JP2013510204A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2013510204A5 JP2013510204A5 JP2012537366A JP2012537366A JP2013510204A5 JP 2013510204 A5 JP2013510204 A5 JP 2013510204A5 JP 2012537366 A JP2012537366 A JP 2012537366A JP 2012537366 A JP2012537366 A JP 2012537366A JP 2013510204 A5 JP2013510204 A5 JP 2013510204A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer composition
- photosensitive polymer
- writing
- writing monomer
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 claims description 27
- 239000000178 monomer Substances 0.000 claims description 20
- 239000011159 matrix material Substances 0.000 claims description 7
- 230000005670 electromagnetic radiation Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 229920002635 polyurethane Polymers 0.000 claims description 3
- 239000004014 plasticizer Substances 0.000 description 4
- 230000001588 bifunctional effect Effects 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- MHCLJIVVJQQNKQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O MHCLJIVVJQQNKQ-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09013769 | 2009-11-03 | ||
| EP09013769.6 | 2009-11-03 | ||
| PCT/EP2010/066594 WO2011054797A1 (de) | 2009-11-03 | 2010-11-02 | Photopolymer-formulierung mit verschiedenen schreibcomonomeren |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013510204A JP2013510204A (ja) | 2013-03-21 |
| JP2013510204A5 true JP2013510204A5 (enExample) | 2013-12-19 |
| JP5638085B2 JP5638085B2 (ja) | 2014-12-10 |
Family
ID=41665175
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012537366A Active JP5638085B2 (ja) | 2009-11-03 | 2010-11-02 | 異なった書込コモノマーを含有する感光性ポリマー組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8889322B2 (enExample) |
| EP (1) | EP2497083B1 (enExample) |
| JP (1) | JP5638085B2 (enExample) |
| KR (1) | KR101782182B1 (enExample) |
| CN (1) | CN102667935B (enExample) |
| TW (1) | TWI489205B (enExample) |
| WO (1) | WO2011054797A1 (enExample) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL200722A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Photopolymer compositions for optical elements and visual displays |
| CN102171267B (zh) * | 2008-10-01 | 2014-09-03 | 拜尔材料科学股份公司 | 基于自显影聚合物的体全息记录用介质 |
| CN102741925B (zh) * | 2009-11-03 | 2015-12-16 | 拜尔材料科学股份公司 | 生产全息膜的方法 |
| ES2381808T3 (es) | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
| RU2542981C9 (ru) * | 2009-11-03 | 2015-12-10 | Байер Матириальсайенс Аг | Способ изготовления голографических сред |
| ES2433235T3 (es) * | 2009-11-03 | 2013-12-10 | Bayer Intellectual Property Gmbh | Fluorouretanos como aditivos en una formulación de fotopolímero |
| EP2497085B1 (de) * | 2009-11-03 | 2014-02-12 | Bayer Intellectual Property GmbH | Verfahren zur herstellung eines holographischen films |
| EP2496588B1 (de) * | 2009-11-03 | 2017-01-11 | Covestro Deutschland AG | Urethanacrylate mit hohem brechungsindex und reduzierter doppelbindungsdichte |
| US20120237856A1 (en) * | 2009-11-03 | 2012-09-20 | Bayer Intellectual Property Gmbh | Selection method for additives in photopolymers |
