JP2011530652A5 - - Google Patents
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- Publication number
- JP2011530652A5 JP2011530652A5 JP2011522047A JP2011522047A JP2011530652A5 JP 2011530652 A5 JP2011530652 A5 JP 2011530652A5 JP 2011522047 A JP2011522047 A JP 2011522047A JP 2011522047 A JP2011522047 A JP 2011522047A JP 2011530652 A5 JP2011530652 A5 JP 2011530652A5
- Authority
- JP
- Japan
- Prior art keywords
- acrylate
- meth
- carboxylate
- metal
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 59
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- -1 oxy, thio Chemical group 0.000 claims description 16
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052758 niobium Inorganic materials 0.000 claims description 8
- 239000010955 niobium Substances 0.000 claims description 8
- 229910052726 zirconium Inorganic materials 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 6
- 239000002243 precursor Substances 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- JRALHSJVDAZMAH-UHFFFAOYSA-N C(C=C)(=O)O[GeH3] Chemical compound C(C=C)(=O)O[GeH3] JRALHSJVDAZMAH-UHFFFAOYSA-N 0.000 claims description 4
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- IEZZIYKTEBHBRQ-UHFFFAOYSA-L but-3-enoate hafnium(4+) oxygen(2-) Chemical compound C(=C)CC(=O)[O-].C(=C)CC(=O)[O-].[O-2].[Hf+4] IEZZIYKTEBHBRQ-UHFFFAOYSA-L 0.000 claims description 3
- HXDFSRUSLMZJEN-UHFFFAOYSA-L but-3-enoate oxygen(2-) titanium(4+) Chemical compound C(=C)CC(=O)[O-].C(=C)CC(=O)[O-].[O-2].[Ti+4] HXDFSRUSLMZJEN-UHFFFAOYSA-L 0.000 claims description 3
- IJBFRXAGQXANTD-UHFFFAOYSA-N ethenyl acetate;hafnium Chemical compound [Hf].CC(=O)OC=C IJBFRXAGQXANTD-UHFFFAOYSA-N 0.000 claims description 3
- DCDITIFKQFNPHX-UHFFFAOYSA-N ethenyl acetate;titanium Chemical compound [Ti].CC(=O)OC=C DCDITIFKQFNPHX-UHFFFAOYSA-N 0.000 claims description 3
- LIIWPMGRDQVHJQ-UHFFFAOYSA-N ethenyl acetate;zirconium Chemical compound [Zr].CC(=O)OC=C LIIWPMGRDQVHJQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910000078 germane Inorganic materials 0.000 claims description 3
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- UCXFJGMSJQNRDJ-UHFFFAOYSA-J 2-bromo-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carboxylate hafnium(4+) Chemical compound [Hf+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br UCXFJGMSJQNRDJ-UHFFFAOYSA-J 0.000 claims description 2
- VXCWFNCPUBWGJG-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid zirconium Chemical compound [Zr].OC(=O)CCOC(=O)C=C.OC(=O)CCOC(=O)C=C.OC(=O)CCOC(=O)C=C.OC(=O)CCOC(=O)C=C VXCWFNCPUBWGJG-UHFFFAOYSA-N 0.000 claims description 2
- ZSSWJEIYDJGJRA-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid;tantalum Chemical compound [Ta].OC(=O)CCOC(=O)C=C ZSSWJEIYDJGJRA-UHFFFAOYSA-N 0.000 claims description 2
- QSAWSTOTHRARBS-UHFFFAOYSA-N 3-prop-2-enoyloxypropanoic acid;titanium Chemical compound [Ti].OC(=O)CCOC(=O)C=C QSAWSTOTHRARBS-UHFFFAOYSA-N 0.000 claims description 2
- MABJZCQTALLEGQ-UHFFFAOYSA-N C(CCC)O[Ge](OC(C(=C)C)=O)(OC(C(=C)C)=O)OCCCC Chemical compound C(CCC)O[Ge](OC(C(=C)C)=O)(OC(C(=C)C)=O)OCCCC MABJZCQTALLEGQ-UHFFFAOYSA-N 0.000 claims description 2
- UYKLIWZPRMRNDQ-IITHXBDYSA-J C1=C(C=CC2=CC=CC=C12)[S-].CS(=O)(=O)O[C@@]12C(C[C@@H](CC1)C2(C)C)=O.[Zr+4].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-] Chemical compound C1=C(C=CC2=CC=CC=C12)[S-].CS(=O)(=O)O[C@@]12C(C[C@@H](CC1)C2(C)C)=O.[Zr+4].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-] UYKLIWZPRMRNDQ-IITHXBDYSA-J 0.000 claims description 2
