JP2604580B2 - アノード短絡形ゲートターンオフサイリスタ - Google Patents

アノード短絡形ゲートターンオフサイリスタ

Info

Publication number
JP2604580B2
JP2604580B2 JP61234855A JP23485586A JP2604580B2 JP 2604580 B2 JP2604580 B2 JP 2604580B2 JP 61234855 A JP61234855 A JP 61234855A JP 23485586 A JP23485586 A JP 23485586A JP 2604580 B2 JP2604580 B2 JP 2604580B2
Authority
JP
Japan
Prior art keywords
base layer
type base
thyristor
turn
short
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61234855A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6388863A (ja
Inventor
浩靖 萩野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP61234855A priority Critical patent/JP2604580B2/ja
Priority to DE3733100A priority patent/DE3733100C3/de
Publication of JPS6388863A publication Critical patent/JPS6388863A/ja
Application granted granted Critical
Publication of JP2604580B2 publication Critical patent/JP2604580B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D18/00—Thyristors
    • H10D18/60—Gate-turn-off devices 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/50—Physical imperfections
    • H10D62/53—Physical imperfections the imperfections being within the semiconductor body 

Landscapes

  • Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Thyristors (AREA)
JP61234855A 1986-10-01 1986-10-01 アノード短絡形ゲートターンオフサイリスタ Expired - Lifetime JP2604580B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP61234855A JP2604580B2 (ja) 1986-10-01 1986-10-01 アノード短絡形ゲートターンオフサイリスタ
DE3733100A DE3733100C3 (de) 1986-10-01 1987-09-30 Abschalt-Thyristor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61234855A JP2604580B2 (ja) 1986-10-01 1986-10-01 アノード短絡形ゲートターンオフサイリスタ

Publications (2)

Publication Number Publication Date
JPS6388863A JPS6388863A (ja) 1988-04-19
JP2604580B2 true JP2604580B2 (ja) 1997-04-30

Family

ID=16977404

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61234855A Expired - Lifetime JP2604580B2 (ja) 1986-10-01 1986-10-01 アノード短絡形ゲートターンオフサイリスタ

Country Status (2)

Country Link
JP (1) JP2604580B2 (en:Method)
DE (1) DE3733100C3 (en:Method)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS649658A (en) * 1987-07-01 1989-01-12 Mitsubishi Electric Corp Gto thyristor
GB2213988B (en) * 1987-12-18 1992-02-05 Matsushita Electric Works Ltd Semiconductor device
EP0343369A1 (de) * 1988-05-19 1989-11-29 Siemens Aktiengesellschaft Verfahren zum Herstellen eines Thyristors
DE3832208A1 (de) * 1988-09-22 1990-03-29 Asea Brown Boveri Steuerbares leistungshalbleiterbauelement
US5182626A (en) * 1989-09-20 1993-01-26 Mitsubishi Denki Kabushiki Kaisha Insulated gate bipolar transistor and method of manufacturing the same
JPH0680820B2 (ja) * 1989-10-16 1994-10-12 株式会社東芝 過電圧保護機能付半導体装置及びその製造方法
US5191438A (en) * 1989-12-12 1993-03-02 Sharp Kabushiki Kaisha Facsimile device with skew correction and text line direction detection
JP2739002B2 (ja) * 1991-12-20 1998-04-08 三菱電機株式会社 半導体装置及びその製造方法
DE69319465T2 (de) * 1992-02-20 1998-11-12 Hitachi Ltd Gate-Turn-Off-Thyristor und dessen Verwendung in Leistungwandlern
DE19711438A1 (de) * 1997-03-19 1998-09-24 Asea Brown Boveri Thyristor
KR100498943B1 (ko) * 1998-08-05 2005-07-04 엠이엠씨 일렉트로닉 머티리얼즈 인코포레이티드 고성능 실리콘 전력장치에서의 불균일한 소수 캐리어 수명 분포
DE102005037573B4 (de) * 2005-08-09 2007-05-31 Infineon Technologies Ag Thyristor mit Freiwerdeschutz in Form eines Thyristorsystems und Verfahren zur Herstellung des Thyristorsystems

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5021345A (en:Method) * 1973-06-27 1975-03-06
US4056408A (en) * 1976-03-17 1977-11-01 Westinghouse Electric Corporation Reducing the switching time of semiconductor devices by nuclear irradiation
US4311534A (en) * 1980-06-27 1982-01-19 Westinghouse Electric Corp. Reducing the reverse recovery charge of thyristors by nuclear irradiation
DE3117202A1 (de) * 1981-04-30 1982-11-18 Brown, Boveri & Cie Ag, 6800 Mannheim Verfahren zum einstellen der lebensdauer der minoritaetsladungstraeger in halbleiterschaltern mit protonenstrahlen
JPS58114467A (ja) * 1981-12-28 1983-07-07 Toyo Electric Mfg Co Ltd 高速ダイオ−ド
DE3423287A1 (de) * 1983-07-01 1985-01-03 Brown, Boveri & Cie Ag, 6800 Mannheim Halbleiter-bauelement mit mindestens einem pn-uebergang und mit in der tiefe der basisschicht scharf lokalisierten ionen, verfahren zu dessen herstellung und seine verwendung
JPH0691244B2 (ja) * 1984-04-27 1994-11-14 三菱電機株式会社 ゲートターンオフサイリスタの製造方法
GB2171555A (en) * 1985-02-20 1986-08-28 Philips Electronic Associated Bipolar semiconductor device with implanted recombination region

Also Published As

Publication number Publication date
DE3733100C3 (de) 1997-01-02
JPS6388863A (ja) 1988-04-19
DE3733100A1 (de) 1988-04-14
DE3733100C2 (en:Method) 1993-03-18

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term