| KR20120125270A (ko) * | 2010-02-02 | 2012-11-14 | 바이엘 인텔렉쳐 프로퍼티 게엠베하 | 트리아진-기재 기록 단량체를 갖는 광중합체 배합물 |
| CN102754026B (zh) * | 2010-02-02 | 2015-10-07 | 拜耳知识产权有限责任公司 | 具有酯基书写单体的光聚合物制剂 |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| EP2450387A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung für die Herstellung holographischer Medien |
| WO2013053771A1 (de) | 2011-10-12 | 2013-04-18 | Bayer Intellectual Property Gmbh | Schwefelhaltige kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen |
| EP2766903A1 (de) | 2011-10-12 | 2014-08-20 | Bayer Intellectual Property GmbH | Kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen |
| EP2613319A1 (de) * | 2012-01-05 | 2013-07-10 | Bayer MaterialScience AG | Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht |
| EP2613318B1 (de) | 2012-01-05 | 2014-07-30 | Bayer Intellectual Property GmbH | Schichtaufbau mit einer Schutzschicht und einer belichteten Photopolymerschicht |
| US20140302425A1 (en) * | 2012-04-30 | 2014-10-09 | Bayer Intellectual Property Gmbh | Method for producing holographic media |
| EP2700510B1 (de) | 2012-08-23 | 2015-09-16 | Bayer MaterialScience AG | Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper |
| EP2772917A1 (de) | 2013-02-27 | 2014-09-03 | Bayer MaterialScience AG | Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen |
| TWI640428B (zh) | 2013-02-27 | 2018-11-11 | 拜耳材料科學股份有限公司 | 以丙烯酸酯為基底之保護塗層與黏著劑 |
| JP6497850B2 (ja) | 2013-05-08 | 2019-04-10 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ | ハロー防止層を有するホログラフィック記録媒体およびその製造 |
| US10001703B2 (en) | 2013-10-17 | 2018-06-19 | Covestro Deutschland Ag | Photopolymer formulation for production of holographic media comprising borates with low TG |
| TWI684782B (zh) * | 2014-08-01 | 2020-02-11 | 德商拜耳材料科學股份有限公司 | 含光聚合物層與基材層之層狀結構 |
| CN107001246B (zh) * | 2014-12-12 | 2021-02-02 | 科思创德国股份有限公司 | 作为光聚合物用书写单体的萘基丙烯酸酯 |
| TW201718523A (zh) * | 2015-06-23 | 2017-06-01 | 科思創德意志股份有限公司 | 作為光起始劑之新型三及其製備 |
| EP3166109A1 (de) | 2015-11-09 | 2017-05-10 | Covestro Deutschland AG | Kit-of-parts enthaltend versiegellungsschicht und photopolymer |
| US11535713B2 (en) | 2016-08-23 | 2022-12-27 | The Regents Of The University Of Colorado, A Body Corporate | Network polymers and methods of making and using same |
| KR102009421B1 (ko) | 2017-04-25 | 2019-08-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| EP3401909A1 (de) | 2017-05-09 | 2018-11-14 | Covestro Deutschland AG | Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
| EP3622352B1 (de) | 2017-05-09 | 2025-07-23 | Covestro Deutschland AG | System aus zwei trocken übertragbaren uv-härtenden lackschichten für den schutz eines hologramms in einem photopolymer-folienverbund |
| EP3401910A1 (de) | 2017-05-09 | 2018-11-14 | Covestro Deutschland AG | Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
| TW201906730A (zh) | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜 |
| TW201906882A (zh) | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構 |
| JP2020519943A (ja) | 2017-05-09 | 2020-07-02 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ | ホログラフィック露光用のフォトポリマー層と高耐性コーティング層を含むホログラフィック媒体 |
