JP2009537458A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2009537458A5 JP2009537458A5 JP2009510242A JP2009510242A JP2009537458A5 JP 2009537458 A5 JP2009537458 A5 JP 2009537458A5 JP 2009510242 A JP2009510242 A JP 2009510242A JP 2009510242 A JP2009510242 A JP 2009510242A JP 2009537458 A5 JP2009537458 A5 JP 2009537458A5
- Authority
- JP
- Japan
- Prior art keywords
- functional group
- alkyl
- hydrogen
- polymer binder
- polyvinyl alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000524 functional group Chemical group 0.000 claims 20
- 125000000217 alkyl group Chemical group 0.000 claims 19
- 239000001257 hydrogen Substances 0.000 claims 13
- 229910052739 hydrogen Inorganic materials 0.000 claims 13
- -1 hexafluoroantimonate Chemical compound 0.000 claims 12
- 239000002491 polymer binding agent Substances 0.000 claims 12
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 11
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims 11
- 229920001577 copolymer Polymers 0.000 claims 11
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims 11
- 229920002451 polyvinyl alcohol Polymers 0.000 claims 11
- 125000003118 aryl group Chemical group 0.000 claims 10
- 239000011248 coating agent Substances 0.000 claims 10
- 238000000576 coating method Methods 0.000 claims 10
- 229920005596 polymer binder Polymers 0.000 claims 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 7
- 238000010538 cationic polymerization reaction Methods 0.000 claims 5
- 238000010526 radical polymerization reaction Methods 0.000 claims 5
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims 3
- 238000010521 absorption reaction Methods 0.000 claims 3
- 125000000129 anionic group Chemical group 0.000 claims 3
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims 3
- 229920001688 coating polymer Polymers 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 3
- 150000002431 hydrogen Chemical class 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims 3
- DAIWSSSTZCBQEX-UHFFFAOYSA-N COC(NS(=O)(=O)CC1=CC=CC=C1)=O Chemical group COC(NS(=O)(=O)CC1=CC=CC=C1)=O DAIWSSSTZCBQEX-UHFFFAOYSA-N 0.000 claims 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical group CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims 2
- 229920003086 cellulose ether Polymers 0.000 claims 2
- 125000004663 dialkyl amino group Chemical group 0.000 claims 2
- YOZHLACIXDCHPV-UHFFFAOYSA-N n-(methoxymethyl)-2-methylprop-2-enamide Chemical compound COCNC(=O)C(C)=C YOZHLACIXDCHPV-UHFFFAOYSA-N 0.000 claims 2
- ULYOZOPEFCQZHH-UHFFFAOYSA-N n-(methoxymethyl)prop-2-enamide Chemical compound COCNC(=O)C=C ULYOZOPEFCQZHH-UHFFFAOYSA-N 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 claims 2
- 229920001451 polypropylene glycol Polymers 0.000 claims 2
- 125000005208 trialkylammonium group Chemical group 0.000 claims 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
- 125000004103 aminoalkyl group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 239000004202 carbamide Substances 0.000 claims 1
- LZDLRJOUWKXNIG-UHFFFAOYSA-N carbonic acid;fluoroform Chemical compound OC(O)=O.FC(F)F LZDLRJOUWKXNIG-UHFFFAOYSA-N 0.000 claims 1
- 125000004181 carboxyalkyl group Chemical group 0.000 claims 1
