JP2010517265A - 印刷ベースの組立により製作される光学システム - Google Patents
印刷ベースの組立により製作される光学システム Download PDFInfo
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- JP2010517265A JP2010517265A JP2009546361A JP2009546361A JP2010517265A JP 2010517265 A JP2010517265 A JP 2010517265A JP 2009546361 A JP2009546361 A JP 2009546361A JP 2009546361 A JP2009546361 A JP 2009546361A JP 2010517265 A JP2010517265 A JP 2010517265A
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Classifications
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- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier specially adapted for light emission
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/50—Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
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- H—ELECTRICITY
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Abstract
【選択図】図2A
Description
[0167]光起電力(PV)エネルギー変換は、半導体デバイス構造を使用して太陽光を電気へと直接変換するものである。PV産業における最も一般的な技術は、単結晶及び多結晶シリコン技術に基づいている。現在、シリコンPV技術は、バルクシリコン材料を比較的非効率に使用しているため、材料コストが高い。従来方法では、バルク結晶シリコンをソーイングしてウェーハにし、次いでウェーハを太陽電池に加工し、一緒にはんだ付けして最終モジュールを形成する。典型的な多結晶効率は15%程度であり、高性能単結晶シリコンは、20%の効率で製作されている。このタイプの太陽電池では、コストの57%が材料にあり、その総材料コストのうち42%が、結晶Siから生じている。さらに、これらのモジュールは剛性であり、重量がある。
1.単結晶シリコンウェーハ上で成長させてエッチングした、超薄型(厚さ20ミクロン未満)結晶シリコン太陽電池。この電池のサイズは、これまでのシリコン移転プロセスで使用されたサイズよりもずっと(例えば2桁)小さく、例えば、この太陽電池は、いくつかの実施形態では100ミクロン程度の長さ及び幅を有する。
2.シリコン太陽電池をマザーウェーハから取り外し、それを可撓性ポリマー基板に移転する、革新的なマイクロスタンピングプロセス。
3.必要に応じて、最終モジュールを形成するための、移転された電池の自動化相互接続。
[0190]本発明は、無機発光ダイオードを薄い可撓性基板と集積化する手段をもたらす印刷ベースの技法を提供する。自動化高精度プリンタシステムを用いて実施されるこの手法は、自動車及び他の用途向けの軽量で機械的共形性のある室内照明要素を、低コスト製造に適合する様式で製作するのに有用である。
[0202]図44は、低レベル集光レンズを有するマイクロ単結晶シリコン太陽電池の作製に関する概略図を示す。第1のステップ(a)では、マイクロ構造をPDMSからデバイスの裏面電気接点として働く埋込み電極上に転写する。シリコンは、電極表面上にPDMSをラミネートし、PDMSを後方にゆっくりと剥がすことにより転写される。次に、ステップ(b)では、平坦化と、それに続いて上部金属接点の作製を実施する。デバイスは、PDMSから作製した低集光円柱レンズアレイをデバイス上に集積化することにより、完全なものになる(ステップc)。この最終ステップでは、シリコン電池の並びがレンズアレイの焦点と整合するようにデバイスが設計されたことが分かる。