| EP3435156A1 (de) | 2017-07-26 | 2019-01-30 | Covestro Deutschland AG | Schutzschicht für photopolymer |
| KR102268129B1 (ko) * | 2017-10-16 | 2021-06-22 | 주식회사 엘지화학 | 비반응성 불소계 화합물 및 이를 포함하는 광중합성 조성물 |
| EP3495886A1 (de) | 2017-12-06 | 2019-06-12 | Covestro Deutschland AG | Klebstofffreier photopolymerschichtaufbau |
| KR102244648B1 (ko) | 2017-12-08 | 2021-04-26 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102166846B1 (ko) * | 2017-12-11 | 2020-10-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| DE102018207251B4 (de) | 2018-05-09 | 2025-10-16 | Bundesdruckerei Gmbh | Verfahren zum Herstellen eines Sicherheitselements mit zwei Sicherheitsmerkmalen und Verwendung des Verfahrens |
| US12071515B2 (en) | 2018-06-08 | 2024-08-27 | The Regents Of The University Of Colorado, A Body Corporate | High dynamic range two-stage photopolymers |
| US12391780B2 (en) | 2019-02-18 | 2025-08-19 | The Regents Of The University Of Colorado, A Body Corporate | Network polymers and methods of making and using same |
| US20200354594A1 (en) * | 2019-05-08 | 2020-11-12 | Facebook Technologies, Llc | Thermally reversible and reorganizable crosslinking polymers for volume bragg gratings |
| CN111045295B (zh) * | 2019-12-25 | 2023-10-31 | 杭州光粒科技有限公司 | 金属纳米颗粒掺杂的光致聚合物组合物以及光栅 |
| CN113527143B (zh) * | 2020-04-20 | 2023-06-20 | 杭州光粒科技有限公司 | 书写单体及其制备方法以及光致聚合物组合物及其光栅 |
| KR20230007435A (ko) | 2020-06-15 | 2023-01-12 | 쌩-고벵 글래스 프랑스 | 홀로그래픽 요소를 갖는 복합 판유리 및 그 생산 방법 |
| WO2021254872A1 (de) | 2020-06-15 | 2021-12-23 | Saint-Gobain Glass France | Verbundscheibe mit einem holographischen element und verfahren zu deren herstellung |
| CN121195304A (zh) | 2023-03-29 | 2025-12-23 | 三菱化学株式会社 | 全息记录用感光性组合物、全息记录介质、聚合物、大容量存储器、光学元件、ar导光板以及ar眼镜 |
| WO2026084847A1 (en) * | 2024-10-15 | 2026-04-23 | Nitto Denko Corporation | Mesh size control of holographic photopolymer and method for making the same |
Family Cites Families (73)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3374869D1 (en) * | 1983-09-22 | 1988-01-21 | Toray Industries | Resin material for plastic lens and lens composed thereof |
| EP0223587B1 (en) | 1985-11-20 | 1991-02-13 | The Mead Corporation | Photosensitive materials containing ionic dye compounds as initiators |
| JP3339873B2 (ja) * | 1992-03-23 | 2002-10-28 | 大日本印刷株式会社 | ホログラム形成材料 |
| US5712216A (en) | 1995-05-15 | 1998-01-27 | Arco Chemical Technology, L.P. | Highly active double metal cyanide complex catalysts |
| US5470813A (en) | 1993-11-23 | 1995-11-28 | Arco Chemical Technology, L.P. | Double metal cyanide complex catalysts |
| JP3050769B2 (ja) * | 1994-03-18 | 2000-06-12 | シャープ株式会社 | 液晶表示素子及びその製造方法 |
| GB9410578D0 (en) * | 1994-05-26 | 1994-07-13 | London Hospital Med Coll | Novel (meth)acrylate monomers and denture base compositions prepared therefrom |
| US5482908A (en) | 1994-09-08 | 1996-01-09 | Arco Chemical Technology, L.P. | Highly active double metal cyanide catalysts |
| US5679710A (en) * | 1994-11-01 | 1997-10-21 | London Hospital Medical College | High refractive index and/or radio-opaque resins systems |
