JP2009527021A5 - - Google Patents
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- Publication number
- JP2009527021A5 JP2009527021A5 JP2008555229A JP2008555229A JP2009527021A5 JP 2009527021 A5 JP2009527021 A5 JP 2009527021A5 JP 2008555229 A JP2008555229 A JP 2008555229A JP 2008555229 A JP2008555229 A JP 2008555229A JP 2009527021 A5 JP2009527021 A5 JP 2009527021A5
- Authority
- JP
- Japan
- Prior art keywords
- value
- antireflection film
- electronic device
- forming
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 claims 9
- 229920005989 resin Polymers 0.000 claims 9
- 239000002904 solvent Substances 0.000 claims 9
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 7
- 239000012530 fluid Substances 0.000 claims 7
- 238000000034 method Methods 0.000 claims 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 5
- 238000005530 etching Methods 0.000 claims 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US77261906P | 2006-02-13 | 2006-02-13 | |
| US60/772,619 | 2006-02-13 | ||
| PCT/US2006/046810 WO2007094848A2 (en) | 2006-02-13 | 2006-12-07 | Antireflective coating material |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009527021A JP2009527021A (ja) | 2009-07-23 |
| JP2009527021A5 true JP2009527021A5 (enExample) | 2011-06-23 |
| JP4881396B2 JP4881396B2 (ja) | 2012-02-22 |
Family
ID=38371944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008555229A Expired - Fee Related JP4881396B2 (ja) | 2006-02-13 | 2006-12-07 | 反射防止膜材料 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8263312B2 (enExample) |
| EP (1) | EP1989593A2 (enExample) |
| JP (1) | JP4881396B2 (enExample) |
| KR (1) | KR101324052B1 (enExample) |
| CN (1) | CN101371196B (enExample) |
| TW (1) | TWI406099B (enExample) |
| WO (1) | WO2007094848A2 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7756384B2 (en) * | 2004-11-08 | 2010-07-13 | Dow Corning Corporation | Method for forming anti-reflective coating |
| US20070212886A1 (en) * | 2006-03-13 | 2007-09-13 | Dong Seon Uh | Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositions |
| JP4945460B2 (ja) * | 2008-01-04 | 2012-06-06 | 株式会社東芝 | 反射防止構造の形成方法および反射防止構造 |
| KR20100126295A (ko) * | 2008-01-08 | 2010-12-01 | 다우 코닝 도레이 캄파니 리미티드 | 실세스퀴옥산 수지 |
| CN101910253B (zh) * | 2008-01-15 | 2013-04-10 | 陶氏康宁公司 | 倍半硅氧烷树脂 |
| KR20100134578A (ko) * | 2008-03-04 | 2010-12-23 | 다우 코닝 코포레이션 | 실세스퀴옥산 수지 |
| KR101541939B1 (ko) * | 2008-03-05 | 2015-08-04 | 다우 코닝 코포레이션 | 실세스퀴옥산 수지 |
| US8293354B2 (en) | 2008-04-09 | 2012-10-23 | The Regents Of The University Of Michigan | UV curable silsesquioxane resins for nanoprint lithography |
| WO2010068338A1 (en) * | 2008-12-10 | 2010-06-17 | Dow Corning Corporation | Switchable antireflective coatings |
| JP5632387B2 (ja) * | 2008-12-10 | 2014-11-26 | ダウ コーニング コーポレーションDow Corning Corporation | 湿式エッチング可能な反射防止膜 |
| KR20110096063A (ko) | 2008-12-10 | 2011-08-26 | 다우 코닝 코포레이션 | 실세스퀴옥산 수지 |
| US9376593B2 (en) * | 2009-04-30 | 2016-06-28 | Enki Technology, Inc. | Multi-layer coatings |
| US9353268B2 (en) | 2009-04-30 | 2016-05-31 | Enki Technology, Inc. | Anti-reflective and anti-soiling coatings for self-cleaning properties |
| US20110305787A1 (en) * | 2010-06-11 | 2011-12-15 | Satoshi Ishii | Stamper for transfer of microscopic structure and transfer apparatus of microscopic structure |
| CA2804059A1 (en) * | 2010-07-01 | 2012-01-05 | Inmold Biosystems A/S | Method and apparatus for producing a nanostructured or smooth polymer article |
| US9399720B2 (en) | 2014-07-14 | 2016-07-26 | Enki Technology, Inc. | High gain durable anti-reflective coating |