[0210]本発明は、コンタクト印刷方法により製作される半導体ベース光学システムの良好な電気接続を確立するのに有用な方法及びシステムを提供する。本発明の加工ステップ及びデバイス幾何形状は、コンタクト印刷により組み立てられた、電子デバイスと電子デバイス構成要素との間、或いは電子デバイス間又は電子デバイス構成要素間の、効率の良い、機械的に堅固な、高導電性の電気接続を可能にする。本加工ステップ及びデバイス幾何形状は、フォトリソグラフィ処理、堆積技法、及び/又はソフトリソグラフィ(例えばコンタクト印刷)パターニングを含めた、電気相互接続の一連のパターニング及び加工技法に適合する。
[0211]一態様では、本発明は、デバイス基板上にコンタクト印刷により組み立てられた半導体電子デバイス及びデバイス構成要素などの半導体要素の段差エッジから生じる、デバイス電気相互接続の電子的性能の劣化を最小限に抑え、又は完全に回避する、平坦化処理ステップ及び平坦なデバイス幾何形状を提供する。この記載の文脈では、「平坦化」とは、1つ又は複数の印刷可能半導体要素がデバイス基板と、実質的に平坦な幾何形状を有する露出面を有して表面構造が作製されるように集積化されるプロセスを指す。好ましくは、いくつかの用途では、実質的に平坦な幾何形状を有する露出面が、(1つ又は複数の)印刷半導体要素の、例えば光リソグラフィ及び堆積技法を使用してデバイス電気相互接続構造でパターニングすることができる1つ又は複数の個々の表面を含む。平坦な幾何形状とは一般に、表面上のあらゆる点が共通平面を占める表面形状を指す。しかし、この記載の文脈では、実質的に平坦な幾何形状は、絶対的に平坦な形状からのいくらかのずれを含む。いくつかの実施形態では、例えば、実質的に平坦な幾何形状が、絶対的に平坦な形状からの2ミクロン未満の表面位置のずれ、好ましくは、いくつかの実施形態では、絶対的に平坦な形状からの1ミクロン未満の表面位置のずれ、より好ましくは、いくつかの実施形態では、絶対的に平坦な形状からの500ナノメートル未満の表面位置のずれを含む。
[0228]本発明は、電気伝導性メッシュ又はグリッド電極を使用して、コンタクト印刷により組み立てられた印刷可能半導体要素を電気的に相互接続する、デバイス幾何形状及び加工方法も含む。メッシュ及びグリッドの電気相互接続要素及び/又は電極は、任意選択で共形性転写デバイスを使用して、任意選択で、コンタクト印刷方法によりデバイス基板、光学システム、又は光学構成要素の受取面上に組み立てられ、又はコンタクト印刷方法により印刷半導体要素の露出面上に組み立てられる。メッシュ及びグリッド電極を使用する利点には、それらを大面積にわたって効果的にパターニングし、それにより、コンタクト印刷デュー(due)により組み立てられる印刷可能半導体要素の配置精度の面でより大きな許容差を可能にできることがある。この加工及び設計上の利点は、印刷可能半導体要素のコンタクト印刷ベース組立に関係する加工上の制約及びデバイス幾何形状の許容差の緩和をもたらす。例えば、メッシュ及びグリッドの電極及びデバイス相互接続を使用すると、コンタクト印刷により組み立てられる印刷可能半導体要素の整合及び位置に対する設計及び配置の制約が大幅に緩和する。さらに、メッシュ及びグリッド電極を使用すると、多数の印刷可能半導体要素を、単一(又は少数の)加工ステップで効果的に電気的に相互接続することが可能になる。さらに、メッシュ又はグリッド電極の厚さ及び/又は充填率を、これらの電極が光学的に透明となるように選択することができ、それにより、そうした構成要素を、ディスプレイ、光起電力システム、感光システム、及び多機能光学システムなど、メッシュ又はグリッドを通って電磁放射を透過させる必要のある光学システム内に実装することが可能になる。いくつかの実施形態では、グリッド又はメッシュは、選択された電磁放射波長で50%を超えて光学的に透明である。
[0239]本発明は、コンタクト印刷による組立としての電極のパターニング及び電気相互接続を容易にする、印刷可能半導体デバイス及びデバイス構成要素などの印刷可能半導体要素用の電極相互接続幾何形状も含む。こうした相互接続幾何形状は、太陽電池、LED、トランジスタ、ダイオード、レーザ、及びセンサを含む、さまざまな印刷可能電子デバイス及びその構成要素に適用可能である。
[0241]本発明のコンタクト印刷ベースの加工方法の利点は、その方法が、さまざまな光学システム及びその光学構成要素上への直接的なデバイスの組立及び集積化に適合することである。これにより、さまざまな有用な構造及びデバイス幾何形状を、本製作方法を使用して効率的に得ることが可能になる。
