JP2008524650A5 - - Google Patents

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Publication number
JP2008524650A5
JP2008524650A5 JP2007546642A JP2007546642A JP2008524650A5 JP 2008524650 A5 JP2008524650 A5 JP 2008524650A5 JP 2007546642 A JP2007546642 A JP 2007546642A JP 2007546642 A JP2007546642 A JP 2007546642A JP 2008524650 A5 JP2008524650 A5 JP 2008524650A5
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JP
Japan
Prior art keywords
antireflection film
value
forming
silsesquioxane resin
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007546642A
Other languages
English (en)
Japanese (ja)
Other versions
JP4995096B2 (ja
JP2008524650A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2005/034677 external-priority patent/WO2006065316A1/en
Publication of JP2008524650A publication Critical patent/JP2008524650A/ja
Publication of JP2008524650A5 publication Critical patent/JP2008524650A5/ja
Application granted granted Critical
Publication of JP4995096B2 publication Critical patent/JP4995096B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007546642A 2004-12-17 2005-09-29 反射防止膜の形成方法、レジスト画像の形成方法、パターンの形成方法、電子デバイスの製造方法及びａｒｃ組成物 Expired - Fee Related JP4995096B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US63695804P 2004-12-17 2004-12-17
US60/636,958 2004-12-17
PCT/US2005/034677 WO2006065316A1 (en) 2004-12-17 2005-09-29 Method for forming anti-reflective coating

Publications (3)

Publication Number Publication Date
JP2008524650A JP2008524650A (ja) 2008-07-10
JP2008524650A5 true JP2008524650A5 (enExample) 2008-09-18
JP4995096B2 JP4995096B2 (ja) 2012-08-08

Family

ID=35759377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007546642A Expired - Fee Related JP4995096B2 (ja) 2004-12-17 2005-09-29 反射防止膜の形成方法、レジスト画像の形成方法、パターンの形成方法、電子デバイスの製造方法及びａｒｃ組成物

Country Status (7)

Country Link
US (1) US8025927B2 (enExample)
EP (1) EP1825330B1 (enExample)
JP (1) JP4995096B2 (enExample)
KR (1) KR101253487B1 (enExample)
CN (1) CN101073038B (enExample)
TW (1) TWI372312B (enExample)
WO (1) WO2006065316A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7756384B2 (en) 2004-11-08 2010-07-13 Dow Corning Corporation Method for forming anti-reflective coating
ATE400672T1 (de) 2004-12-17 2008-07-15 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
KR101191098B1 (ko) 2004-12-17 2012-10-15 다우 코닝 코포레이션 실록산 수지 피복물
EP1989593A2 (en) 2006-02-13 2008-11-12 Dow Corning Corporation Antireflective coating material
US8026035B2 (en) 2007-03-30 2011-09-27 Cheil Industries, Inc. Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same
KR20100126295A (ko) * 2008-01-08 2010-12-01 다우 코닝 도레이 캄파니 리미티드 실세스퀴옥산 수지
CN101910253B (zh) * 2008-01-15 2013-04-10 陶氏康宁公司 倍半硅氧烷树脂
KR20100134578A (ko) * 2008-03-04 2010-12-23 다우 코닝 코포레이션 실세스퀴옥산 수지
KR101541939B1 (ko) * 2008-03-05 2015-08-04 다우 코닝 코포레이션 실세스퀴옥산 수지
JP5632387B2 (ja) * 2008-12-10 2014-11-26 ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ 湿式エッチング可能な反射防止膜
KR20110096063A (ko) 2008-12-10 2011-08-26 다우 코닝 코포레이션 실세스퀴옥산 수지
US8999625B2 (en) 2013-02-14 2015-04-07 International Business Machines Corporation Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
CN103305036B (zh) * 2013-06-18 2016-09-14 武汉绿凯科技有限公司 一种含poss减反射膜镀膜液及其制备方法与应用
US9399720B2 (en) 2014-07-14 2016-07-26 Enki Technology, Inc. High gain durable anti-reflective coating
US9598586B2 (en) 2014-07-14 2017-03-21 Enki Technology, Inc. Coating materials and methods for enhanced reliability
WO2016064494A2 (en) * 2014-09-17 2016-04-28 Enki Technology, Inc. Multi-layer coatings
KR102858984B1 (ko) * 2016-02-19 2025-09-12 다우 실리콘즈 코포레이션 에이징된 중합체 실세스퀴옥산
TWI742160B (zh) 2016-09-30 2021-10-11 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法
TWI747956B (zh) 2016-09-30 2021-12-01 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4056492A (en) * 1976-06-24 1977-11-01 General Electric Company Process for the production of a bodied silicone resin without the use of a catalyst
US5320923A (en) * 1993-01-28 1994-06-14 Hewlett-Packard Company Reusable, positive-charging organic photoconductor containing phthalocyanine pigment, hydroxy binder and silicon stabilizer
DE4414653A1 (de) * 1993-05-13 1994-11-17 Gen Electric Schneller klebende Silicon-Klebstoffzusammensetzungen
JP3542185B2 (ja) * 1995-02-02 2004-07-14 ダウ コーニング アジア株式会社 シリコーンレジン、これを含む組成物およびその硬化方法
WO1997007156A1 (en) * 1995-08-15 1997-02-27 Dow Corning Asia Limited Curable polymethylsilsesquioxane, method for curing the same and products of curing thereof
US5861472A (en) * 1996-07-05 1999-01-19 Dow Corning Corporation Method of making silicone pressure sensitive adhesives
US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
US6824879B2 (en) * 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6890448B2 (en) 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
US6420088B1 (en) 2000-06-23 2002-07-16 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer
US20030176614A1 (en) * 2000-06-30 2003-09-18 Nigel Hacker Organohydridosiloxane resins with high organic content
US20030096090A1 (en) * 2001-10-22 2003-05-22 Boisvert Ronald Paul Etch-stop resins
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
CN101073039B (zh) 2004-12-17 2011-12-14 陶氏康宁公司 形成抗反射涂层的方法
KR101191098B1 (ko) 2004-12-17 2012-10-15 다우 코닝 코포레이션 실록산 수지 피복물
ATE400672T1 (de) 2004-12-17 2008-07-15 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung

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