JP2012501941A5 - - Google Patents
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- JP2012501941A5 JP2012501941A5 JP2011525509A JP2011525509A JP2012501941A5 JP 2012501941 A5 JP2012501941 A5 JP 2012501941A5 JP 2011525509 A JP2011525509 A JP 2011525509A JP 2011525509 A JP2011525509 A JP 2011525509A JP 2012501941 A5 JP2012501941 A5 JP 2012501941A5
- Authority
- JP
- Japan
- Prior art keywords
- particles
- dispersion
- och
- independently
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002245 particle Substances 0.000 claims 18
- 239000006185 dispersion Substances 0.000 claims 6
- 229910052760 oxygen Inorganic materials 0.000 claims 6
- 229910052717 sulfur Inorganic materials 0.000 claims 6
- 239000002612 dispersion medium Substances 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims 4
- 239000003607 modifier Substances 0.000 claims 4
- 229910052711 selenium Inorganic materials 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000002131 composite material Substances 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims 2
- 239000011787 zinc oxide Substances 0.000 claims 2
- 239000000010 aprotic solvent Substances 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000000354 decomposition reaction Methods 0.000 claims 1
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 238000002156 mixing Methods 0.000 claims 1
- 229920000307 polymer substrate Polymers 0.000 claims 1
- 230000001376 precipitating effect Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08163703.5 | 2008-09-04 | ||
| EP08163703 | 2008-09-04 | ||
| PCT/EP2009/061103 WO2010026102A1 (de) | 2008-09-04 | 2009-08-28 | Modifizierte partikel und diese enthaltende dispersionen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012501941A JP2012501941A (ja) | 2012-01-26 |
| JP2012501941A5 true JP2012501941A5 (enExample) | 2012-10-11 |
| JP5599797B2 JP5599797B2 (ja) | 2014-10-01 |
Family
ID=41277503
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011525509A Expired - Fee Related JP5599797B2 (ja) | 2008-09-04 | 2009-08-28 | 変性された粒子、及びこれらを含む分散液 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8734899B2 (enExample) |
| EP (1) | EP2321373A1 (enExample) |
| JP (1) | JP5599797B2 (enExample) |
| KR (1) | KR20110066162A (enExample) |
| CN (1) | CN102144004B (enExample) |
| TW (1) | TWI488815B (enExample) |
| WO (1) | WO2010026102A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102271817B (zh) | 2008-12-11 | 2014-10-01 | 巴斯夫欧洲公司 | 从尾矿中富集有价值矿石的方法 |
| US8940814B2 (en) * | 2008-12-12 | 2015-01-27 | Basf Se | Dispersions comprising functionalized oxidic nanoparticles |
| PE20120730A1 (es) | 2009-03-04 | 2012-06-15 | Basf Se | Separacion magnetica de minerales metalicos no ferrosos por acondicionamiento en multiples etapas |
| EP2501472A1 (de) * | 2009-11-20 | 2012-09-26 | Basf Se | Mehrlagenkatalysator zur herstellung von carbonsäuren und/oder carbonsäureanhydriden mit vanadiumantimonat in wenigstens einer katalysatorlage und verfahren zur herstellung von phthalsäureanhydrid mit niedriger hotspottemperatur |
| US9263591B2 (en) | 2009-12-18 | 2016-02-16 | Basf Se | Metal oxide field effect transistors on a mechanically flexible polymer substrate having a die-lectric that can be processed from solution at low temperatures |
| US20110230668A1 (en) * | 2010-03-19 | 2011-09-22 | Basf Se | Catalyst for gas phase oxidations based on low-sulfur and low-calcium titanium dioxide |
| US8901320B2 (en) | 2010-04-13 | 2014-12-02 | Basf Se | Process for controlling a gas phase oxidation reactor for preparation of phthalic anhydride |
| WO2011133228A2 (en) | 2010-04-23 | 2011-10-27 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
| CN102858690B (zh) | 2010-04-28 | 2014-11-05 | 巴斯夫欧洲公司 | 制备呈溶液的锌配合物的方法 |
| US8865000B2 (en) | 2010-06-11 | 2014-10-21 | Basf Se | Utilization of the naturally occurring magnetic constituents of ores |
| US8859459B2 (en) | 2010-06-30 | 2014-10-14 | Basf Se | Multilayer catalyst for preparing phthalic anhydride and process for preparing phthalic anhydride |
