JP2017175121A - プラズマ源のチャンバ部材、および、基板c−リングの平行移動のために半径方向外側に配置されたリフトピンを備えるペデスタル - Google Patents
プラズマ源のチャンバ部材、および、基板c−リングの平行移動のために半径方向外側に配置されたリフトピンを備えるペデスタル Download PDFInfo
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Abstract
【解決手段】基板処理チャンバは、下側チャンバ領域102および上側チャンバ領域104を備える。下側チャンバ領域は、チャンバ側壁面108、チャンバ底面110およびガス分配装置114の下面によって規定される。上側チャンバ領域は、ガス分配装置の上面および上側部分118の内面によって規定される。第2環状支持体125は、ガス流路129から下側チャンバ領域へ処理ガスを供給するための1または複数の離間した穴127を規定する。誘導コイル140が、上側部分の外側部分の周りに配列されてよい。励起されると、誘導コイルは、上側部分の内部に電磁場を生成する。ガスインジェクタ142が、ガス供給システム150−1からガス混合物を注入する
【選択図】図1
Description
本願は、2016年2月12日出願の米国仮出願第62/294,574号の利益を主張する。当該出願の開示全体が、参照によって本明細書に組み込まれる。
適用例1:プラズマ源のチャンバ部材であって、
基板処理チャンバの上側領域を囲む円筒形の側壁と、
前記側壁に結合されている移行部材と、
前記移行部材に結合されている上壁と、
前記上壁に結合され、前記側壁よりも垂直方向に高く配置され、ガスインジェクタに接続するよう構成されているインジェクタ接続部材と、を備え、ガスが前記ガスインジェクタを介して前記インジェクタ接続部材を通って前記基板処理チャンバの前記上側領域内に入り、
前記チャンバ部材の中心高さ対下方内径の比が、0.25〜0.5であるか、または、
前記チャンバ部材の中心高さ対外側高さの比が、0.4〜0.85であるか、の少なくとも一方である、チャンバ部材。
適用例2:適用例1に記載のチャンバ部材であって、前記上壁は、半線形である、チャンバ部材。
適用例3:適用例1に記載のチャンバ部材であって、前記上壁は、線形である、チャンバ部材。
適用例4:適用例1に記載のチャンバ部材であって、前記チャンバ部材の前記中心高さ対下方内径の比は、0.35〜0.45である、チャンバ部材。
適用例5:適用例1に記載のチャンバ部材であって、前記チャンバ部材の前記中心高さ対外側高さの比は、0.5〜0.6である、チャンバ部材。
適用例6: プラズマ源であって、
請求項1に記載のチャンバ部材と、
前記チャンバ部材の中央部分の上方で前記インジェクタ接続部材の周りに配置されている第1コイルと、
前記側壁の周りに配置されている第2コイルと、
を備える、プラズマ源。
適用例7:適用例6に記載のプラズマ源であって、前記第1コイルおよび前記第2コイルは、直列に接続されている、プラズマ源。
適用例8:適用例6に記載のプラズマ源であって、前記第1コイルおよび前記第2コイルは、並列に接続されている、プラズマ源。
適用例9:適用例6に記載のプラズマ源であって、さらに
前記第1コイルおよび前記第2コイルに電流を供給する発電機と、
前記第1コイルおよび前記第2コイルへの電流の供給を制御するよう構成されているコントローラと、
を備え、
前記第1コイルに供給される電流は、前記第2コイルに供給される電流と独立して制御される、プラズマ源。
適用例10:適用例6に記載のプラズマ源であって、さらに、前記基板処理チャンバの前記上側領域内にガスを拡散させるよう構成されている拡散器を備える、プラズマ源。
適用例11:適用例10に記載のプラズマ源であって、
前記拡散器は、複数の流路を備え、
前記複数の流路は、それぞれのガスを受け入れる、プラズマ源。
適用例12: 基板処理チャンバであって、
請求項1に記載のチャンバ部材と、
上方に向かって前記基板処理チャンバ内へガスを注入する第2インジェクタと、
を備える、基板処理チャンバ。
適用例13: 基板処理チャンバであって、
請求項1に記載のチャンバ部材と、
分配プレートまたはシャワーヘッドの下側であって、下方に向かって基板処理チャンバ内へガスを注入する第2インジェクタと、
を備える、基板処理チャンバ。
適用例14: 基板処理チャンバであって、
請求項1に記載のチャンバ部材と、
分配プレートと、
前記分配プレートを通して前記基板処理チャンバ内へガスを注入する第2インジェクタと、
を備える、基板処理チャンバ。
適用例15:基板処理システムであって、
請求項1に記載のチャンバ部材と、
前記チャンバ部材を備えるプラズマ源と、
キャパシタンスを含む複数の高周波構成要素と、
接地シールドと、
保護筐体と、
を備え、
前記プラズマ源、前記複数の高周波構成要素、および、前記接地シールドは、前記保護筐体内に配置され、
前記接地シールドは、前記高周波構成要素を前記プラズマ源から分離する、基板処理システム。
適用例16:適用例15に記載の基板処理システムであって、前記保護筐体は、
上壁と、
前記保護筐体の前記上壁に結合されている絶縁体と、
前記絶縁体を通過するピンと、
前記ピンに接続し、前記複数の高周波構成要素に電流を供給するコントローラと、
を備える、基板処理システム。
適用例17:適用例15に記載の基板処理システムであって、さらに、ペデスタルを備え、前記ペデスタルは、
高周波電極と、
前記高周波電極の半径方向外側に配置されている複数のリフトピンと、
基板を受けるc−リングと、を備え、前記複数のリフトピンは、前記c−リングを前記ペデスタルに対して移動させる、基板処理システム。
適用例18:ペデスタルであって、
高周波電極と、
前記高周波電極の半径方向外側に配置されている複数のリフトピンと、
基板を受けるc−リングと、前記複数のリフトピンは、前記c−リングを前記ペデスタルに対して移動させ、
複数の絶縁体と、
接地シールドと、を備え、前記高周波電極、前記リフトピン、および、前記複数の絶縁体は、前記接地シールド内に配置され
前記複数の絶縁体は、前記高周波電極を前記リフトピンおよび前記接地シールドから絶縁する、ペデスタル。
適用例19:適用例18に記載のペデスタルであって、前記c−リングは、前記基板が保持されるテーパ状または段状の内面を備える、ペデスタル。
適用例20:基板処理システムであって、
請求項18に記載のペデスタルと、
前記ペデスタルの上方に配置され、前記基板をエッチングするためにプラズマを生成するプラズマ源と、
を備える、基板処理システム。
Claims (20)
- プラズマ源のチャンバ部材であって、
基板処理チャンバの上側領域を囲む円筒形の側壁と、
前記側壁に結合されている移行部材と、
前記移行部材に結合されている上壁と、
前記上壁に結合され、前記側壁よりも垂直方向に高く配置され、ガスインジェクタに接続するよう構成されているインジェクタ接続部材と、を備え、ガスが前記ガスインジェクタを介して前記インジェクタ接続部材を通って前記基板処理チャンバの前記上側領域内に入り、
前記チャンバ部材の中心高さ対下方内径の比が、0.25〜0.5であるか、または、
前記チャンバ部材の中心高さ対外側高さの比が、0.4〜0.85であるか、の少なくとも一方である、チャンバ部材。 - 請求項1に記載のチャンバ部材であって、前記上壁は、半線形である、チャンバ部材。
- 請求項1に記載のチャンバ部材であって、前記上壁は、線形である、チャンバ部材。
- 請求項1に記載のチャンバ部材であって、前記チャンバ部材の前記中心高さ対下方内径の比は、0.35〜0.45である、チャンバ部材。
- 請求項1に記載のチャンバ部材であって、前記チャンバ部材の前記中心高さ対外側高さの比は、0.5〜0.6である、チャンバ部材。
- プラズマ源であって、
請求項1に記載のチャンバ部材と、
前記チャンバ部材の中央部分の上方で前記インジェクタ接続部材の周りに配置されている第1コイルと、
前記側壁の周りに配置されている第2コイルと、
を備える、プラズマ源。 - 請求項6に記載のプラズマ源であって、前記第1コイルおよび前記第2コイルは、直列に接続されている、プラズマ源。
- 請求項6に記載のプラズマ源であって、前記第1コイルおよび前記第2コイルは、並列に接続されている、プラズマ源。
- 請求項6に記載のプラズマ源であって、さらに
前記第1コイルおよび前記第2コイルに電流を供給する発電機と、
前記第1コイルおよび前記第2コイルへの電流の供給を制御するよう構成されているコントローラと、
を備え、
前記第1コイルに供給される電流は、前記第2コイルに供給される電流と独立して制御される、プラズマ源。 - 請求項6に記載のプラズマ源であって、さらに、前記基板処理チャンバの前記上側領域内にガスを拡散させるよう構成されている拡散器を備える、プラズマ源。
- 請求項10に記載のプラズマ源であって、
前記拡散器は、複数の流路を備え、
前記複数の流路は、それぞれのガスを受け入れる、プラズマ源。 - 基板処理チャンバであって、
請求項1に記載のチャンバ部材と、
上方に向かって前記基板処理チャンバ内へガスを注入する第2インジェクタと、
を備える、基板処理チャンバ。 - 基板処理チャンバであって、
請求項1に記載のチャンバ部材と、
分配プレートまたはシャワーヘッドの下側であって、下方に向かって基板処理チャンバ内へガスを注入する第2インジェクタと、
を備える、基板処理チャンバ。 - 基板処理チャンバであって、
請求項1に記載のチャンバ部材と、
分配プレートと、
前記分配プレートを通して前記基板処理チャンバ内へガスを注入する第2インジェクタと、
を備える、基板処理チャンバ。 - 基板処理システムであって、
請求項1に記載のチャンバ部材と、
前記チャンバ部材を備えるプラズマ源と、
キャパシタンスを含む複数の高周波構成要素と、
接地シールドと、
保護筐体と、
を備え、
前記プラズマ源、前記複数の高周波構成要素、および、前記接地シールドは、前記保護筐体内に配置され、
前記接地シールドは、前記高周波構成要素を前記プラズマ源から分離する、基板処理システム。 - 請求項15に記載の基板処理システムであって、前記保護筐体は、
上壁と、
前記保護筐体の前記上壁に結合されている絶縁体と、
前記絶縁体を通過するピンと、
前記ピンに接続し、前記複数の高周波構成要素に電流を供給するコントローラと、
を備える、基板処理システム。 - 請求項15に記載の基板処理システムであって、さらに、ペデスタルを備え、前記ペデスタルは、
高周波電極と、
前記高周波電極の半径方向外側に配置されている複数のリフトピンと、
基板を受けるc−リングと、を備え、前記複数のリフトピンは、前記c−リングを前記ペデスタルに対して移動させる、基板処理システム。 - ペデスタルであって、
高周波電極と、
前記高周波電極の半径方向外側に配置されている複数のリフトピンと、
基板を受けるc−リングと、前記複数のリフトピンは、前記c−リングを前記ペデスタルに対して移動させ、
複数の絶縁体と、
接地シールドと、を備え、前記高周波電極、前記リフトピン、および、前記複数の絶縁体は、前記接地シールド内に配置され
前記複数の絶縁体は、前記高周波電極を前記リフトピンおよび前記接地シールドから絶縁する、ペデスタル。 - 請求項18に記載のペデスタルであって、前記c−リングは、前記基板が保持されるテーパ状または段状の内面を備える、ペデスタル。
- 基板処理システムであって、
請求項18に記載のペデスタルと、
前記ペデスタルの上方に配置され、前記基板をエッチングするためにプラズマを生成するプラズマ源と、
を備える、基板処理システム。
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US15/428,585 US10699878B2 (en) | 2016-02-12 | 2017-02-09 | Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10395900B2 (en) * | 2016-06-17 | 2019-08-27 | Samsung Electronics Co., Ltd. | Plasma processing apparatus |