- BZWCKTVNRBTCQP-YZUKSGEXSA-N CC(C)([C@H](CC1)CC2=O)[C@@]12OS(C)(=O)=O.SC1=CC2=CC=CC=C2C=C1 Chemical compound CC(C)([C@H](CC1)CC2=O)[C@@]12OS(C)(=O)=O.SC1=CC2=CC=CC=C2C=C1 BZWCKTVNRBTCQP-YZUKSGEXSA-N 0.000 claims description 2
- QBCQKFGJPPBHLN-UHFFFAOYSA-I [Ta+5].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br Chemical compound [Ta+5].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br QBCQKFGJPPBHLN-UHFFFAOYSA-I 0.000 claims description 2
- XYHFOGFBDCDCBS-UHFFFAOYSA-I [Ta+5].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 Chemical compound [Ta+5].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 XYHFOGFBDCDCBS-UHFFFAOYSA-I 0.000 claims description 2
- FDBUONQYVUSEGA-UHFFFAOYSA-J [Ti+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br Chemical compound [Ti+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br FDBUONQYVUSEGA-UHFFFAOYSA-J 0.000 claims description 2
- SRSZLIFGDFXEBE-UHFFFAOYSA-J [Ti+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 Chemical compound [Ti+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 SRSZLIFGDFXEBE-UHFFFAOYSA-J 0.000 claims description 2
- GRNSGUXSBNAART-UHFFFAOYSA-J [Zr+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 Chemical compound [Zr+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 GRNSGUXSBNAART-UHFFFAOYSA-J 0.000 claims description 2
- AMRRNBRZCNLQBA-UHFFFAOYSA-K aluminum 2-bromo-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carboxylate Chemical compound [Al+3].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br AMRRNBRZCNLQBA-UHFFFAOYSA-K 0.000 claims description 2
- NPPKLNJUOJIWFW-UHFFFAOYSA-K bis(3-oxatricyclo[3.2.1.02,4]octane-6-carbonyloxy)alumanyl 3-oxatricyclo[3.2.1.02,4]octane-6-carboxylate Chemical compound [Al+3].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 NPPKLNJUOJIWFW-UHFFFAOYSA-K 0.000 claims description 2
- CKEGKURXFKLBDX-UHFFFAOYSA-N butan-1-ol;hafnium Chemical compound [Hf].CCCCO.CCCCO.CCCCO.CCCCO CKEGKURXFKLBDX-UHFFFAOYSA-N 0.000 claims description 2
- PVZMSIQWTGPSHJ-UHFFFAOYSA-N butan-1-ol;tantalum Chemical compound [Ta].CCCCO.CCCCO.CCCCO.CCCCO.CCCCO PVZMSIQWTGPSHJ-UHFFFAOYSA-N 0.000 claims description 2
- DINQVNXOZUORJS-UHFFFAOYSA-N butan-1-olate;niobium(5+) Chemical compound [Nb+5].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] DINQVNXOZUORJS-UHFFFAOYSA-N 0.000 claims description 2
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 claims description 2
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 claims description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 claims description 2
- NSANGDPBUXTZLU-UHFFFAOYSA-N ethenyl acetate;niobium Chemical compound [Nb].CC(=O)OC=C NSANGDPBUXTZLU-UHFFFAOYSA-N 0.000 claims description 2
- CEWRRSHXODUOEA-UHFFFAOYSA-N ethenyl acetate;tantalum Chemical compound [Ta].CC(=O)OC=C CEWRRSHXODUOEA-UHFFFAOYSA-N 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- OKOAUMOHCRQSOV-UHFFFAOYSA-J hafnium(4+) 3-oxatricyclo[3.2.1.02,4]octane-6-carboxylate Chemical compound [Hf+4].[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21.[O-]C(=O)C1CC2CC1C1OC21 OKOAUMOHCRQSOV-UHFFFAOYSA-J 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- AWGVROXZUWZNIG-UHFFFAOYSA-N hafnium;3-prop-2-enoyloxypropanoic acid Chemical compound [Hf].OC(=O)CCOC(=O)C=C AWGVROXZUWZNIG-UHFFFAOYSA-N 0.000 claims description 2
