DE602005024447D1 - Siloxanharzbeschichtung - Google Patents

Siloxanharzbeschichtung

Info

Publication number
DE602005024447D1
DE602005024447D1 DE602005024447T DE602005024447T DE602005024447D1 DE 602005024447 D1 DE602005024447 D1 DE 602005024447D1 DE 602005024447 T DE602005024447 T DE 602005024447T DE 602005024447 T DE602005024447 T DE 602005024447T DE 602005024447 D1 DE602005024447 D1 DE 602005024447D1
Authority
DE
Germany
Prior art keywords
value
siloxanharzbeschichtung
siloxane
hsio3
rsio3
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005024447T
Other languages
English (en)
Inventor
Bianxiao Zhong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of DE602005024447D1 publication Critical patent/DE602005024447D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/12—Polysiloxanes containing silicon bound to hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
  • Traffic Control Systems (AREA)
  • Catching Or Destruction (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE602005024447T 2004-12-17 2005-09-23 Siloxanharzbeschichtung Active DE602005024447D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63700104P 2004-12-17 2004-12-17
PCT/US2005/034236 WO2006065310A2 (en) 2004-12-17 2005-09-23 Siloxane resin coating

Publications (1)

Publication Number Publication Date
DE602005024447D1 true DE602005024447D1 (de) 2010-12-09

Family

ID=36588304

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005024447T Active DE602005024447D1 (de) 2004-12-17 2005-09-23 Siloxanharzbeschichtung

Country Status (9)

Country Link
US (2) US7838615B2 (de)
EP (1) EP1846479B1 (de)
JP (1) JP5412037B2 (de)
KR (1) KR101191098B1 (de)
CN (1) CN101072813B (de)
AT (1) ATE486098T1 (de)
DE (1) DE602005024447D1 (de)
TW (1) TWI384016B (de)
WO (1) WO2006065310A2 (de)

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US7833696B2 (en) 2004-12-17 2010-11-16 Dow Corning Corporation Method for forming anti-reflective coating
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KR101253487B1 (ko) 2004-12-17 2013-04-11 다우 코닝 코포레이션 반사방지막의 형성방법
EP1989593A2 (de) 2006-02-13 2008-11-12 Dow Corning Corporation Antireflektierendes beschichtungsmaterial
US7704670B2 (en) 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
CN101622296B (zh) 2007-02-27 2013-10-16 Az电子材料美国公司 硅基抗反射涂料组合物
US8653217B2 (en) 2007-05-01 2014-02-18 Dow Corning Corporation Method for forming anti-reflective coating
JP2009199061A (ja) * 2007-11-12 2009-09-03 Rohm & Haas Electronic Materials Llc オーバーコートされたフォトレジストと共に用いるためのコーティング組成物
US9023433B2 (en) 2008-01-15 2015-05-05 Dow Corning Corporation Silsesquioxane resins and method of using them to form an antireflective coating
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JP2011097024A (ja) * 2009-09-29 2011-05-12 Jsr Corp 光半導体素子の製造方法、及び、光半導体素子保護層形成用組成物
KR20110035924A (ko) * 2009-09-29 2011-04-06 제이에스알 가부시끼가이샤 광반도체 소자의 제조 방법 및 광반도체 소자 보호층 형성용 조성물
JP5062352B2 (ja) 2010-09-09 2012-10-31 Ｊｓｒ株式会社 レジストパターン形成方法
TW201300459A (zh) * 2011-03-10 2013-01-01 Dow Corning 用於抗反射塗層的聚矽烷矽氧烷（ｐｏｌｙｓｉｌａｎｅｓｉｌｏｘａｎｅ）樹脂
EP2804918A1 (de) * 2012-01-18 2014-11-26 Dow Corning Corporation Siliciumreiche antireflexbeschichtungsmaterialien und verfahren zu ihrer herstellung
US9348228B2 (en) 2013-01-03 2016-05-24 Globalfoundries Inc. Acid-strippable silicon-containing antireflective coating
EP3208295B1 (de) * 2014-09-30 2021-01-13 Kaneka Corporation Verfahren zur herstellung von siloxanharz
US10886477B2 (en) * 2018-03-23 2021-01-05 Feng-wen Yen Iridium complex and organic electroluminescence device using the same

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Also Published As

Publication number Publication date
US20070261600A1 (en) 2007-11-15
WO2006065310A2 (en) 2006-06-22
WO2006065310A3 (en) 2007-01-04
EP1846479B1 (de) 2010-10-27
JP2008524374A (ja) 2008-07-10
TWI384016B (zh) 2013-02-01
KR101191098B1 (ko) 2012-10-15
CN101072813A (zh) 2007-11-14
TW200626638A (en) 2006-08-01
JP5412037B2 (ja) 2014-02-12
US7838615B2 (en) 2010-11-23
KR20070089160A (ko) 2007-08-30
US8129491B2 (en) 2012-03-06
CN101072813B (zh) 2011-06-08
ATE486098T1 (de) 2010-11-15
US20110034629A1 (en) 2011-02-10
EP1846479A2 (de) 2007-10-24

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