JP2013510333A5 - - Google Patents
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- JP2013510333A5 JP2013510333A5 JP2012537352A JP2012537352A JP2013510333A5 JP 2013510333 A5 JP2013510333 A5 JP 2013510333A5 JP 2012537352 A JP2012537352 A JP 2012537352A JP 2012537352 A JP2012537352 A JP 2012537352A JP 2013510333 A5 JP2013510333 A5 JP 2013510333A5
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- Prior art keywords
- writing monomer
- polymer composition
- photosensitive polymer
- exposed
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000178 monomer Substances 0.000 claims description 28
- 229920000642 polymer Polymers 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 18
- 239000011159 matrix material Substances 0.000 claims description 9
- 239000000654 additive Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 2
- 239000003054 catalyst Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 239000003381 stabilizer Substances 0.000 claims description 2
- 230000000996 additive effect Effects 0.000 claims 1
- 239000004014 plasticizer Substances 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 4
- 125000000962 organic group Chemical group 0.000 description 4
- 125000005842 heteroatom Chemical group 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09013771.2 | 2009-11-03 | ||
| EP20090013771 EP2317511B1 (de) | 2009-11-03 | 2009-11-03 | Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv |
| PCT/EP2010/066456 WO2011054749A1 (de) | 2009-11-03 | 2010-10-29 | Photopolymerformulierungen mit einstellbarem mechanischem modul guv |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013510333A JP2013510333A (ja) | 2013-03-21 |
| JP2013510333A5 true JP2013510333A5 (enExample) | 2013-12-19 |
| JP5886751B2 JP5886751B2 (ja) | 2016-03-16 |
Family
ID=41667267
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012537352A Active JP5886751B2 (ja) | 2009-11-03 | 2010-10-29 | 調節可能な力学的弾性率ｇｕｖを有する感光性ポリマー組成物 |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US8921012B2 (enExample) |
| EP (1) | EP2317511B1 (enExample) |
| JP (1) | JP5886751B2 (enExample) |
| KR (1) | KR101727352B1 (enExample) |
| CN (1) | CN102792377B (enExample) |
| AT (1) | ATE548730T1 (enExample) |
| BR (1) | BR112012010468A2 (enExample) |
| ES (1) | ES2381808T3 (enExample) |
| PL (1) | PL2317511T3 (enExample) |
| RU (1) | RU2542975C9 (enExample) |
| TW (1) | TWI494691B (enExample) |
| WO (1) | WO2011054749A1 (enExample) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL200996A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Photopolymer formulations having a low crosslinking density |
| CA2738835A1 (en) * | 2008-10-01 | 2010-04-08 | Bayer Materialscience Ag | Prepolymer-based polyurethane formulations for producing holographic media |
| EP2218742A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Photopolymerzusammensetzungen als verdruckbare Formulierungen |
| EP2497085B1 (de) * | 2009-11-03 | 2014-02-12 | Bayer Intellectual Property GmbH | Verfahren zur herstellung eines holographischen films |
| EP2496588B1 (de) * | 2009-11-03 | 2017-01-11 | Covestro Deutschland AG | Urethanacrylate mit hohem brechungsindex und reduzierter doppelbindungsdichte |
| US20120237856A1 (en) * | 2009-11-03 | 2012-09-20 | Bayer Intellectual Property Gmbh | Selection method for additives in photopolymers |
| KR101782182B1 (ko) * | 2009-11-03 | 2017-09-26 | 코베스트로 도이칠란드 아게 | 상이한 기록 공단량체를 갖는 광중합체 제제 |
| ES2433235T3 (es) * | 2009-11-03 | 2013-12-10 | Bayer Intellectual Property Gmbh | Fluorouretanos como aditivos en una formulación de fotopolímero |
| ES2381808T3 (es) * | 2009-11-03 | 2012-05-31 | Bayer Materialscience Ag | Formulaciones de fotopolímeros con módulo mecánico ajustable Guv |
| CN102741925B (zh) * | 2009-11-03 | 2015-12-16 | 拜尔材料科学股份公司 | 生产全息膜的方法 |
| RU2542981C9 (ru) * | 2009-11-03 | 2015-12-10 | Байер Матириальсайенс Аг | Способ изготовления голографических сред |
| TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
| CN102754026B (zh) * | 2010-02-02 | 2015-10-07 | 拜耳知识产权有限责任公司 | 具有酯基书写单体的光聚合物制剂 |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| EP2613319A1 (de) * | 2012-01-05 | 2013-07-10 | Bayer MaterialScience AG | Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht |
| US20140302425A1 (en) * | 2012-04-30 | 2014-10-09 | Bayer Intellectual Property Gmbh | Method for producing holographic media |
| JP6437435B2 (ja) | 2012-08-13 | 2018-12-12 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ | 出力結合素子を有する導光板 |
| EP2700510B1 (de) * | 2012-08-23 | 2015-09-16 | Bayer MaterialScience AG | Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper |
| CN104540685B (zh) * | 2012-08-23 | 2017-09-26 | 科思创德国股份有限公司 | 含有具有全息图的视觉可变窗口的安全文件和/或有价文件 |
| EP3134446B1 (de) * | 2014-04-25 | 2019-04-24 | Covestro Deutschland AG | Aromatische glykolether als schreibmonomere in holographischen photopolymer-formulierungen |
| CN107001246B (zh) * | 2014-12-12 | 2021-02-02 | 科思创德国股份有限公司 | 作为光聚合物用书写单体的萘基丙烯酸酯 |
| US10329244B2 (en) * | 2014-12-19 | 2019-06-25 | Covestro Deutschland Ag | Moisture-stable holographic media |