| US9598586B2 (en) | 2014-07-14 | 2017-03-21 | Enki Technology, Inc. | Coating materials and methods for enhanced reliability |
| TWI592760B (zh) * | 2014-12-30 | 2017-07-21 | 羅門哈斯電子材料韓國有限公司 | 與經外塗佈之光致抗蝕劑一起使用之塗層組合物 |
| KR102858984B1 (ko) * | 2016-02-19 | 2025-09-12 | 다우 실리콘즈 코포레이션 | 에이징된 중합체 실세스퀴옥산 |
Family Cites Families (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4587138A (en) | 1984-11-09 | 1986-05-06 | Intel Corporation | MOS rear end processing |
| US5010159A (en) | 1989-09-01 | 1991-04-23 | Dow Corning Corporation | Process for the synthesis of soluble, condensed hydridosilicon resins containing low levels of silanol |
| US5100503A (en) | 1990-09-14 | 1992-03-31 | Ncr Corporation | Silica-based anti-reflective planarizing layer |
| US5210168A (en) | 1992-04-02 | 1993-05-11 | Dow Corning Corporation | Process for forming siloxane bonds |
| EP0568476B1 (en) | 1992-04-30 | 1995-10-11 | International Business Machines Corporation | Silicon-containing positive resist and method of using the same in thin film packaging technology |
| JPH0656560A (ja) | 1992-08-10 | 1994-03-01 | Sony Corp | Sog組成物及びそれを用いた半導体装置の製造方法 |
| US5441765A (en) | 1993-09-22 | 1995-08-15 | Dow Corning Corporation | Method of forming Si-O containing coatings |
| JP3499032B2 (ja) | 1995-02-02 | 2004-02-23 | ダウ コーニング アジア株式会社 | 放射線硬化性組成物、その硬化方法及びパターン形成方法 |
| JP3324360B2 (ja) | 1995-09-25 | 2002-09-17 | 信越化学工業株式会社 | ポリシロキサン化合物及びポジ型レジスト材料 |
| JPH09124794A (ja) | 1995-11-06 | 1997-05-13 | Dow Corning Asia Ltd | 有機光機能材を含有するポリシロキサン樹脂組成物及びそれから得られる透明な光機能素子 |
| JP3192947B2 (ja) | 1995-11-16 | 2001-07-30 | 東京応化工業株式会社 | シリカ系被膜形成用塗布液の製造方法 |
| US6143855A (en) * | 1997-04-21 | 2000-11-07 | Alliedsignal Inc. | Organohydridosiloxane resins with high organic content |
| US6448331B1 (en) * | 1997-07-15 | 2002-09-10 | Asahi Kasei Kabushiki Kaisha | Alkoxysilane/organic polymer composition for thin insulating film production and use thereof |
| JPH1184640A (ja) * | 1997-09-05 | 1999-03-26 | Tokyo Ohka Kogyo Co Ltd | 反射防止膜形成用塗布液 |
| US6057239A (en) | 1997-12-17 | 2000-05-02 | Advanced Micro Devices, Inc. | Dual damascene process using sacrificial spin-on materials |
| US6344284B1 (en) | 1998-04-10 | 2002-02-05 | Organic Display Technology | Organic electroluminescent materials and devices made from such materials |
| US6156640A (en) | 1998-07-14 | 2000-12-05 | United Microelectronics Corp. | Damascene process with anti-reflection coating |
| US6087064A (en) | 1998-09-03 | 2000-07-11 | International Business Machines Corporation | Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method |
| US6177143B1 (en) * | 1999-01-06 | 2001-01-23 | Allied Signal Inc | Electron beam treatment of siloxane resins |
| US6461955B1 (en) | 1999-04-29 | 2002-10-08 | Texas Instruments Incorporated | Yield improvement of dual damascene fabrication through oxide filling |
| US6281285B1 (en) | 1999-06-09 | 2001-08-28 | Dow Corning Corporation | Silicone resins and process for synthesis |
| US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| WO2000077575A1 (en) | 1999-06-10 | 2000-12-21 | Alliedsignal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| US6268457B1 (en) | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
| US6890448B2 (en) | 1999-06-11 | 2005-05-10 | Shipley Company, L.L.C. | Antireflective hard mask compositions |
| US6329118B1 (en) | 1999-06-21 | 2001-12-11 | Intel Corporation | Method for patterning dual damascene interconnects using a sacrificial light absorbing material |
| US6982006B1 (en) | 1999-10-19 | 2006-01-03 | Boyers David G | Method and apparatus for treating a substrate with an ozone-solvent solution |