JP7386362B2 (ja) | 2020-05-09 | 2023-11-24 | ベイジン・ナウラ・マイクロエレクトロニクス・イクイップメント・カンパニー・リミテッド | 半導体反応チャンバ及び原子層プラズマエッチング装置 |
Families Citing this family (66)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
SG10202002601QA (en) | 2014-10-17 | 2020-05-28 | Applied Materials Inc | Cmp pad construction with composite material properties using additive manufacturing processes |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
US10957561B2 (en) | 2015-07-30 | 2021-03-23 | Lam Research Corporation | Gas delivery system |
US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
US10825659B2 (en) | 2016-01-07 | 2020-11-03 | Lam Research Corporation | Substrate processing chamber including multiple gas injection points and dual injector |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
US10685862B2 (en) | 2016-01-22 | 2020-06-16 | Applied Materials, Inc. | Controlling the RF amplitude of an edge ring of a capacitively coupled plasma process device |
CN108369922B (zh) | 2016-01-26 | 2023-03-21 | 应用材料公司 | 晶片边缘环升降解决方案 |
US10204795B2 (en) | 2016-02-04 | 2019-02-12 | Applied Materials, Inc. | Flow distribution plate for surface fluorine reduction |
US10651015B2 (en) | 2016-02-12 | 2020-05-12 | Lam Research Corporation | Variable depth edge ring for etch uniformity control |
US10699878B2 (en) | 2016-02-12 | 2020-06-30 | Lam Research Corporation | Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring |
US10410832B2 (en) | 2016-08-19 | 2019-09-10 | Lam Research Corporation | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment |
US9947517B1 (en) | 2016-12-16 | 2018-04-17 | Applied Materials, Inc. | Adjustable extended electrode for edge uniformity control |
US10553404B2 (en) | 2017-02-01 | 2020-02-04 | Applied Materials, Inc. | Adjustable extended electrode for edge uniformity control |
US10840068B2 (en) * | 2017-02-15 | 2020-11-17 | Yield Engineering Systems, Inc. | Plasma spreading apparatus and method of spreading plasma in process ovens |
US10763081B2 (en) | 2017-07-10 | 2020-09-01 | Applied Materials, Inc. | Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process device |
US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
US10763150B2 (en) | 2017-09-20 | 2020-09-01 | Applied Materials, Inc. | System for coupling a voltage to spatially segmented portions of the wafer with variable voltage |
US10904996B2 (en) | 2017-09-20 | 2021-01-26 | Applied Materials, Inc. | Substrate support with electrically floating power supply |
US10811296B2 (en) | 2017-09-20 | 2020-10-20 | Applied Materials, Inc. | Substrate support with dual embedded electrodes |
US10714372B2 (en) | 2017-09-20 | 2020-07-14 | Applied Materials, Inc. | System for coupling a voltage to portions of a substrate |
US10510575B2 (en) | 2017-09-20 | 2019-12-17 | Applied Materials, Inc. | Substrate support with multiple embedded electrodes |
US11075105B2 (en) | 2017-09-21 | 2021-07-27 | Applied Materials, Inc. | In-situ apparatus for semiconductor process module |
US11043400B2 (en) | 2017-12-21 | 2021-06-22 | Applied Materials, Inc. | Movable and removable process kit |
US10727075B2 (en) | 2017-12-22 | 2020-07-28 | Applied Materials, Inc. | Uniform EUV photoresist patterning utilizing pulsed plasma process |
KR102518372B1 (ko) | 2018-03-23 | 2023-04-06 | 삼성전자주식회사 | 가스 분배 장치, 이를 포함하는 기판 처리 장치 및 이를 이용하는 반도체 공정 방법 |
US10555412B2 (en) | 2018-05-10 | 2020-02-04 | Applied Materials, Inc. | Method of controlling ion energy distribution using a pulse generator with a current-return output stage |
US10600623B2 (en) | 2018-05-28 | 2020-03-24 | Applied Materials, Inc. | Process kit with adjustable tuning ring for edge uniformity control |
US10347500B1 (en) | 2018-06-04 | 2019-07-09 | Applied Materials, Inc. | Device fabrication via pulsed plasma |
US11935773B2 (en) | 2018-06-14 | 2024-03-19 | Applied Materials, Inc. | Calibration jig and calibration method |
TWI662595B (zh) * | 2018-06-20 | 2019-06-11 | 凱樂士股份有限公司 | 噴淋頭結構及其多孔質陶瓷盤之製造方法 |
CN112654655A (zh) | 2018-09-04 | 2021-04-13 | 应用材料公司 | 先进抛光垫配方 |
US11476145B2 (en) | 2018-11-20 | 2022-10-18 | Applied Materials, Inc. | Automatic ESC bias compensation when using pulsed DC bias |
US11289310B2 (en) | 2018-11-21 | 2022-03-29 | Applied Materials, Inc. | Circuits for edge ring control in shaped DC pulsed plasma process device |
CN113169026B (zh) | 2019-01-22 | 2024-04-26 | 应用材料公司 | 用于控制脉冲电压波形的反馈回路 |
US11508554B2 (en) | 2019-01-24 | 2022-11-22 | Applied Materials, Inc. | High voltage filter assembly |
US10784089B2 (en) | 2019-02-01 | 2020-09-22 | Applied Materials, Inc. | Temperature and bias control of edge ring |
US11279032B2 (en) | 2019-04-11 | 2022-03-22 | Applied Materials, Inc. | Apparatus, systems, and methods for improved joint coordinate teaching accuracy of robots |
US11101115B2 (en) | 2019-04-19 | 2021-08-24 | Applied Materials, Inc. | Ring removal from processing chamber |
US11515127B2 (en) | 2019-05-14 | 2022-11-29 | Beijing E-Town Semiconductor Technology Co., Ltd | End effectors for moving workpieces and replaceable parts within a system for processing workpieces under vacuum |
US10964584B2 (en) | 2019-05-20 | 2021-03-30 | Applied Materials, Inc. | Process kit ring adaptor |
US11626305B2 (en) | 2019-06-25 | 2023-04-11 | Applied Materials, Inc. | Sensor-based correction of robot-held object |
CN112216646A (zh) * | 2019-07-10 | 2021-01-12 | Asm Ip私人控股有限公司 | 基板支撑组件及包括其的基板处理装置 |
