JP2013510204A5 - - Google Patents
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- JP2013510204A5 JP2013510204A5 JP2012537366A JP2012537366A JP2013510204A5 JP 2013510204 A5 JP2013510204 A5 JP 2013510204A5 JP 2012537366 A JP2012537366 A JP 2012537366A JP 2012537366 A JP2012537366 A JP 2012537366A JP 2013510204 A5 JP2013510204 A5 JP 2013510204A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer composition
- photosensitive polymer
- writing
- writing monomer
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920000642 polymer Polymers 0.000 claims description 27
- 239000000178 monomer Substances 0.000 claims description 20
- 239000011159 matrix material Substances 0.000 claims description 7
- 230000005670 electromagnetic radiation Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 3
- 239000004814 polyurethane Substances 0.000 claims description 3
- 229920002635 polyurethane Polymers 0.000 claims description 3
- 239000004014 plasticizer Substances 0.000 description 4
- 230000001588 bifunctional effect Effects 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- MHCLJIVVJQQNKQ-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O MHCLJIVVJQQNKQ-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09013769.6 | 2009-11-03 | ||
| EP09013769 | 2009-11-03 | ||
| PCT/EP2010/066594 WO2011054797A1 (de) | 2009-11-03 | 2010-11-02 | Photopolymer-formulierung mit verschiedenen schreibcomonomeren |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013510204A JP2013510204A (ja) | 2013-03-21 |
| JP2013510204A5 true JP2013510204A5 (enExample) | 2013-12-19 |
| JP5638085B2 JP5638085B2 (ja) | 2014-12-10 |
Family
ID=41665175
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012537366A Active JP5638085B2 (ja) | 2009-11-03 | 2010-11-02 | 異なった書込コモノマーを含有する感光性ポリマー組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8889322B2 (enExample) |
| EP (1) | EP2497083B1 (enExample) |
| JP (1) | JP5638085B2 (enExample) |
| KR (1) | KR101782182B1 (enExample) |
| CN (1) | CN102667935B (enExample) |
| TW (1) | TWI489205B (enExample) |
| WO (1) | WO2011054797A1 (enExample) |
Families Citing this family (49)
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| TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
| TWI506049B (zh) * | 2009-11-03 | 2015-11-01 | Bayer Materialscience Ag | 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯 |
| ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| TWI488908B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 製造全像膜的方法 |
| ES2453267T3 (es) * | 2009-11-03 | 2014-04-07 | Bayer Intellectual Property Gmbh | Procedimiento de fabricación de una película holográfica |
| JP2013510203A (ja) * | 2009-11-03 | 2013-03-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | 感光性ポリマー組成物における添加剤としてのフルオロウレタン |
| TW201133264A (en) * | 2009-11-03 | 2011-10-01 | Bayer Materialscience Ag | Method for selecting additives in photopolymers |
| WO2011054793A1 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Verfahren zur herstellung von holographischen medien |
| EP2531889B1 (de) * | 2010-02-02 | 2020-06-03 | Covestro Deutschland AG | Verwendung einer photopolymer-formulierung mit ester-basierten schreibmonomeren zur herstellung holographischer medien |
| EP2531892B1 (de) * | 2010-02-02 | 2016-01-27 | Covestro Deutschland AG | Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| EP2450387A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung für die Herstellung holographischer Medien |