| KR102723842B1 (ko) | 2015-12-22 | 2024-10-31 | 코베스트로 도이칠란트 아게 | 기재-안내된 재구성 빔으로 부피 반사 홀로그램을 산업적으로 생산하기 위한 장치 및 방법 |
| JP6939799B2 (ja) * | 2016-08-30 | 2021-09-22 | ソニーグループ株式会社 | ホログラム記録用感光性組成物、ホログラム記録媒体及びホログラム |
| KR102009421B1 (ko) * | 2017-04-25 | 2019-08-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| TW201906730A (zh) * | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜 |
| EP3435156A1 (de) * | 2017-07-26 | 2019-01-30 | Covestro Deutschland AG | Schutzschicht für photopolymer |
| KR102156872B1 (ko) * | 2017-09-27 | 2020-09-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102244648B1 (ko) * | 2017-12-08 | 2021-04-26 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102166846B1 (ko) * | 2017-12-11 | 2020-10-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102157366B1 (ko) * | 2017-12-15 | 2021-03-29 | 주식회사 엘지화학 | 염료 화합물 및 포토폴리머 조성물 |
| CN108645336B (zh) * | 2018-05-11 | 2020-06-09 | 赣南师范大学 | 一种无参考光数字全息相机及标定方法 |
| KR102228538B1 (ko) | 2018-06-01 | 2021-03-15 | 주식회사 엘지화학 | 염료 화합물 및 포토폴리머 조성물 |
| KR102239212B1 (ko) * | 2018-12-14 | 2021-04-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
| US11137603B2 (en) * | 2019-06-20 | 2021-10-05 | Facebook Technologies, Llc | Surface-relief grating with patterned refractive index modulation |
| JP7371699B2 (ja) * | 2019-11-19 | 2023-10-31 | 三菱ケミカル株式会社 | 化合物、重合性組成物、重合体、ホログラム記録媒体、光学材料、及び光学部品 |
| US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
| US20210155639A1 (en) * | 2019-11-27 | 2021-05-27 | Facebook Technologies, Llc | Thiophosphate and phosphine sulfide derivatized monomers and polymers for volume bragg gratings |
| US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
| US20220153693A1 (en) * | 2020-11-13 | 2022-05-19 | Facebook Technologies, Llc | Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings |
| WO2024052256A1 (de) | 2022-09-07 | 2024-03-14 | Covestro Deutschland Ag | Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen |
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| EP2496588B1 (de) * | 2009-11-03 | 2017-01-11 | Covestro Deutschland AG | Urethanacrylate mit hohem brechungsindex und reduzierter doppelbindungsdichte |
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| ES2433235T3 (es) * | 2009-11-03 | 2013-12-10 | Bayer Intellectual Property Gmbh | Fluorouretanos como aditivos en una formulación de fotopolímero |
| KR101782182B1 (ko) * | 2009-11-03 | 2017-09-26 | 코베스트로 도이칠란드 아게 | 상이한 기록 공단량체를 갖는 광중합체 제제 |
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| CN102754026B (zh) * | 2010-02-02 | 2015-10-07 | 拜耳知识产权有限责任公司 | 具有酯基书写单体的光聚合物制剂 |
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| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| KR102071721B1 (ko) * | 2010-04-09 | 2020-01-30 | 호야 가부시키가이샤 | 위상 시프트 마스크 블랭크 및 그 제조 방법, 및 위상 시프트 마스크 |
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| EP2450387A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung für die Herstellung holographischer Medien |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
| WO2013053771A1 (de) * | 2011-10-12 | 2013-04-18 | Bayer Intellectual Property Gmbh | Schwefelhaltige kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen |
| EP2766903A1 (de) * | 2011-10-12 | 2014-08-20 | Bayer Intellectual Property GmbH | Kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen |
| US9195215B2 (en) * | 2011-11-29 | 2015-11-24 | Bayer Intellectual Property Gmbh | Holographic medium having a protective layer |
| EP2613318B1 (de) * | 2012-01-05 | 2014-07-30 | Bayer Intellectual Property GmbH | Schichtaufbau mit einer Schutzschicht und einer belichteten Photopolymerschicht |
| EP2613319A1 (de) * | 2012-01-05 | 2013-07-10 | Bayer MaterialScience AG | Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht |
| US20140302425A1 (en) * | 2012-04-30 | 2014-10-09 | Bayer Intellectual Property Gmbh | Method for producing holographic media |
| TWI557187B (zh) * | 2012-05-03 | 2016-11-11 | 拜耳材料科學股份有限公司 | 用於光聚合物之新穎光起始劑 |
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2009
- 2009-11-03 ES ES09013771T patent/ES2381808T3/es active Active
- 2009-11-03 PL PL09013771T patent/PL2317511T3/pl unknown
- 2009-11-03 EP EP20090013771 patent/EP2317511B1/de active Active
- 2009-11-03 AT AT09013771T patent/ATE548730T1/de active
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2010
- 2010-10-29 BR BR112012010468A patent/BR112012010468A2/pt not_active IP Right Cessation
- 2010-10-29 KR KR1020127014344A patent/KR101727352B1/ko active Active
- 2010-10-29 JP JP2012537352A patent/JP5886751B2/ja active Active
- 2010-10-29 CN CN201080060565.9A patent/CN102792377B/zh active Active
- 2010-10-29 WO PCT/EP2010/066456 patent/WO2011054749A1/de not_active Ceased
- 2010-10-29 RU RU2012122586/04A patent/RU2542975C9/ru not_active IP Right Cessation
- 2010-10-29 US US13/505,501 patent/US8921012B2/en active Active
- 2010-11-02 TW TW099137568A patent/TWI494691B/zh active
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2014
- 2014-11-18 US US14/543,963 patent/US9454130B2/en active Active
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