JP2016051803A - 配線基板及びその製造方法 - Google Patents
配線基板及びその製造方法 Download PDFInfo
- Publication number
- JP2016051803A JP2016051803A JP2014176097A JP2014176097A JP2016051803A JP 2016051803 A JP2016051803 A JP 2016051803A JP 2014176097 A JP2014176097 A JP 2014176097A JP 2014176097 A JP2014176097 A JP 2014176097A JP 2016051803 A JP2016051803 A JP 2016051803A
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- Prior art keywords
- layer
- wiring
- insulating layer
- pad
- solder resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Abstract
Description
[第1の実施の形態に係る配線基板の構造]
まず、第1の実施の形態に係る配線基板の構造について説明する。図1は、第1の実施の形態に係る配線基板を例示する断面図である。なお、図1(b)及び図1(c)は、図1(a)のA部を拡大して例示する部分断面図である。又、図1(d)は、図1(a)のB部を拡大して例示する部分断面図である。又、図2は、図1のA部近傍を拡大して例示する部分平面図である。なお、図2では、便宜上、ソルダーレジスト層19を梨地模様で示している。
次に、第1の実施の形態に係る配線基板の製造方法について説明する。図3〜図7は、第1の実施の形態に係る配線基板の製造工程を例示する図である。
第2の実施の形態では、補強部材を有しない絶縁層を備えた配線基板の例を示す。なお、第2の実施の形態において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
第3の実施の形態では、4層の配線層を備えた配線基板の例を示す。なお、第3の実施の形態において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
第1の実施の形態の応用例1では、第1の実施の形態に係る配線基板に半導体チップ(半導体素子)が搭載(ワイヤボンディング)された半導体パッケージの例を示す。なお、第1の実施の形態の応用例1において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
第1の実施の形態の応用例2では、第1の実施の形態に係る配線基板に半導体チップ(半導体素子)が搭載(フリップチップ実装)された半導体パッケージの例を示す。なお、第1の実施の形態の応用例2において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
第1の実施の形態の応用例3では、複数の半導体チップ(半導体素子)が搭載(フリップチップ実装)されて半導体パッケージとなる配線基板の例を示す。なお、第1の実施の形態の応用例3において、既に説明した実施の形態と同一構成部についての説明は省略する場合がある。
実施例では、第1〜第3の実施の形態に係る配線基板について、実現可能な各層の層厚の一例を示す。
2、2A 半導体パッケージ
10 パッド
11、15、17、22 配線層
11t 配線層11の下面
11u、11w 配線層11の上面
11v 配線層11の側面
11A パッド本体
11B 配線パターン
12 第1金属層
12−1 埋設部
12−2 突出部
12s 突出部12−2の外周部
12u 第1金属層12の上面
13 第2金属層
13u 第2金属層13の上面
13v 第2金属層13の側面
14、16、21 絶縁層
14a 絶縁層14の上面
14g、16g、21g 補強部材
14x、16x、21x ビアホール
17p 配線層17の下面の中央部
17s 配線層17の下面の外縁部
17t 配線層17の下面
18、19 ソルダーレジスト層
18x、19x 開口部
19a ソルダーレジスト層19の上面
71、75、78、79 半導体チップ
72 接着層
73 ボンディングワイヤ
74 封止樹脂
76 バンプ
77 アンダーフィル樹脂
100 支持体
100a 支持体100の一方の面
100b 支持体100の他方の面
110a プリプレグ
110 樹脂層
120 キャリア付き金属箔
121 薄箔
122 厚箔(キャリア箔)