[0248]本方法は、太陽電池アレイを含む高性能光起電力システムを製作するための、効果的な加工基盤を提供する。
[0266]本発明の方法及びシステムは、広範な物理的寸法及び形状を有する、印刷可能半導体ベースデバイス及びデバイス構成要素を含む印刷可能半導体要素を用いて実施することが可能である。コンタクト印刷により組み立てられる印刷可能半導体要素の物理的寸法及び形状に対する本発明の汎用性により、広範なデバイス製作用途が可能になり、広範な電子、光学、光電子デバイスの構成及びレイアウトが得られる。
[0274]図76は、PET基板上に印刷した、印刷可能GaAs/InGaAlP赤色LEDアレイを示す。このデバイスを作製するには、PET基板をPDMSの薄い(1〜2ミクロン)層で被覆し、PDMSを熱により硬化し、基板上に疎な金メッシュアレイをコンタクト印刷により印刷する。次いで、メッシュ電極上に1mm×1mm×約0.3mmのLEDをコンタクト印刷する。LEDを印刷した後、その基板に対して、別のメッシュアレイを収容した薄いPDMS基板をラミネートして、LEDの上面への電気的接触を作製し、約5Vで動作させる(上部左側及び右側)。薄いPDMS基板は、LEDアレイを機械的にカプセル化する働きもする。
Claims (117)
- 半導体ベースの光学システムを作製する方法であって、
受取面を有するデバイス基板を準備するステップと、
前記基板の前記受取面上に印刷可能半導体要素をコンタクト印刷により組み立てるステップであり、前記印刷可能半導体要素が、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する半導体構造を備える前記ステップと
を含む方法。 - 前記印刷可能半導体要素が、0.02ミリメートル〜30ミリメートルの範囲から選択される長さ、及び0.02ミリメートル〜30ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項1に記載の方法。
- 前記印刷可能半導体要素が、0.1ミリメートル〜1ミリメートルの範囲から選択される長さ、及び0.1ミリメートル〜1ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項1に記載の方法。
- 前記印刷可能半導体要素が、1ミリメートル〜10ミリメートルの範囲から選択される長さ、及び1ミリメートル〜10ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項1に記載の方法。
- 前記印刷可能半導体要素が、0.0003ミリメートル〜0.3ミリメートルの範囲から選択される厚さを有する半導体構造を備える、請求項1に記載の方法。
- 前記印刷可能半導体要素が、0.002ミリメートル〜0.02ミリメートルの範囲から選択される厚さを有する半導体構造を備える、請求項1に記載の方法。
- 前記基板の前記受取面上に複数の印刷可能半導体要素をコンタクト印刷により組み立てるステップであり、前記印刷可能半導体要素のそれぞれが、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する半導体構造を備える前記ステップを含む、請求項1に記載の方法。
- 前記デバイス基板の前記受取面を1つ又は複数のデバイス構成要素で予めパターニングするステップをさらに含む、請求項1に記載の方法。
- 1つ又は複数の光学構成要素を、前記印刷可能半導体要素と光学的に連絡した状態で設けるステップをさらに含む、請求項1に記載の方法。
- 拡散光学系、分散光学系、収光光学系、集光光学系、及び光ファイバからなる群から選択される光学構成要素アレイを設けるステップであり、前記光学構成要素アレイが、前記印刷可能半導体要素の少なくとも一部分と光学的に連絡した状態で設けられる前記ステップをさらに含む、請求項7に記載の方法。
- 前記アレイの光学構成要素が、前記印刷可能半導体要素のそれぞれに個別にアドレスされる、請求項10に記載の方法。
- 前記光学構成要素アレイが、レプリカ成形により製作され、前記印刷可能半導体要素が、前記光学構成要素アレイの受取面上にコンタクト印刷により組み立てられる、請求項10に記載の方法。
- 第1及び第2の電極を、前記印刷可能半導体要素の露出面と電気的に接触した状態でパターニングするステップをさらに含む、請求項1に記載の方法。
- 前記印刷可能半導体要素が前記受取面上に、乾式転写コンタクト印刷により組み立てられる、請求項1に記載の方法。
