KR101253487B1 - 반사방지막의 형성방법 - Google Patents

반사방지막의 형성방법 Download PDF

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Publication number
KR101253487B1
KR101253487B1 KR1020077013587A KR20077013587A KR101253487B1 KR 101253487 B1 KR101253487 B1 KR 101253487B1 KR 1020077013587 A KR1020077013587 A KR 1020077013587A KR 20077013587 A KR20077013587 A KR 20077013587A KR 101253487 B1 KR101253487 B1 KR 101253487B1
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South Korea
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KR1020077013587A
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English (en)
Korean (ko)
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KR20070088703A (ko
Inventor
펑-페이 푸
에릭 스캇 모여
크레이그 롤린 예클레
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다우 코닝 코포레이션
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Silicon Polymers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020077013587A 2004-12-17 2005-09-29 반사방지막의 형성방법 Expired - Fee Related KR101253487B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US63695804P 2004-12-17 2004-12-17
US60/636,958 2004-12-17
PCT/US2005/034677 WO2006065316A1 (en) 2004-12-17 2005-09-29 Method for forming anti-reflective coating

Publications (2)

Publication Number Publication Date
KR20070088703A KR20070088703A (ko) 2007-08-29
KR101253487B1 true KR101253487B1 (ko) 2013-04-11

Family

ID=35759377

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077013587A Expired - Fee Related KR101253487B1 (ko) 2004-12-17 2005-09-29 반사방지막의 형성방법

Country Status (7)

Country Link
US (1) US8025927B2 (enExample)
EP (1) EP1825330B1 (enExample)
JP (1) JP4995096B2 (enExample)
KR (1) KR101253487B1 (enExample)
CN (1) CN101073038B (enExample)
TW (1) TWI372312B (enExample)
WO (1) WO2006065316A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7756384B2 (en) 2004-11-08 2010-07-13 Dow Corning Corporation Method for forming anti-reflective coating
EP1819844B1 (en) 2004-12-17 2008-07-09 Dow Corning Corporation Method for forming anti-reflective coating
WO2006065310A2 (en) 2004-12-17 2006-06-22 Dow Corning Corporation Siloxane resin coating
CN101371196B (zh) 2006-02-13 2012-07-04 陶氏康宁公司 抗反射涂料
US8026035B2 (en) 2007-03-30 2011-09-27 Cheil Industries, Inc. Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same
WO2009088600A1 (en) * 2008-01-08 2009-07-16 Dow Corning Toray Co., Ltd. Silsesquioxane resins
EP2238198A4 (en) * 2008-01-15 2011-11-16 Dow Corning RESINS BASED ON SILSESQUIOXANE
US8304161B2 (en) * 2008-03-04 2012-11-06 Dow Corning Corporation Silsesquioxane resins
KR101541939B1 (ko) * 2008-03-05 2015-08-04 다우 코닝 코포레이션 실세스퀴옥산 수지
US20110236835A1 (en) * 2008-12-10 2011-09-29 Peng-Fei Fu Silsesquioxane Resins
EP2373722A4 (en) 2008-12-10 2013-01-23 Dow Corning SILSESQUIOXAN RESINS
US8999625B2 (en) 2013-02-14 2015-04-07 International Business Machines Corporation Silicon-containing antireflective coatings including non-polymeric silsesquioxanes
CN103305036B (zh) * 2013-06-18 2016-09-14 武汉绿凯科技有限公司 一种含poss减反射膜镀膜液及其制备方法与应用
US9399720B2 (en) 2014-07-14 2016-07-26 Enki Technology, Inc. High gain durable anti-reflective coating
US9598586B2 (en) 2014-07-14 2017-03-21 Enki Technology, Inc. Coating materials and methods for enhanced reliability
WO2016064494A2 (en) * 2014-09-17 2016-04-28 Enki Technology, Inc. Multi-layer coatings
JP6997092B2 (ja) * 2016-02-19 2022-01-17 ダウ シリコーンズ コーポレーション エージングしたシルセスキオキサンポリマー
TWI747956B (zh) 2016-09-30 2021-12-01 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法
TWI742160B (zh) 2016-09-30 2021-10-11 美商道康寧公司 橋接聚矽氧樹脂、膜、電子裝置及相關方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
US20020187422A1 (en) 2000-06-23 2002-12-12 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4056492A (en) * 1976-06-24 1977-11-01 General Electric Company Process for the production of a bodied silicone resin without the use of a catalyst
US5320923A (en) * 1993-01-28 1994-06-14 Hewlett-Packard Company Reusable, positive-charging organic photoconductor containing phthalocyanine pigment, hydroxy binder and silicon stabilizer
DE4414653A1 (de) * 1993-05-13 1994-11-17 Gen Electric Schneller klebende Silicon-Klebstoffzusammensetzungen
JP3542185B2 (ja) * 1995-02-02 2004-07-14 ダウ コーニング アジア株式会社 シリコーンレジン、これを含む組成物およびその硬化方法
WO1997007156A1 (en) * 1995-08-15 1997-02-27 Dow Corning Asia Limited Curable polymethylsilsesquioxane, method for curing the same and products of curing thereof
US5861472A (en) * 1996-07-05 1999-01-19 Dow Corning Corporation Method of making silicone pressure sensitive adhesives
US6824879B2 (en) * 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6890448B2 (en) 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
US20030176614A1 (en) 2000-06-30 2003-09-18 Nigel Hacker Organohydridosiloxane resins with high organic content
US20030096090A1 (en) * 2001-10-22 2003-05-22 Boisvert Ronald Paul Etch-stop resins
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
WO2006065310A2 (en) 2004-12-17 2006-06-22 Dow Corning Corporation Siloxane resin coating
EP1819844B1 (en) 2004-12-17 2008-07-09 Dow Corning Corporation Method for forming anti-reflective coating
JP4825811B2 (ja) 2004-12-17 2011-11-30 ダウ・コーニング・コーポレイション 反射防止膜の形成方法、レジスト画像の形成方法、パターンの形成方法及び電子デバイスの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6177143B1 (en) * 1999-01-06 2001-01-23 Allied Signal Inc Electron beam treatment of siloxane resins
US20020187422A1 (en) 2000-06-23 2002-12-12 International Business Machines Corporation Antireflective silicon-containing compositions as hardmask layer

Also Published As

Publication number Publication date
EP1825330A1 (en) 2007-08-29
EP1825330B1 (en) 2019-04-24
JP4995096B2 (ja) 2012-08-08
US20080014335A1 (en) 2008-01-17
TW200622499A (en) 2006-07-01
TWI372312B (en) 2012-09-11
WO2006065316A1 (en) 2006-06-22
JP2008524650A (ja) 2008-07-10
CN101073038B (zh) 2010-05-05
US8025927B2 (en) 2011-09-27
CN101073038A (zh) 2007-11-14
KR20070088703A (ko) 2007-08-29

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