- 125000002091 cationic group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical group 0.000 claims 1
- 125000001033 ether group Chemical group 0.000 claims 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 125000001624 naphthyl group Chemical group 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 125000004964 sulfoalkyl group Chemical group 0.000 claims 1
- 150000005621 tetraalkylammonium salts Chemical class 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US74747406P | 2006-05-17 | 2006-05-17 | |
| US60/747,474 | 2006-05-17 | ||
| PCT/CA2007/000820 WO2007131336A1 (en) | 2006-05-17 | 2007-05-09 | New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009537458A JP2009537458A (ja) | 2009-10-29 |
| JP2009537458A5 true JP2009537458A5 (https=) | 2010-04-02 |
| JP5254958B2 JP5254958B2 (ja) | 2013-08-07 |
Family
ID=38693485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009510242A Expired - Fee Related JP5254958B2 (ja) | 2006-05-17 | 2007-05-09 | 平版印刷版コーティング用新規材料、それを含有する平版印刷版およびコーティング、調製方法ならびに使用 |
Country Status (11)
| Country | Link |
|---|---|
| US (4) | US7910768B2 (https=) |
| EP (1) | EP2018365B1 (https=) |
| JP (1) | JP5254958B2 (https=) |
| KR (1) | KR101174949B1 (https=) |
| CN (1) | CN101454277B (https=) |
| BR (1) | BRPI0707574B1 (https=) |
| CA (1) | CA2652294C (https=) |
| ES (1) | ES2530792T3 (https=) |
| RU (1) | RU2443683C2 (https=) |
| UA (1) | UA98450C2 (https=) |
| WO (1) | WO2007131336A1 (https=) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007131336A1 (en) * | 2006-05-17 | 2007-11-22 | American Dye Source Inc. | New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| WO2008022431A1 (en) * | 2006-08-24 | 2008-02-28 | American Dye Source Inc. | Reactive near infrared absorbing polymeric particles, methods of preparation and uses thereof |
| US7723013B2 (en) * | 2007-01-11 | 2010-05-25 | Southern Lithoplate, Inc. | Negative-acting photolithographic printing plate with improved pre-burn performance |
| EP2098367A1 (en) * | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| US8354216B2 (en) * | 2008-07-15 | 2013-01-15 | Eastman Kodak Company | Negative-working imaging elements and methods of use |
| US8137896B2 (en) * | 2008-07-29 | 2012-03-20 | Eastman Kodak Company | Method of preparing lithographic printing plates |
| JP5622484B2 (ja) * | 2009-08-20 | 2014-11-12 | 富士フイルム株式会社 | 発色感光性組成物、平版印刷版原版及び新規シアニン色素 |
| CA2768722C (en) | 2009-09-15 | 2014-12-09 | Mylan Group | Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates |
| UA105045C2 (uk) | 2009-10-29 | 2014-04-10 | Майлен Груп | Галотаніни для покривних композицій офсетної друкарської форми |
| WO2011130855A1 (en) | 2010-04-20 | 2011-10-27 | Mylan Group | Substrate for lithographic printing plate |
| BR112012030319A2 (pt) | 2010-09-14 | 2016-08-09 | Mylan Group | copolímeros para composições de revestimentos sensíveis à radiação infravermelha próxima para placas de impressão litográfica térmicas de funcionamento positivo |
| JP5955584B2 (ja) * | 2012-02-24 | 2016-07-20 | 株式会社Adeka | 新規化合物及び着色アルカリ現像性感光性組成物 |
| JP6312803B2 (ja) | 2013-04-10 | 2018-04-18 | マイラン・グループ | 積層基板を含む平版印刷版 |
| CN106463061B (zh) * | 2014-05-27 | 2019-10-18 | 本田技研工业株式会社 | 碰撞可能性判定装置 |