- 前記印刷可能半導体要素が前記受取面上に、共形性転写デバイスを使用して組み立てられる、請求項1に記載の方法。
- 前記組み立てるステップが、
接触面を有する前記共形性転写デバイスを準備するステップと、
前記印刷可能半導体要素の外面と前記共形性転写デバイスの前記接触面との間の共形接触を確立するステップであり、前記共形接触が、前記印刷可能半導体要素を前記接触面に接合する前記ステップと、
前記接触面に接合された前記印刷可能半導体要素と前記デバイス基板の前記受取面とを接触させるステップと、
前記印刷可能半導体要素と前記共形性転写デバイスの前記接触面とを分離し、それにより、前記印刷可能半導体要素を前記デバイス基板の前記受取面上に組み立てるステップと
を含む、請求項15に記載の方法。 - 前記印刷可能半導体要素が前記受取面上に、エラストマー転写デバイスを使用して組み立てられる、請求項1に記載の方法。
- 前記印刷可能半導体要素が前記受取面上に、エラストマースタンプを使用して組み立てられる、請求項1に記載の方法。
- 前記印刷可能半導体要素が、電子デバイス又は電子デバイスの構成要素である、請求項1に記載の方法。
- 前記印刷可能半導体要素が、LED、レーザ、太陽電池、センサ、ダイオード、トランジスタ、p−n接合、集積回路、及びフォトダイオードからなる群から選択される電子デバイスである、請求項1に記載の方法。
- 前記印刷可能半導体要素が、別の半導体構造、誘電体構造、導電性構造、及び光学構造からなる群から選択される少なくとも1つの追加構造と共に集積化された前記半導体構造を備える、請求項1に記載の方法。
- 前記印刷可能半導体要素が、電極、誘電体層、光学コーティング、金属接点パッド、及び半導体チャネルからなる群から選択される少なくとも1つの電子デバイス構成要素と共に集積化された前記半導体構造を備える、請求項1に記載の方法。
- 前記印刷可能半導体要素が、LED、レーザ、太陽電池、センサ、ダイオード、トランジスタ、p−n接合、集積回路、及びフォトダイオードからなる群から選択される少なくとも2つの電子デバイスを含む、請求項7に記載の方法。
- 前記印刷可能半導体要素が、100ナノメートル〜100ミクロンの範囲から選択される厚さを有する、請求項1に記載の方法。
- 前記受取面上に接着剤層を設けるステップと、前記印刷可能半導体要素を前記接着剤層と接触させ、それにより、前記印刷可能半導体要素を前記基板の前記受取面に接合するステップとをさらに含む、請求項1に記載の方法。
- 前記接着剤層が、1層又は複数層のポリマー層、プレポリマー層、エラストマー層、金属層、又はそれらの組合せである、請求項25に記載の方法。
- 前記受取面上に組み立てられた前記印刷可能半導体要素を少なくとも部分的にカプセル化又はラミネートすることが可能なラミネート層又はカプセル化層を、前記印刷可能半導体要素と接触して設けるステップをさらに含む、請求項1に記載の方法。
- 前記印刷可能半導体要素が、10000ミクロン2〜1メートル2の範囲で選択される前記受取基板のある領域にわたって組み立てられる、請求項7に記載の方法。
- 前記印刷可能半導体要素が前記基板の前記受取面上に、5半導体要素mm−1以上の密度で組み立てられる、請求項7に記載の方法。
- 前記印刷可能半導体要素が、200ミクロン以下の少なくとも1つの長手方向物理的寸法を有する、請求項1に記載の方法。
- 前記印刷可能半導体要素が、10ナノメートル〜10ミクロンの範囲で選択される断面物理的寸法を有する、請求項1に記載の方法。
- 前記受取面上に組み立てられる前記印刷可能半導体要素相互の相対的な位置が、10,000ナノメートル以内に選択される、請求項7に記載の方法。
- 前記受取面上の前記印刷可能半導体要素が、互いに長手方向に整合され、前記長手方向に整合された半導体要素が、互いに3度以内で平行な長さに延在する、請求項7に記載の方法。
- 前記光学システムが、発光ダイオードアレイ、レーザアレイ、VCSELアレイ、パッシブマトリクスLEDディスプレイ、アクティブマトリクスLEDディスプレイ、光センサ及び光センサアレイ、シートスキャナ、並びに太陽電池アレイからなる群から選択される、請求項1に記載の方法。
- 前記印刷可能半導体要素が単体無機半導体構造を備える、請求項1に記載の方法。
- 前記印刷可能半導体要素が単結晶半導体材料を含む、請求項1に記載の方法。
- 前記光学システム内の1つ又は複数の電極又は電気相互接続構造をもたらす電気伝導性グリッド又はメッシュを、前記印刷可能半導体要素の少なくとも一部分と電気的に接触した状態で設けるステップをさらに含む、請求項7に記載の方法。