US11211269B2 (en) | 2019-07-19 | 2021-12-28 | Applied Materials, Inc. | Multi-object capable loadlock system |
KR20210056646A (ko) | 2019-11-11 | 2021-05-20 | 삼성전자주식회사 | 플라즈마 처리 장비 |
KR102114891B1 (ko) * | 2019-11-18 | 2020-05-26 | 주식회사 기가레인 | 플라즈마 처리 장치 |
US11370114B2 (en) | 2019-12-09 | 2022-06-28 | Applied Materials, Inc. | Autoteach enclosure system |
USD980176S1 (en) | 2020-06-02 | 2023-03-07 | Applied Materials, Inc. | Substrate processing system carrier |
USD954769S1 (en) | 2020-06-02 | 2022-06-14 | Applied Materials, Inc. | Enclosure system shelf |
US11848176B2 (en) | 2020-07-31 | 2023-12-19 | Applied Materials, Inc. | Plasma processing using pulsed-voltage and radio-frequency power |
US11798790B2 (en) | 2020-11-16 | 2023-10-24 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
US11901157B2 (en) | 2020-11-16 | 2024-02-13 | Applied Materials, Inc. | Apparatus and methods for controlling ion energy distribution |
CN112582280B (zh) * | 2020-12-10 | 2021-07-30 | 深圳市冠禹半导体有限公司 | 一种半导体器件的制备装置 |
US20220285180A1 (en) * | 2021-03-08 | 2022-09-08 | Applied Materials, Inc. | Enclosure system structure |
US11495470B1 (en) | 2021-04-16 | 2022-11-08 | Applied Materials, Inc. | Method of enhancing etching selectivity using a pulsed plasma |
US11791138B2 (en) | 2021-05-12 | 2023-10-17 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11948780B2 (en) | 2021-05-12 | 2024-04-02 | Applied Materials, Inc. | Automatic electrostatic chuck bias compensation during plasma processing |
US11967483B2 (en) | 2021-06-02 | 2024-04-23 | Applied Materials, Inc. | Plasma excitation with ion energy control |
US11984306B2 (en) | 2021-06-09 | 2024-05-14 | Applied Materials, Inc. | Plasma chamber and chamber component cleaning methods |
US11810760B2 (en) | 2021-06-16 | 2023-11-07 | Applied Materials, Inc. | Apparatus and method of ion current compensation |
US11569066B2 (en) | 2021-06-23 | 2023-01-31 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
US11476090B1 (en) | 2021-08-24 | 2022-10-18 | Applied Materials, Inc. | Voltage pulse time-domain multiplexing |
JP7417569B2 (ja) * | 2021-10-29 | 2024-01-18 | 株式会社Kokusai Electric | 基板処理装置、半導体装置の製造方法及びプログラム |
US11972924B2 (en) | 2022-06-08 | 2024-04-30 | Applied Materials, Inc. | Pulsed voltage source for plasma processing applications |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07326494A (ja) * | 1992-11-04 | 1995-12-12 | Novellus Syst Inc | プラズマプロセス装置 |
JPH09120898A (ja) * | 1995-07-26 | 1997-05-06 | Applied Materials Inc | 電子的に可変な密度プロファイルを有するプラズマ源 |
JPH1092598A (ja) * | 1996-05-13 | 1998-04-10 | Applied Materials Inc | 上部にソレノイドアンテナを有する電磁結合rfプラズマリアクター |
JPH10258227A (ja) * | 1997-01-02 | 1998-09-29 | Applied Materials Inc | ハイブリッド導体と多半径ドームシーリングを持つrfプラズマリアクタ |
JP2000191370A (ja) * | 1998-12-28 | 2000-07-11 | Taiheiyo Cement Corp | 処理容器用部材 |
US20090250334A1 (en) * | 2008-04-03 | 2009-10-08 | Novellus Systems, Inc. | Plasma generator systems and methods of forming plasma |
JP2009283975A (ja) * | 2003-05-02 | 2009-12-03 | Tokyo Electron Ltd | プラズマ処理装置 |
Family Cites Families (225)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2831856B2 (de) | 1978-07-20 | 1981-07-02 | Drägerwerk AG, 2400 Lübeck | Anordnung zum elektrisch gesteuerten Dosieren und Mischen von Gasen |
NL8004005A (nl) | 1980-07-11 | 1982-02-01 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting. |
US4431477A (en) | 1983-07-05 | 1984-02-14 | Matheson Gas Products, Inc. | Plasma etching with nitrous oxide and fluoro compound gas mixture |
US4793897A (en) | 1987-03-20 | 1988-12-27 | Applied Materials, Inc. | Selective thin film etch process |
EP0424299A3 (en) | 1989-10-20 | 1991-08-28 | International Business Machines Corporation | Selective silicon nitride plasma etching |
US6024826A (en) | 1996-05-13 | 2000-02-15 | Applied Materials, Inc. | Plasma reactor with heated source of a polymer-hardening precursor material |
US5329965A (en) | 1993-07-30 | 1994-07-19 | The Perkin-Elmer Corporation | Hybrid valving system for varying fluid flow rate |
JP2638443B2 (ja) | 1993-08-31 | 1997-08-06 | 日本電気株式会社 | ドライエッチング方法およびドライエッチング装置 |
US5762714A (en) | 1994-10-18 | 1998-06-09 | Applied Materials, Inc. | Plasma guard for chamber equipped with electrostatic chuck |
US5605179A (en) | 1995-03-17 | 1997-02-25 | Insync Systems, Inc. | Integrated gas panel |
US6050283A (en) | 1995-07-07 | 2000-04-18 | Air Liquide America Corporation | System and method for on-site mixing of ultra-high-purity chemicals for semiconductor processing |
US5907221A (en) * | 1995-08-16 | 1999-05-25 | Applied Materials, Inc. | Inductively coupled plasma reactor with an inductive coil antenna having independent loops |
JP2713276B2 (ja) | 1995-12-07 | 1998-02-16 | 日本電気株式会社 | 半導体装置の製造装置およびこれを用いた半導体装置の製造方法 |
US5662143A (en) | 1996-05-16 | 1997-09-02 | Gasonics International | Modular gas box system |
US6022609A (en) | 1996-10-02 | 2000-02-08 | Seagate Technology, Inc. | Magnetic recording medium with substantially uniform sub-micron-scale morphology |
US5744695A (en) | 1997-01-10 | 1998-04-28 | Sony Corporation | Apparatus to check calibration of mass flow controllers |
US6210593B1 (en) | 1997-02-06 | 2001-04-03 | Matsushita Electric Industrial Co., Ltd. | Etching method and etching apparatus |
KR100295518B1 (ko) | 1997-02-25 | 2001-11-30 | 아끼구사 나오유끼 | 질화실리콘층의에칭방법및반도체장치의제조방법 |
US6388226B1 (en) | 1997-06-26 | 2002-05-14 | Applied Science And Technology, Inc. | Toroidal low-field reactive gas source |
