JP2009514012A5 - - Google Patents

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Publication number
JP2009514012A5
JP2009514012A5 JP2008537641A JP2008537641A JP2009514012A5 JP 2009514012 A5 JP2009514012 A5 JP 2009514012A5 JP 2008537641 A JP2008537641 A JP 2008537641A JP 2008537641 A JP2008537641 A JP 2008537641A JP 2009514012 A5 JP2009514012 A5 JP 2009514012A5
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workpiece
pattern
pixel
pixel grid
axis
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JP2008537641A
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JP2009514012A (ja
JP4938784B2 (ja
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Priority claimed from PCT/SE2006/001214 external-priority patent/WO2007050023A1/en
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JP2008537641A 2005-10-26 2006-10-26 書込み装置および方法 Active JP4938784B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US73000905P 2005-10-26 2005-10-26
US60/730,009 2005-10-26
US77691906P 2006-02-28 2006-02-28
US60/776,919 2006-02-28
PCT/SE2006/001214 WO2007050023A1 (en) 2005-10-26 2006-10-26 Writing apparatuses and methods

Publications (3)

Publication Number Publication Date
JP2009514012A JP2009514012A (ja) 2009-04-02
JP2009514012A5 true JP2009514012A5 (enExample) 2009-11-12
JP4938784B2 JP4938784B2 (ja) 2012-05-23

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JP2008537640A Active JP4938783B2 (ja) 2005-10-26 2006-10-26 書き込み装置及び書き込み方法
JP2008537641A Active JP4938784B2 (ja) 2005-10-26 2006-10-26 書込み装置および方法

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JP2008537640A Active JP4938783B2 (ja) 2005-10-26 2006-10-26 書き込み装置及び書き込み方法

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US (3) US20070182808A1 (enExample)
EP (1) EP1987397A4 (enExample)
JP (2) JP4938783B2 (enExample)
KR (2) KR101474566B1 (enExample)
WO (2) WO2007050022A2 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101474566B1 (ko) 2005-10-26 2014-12-18 마이크로닉 마이데이터 아베 라이팅 장치 및 방법
US8049695B2 (en) * 2007-10-15 2011-11-01 Sharp Laboratories Of America, Inc. Correction of visible mura distortions in displays by use of flexible system for memory resources and mura characteristics
TWI427431B (zh) * 2008-09-22 2014-02-21 Ａｓｍｌ荷蘭公司 微影裝置、可程式化圖案化器件及微影方法
JP5722786B2 (ja) 2008-12-05 2015-05-27 コーニンクレッカ フィリップス エヌ ヴェ パターニングされたｌｅｄデバイス、パターニングを発生させるための方法、パターニングのためのシステム、及びシステムを較正するための方法
JP5469674B2 (ja) 2008-12-05 2014-04-16 マイクロニック マイデータ アーベー 被加工物に書き込む方法およびシステム
US8127628B2 (en) 2009-02-10 2012-03-06 Consolidated Edison Company Of New York, Inc. Gas meter reading system
WO2010093391A1 (en) 2009-02-10 2010-08-19 Consolidated Edison Company Of New York, Inc. Optical reading system and method of operation
US8570613B2 (en) 2009-03-06 2013-10-29 Micronic Laser Systems Ab Lithographic printing system with placement corrections
IL198719A0 (en) * 2009-05-12 2010-02-17 Orbotech Ltd Optical imaging system
EP2267534A1 (en) * 2009-06-22 2010-12-29 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Illumination system
CN102713759B (zh) * 2009-09-01 2015-04-29 麦克罗尼克迈达塔有限责任公司 图案产生系统
JP2011090055A (ja) 2009-10-20 2011-05-06 Sony Corp 露光装置及び露光方法
JP5219982B2 (ja) * 2009-11-20 2013-06-26 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
TWI448830B (zh) 2010-02-09 2014-08-11 Ａｓｍｌ荷蘭公司 微影裝置及元件製造方法
NL2006256A (en) 2010-02-23 2011-08-24 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2006261A (en) 2010-02-25 2011-08-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5778703B2 (ja) * 2010-03-03 2015-09-16 マイクロニック アーベーＭｙｃｒｏｎｉｃ Ａｂ 校正システムを有するパターン発生器
US9696633B2 (en) 2010-04-12 2017-07-04 Asml Netherlands B.V. Substrate handling apparatus and lithographic apparatus
US9316926B2 (en) 2010-12-08 2016-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG193240A1 (en) 2011-03-29 2013-10-30 Asml Netherlands Bv Measurement of the position of a radiation beam spot in lithography
WO2012136434A2 (en) 2011-04-08 2012-10-11 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
KR101579916B1 (ko) 2011-04-21 2015-12-23 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 리소그래피 장치를 유지하는 방법, 및 디바이스 제조 방법
EP2541323B1 (en) * 2011-06-27 2013-06-05 National Formosa University Manufacturing-process equipment
KR101633744B1 (ko) 2011-08-18 2016-06-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
FR2980859B1 (fr) * 2011-09-30 2013-10-11 Commissariat Energie Atomique Procede et dispositif de lithographie
NL2009342A (en) 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US10346729B2 (en) 2011-11-29 2019-07-09 Asml Netherlands B.V. Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
CN103946750B (zh) 2011-11-29 2019-03-29 Asml荷兰有限公司 光刻设备、器件制造方法和计算机程序
NL2009806A (en) 2011-12-05 2013-06-10 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2009817A (en) 2011-12-06 2013-06-10 Asml Netherlands Bv A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program.
NL2009902A (en) * 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2009979A (en) 2012-01-12 2013-07-15 Asml Netherlands Bv A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program.
JP5905126B2 (ja) 2012-01-17 2016-04-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
US9715183B2 (en) 2012-02-23 2017-07-25 Asml Netherlands B.V. Device, lithographic apparatus, method for guiding radiation and device manufacturing method
TWI638241B (zh) 2012-03-26 2018-10-11 日商尼康股份有限公司 基板處理裝置、處理裝置及元件製造方法
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
WO2014140047A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
WO2014140046A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Mechanically produced alignment fiducial method and device
DE102014207866A1 (de) * 2014-04-25 2015-10-29 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Regelung der Positionierung einer Vielzahl von verstellbaren Spiegel-Elementen einer Vielspiegel-Anordnung
WO2017040639A1 (en) 2015-08-31 2017-03-09 Lithoptek LLC Apparatus and method for using scanning light beam for film or surface modification
JP6327305B2 (ja) * 2016-09-01 2018-05-23 株式会社ニコン パターン露光装置及びデバイス製造方法