- 前記メッシュ又はグリッドが1種又は複数種の金属を含む、請求項37に記載の方法。
- 前記電気伝導性グリッド又はメッシュが、50%を超える光学的透明度を有する、請求項37に記載の方法。
- 前記電気伝導性グリッド又はメッシュが、ラミネートされた構造である、請求項37に記載の方法。
- 前記電気伝導性グリッド又はメッシュがエラストマー層に接合される、請求項37に記載の方法。
- 前記グリッド又はメッシュを前記デバイス基板の前記受取面、又は前記印刷可能半導体要素の少なくとも一部分の外面上に組み立て、それにより、前記グリッド又はメッシュと、前記印刷可能半導体要素の前記少なくとも一部分との間の電気的接触を確立するステップをさらに含む、請求項37に記載の方法。
- 前記金属グリッド又はメッシュから前記印刷可能半導体要素への電気接続が、前記グリッド又はメッシュを前記デバイス基板の前記受取面、又は前記印刷可能半導体要素の少なくとも一部分の外面上に、コンタクト印刷により組み立てることによって確立される、請求項42に記載の方法。
- 半導体ベースの光学システムを作製する方法であって、
内面を有する光学構成要素を準備するステップと、
前記光学構成要素の前記内面上に、電気伝導性グリッド又はメッシュを設けるステップと、
受取面を有するデバイス基板を準備するステップと、
前記基板の前記受取面上に複数の印刷可能半導体要素をコンタクト印刷により組み立てるステップであり、前記印刷可能半導体要素のそれぞれが、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する半導体構造を備える前記ステップと、
前記グリッド又はメッシュを有する前記光学構成要素を前記デバイス基板に転写するステップであり、前記光学構成要素が、前記基板の前記受取面上に組み立てられた前記半導体要素の上面に配置され、前記グリッド又はメッシュが、前記光学構成要素と前記半導体要素との間に設けられ、前記グリッド又はメッシュが、前記印刷可能半導体要素の少なくとも一部分と電気的に接触した状態で設けられる前記ステップと
を含む方法。 - 前記印刷可能半導体要素のそれぞれが、0.02ミリメートル〜30ミリメートルの範囲から選択される長さ、及び0.02ミリメートル〜30ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項44に記載の方法。
- 前記印刷可能半導体要素のそれぞれが、0.1ミリメートル〜1ミリメートルの範囲から選択される長さ、及び0.1ミリメートル〜1ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項44に記載の方法。
- 前記印刷可能半導体要素のそれぞれが、1ミリメートル〜10ミリメートルの範囲から選択される長さ、及び1ミリメートル〜10ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項44に記載の方法。
- 前記印刷可能半導体要素のそれぞれが、0.0003ミリメートル〜0.3ミリメートルの範囲から選択される厚さを有する半導体構造を備える、請求項44に記載の方法。
- 前記印刷可能半導体要素のそれぞれが、0.002ミリメートル〜0.02ミリメートルの範囲から選択される厚さを有する半導体構造を備える、請求項44に記載の方法。
- 前記メッシュ又はグリッドが1種又は複数種の金属を含む、請求項44に記載の方法。
- 前記グリッド又はメッシュが、50%を超える光学的透明度を有する、請求項44に記載の方法。
- 前記グリッド又はメッシュが、ラミネートされた構造である、請求項44に記載の方法。
- 前記グリッド又はメッシュがエラストマー層に接合される、請求項44に記載の方法。
- 前記エラストマー層が、ガラス基板に結合され、前記エラストマー層が、前記グリッド又はメッシュと前記ガラス基板との間に配置される、請求項53に記載の方法。
- 前記グリッド又はメッシュが30%未満の充填率を有する、請求項44に記載の方法。
- 前記光学構成要素を、前記基板の前記受取面上に組み立てられた前記半導体要素の上面に転写する前記ステップが、前記光学構成要素を、前記基板の前記受取面上に組み立てられた前記半導体要素の上面に、コンタクト印刷を使用して組み立てるステップを含む、請求項44に記載の方法。
- 前記グリッド又はメッシュが前記光学構成要素の前記内面上に、コンタクト印刷により組み立てられる、請求項44に記載の方法。