US6042687A (en) | 1997-06-30 | 2000-03-28 | Lam Research Corporation | Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing |
JP3586075B2 (ja) | 1997-08-15 | 2004-11-10 | 忠弘 大見 | 圧力式流量制御装置 |
US6074959A (en) | 1997-09-19 | 2000-06-13 | Applied Materials, Inc. | Method manifesting a wide process window and using hexafluoropropane or other hydrofluoropropanes to selectively etch oxide |
US6060400A (en) | 1998-03-26 | 2000-05-09 | The Research Foundation Of State University Of New York | Highly selective chemical dry etching of silicon nitride over silicon and silicon dioxide |
US6185839B1 (en) * | 1998-05-28 | 2001-02-13 | Applied Materials, Inc. | Semiconductor process chamber having improved gas distributor |
US6217937B1 (en) | 1998-07-15 | 2001-04-17 | Cornell Research Foundation, Inc. | High throughput OMVPE apparatus |
JP3830670B2 (ja) | 1998-09-03 | 2006-10-04 | 三菱電機株式会社 | 半導体製造装置 |
US6579805B1 (en) | 1999-01-05 | 2003-06-17 | Ronal Systems Corp. | In situ chemical generator and method |
US7150994B2 (en) | 1999-03-03 | 2006-12-19 | Symyx Technologies, Inc. | Parallel flow process optimization reactor |
US6797189B2 (en) | 1999-03-25 | 2004-09-28 | Hoiman (Raymond) Hung | Enhancement of silicon oxide etch rate and nitride selectivity using hexafluorobutadiene or other heavy perfluorocarbon |
WO2000063756A1 (fr) | 1999-04-16 | 2000-10-26 | Fujikin Incorporated | Dispositif d'alimentation en fluide du type derivation parallele, et procede et dispositif de commande du debit d'un systeme de pression du type a fluide variable utilise dans ledit dispositif |
US6210482B1 (en) | 1999-04-22 | 2001-04-03 | Fujikin Incorporated | Apparatus for feeding gases for use in semiconductor manufacturing |
JP2001023955A (ja) | 1999-07-07 | 2001-01-26 | Mitsubishi Electric Corp | プラズマ処理装置 |
DE60041341D1 (de) | 1999-08-17 | 2009-02-26 | Tokyo Electron Ltd | Gepulstes plasmabehandlungsverfahren und vorrichtung |
US6206976B1 (en) | 1999-08-27 | 2001-03-27 | Lucent Technologies Inc. | Deposition apparatus and related method with controllable edge exclusion |
JP4394778B2 (ja) | 1999-09-22 | 2010-01-06 | 東京エレクトロン株式会社 | プラズマ処理装置およびプラズマ処理方法 |
US6589352B1 (en) | 1999-12-10 | 2003-07-08 | Applied Materials, Inc. | Self aligning non contact shadow ring process kit |
JP2001230239A (ja) | 2000-02-15 | 2001-08-24 | Tokyo Electron Ltd | 処理装置及び処理方法 |
ATE287291T1 (de) | 2000-03-07 | 2005-02-15 | Symyx Technologies Inc | Prozessoptimierungsreaktor mit parallelem durchfluss |
US6645302B2 (en) | 2000-04-26 | 2003-11-11 | Showa Denko Kabushiki Kaisha | Vapor phase deposition system |
TW506234B (en) | 2000-09-18 | 2002-10-11 | Tokyo Electron Ltd | Tunable focus ring for plasma processing |
US6492774B1 (en) | 2000-10-04 | 2002-12-10 | Lam Research Corporation | Wafer area pressure control for plasma confinement |
JP2002110570A (ja) | 2000-10-04 | 2002-04-12 | Asm Japan Kk | 半導体製造装置用ガスラインシステム |
US6333272B1 (en) | 2000-10-06 | 2001-12-25 | Lam Research Corporation | Gas distribution apparatus for semiconductor processing |
JP3388228B2 (ja) | 2000-12-07 | 2003-03-17 | 株式会社半導体先端テクノロジーズ | プラズマエッチング装置、及びプラズマエッチング方法 |
US6962879B2 (en) | 2001-03-30 | 2005-11-08 | Lam Research Corporation | Method of plasma etching silicon nitride |
DE10216703A1 (de) | 2001-04-20 | 2002-11-28 | Festo Corp Hauppauge | Stapelbare Ventilverteileranordnung |
WO2002095519A1 (en) | 2001-05-24 | 2002-11-28 | Unit Instruments, Inc. | Method and apparatus for providing a determined ratio of process fluids |
US20020189947A1 (en) | 2001-06-13 | 2002-12-19 | Eksigent Technologies Llp | Electroosmotic flow controller |
US20030070620A1 (en) | 2001-10-15 | 2003-04-17 | Cooperberg David J. | Tunable multi-zone gas injection system |
US6744212B2 (en) | 2002-02-14 | 2004-06-01 | Lam Research Corporation | Plasma processing apparatus and method for confining an RF plasma under very high gas flow and RF power density conditions |
US6814813B2 (en) | 2002-04-24 | 2004-11-09 | Micron Technology, Inc. | Chemical vapor deposition apparatus |
US20040040664A1 (en) | 2002-06-03 | 2004-03-04 | Yang Jang Gyoo | Cathode pedestal for a plasma etch reactor |
JP3856730B2 (ja) | 2002-06-03 | 2006-12-13 | 東京エレクトロン株式会社 | 流量制御装置を備えたガス供給設備からのチャンバーへのガス分流供給方法。 |
US7552015B2 (en) | 2002-06-24 | 2009-06-23 | Mks Instruments, Inc. | Apparatus and method for displaying mass flow controller pressure |
US7136767B2 (en) | 2002-06-24 | 2006-11-14 | Mks Instruments, Inc. | Apparatus and method for calibration of mass flow controller |
US6810308B2 (en) | 2002-06-24 | 2004-10-26 | Mks Instruments, Inc. | Apparatus and method for mass flow controller with network access to diagnostics |
US6841943B2 (en) | 2002-06-27 | 2005-01-11 | Lam Research Corp. | Plasma processor with electrode simultaneously responsive to plural frequencies |
US6896765B2 (en) | 2002-09-18 | 2005-05-24 | Lam Research Corporation | Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
JP4502590B2 (ja) | 2002-11-15 | 2010-07-14 | 株式会社ルネサステクノロジ | 半導体製造装置 |
US7311784B2 (en) | 2002-11-26 | 2007-12-25 | Tokyo Electron Limited | Plasma processing device |
KR20040050080A (ko) | 2002-12-09 | 2004-06-16 | 주식회사 하이닉스반도체 | 플라즈마 식각 챔버용 포커스 링 구동 장치 |
US7169231B2 (en) | 2002-12-13 | 2007-01-30 | Lam Research Corporation | Gas distribution system with tuning gas |