- MYCXXYXQXKLHFN-UHFFFAOYSA-N niobium;3-prop-2-enoyloxypropanoic acid Chemical compound [Nb].OC(=O)CCOC(=O)C=C MYCXXYXQXKLHFN-UHFFFAOYSA-N 0.000 claims description 2
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 claims description 2
- DYWSVUBJGFTOQC-UHFFFAOYSA-N xi-2-Ethylheptanoic acid Chemical compound CCCCCC(CC)C(O)=O DYWSVUBJGFTOQC-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 12
- 125000000524 functional group Chemical group 0.000 claims 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 229910052738 indium Inorganic materials 0.000 claims 4
- 239000003446 ligand Substances 0.000 claims 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 3
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 3
- 229920002554 vinyl polymer Polymers 0.000 claims 3
- 229910052693 Europium Inorganic materials 0.000 claims 2
- 229910052688 Gadolinium Inorganic materials 0.000 claims 2
- 229910052779 Neodymium Inorganic materials 0.000 claims 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 2
- 229910052772 Samarium Inorganic materials 0.000 claims 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- 229910052787 antimony Inorganic materials 0.000 claims 2
- 229910052785 arsenic Inorganic materials 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052788 barium Inorganic materials 0.000 claims 2
- 238000009739 binding Methods 0.000 claims 2
- 229910052791 calcium Inorganic materials 0.000 claims 2
- 229910052804 chromium Inorganic materials 0.000 claims 2
- 229910052802 copper Inorganic materials 0.000 claims 2
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 2
- 150000002118 epoxides Chemical class 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 2
- 229910052742 iron Inorganic materials 0.000 claims 2
- 229910052745 lead Inorganic materials 0.000 claims 2
- 229910052748 manganese Inorganic materials 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052763 palladium Inorganic materials 0.000 claims 2
- 229910052697 platinum Inorganic materials 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 125000005504 styryl group Chemical group 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- 229910052716 thallium Inorganic materials 0.000 claims 2
- 229910052718 tin Inorganic materials 0.000 claims 2
- 229910052720 vanadium Inorganic materials 0.000 claims 2
- 229910052725 zinc Inorganic materials 0.000 claims 2
- PNBIMJYQLLNKQY-IITHXBDYSA-J C1=C(C=CC2=CC=CC=C12)[S-].CS(=O)(=O)O[C@@]12C(C[C@@H](CC1)C2(C)C)=O.[Hf+4].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-] Chemical compound C1=C(C=CC2=CC=CC=C12)[S-].CS(=O)(=O)O[C@@]12C(C[C@@H](CC1)C2(C)C)=O.[Hf+4].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-].C2=C(C=CC1=CC=CC=C21)[S-] PNBIMJYQLLNKQY-IITHXBDYSA-J 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 241000006460 Cyana Species 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims 1
- NBQPTPWLHFPJCC-UHFFFAOYSA-N N#CS[N-]N=C=[S+]N=C=O Chemical class N#CS[N-]N=C=[S+]N=C=O NBQPTPWLHFPJCC-UHFFFAOYSA-N 0.000 claims 1
- 229910002651 NO3 Inorganic materials 0.000 claims 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 1
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical group O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N Nitrogen dioxide Chemical compound O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical group OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- OBLMVUQQGJTRSA-UHFFFAOYSA-J [Zr+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br Chemical compound [Zr+4].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br OBLMVUQQGJTRSA-UHFFFAOYSA-J 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000000304 alkynyl group Chemical group 0.000 claims 1
