JP2011192872A - プラズマ処理装置およびプラズマ処理方法 - Google Patents
プラズマ処理装置およびプラズマ処理方法 Download PDFInfo
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Abstract
【解決手段】真空容器内部に配置された処理室と、この処理室の下部に配置されその上面に処理対象のウエハが載置される試料台と、前記処理室内部を排気して減圧する排気装置と、前記試料台の上方に配置されて前記処理室に処理用ガスを導入する導入孔とを備え、前記ウエハの上面に配置された膜構造を前記処理用ガスを用いて形成したプラズマによりエッチング処理するプラズマ処理装置であって、前記膜構造が基板上にレジスト膜とマスク膜とポリシリコン膜と絶縁膜とを有して構成されたものであって、前記ウエハを前記試料台上に載せて前記マスク膜の下方に配置されたポリシリコン膜をエッチングする前に前記処理室内にプラズマを形成してこの処理室内部の部材の表面にSiを成分として含む皮膜を被覆する工程を行う。
【選択図】 図1
Description
102 シャワープレート
103 誘電体窓
104 処理室
105 ガス供給装置
106 真空排気口
107 導波管
108 空洞共振器
109 電磁波発生用電源
110 磁場発生コイル
111 ウエハ載置電極
112 ウエハ
113 マッチング回路
114 高周波電源
115 フィルター
116 直流電源
117 冷媒用流路
118 温調器
119,122 ヒーター
120 ヒーター制御器
121 温度センサー
123 発光分光器
124 発光データ処理装置
Claims (8)
- 真空容器内部に配置された処理室と、この処理室の下部に配置されその上面に処理対象のウエハが載置される試料台と、前記処理室内部を排気して減圧する排気装置と、前記試料台の上方に配置されて前記処理室に処理用ガスを導入する導入孔とを備え、前記ウエハの上面に配置された膜構造を前記処理用ガスを用いて形成したプラズマを用いてエッチング処理するプラズマ処理装置であって、
前記膜構造が基板上にレジスト膜とマスク膜とポリシリコン膜と絶縁膜とを有して構成されたものであって、前記ウエハを前記試料台上に載せて前記マスク膜の下方に配置されたポリシリコン膜をエッチングする前に前記処理室内にプラズマを形成してこの処理室内部の部材の表面にSiを成分として含む皮膜を被覆する工程を行うプラズマ処理装置。 - 請求項1に記載のプラズマ処理装置であって、
前記皮膜を被覆する工程において前記処理室内にSiまたはSiとO或いはSiとCの少なくとも何れか一つを成分として含むガスを供給するプラズマ処理装置。 - 請求項1または2に記載のプラズマ処理装置であって、
前記皮膜を被覆する工程の後にこの皮膜の表面を処理するために前記処理室内にプラズマを形成する後処理工程を実施して後、前記ウエハを前記処理室内に配置してエッチング処理するプラズマ処理装置。 - 請求項3に記載のプラズマ処理装置であって、
前記膜構造が前記ポリシリコン膜と前記絶縁膜との間に配置された金属材料から構成された金属膜を有し、前記皮膜から前記金属材料を除くためのプラズマを形成するクリーニング処理を実施するプラズマ処理装置。 - 真空容器内部に配置され減圧された処理室内の下部に配置された試料台の上面に処理対象のウエハを載置し、前記試料台の上方に配置された導入孔から前記処理室に処理用ガスを導入してプラズマを形成して前記ウエハの上面に配置された膜構造をエッチング処理するプラズマ処理方法であって、
前記膜構造が基板上にレジスト膜とマスク膜とポリシリコン膜と絶縁膜とを有して構成されたものであって、
前記ウエハを前記試料台上に載せて前記マスク膜の下方に配置されたポリシリコン膜をエッチングする前に前記処理室内にプラズマを形成してこの処理室内部の部材の表面にSiを成分として含む皮膜を被覆するプラズマ処理方法。 - 請求項5に記載のプラズマ処理方法であって、
前記皮膜を被覆する工程において前記処理室内にSiまたはSiとO或いはSiとCの少なくとも何れか一つを成分として含むガスを供給するプラズマ処理方法。 - 請求項5または6に記載のプラズマ処理方法であって、
前記皮膜を被覆する工程の後にこの皮膜の表面を処理するために前記処理室内にプラズマを形成する後処理工程を実施して後、前記ウエハを前記処理室内に配置してエッチング処理するプラズマ処理方法。 - 請求項7に記載のプラズマ処理方法であって、
前記膜構造が前記ポリシリコン膜と前記絶縁膜との間に配置された金属材料から構成された金属膜を有したものであって、
前記皮膜から前記金属材料を除くためのプラズマを形成するクリーニング処理を実施するプラズマ処理方法。
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US8557709B2 (en) | 2013-10-15 |
US9960031B2 (en) | 2018-05-01 |
JP5450187B2 (ja) | 2014-03-26 |
TWI559395B (zh) | 2016-11-21 |
US9496147B2 (en) | 2016-11-15 |
US20110226734A1 (en) | 2011-09-22 |
TW201432813A (zh) | 2014-08-16 |
US20150024599A1 (en) | 2015-01-22 |
TWI430361B (zh) | 2014-03-11 |
TW201639030A (zh) | 2016-11-01 |
US20170032955A1 (en) | 2017-02-02 |
TW201133605A (en) | 2011-10-01 |
US20140053983A1 (en) | 2014-02-27 |
KR20110104415A (ko) | 2011-09-22 |
TWI593017B (zh) | 2017-07-21 |
KR101214505B1 (ko) | 2012-12-27 |
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