US20040112540A1 (en) | 2002-12-13 | 2004-06-17 | Lam Research Corporation | Uniform etch system |
US6898558B2 (en) | 2002-12-31 | 2005-05-24 | Tokyo Electron Limited | Method and apparatus for monitoring a material processing system |
US20040163601A1 (en) | 2003-02-26 | 2004-08-26 | Masanori Kadotani | Plasma processing apparatus |
US20040168719A1 (en) | 2003-02-28 | 2004-09-02 | Masahiro Nambu | System for dividing gas flow |
US6907904B2 (en) | 2003-03-03 | 2005-06-21 | Redwood Microsystems, Inc. | Fluid delivery system and mounting panel therefor |
CN100350569C (zh) | 2003-05-02 | 2007-11-21 | 东京毅力科创株式会社 | 处理气体导入机构和等离子体处理装置 |
CN100454200C (zh) | 2003-06-09 | 2009-01-21 | 喜开理株式会社 | 相对压力控制系统和相对流量控制系统 |
JP4195837B2 (ja) | 2003-06-20 | 2008-12-17 | 東京エレクトロン株式会社 | ガス分流供給装置及びガス分流供給方法 |
US7137400B2 (en) | 2003-09-30 | 2006-11-21 | Agere Systems Inc. | Bypass loop gas flow calibration |
JP4399227B2 (ja) | 2003-10-06 | 2010-01-13 | 株式会社フジキン | チャンバの内圧制御装置及び内圧被制御式チャンバ |
US7129171B2 (en) | 2003-10-14 | 2006-10-31 | Lam Research Corporation | Selective oxygen-free etching process for barrier materials |
US7128806B2 (en) | 2003-10-21 | 2006-10-31 | Applied Materials, Inc. | Mask etch processing apparatus |
US20050155625A1 (en) | 2004-01-20 | 2005-07-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chamber cleaning method |
US7095179B2 (en) | 2004-02-22 | 2006-08-22 | Zond, Inc. | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities |
US7072743B2 (en) | 2004-03-09 | 2006-07-04 | Mks Instruments, Inc. | Semiconductor manufacturing gas flow divider system and method |
US7708859B2 (en) | 2004-04-30 | 2010-05-04 | Lam Research Corporation | Gas distribution system having fast gas switching capabilities |
US20070066038A1 (en) | 2004-04-30 | 2007-03-22 | Lam Research Corporation | Fast gas switching plasma processing apparatus |
US7412986B2 (en) | 2004-07-09 | 2008-08-19 | Celerity, Inc. | Method and system for flow measurement and validation of a mass flow controller |
US7338907B2 (en) | 2004-10-04 | 2008-03-04 | Sharp Laboratories Of America, Inc. | Selective etching processes of silicon nitride and indium oxide thin films for FeRAM device applications |
US20060124169A1 (en) | 2004-12-09 | 2006-06-15 | Tokyo Electron Limited | Gas supply unit, substrate processing apparatus, and supply gas setting method |
US7621290B2 (en) | 2005-04-21 | 2009-11-24 | Mks Instruments, Inc. | Gas delivery method and system including a flow ratio controller using antisymmetric optimal control |
US7288482B2 (en) | 2005-05-04 | 2007-10-30 | International Business Machines Corporation | Silicon nitride etching methods |
US20070021935A1 (en) | 2005-07-12 | 2007-01-25 | Larson Dean J | Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber |
US7291560B2 (en) | 2005-08-01 | 2007-11-06 | Infineon Technologies Ag | Method of production pitch fractionizations in semiconductor technology |
US8088248B2 (en) | 2006-01-11 | 2012-01-03 | Lam Research Corporation | Gas switching section including valves having different flow coefficients for gas distribution system |
JP4895167B2 (ja) | 2006-01-31 | 2012-03-14 | 東京エレクトロン株式会社 | ガス供給装置,基板処理装置,ガス供給方法 |
US20070204914A1 (en) | 2006-03-01 | 2007-09-06 | Asahi Organic Chemicals Industry Co., Ltd. | Fluid mixing system |
US7578258B2 (en) | 2006-03-03 | 2009-08-25 | Lam Research Corporation | Methods and apparatus for selective pre-coating of a plasma processing chamber |
JP4788920B2 (ja) | 2006-03-20 | 2011-10-05 | 日立金属株式会社 | 質量流量制御装置、その検定方法及び半導体製造装置 |
US7674337B2 (en) | 2006-04-07 | 2010-03-09 | Applied Materials, Inc. | Gas manifolds for use during epitaxial film formation |
US8997791B2 (en) | 2006-04-14 | 2015-04-07 | Mks Instruments, Inc. | Multiple-channel flow ratio controller |
US8440049B2 (en) | 2006-05-03 | 2013-05-14 | Applied Materials, Inc. | Apparatus for etching high aspect ratio features |
US8475625B2 (en) | 2006-05-03 | 2013-07-02 | Applied Materials, Inc. | Apparatus for etching high aspect ratio features |
JP4814706B2 (ja) | 2006-06-27 | 2011-11-16 | 株式会社フジキン | 流量比可変型流体供給装置 |
JP5037510B2 (ja) | 2006-08-23 | 2012-09-26 | 株式会社堀場エステック | 集積型ガスパネル装置 |
KR20080023569A (ko) | 2006-09-11 | 2008-03-14 | 주식회사 하이닉스반도체 | 식각프로파일 변형을 방지하는 플라즈마식각장치 |
US7757541B1 (en) | 2006-09-13 | 2010-07-20 | Pivotal Systems Corporation | Techniques for calibration of gas flows |
US7309646B1 (en) | 2006-10-10 | 2007-12-18 | Lam Research Corporation | De-fluoridation process |
EP2104755A4 (en) | 2006-10-26 | 2011-01-12 | Symyx Solutions Inc | HIGH PRESSURE PARALLEL FIXED BIN REACTOR AND METHOD THEREFOR |
US9405298B2 (en) | 2006-11-20 | 2016-08-02 | Applied Materials, Inc. | System and method to divide fluid flow in a predetermined ratio |
US7758698B2 (en) | 2006-11-28 | 2010-07-20 | Applied Materials, Inc. | Dual top gas feed through distributor for high density plasma chamber |
TWI444799B (zh) | 2006-12-05 | 2014-07-11 | Horiba Stec Co | 流量控制裝置與流量測定裝置之校準方法、流量控制裝置之校準系統、及半導體製造裝置 |
US8019481B2 (en) | 2006-12-12 | 2011-09-13 | Horiba Stec, Co., Ltd. | Flow rate ratio control device |
SE530902C2 (sv) | 2006-12-19 | 2008-10-14 | Alfa Laval Corp Ab | Sektionerad flödesanordning och förfarande för att reglera temperaturen i denna |
US7968469B2 (en) | 2007-01-30 | 2011-06-28 | Applied Materials, Inc. | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity |
US7846497B2 (en) | 2007-02-26 | 2010-12-07 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a processing chamber |