| US20160259243A1 (en) * | 2015-03-03 | 2016-09-08 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| JP6817934B2 (ja) * | 2015-05-29 | 2021-01-20 | 富士フイルム株式会社 | 近赤外線吸収性色素多量体、組成物、膜、光学フィルタ、パターン形成方法および装置 |
| CN105859631B (zh) * | 2016-05-06 | 2019-04-02 | 南昌航空大学 | 一种镀锌钢板用高透明防指纹树脂的制备方法 |
| CN105859632B (zh) * | 2016-05-06 | 2019-04-02 | 南昌航空大学 | 一种电子束固化高透明防指纹树脂的制备方法 |
| CN105778042B (zh) * | 2016-05-06 | 2018-09-07 | 南昌航空大学 | 一种电子束固化耐指纹聚氨酯丙烯酸酯的制备方法 |
| CN105732943B (zh) * | 2016-05-06 | 2019-01-22 | 南昌航空大学 | 一种聚甲基丙烯酸甲酯用高透明防指纹树脂的制备方法 |
| CN105778040B (zh) * | 2016-05-06 | 2018-08-24 | 南昌航空大学 | 一种环保耐指纹树脂的制备方法 |
| CN105778041B (zh) * | 2016-05-06 | 2019-01-15 | 南昌航空大学 | 一种耐磨耐指纹树脂的制备方法 |
| WO2019013139A1 (ja) * | 2017-07-13 | 2019-01-17 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の製版方法、発色組成物、硬化性組成物、及び、画像形成材料 |
| JP7075477B2 (ja) * | 2018-03-05 | 2022-05-25 | 富士フイルム株式会社 | 感光性組成物 |
| CN112512825B (zh) * | 2018-07-30 | 2022-10-25 | 富士胶片株式会社 | 机上显影型平版印刷版原版、平版印刷版的制作方法及平版印刷方法 |
| JP7357062B2 (ja) * | 2019-08-28 | 2023-10-05 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法、化合物、樹脂 |
| US20210078350A1 (en) | 2019-09-17 | 2021-03-18 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US11714354B2 (en) | 2020-03-25 | 2023-08-01 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| CN111691219B (zh) * | 2020-05-28 | 2022-02-08 | 仙鹤股份有限公司 | 一种高撕裂度ctp版衬纸及其制备方法 |
| WO2022212032A1 (en) | 2021-04-01 | 2022-10-06 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US12436459B2 (en) | 2021-04-01 | 2025-10-07 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US20230091079A1 (en) * | 2021-07-23 | 2023-03-23 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| US12222645B2 (en) | 2022-03-03 | 2025-02-11 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| JP2023138231A (ja) * | 2022-03-18 | 2023-10-02 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
| US20240069439A1 (en) | 2022-08-12 | 2024-02-29 | Eastman Kodak Company | Lithographic printing plate precursor and method of use |
| EP4421131A1 (en) * | 2023-02-23 | 2024-08-28 | Dover Europe Sàrl | Polymeric dyes |
| CN117700586B (zh) * | 2024-02-05 | 2024-05-28 | 中国科学院理化技术研究所 | 基于聚苯乙烯类碘鎓盐及其光刻胶组合物 |
Family Cites Families (64)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2929710A (en) * | 1954-10-08 | 1960-03-22 | Du Pont | Polyvinyl acetal with terminal vinylidene groups |
| US3043805A (en) * | 1958-08-05 | 1962-07-10 | Du Pont | Polymeric amides and their preparation |
| US3418295A (en) * | 1965-04-27 | 1968-12-24 | Du Pont | Polymers and their preparation |
| US3448089A (en) * | 1966-03-14 | 1969-06-03 | Du Pont | Photopolymerizable polymers containing free acid or acid anhydride groups reacted with glycidyl acrylate or glycidyl methacrylate |
| US3885964A (en) | 1974-05-31 | 1975-05-27 | Du Pont | Photoimaging process using nitroso dimer |
| LU76471A1 (https=) * | 1976-12-24 | 1978-07-10 | ||
| US4345017A (en) | 1980-10-06 | 1982-08-17 | Polaroid Corporation | Photographic products and processes with a pH sensitive xanthene light screening dye |
| DE3144905A1 (de) * | 1981-11-12 | 1983-05-19 | Basf Ag, 6700 Ludwigshafen | Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials |
| US4701402A (en) * | 1984-02-13 | 1987-10-20 | Minnesota Mining And Manufacturing Company | Oxidative imaging |
