JP2011510133A5 - - Google Patents

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Publication number
JP2011510133A5
JP2011510133A5 JP2010543104A JP2010543104A JP2011510133A5 JP 2011510133 A5 JP2011510133 A5 JP 2011510133A5 JP 2010543104 A JP2010543104 A JP 2010543104A JP 2010543104 A JP2010543104 A JP 2010543104A JP 2011510133 A5 JP2011510133 A5 JP 2011510133A5
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JP
Japan
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value
group
silsesquioxane resin
antireflective coating
generator
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Application number
JP2010543104A
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English (en)
Japanese (ja)
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JP2011510133A (ja
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Priority claimed from PCT/US2008/083849 external-priority patent/WO2009091440A1/en
Publication of JP2011510133A publication Critical patent/JP2011510133A/ja
Publication of JP2011510133A5 publication Critical patent/JP2011510133A5/ja
Pending legal-status Critical Current

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JP2010543104A 2008-01-15 2008-11-18 シルセスキオキサン樹脂 Pending JP2011510133A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2109708P 2008-01-15 2008-01-15
PCT/US2008/083849 WO2009091440A1 (en) 2008-01-15 2008-11-18 Silsesquioxane resins

Publications (2)

Publication Number Publication Date
JP2011510133A JP2011510133A (ja) 2011-03-31
JP2011510133A5 true JP2011510133A5 (enExample) 2011-11-24

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Family Applications (1)

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JP2010543104A Pending JP2011510133A (ja) 2008-01-15 2008-11-18 シルセスキオキサン樹脂

Country Status (7)

Country Link
US (1) US9023433B2 (enExample)
EP (1) EP2238198A4 (enExample)
JP (1) JP2011510133A (enExample)
KR (1) KR20100114075A (enExample)
CN (1) CN101910253B (enExample)
TW (1) TWI437048B (enExample)
WO (1) WO2009091440A1 (enExample)

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CN110452384B (zh) * 2019-08-30 2020-10-23 北京理工大学 一种笼型结构环氧基苯基硅倍半氧烷及其制备方法
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