US7775236B2 (en) | 2007-02-26 | 2010-08-17 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a processing chamber |
US8074677B2 (en) | 2007-02-26 | 2011-12-13 | Applied Materials, Inc. | Method and apparatus for controlling gas flow to a processing chamber |
US7988813B2 (en) | 2007-03-12 | 2011-08-02 | Tokyo Electron Limited | Dynamic control of process chemistry for improved within-substrate process uniformity |
JP5317424B2 (ja) | 2007-03-28 | 2013-10-16 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US8202393B2 (en) | 2007-08-29 | 2012-06-19 | Lam Research Corporation | Alternate gas delivery and evacuation system for plasma processing apparatuses |
US7832354B2 (en) | 2007-09-05 | 2010-11-16 | Applied Materials, Inc. | Cathode liner with wafer edge gas injection in a plasma reactor chamber |
US8440259B2 (en) | 2007-09-05 | 2013-05-14 | Intermolecular, Inc. | Vapor based combinatorial processing |
US7824146B2 (en) | 2007-09-07 | 2010-11-02 | Advanced Technology Development Facility | Automated systems and methods for adapting semiconductor fabrication tools to process wafers of different diameters |
JP5459895B2 (ja) | 2007-10-15 | 2014-04-02 | Ckd株式会社 | ガス分流供給ユニット |
WO2009057583A1 (ja) | 2007-10-31 | 2009-05-07 | Tohoku University | プラズマ処理システム及びプラズマ処理方法 |
US8137463B2 (en) | 2007-12-19 | 2012-03-20 | Applied Materials, Inc. | Dual zone gas injection nozzle |
US8999106B2 (en) | 2007-12-19 | 2015-04-07 | Applied Materials, Inc. | Apparatus and method for controlling edge performance in an inductively coupled plasma chamber |
US8037894B1 (en) | 2007-12-27 | 2011-10-18 | Intermolecular, Inc. | Maintaining flow rate of a fluid |
KR101028213B1 (ko) | 2007-12-27 | 2011-04-11 | 가부시키가이샤 호리바 에스텍 | 유량 비율 제어 장치 |
KR101840047B1 (ko) | 2008-01-18 | 2018-03-19 | 피포탈 시스템즈 코포레이션 | 가스 유동 제어기의 인 시투 시험을 위한 방법 및 장치 |
JP2009188173A (ja) | 2008-02-06 | 2009-08-20 | Tokyo Electron Ltd | 基板処理方法及び基板処理装置 |
JP5759177B2 (ja) | 2008-02-08 | 2015-08-05 | ラム リサーチ コーポレーションLam Research Corporation | プラズマ処理装置、半導体基板を処理する方法、および軸直角変位ベローズユニット |
US8969151B2 (en) | 2008-02-29 | 2015-03-03 | Globalfoundries Singapore Pte. Ltd. | Integrated circuit system employing resistance altering techniques |
US8110068B2 (en) * | 2008-03-20 | 2012-02-07 | Novellus Systems, Inc. | Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes |
US20090272717A1 (en) | 2008-03-21 | 2009-11-05 | Applied Materials, Inc. | Method and apparatus of a substrate etching system and process |
JP2010034416A (ja) | 2008-07-30 | 2010-02-12 | Hitachi High-Technologies Corp | プラズマ処理装置およびプラズマ処理方法 |
ES2379698T3 (es) | 2008-08-13 | 2012-04-30 | Shell Internationale Research Maatschappij B.V. | Método para controlar un caudal de gas entre una pluralidad de flujos de gases |
US8089046B2 (en) | 2008-09-19 | 2012-01-03 | Applied Materials, Inc. | Method and apparatus for calibrating mass flow controllers |
US8809196B2 (en) | 2009-01-14 | 2014-08-19 | Tokyo Electron Limited | Method of etching a thin film using pressure modulation |
JP5216632B2 (ja) | 2009-03-03 | 2013-06-19 | 東京エレクトロン株式会社 | 流体制御装置 |
US8409995B2 (en) | 2009-08-07 | 2013-04-02 | Tokyo Electron Limited | Substrate processing apparatus, positioning method and focus ring installation method |
WO2011021539A1 (ja) | 2009-08-20 | 2011-02-24 | 東京エレクトロン株式会社 | プラズマ処理装置とプラズマ処理方法 |
KR20120098751A (ko) | 2009-10-26 | 2012-09-05 | 솔베이 플루오르 게엠베하 | Tft 매트릭스 제조를 위한 식각 공정 |
US20120244715A1 (en) | 2009-12-02 | 2012-09-27 | Xactix, Inc. | High-selectivity etching system and method |
US9127361B2 (en) | 2009-12-07 | 2015-09-08 | Mks Instruments, Inc. | Methods of and apparatus for controlling pressure in multiple zones of a process tool |
WO2011078242A1 (ja) | 2009-12-25 | 2011-06-30 | 株式会社堀場エステック | マスフローコントローラシステム |
KR101430093B1 (ko) | 2010-03-04 | 2014-09-22 | 도쿄엘렉트론가부시키가이샤 | 플라즈마 에칭 방법, 반도체 디바이스의 제조 방법 및 플라즈마 에칭 장치 |
JP2011226941A (ja) | 2010-04-21 | 2011-11-10 | Seiko Epson Corp | 振動型力検出センサー、及び振動型力検出装置 |
US20110265883A1 (en) | 2010-04-30 | 2011-11-03 | Applied Materials, Inc. | Methods and apparatus for reducing flow splitting errors using orifice ratio conductance control |
JP5584517B2 (ja) | 2010-05-12 | 2014-09-03 | 東京エレクトロン株式会社 | プラズマ処理装置及び半導体装置の製造方法 |
US8485128B2 (en) | 2010-06-30 | 2013-07-16 | Lam Research Corporation | Movable ground ring for a plasma processing chamber |
WO2012016971A1 (en) | 2010-08-02 | 2012-02-09 | Basell Polyolefine Gmbh | Process and apparatus for mixing and splitting fluid streams |
US8869742B2 (en) | 2010-08-04 | 2014-10-28 | Lam Research Corporation | Plasma processing chamber with dual axial gas injection and exhaust |
US8905074B2 (en) | 2010-10-22 | 2014-12-09 | Applied Materials, Inc. | Apparatus for controlling gas distribution using orifice ratio conductance control |
WO2012077071A1 (en) | 2010-12-08 | 2012-06-14 | Oc Oerlikon Balzers Ag | Apparatus and method for depositing a layer onto a substrate |
US20120149213A1 (en) | 2010-12-09 | 2012-06-14 | Lakshminarayana Nittala | Bottom up fill in high aspect ratio trenches |
JP5855921B2 (ja) | 2010-12-17 | 2016-02-09 | 株式会社堀場エステック | ガス濃度調整装置 |
US9303319B2 (en) | 2010-12-17 | 2016-04-05 | Veeco Instruments Inc. | Gas injection system for chemical vapor deposition using sequenced valves |
US8968537B2 (en) * | 2011-02-09 | 2015-03-03 | Applied Materials, Inc. | PVD sputtering target with a protected backing plate |