- LIQDVINWFSWENU-UHFFFAOYSA-K aluminum;prop-2-enoate Chemical compound [Al+3].[O-]C(=O)C=C.[O-]C(=O)C=C.[O-]C(=O)C=C LIQDVINWFSWENU-UHFFFAOYSA-K 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims 1
- 150000001540 azides Chemical class 0.000 claims 1
- JESWDXIHOJGWBP-UHFFFAOYSA-N bicyclo[2.2.1]heptane-3-carboxylic acid Chemical compound C1CC2C(C(=O)O)CC1C2 JESWDXIHOJGWBP-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 150000004985 diamines Chemical class 0.000 claims 1
- YASNYMOWPQKVTK-UHFFFAOYSA-N diarsane Chemical compound [AsH2][AsH2] YASNYMOWPQKVTK-UHFFFAOYSA-N 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000001072 heteroaryl group Chemical group 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 239000002105 nanoparticle Substances 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000004001 thioalkyl group Chemical group 0.000 claims 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- TUYAYQSYGXMTGC-UHFFFAOYSA-N 3-oxatricyclo[3.2.1.02,4]octane-6-carboxylic acid Chemical compound OC(=O)C1CC2C3OC3C1C2 TUYAYQSYGXMTGC-UHFFFAOYSA-N 0.000 description 1
- LUVAQAGMHUTQQE-UHFFFAOYSA-I C(C=C)(=O)[O-].[Ta+5].C(C=C)(=O)[O-].C(C=C)(=O)[O-].C(C=C)(=O)[O-].C(C=C)(=O)[O-] Chemical compound C(C=C)(=O)[O-].[Ta+5].C(C=C)(=O)[O-].C(C=C)(=O)[O-].C(C=C)(=O)[O-].C(C=C)(=O)[O-] LUVAQAGMHUTQQE-UHFFFAOYSA-I 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- NGBOURMYWRXWDG-UHFFFAOYSA-I [Nb+5].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br Chemical compound [Nb+5].[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br.[O-]C(=O)C1C2CC3C(OC(=O)C13)C2Br NGBOURMYWRXWDG-UHFFFAOYSA-I 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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| US18818208P | 2008-08-07 | 2008-08-07 | |
| US61/188,182 | 2008-08-07 | ||
| PCT/US2009/003841 WO2010059174A1 (en) | 2008-08-07 | 2009-06-27 | Metal compositions and methods of making same |
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| JP2011530652A JP2011530652A (ja) | 2011-12-22 |
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Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10131793B2 (en) | 2011-02-02 | 2018-11-20 | Advenira Enterprises, Inc. | Modified hybrid sol-gel solutions and compositions formed from such solutions |
| CA2825214C (en) * | 2011-02-02 | 2017-07-04 | Advenira Enterprises, Inc. | Solution derived nanocomposite precursor solutions, methods for making thin films and thin films made by such methods |
| JP5708521B2 (ja) * | 2011-02-15 | 2015-04-30 | 信越化学工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
| CN102605355B (zh) * | 2012-02-21 | 2014-07-02 | 北京化工大学 | 基材表面的铜膜、其制备方法及应用 |
| JPWO2013145043A1 (ja) * | 2012-03-27 | 2015-08-03 | パナソニックＩｐマネジメント株式会社 | ビルドアップ基板およびその製造方法ならびに半導体集積回路パッケージ |
| KR101486888B1 (ko) | 2013-05-20 | 2015-01-27 | 한국기계연구원 | 금속산화박막 패턴형성용 코팅제 및 나노임프린트를 이용한 금속산화박막 패턴형성방법 |
| GB201319263D0 (en) * | 2013-10-31 | 2013-12-18 | Montanuniversit T Leoben | Method of manufacturing an electrically conductive or semiconductive structure and electronic device comprising the same |
| JP6196897B2 (ja) | 2013-12-05 | 2017-09-13 | 東京応化工業株式会社 | ネガ型レジスト組成物、レジストパターン形成方法及び錯体 |
| KR20170059992A (ko) * | 2014-09-17 | 2017-05-31 | 제이에스알 가부시끼가이샤 | 패턴 형성 방법 |