| KR20140082692A (ko) | 2011-10-12 | 2014-07-02 | 바이엘 인텔렉쳐 프로퍼티 게엠베하 | 폴리우레탄-기재 광중합체 제제에서의 사슬 전달 시약 |
| US20140255824A1 (en) | 2011-10-12 | 2014-09-11 | Bayer Intellectual Property Gmbh | Sulphur-containing chain transfer reagents in polyurethane-based photopolymer formulations |
| EP2613319A1 (de) | 2012-01-05 | 2013-07-10 | Bayer MaterialScience AG | Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht |
| EP2613318B1 (de) | 2012-01-05 | 2014-07-30 | Bayer Intellectual Property GmbH | Schichtaufbau mit einer Schutzschicht und einer belichteten Photopolymerschicht |
| US20140302425A1 (en) * | 2012-04-30 | 2014-10-09 | Bayer Intellectual Property Gmbh | Method for producing holographic media |
| EP2700510B1 (de) | 2012-08-23 | 2015-09-16 | Bayer MaterialScience AG | Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper |
| TWI640428B (zh) | 2013-02-27 | 2018-11-11 | 拜耳材料科學股份有限公司 | 以丙烯酸酯為基底之保護塗層與黏著劑 |
| EP2772917A1 (de) | 2013-02-27 | 2014-09-03 | Bayer MaterialScience AG | Schutzlacke auf Basis von strahlenvernetzbaren Polyurethandispersionen |
| JP6497850B2 (ja) * | 2013-05-08 | 2019-04-10 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ | ハロー防止層を有するホログラフィック記録媒体およびその製造 |
| CN105814487B (zh) | 2013-10-17 | 2019-11-08 | 科思创德国股份有限公司 | 用于制备全息介质的包含具有低Tg的硼酸盐的光聚合物配制品 |
| TWI684782B (zh) * | 2014-08-01 | 2020-02-11 | 德商拜耳材料科學股份有限公司 | 含光聚合物層與基材層之層狀結構 |
| EP3230261B1 (de) * | 2014-12-12 | 2018-09-05 | Covestro Deutschland AG | Naphthylacrylate als schreibmonomere für photopolymere |
| CN107750379A (zh) * | 2015-06-23 | 2018-03-02 | 科思创德国股份有限公司 | 作为光引发剂的新型三嗪及其制备 |
| EP3166109A1 (de) | 2015-11-09 | 2017-05-10 | Covestro Deutschland AG | Kit-of-parts enthaltend versiegellungsschicht und photopolymer |
| WO2018039331A1 (en) | 2016-08-23 | 2018-03-01 | The Regents Of The University Of Colorado, A Body Corporate | Network polymers and methods of making and using same |
| KR102009421B1 (ko) | 2017-04-25 | 2019-08-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| TW201906730A (zh) | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜 |
| KR20200005738A (ko) | 2017-05-09 | 2020-01-16 | 코베스트로 도이칠란트 아게 | 홀로그래픽 노출용 광중합체 층 및 고내성의 코팅 층을 함유하는 홀로그래픽 매체 |
| TW201906882A (zh) | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 含有用於全像照射的光聚合物層及高度耐性漆層之薄膜結構 |
| EP3401909A1 (de) | 2017-05-09 | 2018-11-14 | Covestro Deutschland AG | Folienaufbau enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
| CN110573968B (zh) | 2017-05-09 | 2021-12-21 | 科思创德国股份有限公司 | 用于保护光致聚合物-膜复合结构中的全息图的由两个可干燥转移的uv-固化涂料层构成的体系 |
| EP3401910A1 (de) | 2017-05-09 | 2018-11-14 | Covestro Deutschland AG | Holographisches medium enthaltend eine photopolymerschicht zur holographischen belichtung und eine lackschicht hoher beständigkeit |
| EP3435156A1 (de) | 2017-07-26 | 2019-01-30 | Covestro Deutschland AG | Schutzschicht für photopolymer |
| KR102268129B1 (ko) * | 2017-10-16 | 2021-06-22 | 주식회사 엘지화학 | 비반응성 불소계 화합물 및 이를 포함하는 광중합성 조성물 |
| EP3495886A1 (de) | 2017-12-06 | 2019-06-12 | Covestro Deutschland AG | Klebstofffreier photopolymerschichtaufbau |
| KR102244648B1 (ko) | 2017-12-08 | 2021-04-26 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102166846B1 (ko) * | 2017-12-11 | 2020-10-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| DE102018207251B4 (de) * | 2018-05-09 | 2025-10-16 | Bundesdruckerei Gmbh | Verfahren zum Herstellen eines Sicherheitselements mit zwei Sicherheitsmerkmalen und Verwendung des Verfahrens |