| US5725970A (en) * | 1994-11-07 | 1998-03-10 | E. I. Du Pont De Nemours And Company | Broad band reflection holograms and a dry process for making same |
| US5545601A (en) | 1995-08-22 | 1996-08-13 | Arco Chemical Technology, L.P. | Polyether-containing double metal cyanide catalysts |
| US5627120A (en) | 1996-04-19 | 1997-05-06 | Arco Chemical Technology, L.P. | Highly active double metal cyanide catalysts |
| US5714428A (en) | 1996-10-16 | 1998-02-03 | Arco Chemical Technology, L.P. | Double metal cyanide catalysts containing functionalized polymers |
| JP3951344B2 (ja) * | 1997-03-19 | 2007-08-01 | Ｊｓｒ株式会社 | 感光性樹脂組成物 |
| US6482551B1 (en) * | 1998-03-24 | 2002-11-19 | Inphase Technologies | Optical article and process for forming article |
| DE19905611A1 (de) | 1999-02-11 | 2000-08-17 | Bayer Ag | Doppelmetallcyanid-Katalysatoren für die Herstellung von Polyetherpolyolen |
| US6627354B1 (en) * | 1999-03-01 | 2003-09-30 | Lucent Technologies Inc. | Photorecording medium, process for fabricating medium, and process for holography using medium |
| US6403702B1 (en) * | 1999-12-03 | 2002-06-11 | Bayer Corporation | Diurethane plasticizer containing one-shot polyurethane cast elastomers |
| JP2004525394A (ja) * | 2000-11-10 | 2004-08-19 | デュランド テクノロジー リミテッド | 光学記録材料 |
| JP2003165807A (ja) * | 2001-11-30 | 2003-06-10 | Sumitomo Chem Co Ltd | 光散乱シート用樹脂組成物及びそれの液晶表示分野への使用 |
| JP4071525B2 (ja) * | 2002-04-08 | 2008-04-02 | メモリーテック株式会社 | 光情報記録媒体 |
| JP2003307733A (ja) * | 2002-04-18 | 2003-10-31 | Nitto Denko Corp | 反射型液晶表示装置 |
| US6864019B2 (en) | 2002-06-27 | 2005-03-08 | Imation Corp. | Recording material formulations for holographic media |
| AU2003254775A1 (en) * | 2002-07-30 | 2004-02-16 | Toagosei Co., Ltd. | Composition for holography, method of curing the same, and cured article |
| JP4095474B2 (ja) * | 2003-03-13 | 2008-06-04 | 株式会社東芝 | 光情報記録媒体および情報記録方法 |
| JP4466141B2 (ja) * | 2003-09-17 | 2010-05-26 | コニカミノルタエムジー株式会社 | ホログラフィック記録用組成物、ホログラフィック記録メディア、ホログラフィック記録方法及びホログラフィック情報メディア |
| JP4466140B2 (ja) | 2003-11-27 | 2010-05-26 | コニカミノルタエムジー株式会社 | ホログラフィック記録メディア、ホログラフィック記録方法およびホログラフィック情報メディア |
| US20070172742A1 (en) * | 2004-02-13 | 2007-07-26 | Kentarou Yachi | Volume hologram recording material and volume hologram recording medium |
| JP2005241820A (ja) * | 2004-02-25 | 2005-09-08 | Toshiba Corp | ホログラム記録媒体及びその記録方法 |
| WO2005109114A1 (ja) * | 2004-05-10 | 2005-11-17 | Konica Minolta Medical & Graphic, Inc. | ホログラフィック記録メディア、ホログラフィック記録方法及びホログラフィック情報メディア |
| JP2006152105A (ja) * | 2004-11-29 | 2006-06-15 | Jsr Corp | 光硬化性樹脂組成物及び光学部材 |
| US8941904B2 (en) * | 2005-07-04 | 2015-01-27 | Dai Nippon Printing Co., Ltd. | Hologram sheet and hologram observation sheet using same, and blinding device |
| TW200702954A (en) * | 2005-07-11 | 2007-01-16 | Toagosei Co Ltd | Volume hologram recording material, the method of processing thereof and the recording medium |
| JP2007041160A (ja) * | 2005-08-01 | 2007-02-15 | Fujifilm Corp | 光記録用組成物及び光記録媒体 |
| JP2008081726A (ja) * | 2006-08-30 | 2008-04-10 | Sanyo Electric Co Ltd | 有機無機複合体形成用材料及び有機無機複合体並びにそれを用いた光学素子 |