| US4656229A (en) | 1985-12-02 | 1987-04-07 | National Starch And Chemical Corporation | Anaerobic adhesive compositions |
| DE69411242T2 (de) | 1993-04-20 | 1999-03-25 | Asahi Kasei Kogyo K.K., Osaka | Lithographische druckplatte sowie verfahren zu ihrer herstellung |
| WO1996018133A1 (en) | 1994-12-06 | 1996-06-13 | Napp Systems, Inc. | High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor |
| TR199800369T1 (xx) | 1995-09-02 | 1998-05-21 | New Transducers Limited | Titre�im d�n��t�r�c�leri. |
| EP0770495B1 (en) | 1995-10-24 | 2002-06-19 | Agfa-Gevaert | A method for making a lithographic printing plate involving on press development |
| CA2187046A1 (fr) * | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
| US6008813A (en) | 1997-08-01 | 1999-12-28 | Mitsubishi Electric Information Technology Center America, Inc. (Ita) | Real-time PC based volume rendering system |
| TW436491B (en) * | 1997-08-22 | 2001-05-28 | Ciba Sc Holding Ag | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions |
| US6261740B1 (en) * | 1997-09-02 | 2001-07-17 | Kodak Polychrome Graphics, Llc | Processless, laser imageable lithographic printing plate |
| JP3770436B2 (ja) * | 1997-12-15 | 2006-04-26 | 富士写真フイルム株式会社 | 光重合性組成物 |
| JP2000119306A (ja) | 1998-03-20 | 2000-04-25 | Nippon Soda Co Ltd | ヨ―ドニウム塩化合物を含有する光硬化性組成物 |
| DE69936995T2 (de) * | 1998-03-20 | 2008-05-21 | Nippon Soda Co. Ltd. | Photohärtbare zusammensetzung welche ein iodoniumsalz enthält |
| DE19824546A1 (de) * | 1998-06-03 | 1999-12-09 | Basf Drucksysteme Gmbh | Herstellung vernetzbarer wasserlöslicher oder wasserdispergierbarer Zusammensetzungen und daraus erhältlicher strahlungsempfindlicher Gemische |
| US6884562B1 (en) * | 1998-10-27 | 2005-04-26 | E. I. Du Pont De Nemours And Company | Photoresists and processes for microlithography |
| US6687402B1 (en) | 1998-12-18 | 2004-02-03 | Cognex Corporation | Machine vision methods and systems for boundary feature comparison of patterns and images |
| EP1035105A1 (de) * | 1999-03-11 | 2000-09-13 | Goldschmidt AG | Estergruppen enthaltende Iodoniumsalze und ihre Verwendung zur Strahlenhärtung kationisch härtender Massen |
| US6124425A (en) | 1999-03-18 | 2000-09-26 | American Dye Source, Inc. | Thermally reactive near infrared absorption polymer coatings, method of preparing and methods of use |
| WO2000058930A1 (en) * | 1999-03-30 | 2000-10-05 | Minnesota Mining And Manufacturing Company | Adhesion-enhancing surfaces for marking materials |
| US6255033B1 (en) | 1999-07-30 | 2001-07-03 | Creo, Ltd. | Positive acting photoresist compositions and imageable element |
| AU5649400A (en) * | 1999-09-21 | 2001-10-11 | Goldschmidt Ag | Photoinitiators containing urethane groups for cationic curing |
| US6566035B1 (en) * | 1999-10-29 | 2003-05-20 | Fuji Photo Film Co., Ltd. | Negative-type image recording material and precursor for negative-type lithographic printing plate |
| US20020015826A1 (en) * | 2000-04-11 | 2002-02-07 | Darryl Desmarteau | Zwitterionic iodonium compounds and methods of application |
| JP2002069110A (ja) * | 2000-09-01 | 2002-03-08 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| US6548222B2 (en) * | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