| US12071515B2 (en) | 2018-06-08 | 2024-08-27 | The Regents Of The University Of Colorado, A Body Corporate | High dynamic range two-stage photopolymers |
| WO2020172154A1 (en) | 2019-02-18 | 2020-08-27 | The Regents Of The University Of Colorado, A Body Corporate | Network polymers and methods of making and using same |
| US20200354594A1 (en) * | 2019-05-08 | 2020-11-12 | Facebook Technologies, Llc | Thermally reversible and reorganizable crosslinking polymers for volume bragg gratings |
| CN111045295B (zh) * | 2019-12-25 | 2023-10-31 | 杭州光粒科技有限公司 | 金属纳米颗粒掺杂的光致聚合物组合物以及光栅 |
| CN113527143B (zh) * | 2020-04-20 | 2023-06-20 | 杭州光粒科技有限公司 | 书写单体及其制备方法以及光致聚合物组合物及其光栅 |
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| EP2218742A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Photopolymerzusammensetzungen als verdruckbare Formulierungen |
| EP2218744A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Methode zur Herstellung von holografischen Photopolymeren auf Polymerfolien |
| EP2219073B1 (de) | 2009-02-17 | 2020-06-03 | Covestro Deutschland AG | Holografische Medien und Photopolymerzusammensetzungen |
| JP2010230911A (ja) * | 2009-03-26 | 2010-10-14 | Tdk Corp | 光学デバイス |
| TWI506018B (zh) * | 2009-11-03 | 2015-11-01 | Bayer Materialscience Ag | 新穎的非結晶甲基丙烯酸酯及其製備和用途 |
| TWI488908B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 製造全像膜的方法 |
| TWI506049B (zh) * | 2009-11-03 | 2015-11-01 | Bayer Materialscience Ag | 具有高折射率和降低之雙鍵密度的丙烯酸胺基甲酸酯 |
| ES2453267T3 (es) * | 2009-11-03 | 2014-04-07 | Bayer Intellectual Property Gmbh | Procedimiento de fabricación de una película holográfica |
| TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
| ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| TW201133264A (en) * | 2009-11-03 | 2011-10-01 | Bayer Materialscience Ag | Method for selecting additives in photopolymers |
| WO2011054793A1 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Verfahren zur herstellung von holographischen medien |
| JP2013510203A (ja) * | 2009-11-03 | 2013-03-21 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフト | 感光性ポリマー組成物における添加剤としてのフルオロウレタン |
| EP2531892B1 (de) * | 2010-02-02 | 2016-01-27 | Covestro Deutschland AG | Verwendung einer photopolymer-formulierung mit triazin-basierten schreibmonomeren |
| EP2531889B1 (de) * | 2010-02-02 | 2020-06-03 | Covestro Deutschland AG | Verwendung einer photopolymer-formulierung mit ester-basierten schreibmonomeren zur herstellung holographischer medien |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| RU2013110226A (ru) * | 2010-08-11 | 2014-09-20 | Байер Интеллектуэль Проперти Гмбх | Дифункциональные (мет)-акрилатные пишущие мономеры |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
-
2010
- 2010-11-02 KR KR1020127014345A patent/KR101782182B1/ko active Active
- 2010-11-02 JP JP2012537366A patent/JP5638085B2/ja active Active
- 2010-11-02 WO PCT/EP2010/066594 patent/WO2011054797A1/de not_active Ceased
- 2010-11-02 CN CN201080060489.1A patent/CN102667935B/zh active Active
- 2010-11-02 EP EP10773075.6A patent/EP2497083B1/de active Active
- 2010-11-02 TW TW099137565A patent/TWI489205B/zh not_active IP Right Cessation
- 2010-11-02 US US13/504,429 patent/US8889322B2/en active Active
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