| KR101911300B1 (ko) | 2014-10-08 | 2018-10-24 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 조성물과, 이를 이용한, 레지스트막, 마스크 블랭크, 레지스트 패턴 형성 방법, 및 전자 디바이스의 제조 방법 |
| WO2016194285A1 (ja) | 2015-06-03 | 2016-12-08 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置、膜形成ユニット、基板処理方法および膜形成方法 |
| JP6618334B2 (ja) | 2015-06-03 | 2019-12-11 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置、膜形成ユニット、基板処理方法および膜形成方法 |
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| US10941163B2 (en) | 2015-09-29 | 2021-03-09 | Pryog, Llc | Metal compositions and methods of making same |
| JP6742748B2 (ja) * | 2016-02-17 | 2020-08-19 | 株式会社Ｓｃｒｅｅｎホールディングス | 現像ユニット、基板処理装置、現像方法および基板処理方法 |
| JP7002895B2 (ja) * | 2016-09-30 | 2022-01-20 | 東友ファインケム株式会社 | ハードコーティング組成物及びこれを用いたハードコーティングフィルム |
| JP6980993B2 (ja) * | 2016-10-06 | 2021-12-15 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| DE102016125667A1 (de) * | 2016-12-23 | 2018-06-28 | Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh | Zusammensetzung zur photochemischen Abscheidung von Metallen |
| AU2018246251A1 (en) * | 2017-03-29 | 2019-10-17 | Ih Ip Holdings Limited | Methods for increasing hydrogen trapping vacancies in materials |
| JP7140686B2 (ja) * | 2017-09-11 | 2022-09-21 | フジフイルム エレクトロニック マテリアルズ ユー．エス．エー．， インコーポレイテッド | 誘電フィルム形成用組成物 |
| KR102307977B1 (ko) | 2018-07-31 | 2021-09-30 | 삼성에스디아이 주식회사 | 반도체 레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| US11092889B2 (en) | 2018-07-31 | 2021-08-17 | Samsung Sdi Co., Ltd. | Semiconductor resist composition, and method of forming patterns using the composition |
| US11092890B2 (en) | 2018-07-31 | 2021-08-17 | Samsung Sdi Co., Ltd. | Semiconductor resist composition, and method of forming patterns using the composition |
| CN112313745B (zh) * | 2018-08-09 | 2022-07-05 | 三菱化学株式会社 | 全息记录介质用组合物和全息记录介质 |
| US12601974B2 (en) * | 2019-06-28 | 2026-04-14 | Lam Research Corporation | Bake strategies to enhance lithographic performance of metal-containing resist |
| JP7334683B2 (ja) | 2019-08-02 | 2023-08-29 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
| JP7334684B2 (ja) | 2019-08-02 | 2023-08-29 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| WO2021029224A1 (ja) * | 2019-08-13 | 2021-02-18 | Jsr株式会社 | レジストパターン形成方法及び上層膜形成用組成物 |
| JP7351257B2 (ja) | 2019-08-14 | 2023-09-27 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP7354954B2 (ja) | 2019-09-04 | 2023-10-03 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| JP6831889B2 (ja) * | 2019-10-11 | 2021-02-17 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および基板処理方法 |
| KR102446362B1 (ko) | 2019-10-15 | 2022-09-21 | 삼성에스디아이 주식회사 | 반도체 포토 레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| JP7622544B2 (ja) | 2020-05-18 | 2025-01-28 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料及びパターン形成方法 |
| JP2023530299A (ja) | 2020-06-22 | 2023-07-14 | ラム リサーチ コーポレーション | 金属含有フォトレジスト堆積のための表面改質 |
| US12110592B2 (en) | 2020-09-18 | 2024-10-08 | International Business Machines Corporation | Generating metal-oxide film |
| JP7484846B2 (ja) | 2020-09-28 | 2024-05-16 | 信越化学工業株式会社 | 分子レジスト組成物及びパターン形成方法 |
| JP7837965B2 (ja) * | 2021-06-01 | 2026-03-31 | 東京エレクトロン株式会社 | フォトレジスト組成物、レジストパターンを形成する方法、半導体装置を製造する方法、及び基板処理装置 |
| US12032291B2 (en) * | 2021-06-15 | 2024-07-09 | Inpria Corporation | Organotin patterning materials with ligands having silicon/germanium; precursor compositions; and synthesis methods |