| JP4102014B2 (ja) | 2000-10-03 | 2008-06-18 | 富士フイルム株式会社 | 感光性平版印刷版 |
| JP2002139828A (ja) | 2000-11-06 | 2002-05-17 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| US6777155B2 (en) * | 2000-10-03 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
| JP4253432B2 (ja) * | 2000-11-01 | 2009-04-15 | 富士フイルム株式会社 | 平版印刷版用原版 |
| JP2002207293A (ja) * | 2001-01-12 | 2002-07-26 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US6582882B2 (en) | 2001-04-04 | 2003-06-24 | Kodak Polychrome Graphics Llc | Imageable element comprising graft polymer |
| US6899994B2 (en) * | 2001-04-04 | 2005-05-31 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments |
| US7049046B2 (en) | 2004-03-30 | 2006-05-23 | Eastman Kodak Company | Infrared absorbing compounds and their use in imageable elements |
| US6846614B2 (en) * | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
| JP2003248285A (ja) * | 2001-08-07 | 2003-09-05 | Konica Corp | 熱現像銀塩写真感光材料 |
| TW200304449A (en) * | 2002-02-15 | 2003-10-01 | Shipley Co Llc | Functionalized polymer, method of preparing the same, and photoimageable composition |
| US7659046B2 (en) | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
| US6983694B2 (en) | 2002-04-26 | 2006-01-10 | Agfa Gevaert | Negative-working thermal lithographic printing plate precursor comprising a smooth aluminum support |
| JP2004012706A (ja) * | 2002-06-05 | 2004-01-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| US6969575B2 (en) * | 2002-08-29 | 2005-11-29 | Fuji Photo Film Co., Ltd. | On-press developable lithographic printing plate precursor |
| EP1442877B1 (en) | 2003-01-29 | 2007-04-18 | FUJIFILM Corporation | Presensitized lithographic plate comprising microcapsules |
| JP4070637B2 (ja) * | 2003-03-05 | 2008-04-02 | 富士フイルム株式会社 | 重合性組成物、それに用いる化合物、それに用いた画像形成材料および感光性平版印刷版 |
| JP4473262B2 (ja) | 2003-03-14 | 2010-06-02 | コダック グラフィック コミュニケーションズ カナダ カンパニー | 放射線感受性素子の現像性促進 |
| US7368215B2 (en) | 2003-05-12 | 2008-05-06 | Eastman Kodak Company | On-press developable IR sensitive printing plates containing an onium salt initiator system |
| DE102004029501A1 (de) * | 2004-06-18 | 2006-01-12 | Kodak Polychrome Graphics Gmbh | Modifizierte Polymere und ihre Verwendung bei der Herstellung von Lithographie-Druckplattenvorläufern |
| US7279263B2 (en) * | 2004-06-24 | 2007-10-09 | Kodak Graphic Communications Canada Company | Dual-wavelength positive-working radiation-sensitive elements |
| US20060032390A1 (en) * | 2004-07-30 | 2006-02-16 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method |
| JP2006058430A (ja) | 2004-08-18 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP2006335826A (ja) | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
| US7473515B2 (en) * | 2005-06-03 | 2009-01-06 | American Dye Source, Inc. | Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
| JP5204371B2 (ja) | 2005-06-06 | 2013-06-05 | 富士フイルム株式会社 | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
| JP5170960B2 (ja) | 2005-08-29 | 2013-03-27 | 富士フイルム株式会社 | 平版印刷版原版、及び平版印刷方法 |
| US7169518B1 (en) | 2006-04-17 | 2007-01-30 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
| WO2007131336A1 (en) * | 2006-05-17 | 2007-11-22 | American Dye Source Inc. | New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| CN101269564B (zh) * | 2007-03-19 | 2012-02-15 | 成都新图印刷技术有限公司 | 热敏阴图平版印刷版的制备方法 |