150 保護フィルム
Z 段差部
Claims (10)
- 絶縁層と、
下面及び側面が前記絶縁層に被覆され、上面が前記絶縁層の上面から窪んだ位置に露出する配線層と、
前記絶縁層内に形成され、前記配線層の下面に接続するビア配線と、
前記絶縁層の上面に形成されたソルダーレジスト層と、を有し、
前記ビア配線は、前記配線層の下面と接する部分の面積が、前記絶縁層の下面から露出する部分の面積よりも小さく、
前記配線層は、パッドの一部を構成するパッド本体と、配線パターンと、を含み、
前記ソルダーレジスト層は、開口部内に前記パッドを露出し、前記絶縁層の上面と前記配線パターンの上面とが形成する段差部を埋めるように形成され、
前記パッドは、
前記パッド本体と、
前記パッド本体の上面に形成され、前記絶縁層に埋設された埋設部及び前記絶縁層の上面から突出する突出部を備えた第1金属層と、
前記第1金属層の突出部の上面及び側面を被覆する第2金属層と、を備え、
前記パッド本体の上面と、前記配線パターンの上面とは、同一平面上にあり、
前記第2金属層の上面は、前記ソルダーレジスト層の上面よりも低い位置にある配線基板。 - 前記パッド本体の上面は平滑面であり、前記配線パターンの上面は粗化面である請求項1記載の配線基板。
- 前記絶縁層の上面は粗化面である請求項1又は2記載の配線基板。
- 前記絶縁層の下面側に形成された第2の配線層と、
前記絶縁層の下面側に形成され、前記第2の配線層を選択的に露出する第2の開口部を備えた第2のソルダーレジスト層と、を有し、
前記第2の配線層の下面外縁部は前記第2のソルダーレジスト層に被覆され、
前記第2の配線層の下面中央部は前記第2の開口部内に露出し、
前記第2の配線層の下面外縁部の粗度は、前記配線パターンの上面の粗度と同等であり、
前記第2の配線層の下面中央部の粗度は、前記パッド本体の上面の粗度と同等である請求項1乃至3の何れか一項記載の配線基板。 - 前記パッドは、ボンディングワイヤと接続されるパッドである請求項1乃至4の何れか一項記載の配線基板。
- 前記パッド本体は銅からなり、前記第1金属層はニッケルからなり、前記第2金属層は金からなる請求項1乃至5の何れか一項記載の配線基板。
- 前記絶縁層は、補強部材を有している請求項1乃至6の何れか一項記載の配線基板。
- 厚箔上に前記厚箔よりも薄い薄箔が剥離可能な状態で貼着された金属箔が、前記薄箔の一方の面が露出するように樹脂層に埋設された構造の支持体を作製する工程と、
前記支持体の前記薄箔の一方の面に、配線層を形成する工程と、
前記支持体の前記薄箔の一方の面に、前記配線層を被覆する絶縁層を形成する工程と、
前記絶縁層に、前記配線層の前記薄箔の一方の面と接する面の反対側の面である下面を露出するビアホールを形成する工程と、
前記ビアホールを充填して、前記配線層の下面に接続するビア配線を形成する工程と、
前記薄箔を前記絶縁層側に残し、前記厚箔及び前記樹脂層を除去する工程と、
エッチングにより、前記薄箔を除去して前記絶縁層の前記薄箔の一方の面と接していた面である前記配線層の上面を露出させ、更に前記配線層の上面の一部を除去して前記配線層の上面を前記絶縁層の上面から窪んだ位置に露出させることで段差部が形成される工程と、
前記絶縁層の上面に、開口部内に前記配線層のうちパッド本体となる部分を露出し、前記配線層のうち配線パターンとなる部分を前記段差部を埋めるように被覆するソルダーレジスト層を形成する工程と、
前記開口部内に露出する前記パッド本体の上面に、前記絶縁層に埋設された埋設部及び前記絶縁層の上面から突出する突出部を備えた第1金属層を形成し、前記第1金属層の突出部の上面及び側面を被覆する第2金属層を形成してパッドを作製する工程と、を有し、
前記ビア配線は、前記配線層の下面と接する部分の面積が、前記絶縁層の下面から露出する部分の面積よりも小さく形成され、
前記パッド本体の上面と、前記配線パターンの上面とは、同一平面上にあり、
前記第2金属層の上面は、前記ソルダーレジスト層の上面よりも低い位置に形成される配線基板の製造方法。 - 前記薄箔の一方の面は粗化面であり、
前記薄箔を除去する工程では、前記絶縁層の上面に前記薄箔の粗化面が転写される請求項8記載の配線基板の製造方法。 - 前記薄箔を除去する工程より後であって、前記ソルダーレジスト層を形成する工程よりも前に、前記パッド本体の上面及び前記配線パターンの上面を粗化面とする工程を有し、
前記ソルダーレジスト層を形成する工程よりも後に、前記開口部内に露出する前記パッド本体の上面を平滑面とする工程を有する請求項8又は9記載の配線基板の製造方法。
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