- 前記グリッド又はメッシュが前記光学構成要素の前記内面上に、共形性転写デバイスを使用して組み立てられる、請求項44に記載の方法。
- 前記グリッド又はメッシュが前記光学構成要素の前記内面上に、エラストマー転写デバイスを使用して組み立てられる、請求項44に記載の方法。
- 前記印刷可能半導体要素が前記受取面上に、乾式転写コンタクト印刷を使用して組み立てられる、請求項44に記載の方法。
- 前記光学構成要素が、収光光学構成要素、集光光学構成要素、光拡散光学構成要素、分散光学構成要素、又は光フィルタリング光学構成要素である、請求項44に記載の方法。
- 前記光学構成要素がレンズ又はレンズアレイである、請求項44に記載の方法。
- 前記光学構成要素が、PDMS成形されたレンズ又はPDMS成形されたレンズアレイである、請求項44に記載の方法。
- 前記印刷可能半導体要素が、電子デバイス又は電子デバイス構成要素である、請求項44に記載の方法。
- 前記印刷可能半導体要素が、LED、レーザ、太陽電池、センサ、ダイオード、トランジスタ、p−n接合、集積回路、及びフォトダイオードからなる群から選択される1つ又は複数の電子デバイスである、請求項44に記載の方法。
- 前記印刷可能半導体要素が、別の半導体構造、誘電体構造、導電性構造、及び光学構造からなる群から選択される少なくとも1つの追加構造と共に集積化された前記半導体構造を備える、請求項44に記載の方法。
- 前記印刷可能半導体要素が、電極、誘電体層、光学コーティング、金属接点パッド、及び半導体チャネルからなる群から選択される少なくとも1つの電子デバイス構成要素と共に集積化された前記半導体構造を備える、請求項44に記載の方法。
- 前記印刷可能半導体要素が、100ナノメートル〜100ミクロンの範囲から選択される厚さを有する、請求項44に記載の方法。
- 半導体ベース光学システムを作製する方法であって、
受取面を有するデバイス基板を準備するステップと、
前記基板の前記受取面上に印刷可能半導体要素をコンタクト印刷により組み立てるステップと、
前記受取面上に組み立てられた前記印刷可能半導体要素を平坦化し、それにより、前記半導体ベース光学システムを作製するステップと
を含む方法。 - 前記平坦化するステップが、前記印刷可能半導体要素を前記デバイス基板に埋め込むステップを含む、請求項69に記載の方法。
- 前記基板の前記受取面上に平坦化層を設けるステップをさらに含み、前記平坦化するステップが、前記印刷可能半導体要素を、前記デバイス基板の前記受取面上に設けられた前記平坦化層に埋め込むステップを含む、請求項69に記載の方法。
- 前記平坦化層が、前記受取面上に前記印刷可能半導体要素を組み立てる前記ステップの前に前記受取面に設けられる、請求項71に記載の方法。
- 前記平坦化層が、前記受取面上に前記印刷可能半導体要素を組み立てる前記ステップの後で前記受取面に設けられる、請求項71に記載の方法。
- 前記平坦化層が、10ナノメートル〜1000ミクロンの範囲から選択される厚さを有する、請求項71に記載の方法。
- 前記平坦化層がプレポリマー又はポリマーを含む、請求項71に記載の方法。
- 前記印刷可能半導体要素が中に埋め込まれた前記平坦化層を硬化、重合、又は架橋させ、それにより、前記平坦化層内で前記印刷可能半導体要素を固定するステップをさらに含む、請求項71に記載の方法。
- 前記平坦化するステップが、前記印刷可能半導体要素を有する前記デバイス基板上に実質的に平坦な上面を生成する、請求項69に記載の方法。
- 1つ又は複数の電気相互接続を、前記実質的に平坦な上面の前記平坦化された印刷可能半導体要素の露出面にパターニングするステップをさらに含む、請求項77に記載の方法。
- 前記印刷可能半導体要素が、印刷可能電子デバイス又は電子デバイス構成要素である、請求項69に記載の方法。
- 前記印刷可能半導体要素が、LED、レーザ、太陽電池、センサ、ダイオード、トランジスタ、p−n接合、集積回路、又はフォトダイオードである、請求項69に記載の方法。
- 前記印刷可能半導体要素が、別の半導体構造、誘電体構造、導電性構造、及び光学構造からなる群から選択される少なくとも1つの追加構造と共に集積化された前記半導体構造を備える、請求項69に記載の方法。
- 前記印刷可能半導体要素が、電極、誘電体層、光学コーティング、金属接点パッド、及び半導体チャネルからなる群から選択される少なくとも1つの電子デバイス構成要素と共に集積化された前記半導体構造を備える、請求項69に記載の方法。
