JP2015201644A5 - - Google Patents

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Publication number
JP2015201644A5
JP2015201644A5 JP2015076924A JP2015076924A JP2015201644A5 JP 2015201644 A5 JP2015201644 A5 JP 2015201644A5 JP 2015076924 A JP2015076924 A JP 2015076924A JP 2015076924 A JP2015076924 A JP 2015076924A JP 2015201644 A5 JP2015201644 A5 JP 2015201644A5
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Japan
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polishing composition
composition according
acid
anionic
polishing
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JP2015076924A
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JP2015201644A (ja
JP6437870B2 (ja
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JP2015076924A 2014-04-04 2015-04-03 シリコン酸化膜上のシリコン窒化膜を選択的に研磨するための研磨組成物及び方法 Active JP6437870B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/245,286 2014-04-04
US14/245,286 US9583359B2 (en) 2014-04-04 2014-04-04 Polishing compositions and methods for selectively polishing silicon nitride over silicon oxide films

Publications (3)

Publication Number Publication Date
JP2015201644A JP2015201644A (ja) 2015-11-12
JP2015201644A5 true JP2015201644A5 (enExample) 2016-12-08
JP6437870B2 JP6437870B2 (ja) 2018-12-12

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JP2015076924A Active JP6437870B2 (ja) 2014-04-04 2015-04-03 シリコン酸化膜上のシリコン窒化膜を選択的に研磨するための研磨組成物及び方法

Country Status (5)

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US (2) US9583359B2 (enExample)
EP (1) EP2927294B1 (enExample)
JP (1) JP6437870B2 (enExample)
KR (1) KR101899948B1 (enExample)
TW (1) TWI611009B (enExample)

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