Family Cites Families (93)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4131782A (en) * 1976-05-03 1978-12-26 Lasag Ag Method of and apparatus for machining large numbers of holes of precisely controlled size by coherent radiation
LU80792A1 (fr) * 1979-01-15 1980-08-08 Ntre De Rech Metallurg Ct Voor Dispsitif et procede pour effectuer des perforations a la surface des cylindres de laminoirs
US4322260A (en) 1979-04-04 1982-03-30 Monsanto Company Process for the continuous extrusion forming of a plastic double-walled foam-core conduit
US4377736A (en) * 1981-08-14 1983-03-22 General Electric Company Method and apparatus for removing material from a surface
US4429211A (en) * 1982-08-02 1984-01-31 United Technologies Corporation Laser pipe welding system for nonstationary pipe
LU84687A1 (fr) * 1983-03-11 1984-11-14 Centre Rech Metallurgique Procede pour ameliorer l'etat de surface d'un cylindre
US4533813A (en) * 1983-09-06 1985-08-06 Illinois Tool Works Inc. Optical selective demetallization apparatus
US4652722A (en) * 1984-04-05 1987-03-24 Videojet Systems International, Inc. Laser marking apparatus
US4758705A (en) * 1985-08-06 1988-07-19 Eastman Kodak Company Method and apparatus for texturing a roller
DE3881906T2 (de) * 1987-02-23 1994-01-20 Centre Rech Metallurgique Verfahren zur Oberflächenmarkierung von Walzwerkswalzen.
US4905025A (en) * 1988-06-20 1990-02-27 Dainippon Screen Mfg. Co., Ltd. Method of and apparatus for recording image on photosensitive material with a plurality of photobeams
JPH02125417A (ja) * 1988-07-20 1990-05-14 Matsushita Electric Ind Co Ltd 電子ビーム露光方法
US4977458A (en) 1988-11-16 1990-12-11 Eastman Kodak Company Apparatus for addressing a font to suppress Moire patterns occurring thereby and a method for use therein
JPH02308291A (ja) * 1989-05-24 1990-12-21 Onoda Cement Co Ltd 複写機用熱定着ロール及びその製造方法
FR2657219B1 (fr) * 1990-01-11 1994-02-18 Gim Industrie Sa Procede de fabrication de circuits imprimes souples, circuit imprime fabrique par ce procede, et dispositif pour la mise en óoeuvre de ce procede.
GB2246733A (en) * 1990-08-09 1992-02-12 Cmb Foodcan Plc Apparatus and method for monitoring laser material processing
US5147680A (en) * 1990-11-13 1992-09-15 Paul Slysh Laser assisted masking process
JP2810532B2 (ja) * 1990-11-29 1998-10-15 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
JPH04322891A (ja) * 1991-04-24 1992-11-12 Brother Ind Ltd レーザ加工装置
JP2918366B2 (ja) * 1991-09-04 1999-07-12 大日本スクリーン製造株式会社 円筒内面走査型画像記録装置
DE69226511T2 (de) * 1992-03-05 1999-01-28 Micronic Laser Systems Ab, Taeby Verfahren und Vorrichtung zur Belichtung von Substraten
US5668588A (en) * 1993-04-01 1997-09-16 Dainippon Screen Mfg. Co., Ltd. Spiral scanning image recording apparatus and image recording method
IL106188A (en) * 1993-06-30 1996-10-31 Scitex Corp Ltd Internal drum indicator