- 前記印刷可能半導体要素が、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する、請求項69に記載の方法。
- 前記印刷可能半導体要素が、0.02ミリメートル〜30ミリメートルの範囲から選択される長さ、及び0.02ミリメートル〜30ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項69に記載の方法。
- 前記印刷可能半導体要素が、0.1ミリメートル〜1ミリメートルの範囲から選択される長さ、及び0.1ミリメートル〜1ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項69に記載の方法。
- 前記印刷可能半導体要素が、1ミリメートル〜10ミリメートルの範囲から選択される長さ、及び1ミリメートル〜10ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項69に記載の方法。
- 前記印刷可能半導体要素が、0.0003ミリメートル〜0.3ミリメートルの範囲から選択される厚さを有する半導体構造を備える、請求項69に記載の方法。
- 前記印刷可能半導体要素が、0.002ミリメートル〜0.02ミリメートルの範囲から選択される厚さを有する半導体構造を備える、請求項69に記載の方法。
- 前記基板の前記受取面上に複数の印刷可能半導体要素をコンタクト印刷により組み立てるステップと、
前記受取面上に組み立てられた前記複数の印刷可能半導体要素を平坦化するステップと
を含む、請求項69に記載の方法。 - 前記複数の印刷可能半導体要素が、LED、レーザ、太陽電池、センサ、ダイオード、トランジスタ、p−n接合、集積回路、及びフォトダイオードからなる群から選択される1つ又は複数の電子デバイスを備える、請求項89に記載の方法。
- 半導体ベース光学システムを作製する方法であって、
受取面を有する光学構成要素を準備するステップと、
前記光学構成要素の前記受取面上に印刷可能半導体要素をコンタクト印刷により組み立てるステップであり、前記印刷可能半導体要素が、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する半導体構造を備える前記ステップと
を含む方法。 - 前記印刷可能半導体要素が、0.02ミリメートル〜30ミリメートルの範囲から選択される長さ、及び0.02ミリメートル〜30ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項91に記載の方法。
- 前記印刷可能半導体要素が、0.1ミリメートル〜1ミリメートルの範囲から選択される長さ、及び0.1ミリメートル〜1ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項91に記載の方法。
- 前記印刷可能半導体要素が、1ミリメートル〜10ミリメートルの範囲から選択される長さ、及び1ミリメートル〜10ミリメートルの範囲から選択される幅を有する半導体構造を備える、請求項91に記載の方法。
- 前記印刷可能半導体要素が、0.0003ミリメートル〜0.3ミリメートルの範囲から選択される厚さを有する半導体構造を備える、請求項91に記載の方法。
- 前記印刷可能半導体要素が、0.002ミリメートル〜0.02ミリメートルの範囲から選択される厚さを有する半導体構造を備える、請求項91に記載の方法。
- 前記光学構成要素の前記受取面上に複数の印刷可能半導体要素をコンタクト印刷により組み立てるステップであり、前記印刷可能半導体要素のそれぞれが、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する半導体構造を備える前記ステップを含む、請求項91に記載の方法。
- 前記光学構成要素が、収光光学構成要素、集光光学構成要素、光拡散光学構成要素、光分散光学構成要素、又は光フィルタリング光学構成要素である、請求項91に記載の方法。
- 前記光学構成要素が、レンズ、レンズアレイ、反射器、反射器アレイ、導波路、導波路アレイ、光学コーティング、光学コーティングアレイ、光学フィルタ、光学フィルタアレイ、光ファイバ要素、及び光ファイバ要素アレイからなる群から選択される、請求項91に記載の方法。
- 前記光学構成要素がレプリカ成形により製作されるレンズアレイである、請求項91に記載の方法。
- 前記光学構成要素が、収光光学構成要素、集光光学構成要素、光拡散光学構成要素、分散光学構成要素、又は光フィルタリング光学構成要素のアレイである、請求項91に記載の方法。