US9064815B2 (en) | 2011-03-14 | 2015-06-23 | Applied Materials, Inc. | Methods for etch of metal and metal-oxide films |
US8999856B2 (en) | 2011-03-14 | 2015-04-07 | Applied Materials, Inc. | Methods for etch of sin films |
US9476144B2 (en) | 2011-03-28 | 2016-10-25 | Applied Materials, Inc. | Method and apparatus for the selective deposition of epitaxial germanium stressor alloys |
US9059678B2 (en) | 2011-04-28 | 2015-06-16 | Lam Research Corporation | TCCT match circuit for plasma etch chambers |
US8746284B2 (en) | 2011-05-11 | 2014-06-10 | Intermolecular, Inc. | Apparatus and method for multiple symmetrical divisional gas distribution |
KR101926571B1 (ko) | 2011-05-31 | 2018-12-10 | 어플라이드 머티어리얼스, 인코포레이티드 | 유도성 커플링된 플라즈마(icp) 반응기를 위한 동적인 이온 라디칼 시브 및 이온 라디칼 개구 |
US10364496B2 (en) | 2011-06-27 | 2019-07-30 | Asm Ip Holding B.V. | Dual section module having shared and unshared mass flow controllers |
JP5377587B2 (ja) | 2011-07-06 | 2013-12-25 | 東京エレクトロン株式会社 | アンテナ、プラズマ処理装置及びプラズマ処理方法 |
JP5739261B2 (ja) | 2011-07-28 | 2015-06-24 | 株式会社堀場エステック | ガス供給システム |
US8728239B2 (en) | 2011-07-29 | 2014-05-20 | Asm America, Inc. | Methods and apparatus for a gas panel with constant gas flow |
JP5948026B2 (ja) | 2011-08-17 | 2016-07-06 | 東京エレクトロン株式会社 | 半導体製造装置及び処理方法 |
US20130045605A1 (en) | 2011-08-18 | 2013-02-21 | Applied Materials, Inc. | Dry-etch for silicon-and-nitrogen-containing films |
US8849466B2 (en) | 2011-10-04 | 2014-09-30 | Mks Instruments, Inc. | Method of and apparatus for multiple channel flow ratio controller system |
US20130104996A1 (en) | 2011-10-26 | 2013-05-02 | Applied Materials, Inc. | Method for balancing gas flow supplying multiple cvd reactors |
US8933628B2 (en) | 2011-10-28 | 2015-01-13 | Applied Materials, Inc. | Inductively coupled plasma source with phase control |
JP5932599B2 (ja) | 2011-10-31 | 2016-06-08 | 株式会社日立ハイテクノロジーズ | プラズマエッチング方法 |
US8671733B2 (en) | 2011-12-13 | 2014-03-18 | Intermolecular, Inc. | Calibration procedure considering gas solubility |
US8900469B2 (en) | 2011-12-19 | 2014-12-02 | Applied Materials, Inc. | Etch rate detection for anti-reflective coating layer and absorber layer etching |
US8592328B2 (en) | 2012-01-20 | 2013-11-26 | Novellus Systems, Inc. | Method for depositing a chlorine-free conformal sin film |
US9804609B2 (en) | 2012-02-22 | 2017-10-31 | Agilent Technologies, Inc. | Mass flow controllers and methods for auto-zeroing flow sensor without shutting off a mass flow controller |
JP5881467B2 (ja) | 2012-02-29 | 2016-03-09 | 株式会社フジキン | ガス分流供給装置及びこれを用いたガス分流供給方法 |
US20130255784A1 (en) | 2012-03-30 | 2013-10-03 | Applied Materials, Inc. | Gas delivery systems and methods of use thereof |
US9301383B2 (en) | 2012-03-30 | 2016-03-29 | Tokyo Electron Limited | Low electron temperature, edge-density enhanced, surface wave plasma (SWP) processing method and apparatus |
KR101974420B1 (ko) | 2012-06-08 | 2019-05-02 | 세메스 주식회사 | 기판처리장치 및 방법 |
KR101974422B1 (ko) | 2012-06-27 | 2019-05-02 | 세메스 주식회사 | 기판처리장치 및 방법 |
US9023734B2 (en) | 2012-09-18 | 2015-05-05 | Applied Materials, Inc. | Radical-component oxide etch |
KR102207992B1 (ko) | 2012-10-23 | 2021-01-26 | 램 리써치 코포레이션 | 서브-포화된 원자층 증착 및 등각막 증착 |
JP5616416B2 (ja) | 2012-11-02 | 2014-10-29 | 株式会社フジキン | 集積型ガス供給装置 |
US8969212B2 (en) | 2012-11-20 | 2015-03-03 | Applied Materials, Inc. | Dry-etch selectivity |
US20140144471A1 (en) | 2012-11-28 | 2014-05-29 | Intermolecular, Inc. | Contamination Control, Rinsing, and Purging Methods to Extend the Life of Components within Combinatorial Processing Systems |
US9090972B2 (en) | 2012-12-31 | 2015-07-28 | Lam Research Corporation | Gas supply systems for substrate processing chambers and methods therefor |
US9362130B2 (en) | 2013-03-01 | 2016-06-07 | Applied Materials, Inc. | Enhanced etching processes using remote plasma sources |
CN104798446B (zh) | 2013-03-12 | 2017-09-08 | 应用材料公司 | 具有方位角与径向分布控制的多区域气体注入组件 |
US20140273460A1 (en) | 2013-03-13 | 2014-09-18 | Applied Materials, Inc. | Passive control for through silicon via tilt in icp chamber |
US20140271097A1 (en) | 2013-03-15 | 2014-09-18 | Applied Materials, Inc. | Processing systems and methods for halide scavenging |
US9425077B2 (en) | 2013-03-15 | 2016-08-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor apparatus with transportable edge ring for substrate transport |
US20150010381A1 (en) | 2013-07-08 | 2015-01-08 | United Microelectronics Corp. | Wafer processing chamber and method for transferring wafer in the same |
US9147581B2 (en) | 2013-07-11 | 2015-09-29 | Lam Research Corporation | Dual chamber plasma etcher with ion accelerator |
CN104299929A (zh) | 2013-07-19 | 2015-01-21 | 朗姆研究公司 | 用于原位晶片边缘和背侧等离子体清洁的系统和方法 |
JP6193679B2 (ja) | 2013-08-30 | 2017-09-06 | 株式会社フジキン | ガス分流供給装置及びガス分流供給方法 |
US8956980B1 (en) | 2013-09-16 | 2015-02-17 | Applied Materials, Inc. | Selective etch of silicon nitride |
CN103730318B (zh) | 2013-11-15 | 2016-04-06 | 中微半导体设备(上海)有限公司 | 一种晶圆边缘保护环及减少晶圆边缘颗粒的方法 |
WO2015099892A1 (en) | 2013-12-23 | 2015-07-02 | Applied Materials, Inc. | Extreme edge and skew control in icp plasma reactor |
US20150184287A1 (en) | 2013-12-26 | 2015-07-02 | Intermolecular, Inc. | Systems and Methods for Parallel Combinatorial Vapor Deposition Processing |
CN104752141B (zh) | 2013-12-31 | 2017-02-08 | 中微半导体设备(上海)有限公司 | 一种等离子体处理装置及其运行方法 |
CN104851832B (zh) | 2014-02-18 | 2018-01-19 | 北京北方华创微电子装备有限公司 | 一种固定装置、反应腔室及等离子体加工设备 |