| EP2110718B1 (en) * | 2007-02-05 | 2012-10-10 | Nippon Steel Chemical Co., Ltd. | Volume phase hologram recording material and optical information recording medium |
| JP4785001B2 (ja) * | 2007-03-20 | 2011-10-05 | 日本電信電話株式会社 | 光記録媒体 |
| JPWO2008123302A1 (ja) * | 2007-03-30 | 2010-07-15 | ダイキン工業株式会社 | 含フッ素体積型ホログラム記録用感光性組成物ならびにそれを用いた含フッ素体積型ホログラム記録用感光性媒体および含フッ素体積型ホログラム |
| WO2008123303A1 (ja) * | 2007-03-30 | 2008-10-16 | Daikin Industries, Ltd. | 含フッ素体積型ホログラム光情報記録材料用組成物およびそれを用いた含フッ素体積型ホログラム光情報記録媒体 |
| CN101034257B (zh) * | 2007-04-06 | 2010-09-08 | 上海复旦天臣新技术有限公司 | 用于全息记录的感光薄膜及其制备方法 |
| CA2683882A1 (en) | 2007-04-11 | 2008-10-23 | Bayer Materialscience Ag | Aromatic urethane acrylates having a high refractive index |
| ATE501193T1 (de) | 2007-04-11 | 2011-03-15 | Bayer Materialscience Ag | Strahlungsvernetzende und wärmevernetzende pu- systeme auf der basis von isocyanat-reaktiven blockcopolymeren |
| RU2009141372A (ru) * | 2007-04-11 | 2011-05-20 | Байер МатириальСайенс АГ (DE) | Предпочтительные запоминающие среды для голографических применений |
| RU2009141369A (ru) * | 2007-04-11 | 2011-05-20 | Байер МатириальСайенс АГ (DE) | Радиационно-сшиваемые и термически-сшиваемые полиуретановые системы, содержащие иминооксадиазиндион |
| JP2008268514A (ja) * | 2007-04-19 | 2008-11-06 | Fujifilm Corp | 光記録用組成物およびホログラフィック記録媒体 |
| US8435701B2 (en) * | 2007-11-27 | 2013-05-07 | Southbourne Investments Ltd. | Holographic recording medium |
| CN101320208B (zh) * | 2008-07-21 | 2011-06-01 | 上海复旦天臣新技术有限公司 | 反射全息薄膜及其制备方法 |
| DE502008002161D1 (de) * | 2008-08-08 | 2011-02-10 | Bayer Materialscience Ag | Phenylisocyanat-basierte Urethanacrylate mit hohem Brechungsindex |
| CA2738835A1 (en) * | 2008-10-01 | 2010-04-08 | Bayer Materialscience Ag | Prepolymer-based polyurethane formulations for producing holographic media |
| IL200722A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Photopolymer compositions for optical elements and visual displays |
| IL200996A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Photopolymer formulations having a low crosslinking density |
| IL200997A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Special polyether-based polyurethane formulations for the production of holographic media |
| CN102171267B (zh) * | 2008-10-01 | 2014-09-03 | 拜尔材料科学股份公司 | 基于自显影聚合物的体全息记录用介质 |
| IL200995A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Polyether-based polyurethane formulations for the production of holographic media |
| EP2218742A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Photopolymerzusammensetzungen als verdruckbare Formulierungen |
| EP2218743A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme |
| EP2218744A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Methode zur Herstellung von holografischen Photopolymeren auf Polymerfolien |
| EP2219073B1 (de) * | 2009-02-17 | 2020-06-03 | Covestro Deutschland AG | Holografische Medien und Photopolymerzusammensetzungen |
| JP2010230911A (ja) * | 2009-03-26 | 2010-10-14 | Tdk Corp | 光学デバイス |
| EP2496588B1 (de) * | 2009-11-03 | 2017-01-11 | Covestro Deutschland AG | Urethanacrylate mit hohem brechungsindex und reduzierter doppelbindungsdichte |