| JP7823536B2 (ja) | 2021-11-02 | 2026-03-04 | 信越化学工業株式会社 | 分子レジスト組成物及びパターン形成方法 |
| CN114317076B (zh) * | 2021-12-14 | 2022-10-25 | 菏泽学院 | 一种同核异壳纳米颗粒电流变液及其制备方法 |
Family Cites Families (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2502411A (en) | 1947-08-18 | 1950-04-04 | Rohm & Haas | Zirconyl acrylates |
| NL288151A (enExample) | 1961-08-31 | 1900-01-01 | ||
| US3379702A (en) | 1965-06-14 | 1968-04-23 | Dow Chemical Co | Method for preparing terpolymers of ethylene, acrylic acids and salts of acrylic acids |
| US3705137A (en) | 1969-12-04 | 1972-12-05 | Mitsui Mining & Smelting Co | Precipitation copolymerization of metal salts of unsaturated carboxylic acids |
| US3672942A (en) | 1969-12-24 | 1972-06-27 | Loctite Corp | Process for impregnating porous metal articles |
| US4022960A (en) | 1971-03-15 | 1977-05-10 | Agency Of Industrial Science & Technology | Polymers with high transparency and refractive index and process for production thereof |
| US4129524A (en) | 1976-07-16 | 1978-12-12 | Kyowa Gas Chemical Industry Co., Ltd. | Radiation shielding material and a process for producing the same |
| US4127524A (en) * | 1977-06-16 | 1978-11-28 | Coy David Howard | Novel dodecapeptides, intermediates therefor, and compositions and methods employing said dodecapeptides |
| US4429094A (en) * | 1981-04-06 | 1984-01-31 | Arthur D. Little, Inc. | Optically transparent radiation shielding material |
| DE3366938D1 (en) | 1982-11-01 | 1986-11-20 | Hitachi Ltd | Transparent resin material containing metal atoms |
| US4608409A (en) | 1985-05-08 | 1986-08-26 | Desoto, Inc. | Polyacrylated oligomers in ultraviolet curable optical fiber coatings |
| US5159035A (en) | 1986-06-10 | 1992-10-27 | The Dow Chemical Company | Homogenous copolymerization of non-polar monomers with ionic amphiphilic monomers |
| DE3824333A1 (de) | 1988-07-18 | 1990-01-25 | Fraunhofer Ges Forschung | Verfahren zur fixierung einer anorganischen spezies in einer organischen matrix |
| DE69316126T2 (de) | 1992-10-01 | 1998-08-13 | Hitachi Chemical Co Ltd | Harz für eine Kunststofflinse |
| CA2149645A1 (en) | 1992-11-19 | 1994-05-26 | The University Court Of The University Of Dundee | Method of deposition |
| US5484867A (en) | 1993-08-12 | 1996-01-16 | The University Of Dayton | Process for preparation of polyhedral oligomeric silsesquioxanes and systhesis of polymers containing polyhedral oligomeric silsesqioxane group segments |
| US5664041A (en) | 1993-12-07 | 1997-09-02 | Dsm Desotech, Inc. | Coating system for glass adhesion retention |
| US5534312A (en) | 1994-11-14 | 1996-07-09 | Simon Fraser University | Method for directly depositing metal containing patterned films |
| JPH10229080A (ja) * | 1996-12-10 | 1998-08-25 | Sony Corp | 酸化物の処理方法、アモルファス酸化膜の形成方法およびアモルファス酸化タンタル膜 |
| US6194504B1 (en) | 1997-04-28 | 2001-02-27 | Sartomer Technologies, Inc. | Process for compounding metal salts in elastomers |
| MY122234A (en) | 1997-05-13 | 2006-04-29 | Inst Neue Mat Gemein Gmbh | Nanostructured moulded bodies and layers and method for producing same |
| US5856415A (en) | 1997-08-28 | 1999-01-05 | Bar-Ray Products, Inc. | Optically transparent metal-containing polymers |
| US6329058B1 (en) | 1998-07-30 | 2001-12-11 | 3M Innovative Properties Company | Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers |
| DE19923118A1 (de) | 1999-05-19 | 2000-11-23 | Henkel Kgaa | Chromfreies Korrosionsschutzmittel und Korrosionsschutzverfahren |