| US6359096B1 (en) | 1999-10-25 | 2002-03-19 | Dow Corning Corporation | Silicone resin compositions having good solution solubility and stability |
| KR100355604B1 (ko) | 1999-12-23 | 2002-10-12 | 주식회사 하이닉스반도체 | 난반사 방지막용 중합체와 그 제조방법 |
| JP3795333B2 (ja) | 2000-03-30 | 2006-07-12 | 東京応化工業株式会社 | 反射防止膜形成用組成物 |
| US6420088B1 (en) | 2000-06-23 | 2002-07-16 | International Business Machines Corporation | Antireflective silicon-containing compositions as hardmask layer |
| US20030176614A1 (en) * | 2000-06-30 | 2003-09-18 | Nigel Hacker | Organohydridosiloxane resins with high organic content |
| US6368400B1 (en) | 2000-07-17 | 2002-04-09 | Honeywell International | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| JP4141625B2 (ja) | 2000-08-09 | 2008-08-27 | 東京応化工業株式会社 | ポジ型レジスト組成物およびそのレジスト層を設けた基材 |
| EP1197511A1 (en) | 2000-10-10 | 2002-04-17 | Shipley Company LLC | Antireflective composition |
| TW588072B (en) | 2000-10-10 | 2004-05-21 | Shipley Co Llc | Antireflective porogens |
| US6589711B1 (en) | 2001-04-04 | 2003-07-08 | Advanced Micro Devices, Inc. | Dual inlaid process using a bilayer resist |
| US6746530B2 (en) | 2001-08-02 | 2004-06-08 | Chunghwa Pictures Tubes, Ltd. | High contrast, moisture resistant antistatic/antireflective coating for CRT display screen |
| US20030096090A1 (en) | 2001-10-22 | 2003-05-22 | Boisvert Ronald Paul | Etch-stop resins |
| AU2002359387A1 (en) | 2001-11-15 | 2003-06-10 | Honeywell International Inc. | Anti-reflective coatings for photolithography and methods of preparation thereof |
| KR20040075866A (ko) | 2001-11-15 | 2004-08-30 | 허니웰 인터내셔날 인코포레이티드 | 포토리소그래피용 스핀-온 무반사 코팅 |
| EP1478681A4 (en) | 2001-11-16 | 2006-10-11 | Honeywell Int Inc | SPIN ON GLASS ANTIREFLECTION COATINGS FOR PHOTOLITHOGRAPHY |
| US6730454B2 (en) | 2002-04-16 | 2004-05-04 | International Business Machines Corporation | Antireflective SiO-containing compositions for hardmask layer |
| WO2004044025A2 (en) * | 2002-11-12 | 2004-05-27 | Honeywell International Inc | Anti-reflective coatings for photolithography and methods of preparation thereof |
| JP4244315B2 (ja) * | 2002-12-02 | 2009-03-25 | 東京応化工業株式会社 | レジストパターン形成用材料 |
| KR20050084283A (ko) | 2002-12-02 | 2005-08-26 | 토쿄오오카코교 가부시기가이샤 | 래더형 실리콘 공중합체 |
| TW200505966A (en) | 2003-04-02 | 2005-02-16 | Dow Global Technologies Inc | Organosilicate resin formulation for use in microelectronic devices |
| ATE377036T1 (de) | 2003-05-23 | 2007-11-15 | Dow Corning | Siloxan-harz basierte anti- reflektionsbeschichtung mit hoher nassätzgeschwindigkeit |
| ATE400672T1 (de) | 2004-12-17 | 2008-07-15 | Dow Corning | Verfahren zur ausbildung einer antireflexionsbeschichtung |
| US8025927B2 (en) | 2004-12-17 | 2011-09-27 | Dow Corning Corporation | Method for forming anti-reflective coating |
| CN101073039B (zh) | 2004-12-17 | 2011-12-14 | 陶氏康宁公司 | 形成抗反射涂层的方法 |
| KR101191098B1 (ko) | 2004-12-17 | 2012-10-15 | 다우 코닝 코포레이션 | 실록산 수지 피복물 |
-
2006
- 2006-12-07 EP EP20060847526 patent/EP1989593A2/en not_active Withdrawn
- 2006-12-07 JP JP2008555229A patent/JP4881396B2/ja not_active Expired - Fee Related
- 2006-12-07 CN CN2006800527193A patent/CN101371196B/zh not_active Expired - Fee Related
- 2006-12-07 WO PCT/US2006/046810 patent/WO2007094848A2/en not_active Ceased
- 2006-12-07 KR KR1020087019774A patent/KR101324052B1/ko not_active Expired - Fee Related
- 2006-12-07 US US12/160,325 patent/US8263312B2/en not_active Expired - Fee Related
-
2007
- 2007-01-08 TW TW96100714A patent/TWI406099B/zh not_active IP Right Cessation
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