US9580360B2 (en) | 2014-04-07 | 2017-02-28 | Lam Research Corporation | Monolithic ceramic component of gas delivery system and method of making and use thereof |
JP6204869B2 (ja) | 2014-04-09 | 2017-09-27 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
US20150340209A1 (en) | 2014-05-20 | 2015-11-26 | Micron Technology, Inc. | Focus ring replacement method for a plasma reactor, and associated systems and methods |
US9318343B2 (en) | 2014-06-11 | 2016-04-19 | Tokyo Electron Limited | Method to improve etch selectivity during silicon nitride spacer etch |
CN105336561B (zh) | 2014-07-18 | 2017-07-21 | 中微半导体设备(上海)有限公司 | 等离子体刻蚀装置 |
CN107148661B (zh) | 2014-10-17 | 2019-10-18 | 朗姆研究公司 | 包括用于可调气流控制的气体分流器的气体供应输送装置 |
US20160181116A1 (en) | 2014-12-18 | 2016-06-23 | Lam Research Corporation | Selective nitride etch |
US11605546B2 (en) | 2015-01-16 | 2023-03-14 | Lam Research Corporation | Moveable edge coupling ring for edge process control during semiconductor wafer processing |
US10658222B2 (en) | 2015-01-16 | 2020-05-19 | Lam Research Corporation | Moveable edge coupling ring for edge process control during semiconductor wafer processing |
TW201634738A (zh) | 2015-01-22 | 2016-10-01 | 應用材料股份有限公司 | 用於在空間上分離之原子層沉積腔室的經改良注射器 |
US9911620B2 (en) | 2015-02-23 | 2018-03-06 | Lam Research Corporation | Method for achieving ultra-high selectivity while etching silicon nitride |
US9966270B2 (en) | 2015-03-31 | 2018-05-08 | Lam Research Corporation | Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity |
US10957561B2 (en) | 2015-07-30 | 2021-03-23 | Lam Research Corporation | Gas delivery system |
US9837286B2 (en) | 2015-09-04 | 2017-12-05 | Lam Research Corporation | Systems and methods for selectively etching tungsten in a downstream reactor |
US10192751B2 (en) | 2015-10-15 | 2019-01-29 | Lam Research Corporation | Systems and methods for ultrahigh selective nitride etch |
US10825659B2 (en) | 2016-01-07 | 2020-11-03 | Lam Research Corporation | Substrate processing chamber including multiple gas injection points and dual injector |
CN108369922B (zh) | 2016-01-26 | 2023-03-21 | 应用材料公司 | 晶片边缘环升降解决方案 |
US9640409B1 (en) | 2016-02-02 | 2017-05-02 | Lam Research Corporation | Self-limited planarization of hardmask |
US10651015B2 (en) | 2016-02-12 | 2020-05-12 | Lam Research Corporation | Variable depth edge ring for etch uniformity control |
US10147588B2 (en) | 2016-02-12 | 2018-12-04 | Lam Research Corporation | System and method for increasing electron density levels in a plasma of a substrate processing system |
US10699878B2 (en) | 2016-02-12 | 2020-06-30 | Lam Research Corporation | Chamber member of a plasma source and pedestal with radially outward positioned lift pins for translation of a substrate c-ring |
US10438833B2 (en) | 2016-02-16 | 2019-10-08 | Lam Research Corporation | Wafer lift ring system for wafer transfer |
CN107093569B (zh) | 2016-02-18 | 2019-07-05 | 北京北方华创微电子装备有限公司 | 一种晶片定位装置及反应腔室 |
US20170278679A1 (en) | 2016-03-24 | 2017-09-28 | Lam Research Corporation | Method and apparatus for controlling process within wafer uniformity |
US10312121B2 (en) | 2016-03-29 | 2019-06-04 | Lam Research Corporation | Systems and methods for aligning measurement device in substrate processing systems |
US11011353B2 (en) | 2016-03-29 | 2021-05-18 | Lam Research Corporation | Systems and methods for performing edge ring characterization |
US10410832B2 (en) | 2016-08-19 | 2019-09-10 | Lam Research Corporation | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment |
-
2017
- 2017-02-09 US US15/428,585 patent/US10699878B2/en active Active
- 2017-02-10 KR KR1020170018561A patent/KR20170095151A/ko not_active Application Discontinuation
- 2017-02-10 TW TW106104387A patent/TWI736582B/zh active
- 2017-02-13 CN CN201710076420.1A patent/CN107086169B/zh active Active
- 2017-02-13 JP JP2017023976A patent/JP6947510B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07326494A (ja) * | 1992-11-04 | 1995-12-12 | Novellus Syst Inc | プラズマプロセス装置 |
JPH09120898A (ja) * | 1995-07-26 | 1997-05-06 | Applied Materials Inc | 電子的に可変な密度プロファイルを有するプラズマ源 |
JPH1092598A (ja) * | 1996-05-13 | 1998-04-10 | Applied Materials Inc | 上部にソレノイドアンテナを有する電磁結合rfプラズマリアクター |
JPH10258227A (ja) * | 1997-01-02 | 1998-09-29 | Applied Materials Inc | ハイブリッド導体と多半径ドームシーリングを持つrfプラズマリアクタ |
JP2000191370A (ja) * | 1998-12-28 | 2000-07-11 | Taiheiyo Cement Corp | 処理容器用部材 |
JP2009283975A (ja) * | 2003-05-02 | 2009-12-03 | Tokyo Electron Ltd | プラズマ処理装置 |
US20090250334A1 (en) * | 2008-04-03 | 2009-10-08 | Novellus Systems, Inc. | Plasma generator systems and methods of forming plasma |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10395900B2 (en) * | 2016-06-17 | 2019-08-27 | Samsung Electronics Co., Ltd. | Plasma processing apparatus |
US10903053B2 (en) | 2016-06-17 | 2021-01-26 | Samsung Electronics Co., Ltd. | Plasma processing apparatus |
JP7386362B2 (ja) | 2020-05-09 | 2023-11-24 | ベイジン・ナウラ・マイクロエレクトロニクス・イクイップメント・カンパニー・リミテッド | 半導体反応チャンバ及び原子層プラズマエッチング装置 |
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US20170236688A1 (en) | 2017-08-17 |
TW201740425A (zh) | 2017-11-16 |
CN107086169B (zh) | 2020-09-08 |
TWI736582B (zh) | 2021-08-21 |
KR20170095151A (ko) | 2017-08-22 |
CN107086169A (zh) | 2017-08-22 |
JP6947510B2 (ja) | 2021-10-13 |
US10699878B2 (en) | 2020-06-30 |
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