| WO2021062463A1 (en) | 2019-09-30 | 2021-04-08 | Robert Bosch (Australia) Pty Ltd | Method and system for relay attack prevention incorporating channel coherence |
-
2007
- 2007-05-09 WO PCT/CA2007/000820 patent/WO2007131336A1/en not_active Ceased
- 2007-05-09 EP EP07719744.0A patent/EP2018365B1/en not_active Not-in-force
- 2007-05-09 RU RU2008131537/05A patent/RU2443683C2/ru not_active IP Right Cessation
- 2007-05-09 CA CA2652294A patent/CA2652294C/en not_active Expired - Fee Related
- 2007-05-09 CN CN200780005807.2A patent/CN101454277B/zh not_active Expired - Fee Related
- 2007-05-09 US US11/746,252 patent/US7910768B2/en not_active Expired - Fee Related
- 2007-05-09 ES ES07719744T patent/ES2530792T3/es active Active
- 2007-05-09 BR BRPI0707574A patent/BRPI0707574B1/pt not_active IP Right Cessation
- 2007-05-09 KR KR1020087030720A patent/KR101174949B1/ko not_active Expired - Fee Related
- 2007-05-09 JP JP2009510242A patent/JP5254958B2/ja not_active Expired - Fee Related
- 2007-09-05 UA UAA200810363A patent/UA98450C2/uk unknown
-
2009
- 2009-10-15 US US12/579,844 patent/US8021827B2/en not_active Expired - Fee Related
- 2009-10-15 US US12/579,881 patent/US8323867B2/en not_active Expired - Fee Related
-
2011
- 2011-07-25 US US13/189,908 patent/US20120003584A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2009537458A5 (https=) | ||
| RU2008131537A (ru) | Новые материалы для покрытий офсетных печатных форм, офсетные печатные формы и покрытия, содержащие эти материалы, способы получения и применение | |
| Wang et al. | Organoboron-based photochromic copolymers for erasable writing and patterning | |
| US20020058601A1 (en) | Compositions including ether-capped poly(oxyalkylated) alcohol wetting agents | |
| JP2005527677A5 (https=) | ||
| CN106279522A (zh) | 一种速溶型阳离子聚丙烯酰胺类包被剂及其制备方法 | |
| RU2009110493A (ru) | Реакционноспособные полимерные частицы, поглощающие инфракрасное излучение в ближней области, способы их получения и их применение | |
| RU2012102774A (ru) | Сополимеры, полимерные частицы, содержащие упомянутые сополимеры, и сополимерные связующие для композиций радиационно-чувствительных покрытий для негативных копировальных радиационно-чувствительных литографических печатных форм | |
| CN107099006B (zh) | 一种具有液晶及光记忆储存型梳状高分子材料的制备方法 | |
| JP2014224970A5 (https=) | ||
| CN105068378A (zh) | 一种用于3d打印的阻燃型sla光敏树脂 | |
| CN109790257A (zh) | 高分子化合物 | |
| CN113831428A (zh) | 一种硫杂蒽酮-查尔酮光引发剂及其制备方法和应用 | |
| JP5594730B2 (ja) | 金属高分子錯体からなるミセルの分散液 | |
| US11713409B2 (en) | Substituted saccharides or glycosides and use thereof in a drilling fluid composition | |
| CN105283527A (zh) | 感光性亲水性涂料 | |
| JP2012068357A5 (https=) | ||
| CN103073659B (zh) | 一种水溶性有机硅大分子光引发剂及其制备方法 | |
| CN106065076B (zh) | 一种水溶性硅醚嵌段离子液体型大分子光引发剂及其制备方法 | |
| CN104004508A (zh) | 一种导电性混金属聚合物薄膜材料的制备方法 | |
| CN119931601A (zh) | 一种高效润湿与凝聚复合型抑尘材料及其制备方法和应用 | |
| US20250236606A1 (en) | Polydentate organic ligand, metallo-supramolecular polymer, polymer film and preparation method thereof | |
| JPS604568A (ja) | 耐摩耗撥水性皮膜 | |
| CN116419737B (zh) | 牙科组合物 | |
| KR102456401B1 (ko) | 레지스트 하층막 형성용 조성물, 레지스트 하층막, 레지스트 하층막의 형성 방법, 패터닝된 기판의 제조 방법 및 화합물 |