| US6972256B2 (en) | 1999-11-30 | 2005-12-06 | Ebara Corporation | Method and apparatus for forming thin film of metal |
| JP2001200023A (ja) | 2000-01-17 | 2001-07-24 | Jsr Corp | 硬化性組成物、その硬化物及び積層体 |
| US6849305B2 (en) | 2000-04-28 | 2005-02-01 | Ekc Technology, Inc. | Photolytic conversion process to form patterned amorphous film |
| US6696363B2 (en) * | 2000-06-06 | 2004-02-24 | Ekc Technology, Inc. | Method of and apparatus for substrate pre-treatment |
| US7074640B2 (en) * | 2000-06-06 | 2006-07-11 | Simon Fraser University | Method of making barrier layers |
| US7176114B2 (en) | 2000-06-06 | 2007-02-13 | Simon Fraser University | Method of depositing patterned films of materials using a positive imaging process |
| JP2004509212A (ja) | 2000-09-14 | 2004-03-25 | ディーエスエム エヌ．ブイ． | プラスチック基体用コーティング組成物 |
| US6553169B2 (en) | 2000-11-29 | 2003-04-22 | Corning Incorporated | Optical fiber coating compositions and coated optical fibers |
| US6656990B2 (en) | 2001-07-11 | 2003-12-02 | Corning Incorporated | Curable high refractive index compositions |
| US20030073042A1 (en) * | 2001-10-17 | 2003-04-17 | Cernigliaro George J. | Process and materials for formation of patterned films of functional materials |
| GB0213925D0 (en) * | 2002-06-18 | 2002-07-31 | Univ Dundee | Metallisation |
| KR100819297B1 (ko) * | 2002-06-26 | 2008-04-02 | 삼성전자주식회사 | 고반사율 미세 패턴의 제조방법 |
| US6844950B2 (en) | 2003-01-07 | 2005-01-18 | General Electric Company | Microstructure-bearing articles of high refractive index |
| US20040171743A1 (en) | 2003-01-21 | 2004-09-02 | Terry Brewer, Ph.D. | Hybrid organic-inorganic polymer coatings with high refractive indices |
| WO2004073030A2 (en) | 2003-02-06 | 2004-08-26 | Georgia Tech Research Corporation | Metal 8-hydroxyquinoline -functionalized polymers and related materials and methods of making and using the same |
| DE10330217B3 (de) | 2003-07-03 | 2004-12-09 | Sasol Germany Gmbh | Verfahren zur Herstellung von Metallsalzen kurzkettiger ungesättigter Carbonsäuren und Verwendung der erhaltenen Metallsalze |
| JP2005213567A (ja) * | 2004-01-29 | 2005-08-11 | Ebara Corp | エネルギー線照射による金属または金属酸化物の析出方法 |
| US7888441B2 (en) * | 2004-12-13 | 2011-02-15 | Pryog, Llc | Metal-containing compositions |
| JP2005340844A (ja) * | 2005-06-13 | 2005-12-08 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
| US20070075628A1 (en) * | 2005-10-04 | 2007-04-05 | General Electric Company | Organic light emitting devices having latent activated layers |
| US7629424B2 (en) * | 2005-12-09 | 2009-12-08 | Pryog, Llc | Metal-containing compositions and method of making same |
| WO2007070092A2 (en) * | 2005-12-09 | 2007-06-21 | Pryog, Llc | Metal-containing compositions and method of making same |
| US20080083299A1 (en) * | 2006-10-06 | 2008-04-10 | General Electric Company | Composition and associated method |
| US7972691B2 (en) * | 2006-12-22 | 2011-07-05 | Nanogram Corporation | Composites of polymers and metal/metalloid oxide nanoparticles and methods for forming these composites |
-
2009
- 2009-06-27 EP EP09827844.3A patent/EP2326744B1/en active Active
- 2009-06-27 WO PCT/US2009/003841 patent/WO2010059174A1/en not_active Ceased
- 2009-06-27 JP JP2011522047A patent/JP6004649B2/ja active Active
- 2009-06-27 US US12/737,694 patent/US8802346B2/en active Active
- 2009-08-10 TW TW098126808A patent/TWI547528B/zh active
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