| US9212157B2 (en) | 2010-07-30 | 2015-12-15 | Basf Se | Catalyst for the oxidation of o-xylene and/or naphthalene to phthalic anhydride |
| US9376457B2 (en) | 2010-09-03 | 2016-06-28 | Basf Se | Hydrophobic, functionalized particles |
| US8920675B2 (en) | 2010-10-27 | 2014-12-30 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
| US9359689B2 (en) | 2011-10-26 | 2016-06-07 | Pixelligent Technologies, Llc | Synthesis, capping and dispersion of nanocrystals |
| KR101978835B1 (ko) * | 2012-03-16 | 2019-05-15 | 한국전자통신연구원 | 박막 트랜지스터 |
| JP6108563B2 (ja) * | 2013-02-04 | 2017-04-05 | 国立研究開発法人産業技術総合研究所 | 抵抗体、誘電体等の電子部品用無機材料ペースト及び該無機材料ペーストの製造方法 |
| FI130559B (en) * | 2021-06-23 | 2023-11-21 | Turun Yliopisto | Semiconductor structure, semiconductor device, and method |
| KR102756449B1 (ko) * | 2022-02-11 | 2025-01-21 | 한인정밀화학(주) | 양자점 조성물, 이로부터 형성된 경화 패턴, 및 이를 포함하는 디스플레이 장치 |
| CN118039856A (zh) * | 2024-02-19 | 2024-05-14 | 贵州大学 | 锂电池用包覆及掺杂改性的高镍正极材料和低温电解液 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2303330A (en) | 1942-02-02 | 1942-12-01 | New Jersey Zinc Co | Zinc oxide |
| DE19907704A1 (de) * | 1999-02-23 | 2000-08-24 | Bayer Ag | Nanopartikuläres, redispergierbares Fällungszinkoxid |
| DE10063092A1 (de) | 2000-12-18 | 2002-06-20 | Henkel Kgaa | Nanoskalige Materialien in Hygiene-Produkten |
| JP2003073122A (ja) * | 2001-09-04 | 2003-03-12 | Mitsui Chemicals Inc | 無機微粒子分散液及びそれを用いて製造される複合材料組成物 |
| US7553512B2 (en) | 2001-11-02 | 2009-06-30 | Cabot Corporation | Method for fabricating an inorganic resistor |
| JP2004010807A (ja) * | 2002-06-10 | 2004-01-15 | Toyo Ink Mfg Co Ltd | 水性分散体の製造方法 |
| US20050182153A1 (en) * | 2002-06-12 | 2005-08-18 | Koji Yokoi | Porous metal oxide material in flake form, method for producing the same and cosmetic, coating material resin composition ink composition and paper comprising the same |
| JP2004182483A (ja) * | 2002-11-29 | 2004-07-02 | Mitsubishi Chemicals Corp | 酸化亜鉛超微粒子の製造方法 |
| DE10257388A1 (de) | 2002-12-06 | 2004-06-24 | Sustech Gmbh & Co. Kg | Nanopartikuläres redispergierbares Zinkoxidpulver |
| DE10304849A1 (de) * | 2003-02-06 | 2004-08-19 | Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung | Chemomechanische Herstellung von Funktionskolloiden |
| WO2004087577A1 (ja) | 2003-03-31 | 2004-10-14 | Toto Ltd. | 表面改質二酸化チタン微粒子とその分散液、およびその製造方法 |
| JP5014796B2 (ja) * | 2004-09-30 | 2012-08-29 | 株式会社カネカ | ポリマー修飾金属カルコゲン化物ナノ粒子の製造方法 |
| DE102004048230A1 (de) * | 2004-10-04 | 2006-04-06 | Institut für Neue Materialien Gemeinnützige GmbH | Verfahren zur Herstellung von Nanopartikeln mit maßgeschneiderter Oberflächenchemie und entsprechenden Kolloiden |
| DE102005007374A1 (de) | 2005-02-17 | 2006-08-24 | Universität Ulm | Nanopartikel und deren Verwendung |
| JP4918994B2 (ja) * | 2005-05-30 | 2012-04-18 | 住友電気工業株式会社 | 金属被膜の形成方法および金属配線 |
| DE102005047807A1 (de) | 2005-06-04 | 2006-12-07 | Solvay Infra Bad Hönningen GmbH | Modifizierte Nanopartikel |
| US7402506B2 (en) | 2005-06-16 | 2008-07-22 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| US7691666B2 (en) * | 2005-06-16 | 2010-04-06 | Eastman Kodak Company | Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| JP4738931B2 (ja) * | 2005-07-29 | 2011-08-03 | 富士フイルム株式会社 | ナノ粒子分散液、それを用いた半導体デバイスの製造方法及び半導体デバイス |
| KR100768632B1 (ko) * | 2006-10-30 | 2007-10-18 | 삼성전자주식회사 | 나노입자의 분산방법 및 이를 이용한 나노입자 박막의제조방법 |
| KR20080108767A (ko) * | 2007-06-11 | 2008-12-16 | 삼성에스디아이 주식회사 | 전극 단자부 코팅재 및 이를 구비한 플라즈마 디스플레이패널 |
-
2009
- 2009-08-28 KR KR1020117007826A patent/KR20110066162A/ko not_active Abandoned
- 2009-08-28 WO PCT/EP2009/061103 patent/WO2010026102A1/de not_active Ceased
- 2009-08-28 EP EP09782305A patent/EP2321373A1/de not_active Withdrawn
- 2009-08-28 JP JP2011525509A patent/JP5599797B2/ja not_active Expired - Fee Related
- 2009-08-28 US US13/062,229 patent/US8734899B2/en not_active Expired - Fee Related
- 2009-08-28 CN CN200980134455.XA patent/CN102144004B/zh not_active Expired - Fee Related
- 2009-09-03 TW TW098129750A patent/TWI488815B/zh not_active IP Right Cessation
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