JP2012036021A - 誘電体セラミック、及び積層セラミックコンデンサ - Google Patents
誘電体セラミック、及び積層セラミックコンデンサ Download PDFInfo
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- JP2012036021A JP2012036021A JP2010175376A JP2010175376A JP2012036021A JP 2012036021 A JP2012036021 A JP 2012036021A JP 2010175376 A JP2010175376 A JP 2010175376A JP 2010175376 A JP2010175376 A JP 2010175376A JP 2012036021 A JP2012036021 A JP 2012036021A
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- 239000000919 ceramic Substances 0.000 title claims abstract description 78
- 239000003985 ceramic capacitor Substances 0.000 title claims abstract description 30
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 18
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 18
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 18
- 229910002113 barium titanate Inorganic materials 0.000 claims abstract description 14
- 150000001875 compounds Chemical class 0.000 claims abstract description 14
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000002245 particle Substances 0.000 claims description 38
- 229910052791 calcium Inorganic materials 0.000 claims description 13
- -1 barium titanate compound Chemical class 0.000 claims description 11
- 229910052788 barium Inorganic materials 0.000 claims description 9
- 229910052712 strontium Inorganic materials 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 229910052684 Cerium Inorganic materials 0.000 claims description 5
- 229910052746 lanthanum Inorganic materials 0.000 claims description 5
- 229910052748 manganese Inorganic materials 0.000 claims description 5
- 229910052727 yttrium Inorganic materials 0.000 claims description 5
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 4
- 229910052691 Erbium Inorganic materials 0.000 claims description 4
- 229910052693 Europium Inorganic materials 0.000 claims description 4
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 4
- 229910052689 Holmium Inorganic materials 0.000 claims description 4
- 229910052765 Lutetium Inorganic materials 0.000 claims description 4
- 229910052779 Neodymium Inorganic materials 0.000 claims description 4
- 229910052777 Praseodymium Inorganic materials 0.000 claims description 4
- 229910052772 Samarium Inorganic materials 0.000 claims description 4
- 229910052771 Terbium Inorganic materials 0.000 claims description 4
- 229910052775 Thulium Inorganic materials 0.000 claims description 4
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 4
- 229910052744 lithium Inorganic materials 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- 230000035939 shock Effects 0.000 abstract description 22
- 238000009413 insulation Methods 0.000 abstract description 18
- 230000002829 reductive effect Effects 0.000 abstract description 2
- 239000000470 constituent Substances 0.000 abstract 1
- 230000000254 damaging effect Effects 0.000 abstract 1
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 31
- 229910018464 Al—Mg—Si Inorganic materials 0.000 description 26
- 239000000843 powder Substances 0.000 description 23
- 238000000034 method Methods 0.000 description 16
- 239000000203 mixture Substances 0.000 description 16
- 239000002994 raw material Substances 0.000 description 14
- 229910002077 partially stabilized zirconia Inorganic materials 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 229910004298 SiO 2 Inorganic materials 0.000 description 10
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 9