| ES2433235T3 (es) * | 2009-11-03 | 2013-12-10 | Bayer Intellectual Property Gmbh | Fluorouretanos como aditivos en una formulación de fotopolímero |
| WO2011054818A2 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung |
| ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| RU2542981C9 (ru) * | 2009-11-03 | 2015-12-10 | Байер Матириальсайенс Аг | Способ изготовления голографических сред |
| US20120237856A1 (en) * | 2009-11-03 | 2012-09-20 | Bayer Intellectual Property Gmbh | Selection method for additives in photopolymers |
| TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
| EP2497085B1 (de) * | 2009-11-03 | 2014-02-12 | Bayer Intellectual Property GmbH | Verfahren zur herstellung eines holographischen films |
| CN102741925B (zh) * | 2009-11-03 | 2015-12-16 | 拜尔材料科学股份公司 | 生产全息膜的方法 |
| CN102754026B (zh) * | 2010-02-02 | 2015-10-07 | 拜耳知识产权有限责任公司 | 具有酯基书写单体的光聚合物制剂 |
| KR20120125270A (ko) * | 2010-02-02 | 2012-11-14 | 바이엘 인텔렉쳐 프로퍼티 게엠베하 | 트리아진-기재 기록 단량체를 갖는 광중합체 배합물 |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| KR20130099932A (ko) * | 2010-08-11 | 2013-09-06 | 바이엘 인텔렉쳐 프로퍼티 게엠베하 | 이관능성 (메트)아크릴레이트 기록 단량체 |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
-
2010
- 2010-11-02 KR KR1020127014345A patent/KR101782182B1/ko active Active
- 2010-11-02 TW TW099137565A patent/TWI489205B/zh not_active IP Right Cessation
- 2010-11-02 EP EP10773075.6A patent/EP2497083B1/de active Active
- 2010-11-02 CN CN201080060489.1A patent/CN102667935B/zh active Active
- 2010-11-02 WO PCT/EP2010/066594 patent/WO2011054797A1/de not_active Ceased
- 2010-11-02 US US13/504,429 patent/US8889322B2/en active Active
- 2010-11-02 JP JP2012537366A patent/JP5638085B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2013510333A5 (enExample) | ||
| JP2013510203A5 (enExample) | ||
| JP2014516094A5 (enExample) | ||
| JP2010524037A5 (enExample) | ||
| RU2012122586A (ru) | Фотополимерные композиции с регулируемым механическим модулем guv | |
| IL200997A0 (en) | Special polyether-based polyurethane formulations for the production of holographic media | |
| ATE517139T1 (de) | Photopolymerformulierungen mit niedriger vernetzungsdichte | |
| JP2011511851A5 (enExample) | ||
| JP2011127112A5 (enExample) | ||
| WO2015079728A1 (ja) | 光硬化性光学接着剤組成物、その硬化物、及び液晶表示装置 | |
| JP2013518952A5 (enExample) | ||
| JP5779039B2 (ja) | ハードコート性樹脂組成物及びその硬化物 | |
| CN109810228A (zh) | 一种耐摔型3d打印光固化树脂及其制备方法 | |
| TW201022742A (en) | Polarizing plate and production method thereof | |
| JP6797529B2 (ja) | 光学部材の製造方法及びそれに用いられる組成物 | |
| US20190330427A1 (en) | Emulsion particle, emulsion comprising same, method for manufacturing emulsion | |
| JP2014012833A5 (enExample) | ||
| CN101842400A (zh) | 固化性片材组合物 | |
| JP2014178573A5 (enExample) | ||
| JP5459465B2 (ja) | 低重合収縮性ビニルシクロプロパン化合物及びその重合方法 | |
| TWI812767B (zh) | 硬化性樹脂組合物、及聚合物、(甲基)丙烯酸系彈性體及片材 | |
| JP2024004507A (ja) | エラストマー形成用組成物、エラストマー、積層体、電機デバイス、アクチュエータ、センサ、及び、エラストマー形成用組成物の製造方法 | |
| JP7708878B2 (ja) | 重合体、エラストマー及びその製造方法、並びに、アクチュエータ、及び、センサ | |
| JP6910755B2 (ja) | （メタ）アクリル系誘電体材料 | |
| CN107922546A (zh) | 固化性树脂组合物及其固化物 |