- 前記アレイ内にある前記構成要素のそれぞれが、前記印刷可能半導体要素の少なくとも1つに対して空間的に整合される、請求項101に記載の方法。
- 前記アレイ内にある前記構成要素のそれぞれが、前記印刷可能半導体要素の少なくとも1つに個別にアドレスされる、請求項101に記載の方法。
- 前記印刷可能半導体要素が、電子デバイス又は電子デバイス構成要素である、請求項91に記載の方法。
- 前記印刷可能半導体要素が、LED、レーザ、太陽電池、センサ、ダイオード、トランジスタ、p−n接合、集積回路、及びフォトダイオードからなる群から選択される1つ又は複数の電子デバイスである、請求項91に記載の方法。
- 前記印刷可能半導体要素が、別の半導体構造、誘電体構造、導電性構造、及び光学構造からなる群から選択される少なくとも1つの追加構造と共に集積化された前記半導体構造を備える、請求項91に記載の方法。
- 前記印刷可能半導体要素が、電極、誘電体層、光学コーティング、金属接点パッド、及び半導体チャネルからなる群から選択される少なくとも1つの電子デバイス構成要素と共に集積化された前記半導体構造を備える、請求項91に記載の方法。
- 前記印刷可能半導体要素のそれぞれが、100ナノメートル〜100ミクロンの範囲から選択される厚さを有する、請求項91に記載の方法。
- 前記印刷可能半導体要素が前記受取面上に、乾式転写コンタクト印刷により組み立てられる、請求項91に記載の方法。
- 前記印刷可能半導体要素が前記受取面上に、共形性転写デバイスを使用して組み立てられる、請求項91に記載の方法。
- 前記組み立てるステップが、
接触面を有する前記共形性転写デバイスを準備するステップと、
前記印刷可能半導体要素の外面と前記共形性転写デバイスの前記接触面との間の共形接触を確立するステップであり、前記共形接触が、前記印刷可能半導体要素を前記接触面に接合する前記ステップと、
前記接触面に接合された前記印刷可能半導体要素と前記光学構成要素の前記受取面とを接触させるステップと、
前記印刷可能半導体要素と前記共形性転写デバイスの前記接触面とを分離し、それにより、前記印刷可能半導体要素を前記光学構成要素の前記受取面上に組み立てるステップと
を含む、請求項110に記載の方法。 - 前記印刷可能半導体要素が前記受取面上に、エラストマー転写デバイスを使用して組み立てられる、請求項91に記載の方法。
- 前記印刷可能半導体要素が前記受取面上に、エラストマースタンプを使用して組み立てられる、請求項91に記載の方法。
- 前記光学構成要素の前記受取面に接着剤層又は平坦化層を設けるステップをさらに含む、請求項91に記載の方法。
- 受取面を有するデバイス基板を準備するステップと、
前記基板の前記受取面上に印刷可能半導体要素をコンタクト印刷により組み立てるステップであり、前記印刷可能半導体要素が、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する半導体構造を備える前記ステップと
を含む方法により作製されるデバイスを備える、半導体ベース光学システム。 - 受取面を有するデバイス基板と、
前記受取面により支持される平坦化された印刷可能半導体要素とを備え、前記印刷可能半導体要素を有する前記デバイス基板が、前記印刷可能半導体要素を含む前記実質的に平坦な上面を有し、前記平坦化された印刷可能半導体要素が、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する半導体構造を備える
半導体ベース光学システム。 - 半導体ベースの光学システムであって、
受取面を有するデバイス基板と、
前記受取面により支持される複数の印刷可能半導体要素であり、前記印刷可能半導体要素のそれぞれが、0.0001ミリメートル〜1000ミリメートルの範囲から選択される長さ、0.0001ミリメートル〜1000ミリメートルの範囲から選択される幅、及び0.00001ミリメートル〜3ミリメートルの範囲から選択される厚さを有する半導体構造を備える、前記複数の印刷可能半導体要素と、
前記受取面により支持される前記複数の印刷可能半導体要素の少なくとも一部分と電気的に接触した状態で設けられるグリッド又はメッシュであり、電気伝導性材料を含み、前記光学システムの電気相互接続構造又は電極をもたらす前記グリッド又はメッシュと
を備える、半導体ベース光学システム。
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