセン ハンス
コエルト シュタフェンガ マルコ
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エーエスエムエル ネザーランズ ビー．ブイ．
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005326781A 2004-11-12 2005-11-11 リソグラフィ装置及びデバイス製造方法 Expired - Fee Related JP4346602B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/986,185 US7423720B2 (en) 2004-11-12 2004-11-12 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

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JP2009048424A Division JP4959737B2 (ja) 2004-11-12 2009-03-02 リソグラフィ装置及びデバイス製造方法

Publications (2)

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JP2006140494A JP2006140494A (ja) 2006-06-01
JP4346602B2 true JP4346602B2 (ja) 2009-10-21

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JP2005326781A Expired - Fee Related JP4346602B2 (ja) 2004-11-12 2005-11-11 リソグラフィ装置及びデバイス製造方法
JP2009048424A Expired - Lifetime JP4959737B2 (ja) 2004-11-12 2009-03-02 リソグラフィ装置及びデバイス製造方法
JP2011220593A Expired - Fee Related JP5193349B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法
JP2011220594A Expired - Fee Related JP5193350B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法

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JP2009048424A Expired - Lifetime JP4959737B2 (ja) 2004-11-12 2009-03-02 リソグラフィ装置及びデバイス製造方法
JP2011220593A Expired - Fee Related JP5193349B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法
JP2011220594A Expired - Fee Related JP5193350B2 (ja) 2004-11-12 2011-10-05 リソグラフィ投影装置及びデバイス製造方法

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US (9) US7423720B2 (https=)
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