- 230000002950 deficient Effects 0.000 description 9
- 229910052761 rare earth metal Inorganic materials 0.000 description 8
- 238000013507 mapping Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 230000007547 defect Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- 229910052726 zirconium Inorganic materials 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052735 hafnium Inorganic materials 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 229910010293 ceramic material Inorganic materials 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000005204 segregation Methods 0.000 description 3
- 229910018134 Al-Mg Inorganic materials 0.000 description 2
- 229910018467 Al—Mg Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000002075 main ingredient Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- AREPHAPHABGCQP-UHFFFAOYSA-N 1-(dimethylamino)-3-[2-[2-(4-methoxyphenyl)ethyl]phenoxy]propan-2-ol Chemical compound C1=CC(OC)=CC=C1CCC1=CC=CC=C1OCC(O)CN(C)C AREPHAPHABGCQP-UHFFFAOYSA-N 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
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- C04B35/468—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates
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Abstract
【解決手段】誘電体セラミックが、一般式ABO3で表されるチタン酸バリウム系化合物を主成分とし、Al、Mg、及びSiを含有した結晶性酸化物が、二次相粒子として存在している。そして、誘電体層6a〜6gは上記誘電体セラミックで形成されている。
【選択図】図1
Description
(i)Al、Mg、Siの各元素が略同一箇所に存在すること
(ii)(i)において、Al、Mg、Siの各元素の含有量総計が、酸素原子を除いて50モル%以上であること
(iii)(i)において、Al、Mg、Siの各元素が、酸素原子を除いて単独でそれぞれ5モル%以上であること
の3要件を満たすことにより、Al−Mg−Si酸化物が二次相粒子として存在すると認められ、これにより上述した作用効果を奏することができる。
(試料番号1)
セラミック素原料として、BaCO3、TiO2を所定量秤量し、これら秤量物をPSZボール及び純水と共にボールミルに投入し、十分に湿式で混合粉砕し、乾燥させた後、1150℃の温度で約2時間、熱処理を行い、これにより平均粒径0.15μmのBa1.003TiO3からなる主成分粉末を作製した。
試料番号1と同様の方法・手順で、Ba1.003TiO3を作製した。
試料番号1、2について、以下の方法で誘電率、絶縁抵抗、静電容量の温度特性、耐熱衝撃性及び高温負荷特性を評価した。
6a〜6g 誘電体層
Claims (5)
- 一般式ABO3で表されるチタン酸バリウム系化合物を主成分とし、
Al、Mg、及びSiを含有した結晶性酸化物が、二次相粒子として存在していることを特徴とする誘電体セラミック。 - 前記チタン酸バリウム系化合物は、Aサイトが、Baを78〜100モル%、Srを0〜2モル%、Caを0〜20モル%の範囲で含有し、Bサイトが、Tiを96〜100モル%、Zrを0〜2モル%、Hfを0〜2モル%の範囲で含有することを特徴とする請求項1記載の誘電体セラミック。
- Ba及びCaのうちの少なくとも1種の元素M1、La、Ce、Pr、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu及びYの中から選択された少なくとも1種の元素R、及びMn、Ni、Co、Fe、Cr、Cu、Mg、Li、Al、Si、Mo、W及びVの中から選択された少なくとも1種の元素M2のうちのいずれかを含有し、
前記元素M1の含有量は、前記主成分100モル部に対し0.2〜3モル部であり、前記元素Rの含有量は、前記主成分100モル部に対し0.1〜3モル部であり、前記元素M2の含有量は、前記主成分100モル部に対し0.2〜5モル部であることを特徴とする請求項1又は請求項2記載の誘電体セラミック。 - 誘電体層と内部電極とが交互に積層されてなる積層セラミックコンデンサにおいて、
前記誘電体層が、請求項1乃至請求項3のいずれかに記載の誘電体セラミックで形成されていることを特徴とする積層セラミックコンデンサ。 - 前記内部電極が、Niを主成分としていることを特徴とする請求項4記載の積層セラミックコンデンサ。
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JP2010175376A JP5224074B2 (ja) | 2010-08-04 | 2010-08-04 | 誘電体セラミック、及び積層セラミックコンデンサ |
CN201110216949.1A CN102372484B (zh) | 2010-08-04 | 2011-07-29 | 电介质陶瓷和层叠陶瓷电容器 |
US13/195,147 US8673798B2 (en) | 2010-08-04 | 2011-08-01 | Dielectric ceramic and laminated ceramic capacitor |
KR1020110076852A KR101189908B1 (ko) | 2010-08-04 | 2011-08-02 | 유전체 세라믹, 및 적층 세라믹 콘덴서 |
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WO2023218955A1 (ja) * | 2022-05-12 | 2023-11-16 | 株式会社村田製作所 | 積層セラミックコンデンサ |
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KR20120013195A (ko) | 2012-02-14 |
US20120033344A1 (en) | 2012-02-09 |
CN102372484B (zh) | 2016-05-04 |
CN102372484A (zh) | 2012-03-14 |
KR101189908B1 (ko) | 2012-10-10 |
US8673798B2 (en) | 2014-03-18 |
JP5224074B2 (ja) | 2013-07-03 |
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