JPH07101032A (ja) * 1993-09-30 1995-04-18 Sony Corp レーザ製版装置及び刷版
JPH0927447A (ja) * 1995-07-11 1997-01-28 Nikon Corp ステージ駆動制御装置
JPH0952186A (ja) * 1995-08-09 1997-02-25 Mitsubishi Heavy Ind Ltd レーザオービタル溶接装置
JP3220634B2 (ja) 1996-01-08 2001-10-22 松下電送システム株式会社 画像記録装置
US5868075A (en) * 1997-02-26 1999-02-09 Presstek, Inc. Method and apparatus for imaging a seamless print medium
JPH10256476A (ja) 1997-03-12 1998-09-25 Canon Inc 柱状デバイス及び露光装置及びデバイス製造方法
US5982795A (en) * 1997-12-22 1999-11-09 Cymer, Inc. Excimer laser having power supply with fine digital regulation
SE508228C2 (sv) * 1997-05-07 1998-09-14 Inst Verkstadstek Forsk Ivf Anordning för detektering och beräkning av en laserstråles fokusläge, form och effektfördelning
DK0981895T3 (da) * 1997-05-14 2002-05-27 Luescher Ursula System til belysning af trykplader og dettes anvendelse
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
US6586702B2 (en) * 1997-09-25 2003-07-01 Laser Electro Optic Application Technology Company High density pixel array and laser micro-milling method for fabricating array
JP3040372B2 (ja) * 1998-03-10 2000-05-15 ファナック株式会社 加工ツール付ロボット及び加工方法
US6066830A (en) * 1998-06-04 2000-05-23 Astronics Corporation Laser etching of electroluminescent lamp electrode structures, and electroluminescent lamps produced thereby
EP0968833B1 (en) * 1998-07-03 2004-11-10 Fuji Photo Film Co., Ltd. Image recording apparatus
US6130405A (en) * 1998-09-10 2000-10-10 Chromalloy Gas Turbine Corporation Laser drilling holes in a cylindrical workpiece
US6424879B1 (en) 1999-04-13 2002-07-23 Applied Materials, Inc. System and method to correct for distortion caused by bulk heating in a substrate
EP1135789A2 (en) 1999-05-03 2001-09-26 Etec Systems, Inc. Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
US6765945B2 (en) 1999-09-27 2004-07-20 Cymer, Inc. Injection seeded F2 laser with pre-injection filter
DE19923679C1 (de) * 1999-05-22 2001-03-08 Krause Biagosch Gmbh Belichtungsvorrichtung
IL130340A0 (en) * 1999-06-07 2000-06-01 Scitex Corp Ltd Multibeam multi-wavelength internal drum recording apparatus
DE19926479A1 (de) * 1999-06-10 2000-12-14 Heidelberger Druckmasch Ag Innentrommelbelichter
US6180325B1 (en) * 1999-06-23 2001-01-30 Creo Srl Method for masking and exposing photosensitive printing plates
US6441908B1 (en) * 1999-08-06 2002-08-27 Metron Systems, Inc. Profiling of a component having reduced sensitivity to anomalous off-axis reflections
US6262825B1 (en) * 1999-08-24 2001-07-17 Napp Systems, Inc. Apparatus and method for the enhanced imagewise exposure of a photosensitive material
JP3854761B2 (ja) 1999-09-17 2006-12-06 天龍工業株式会社 ドラム及びその製造方法並びにドラム端壁部材の形成方法
JP4493134B2 (ja) 1999-12-28 2010-06-30 旭化成イーマテリアルズ株式会社 シームレスシリンダー印刷版の製造方法、及び製造装置
US6985261B2 (en) 2000-03-08 2006-01-10 Esko-Graphics A/S Method and apparatus for seamless imaging of sleeves as used in flexography
EP1285222A4 (en) * 2000-05-17 2006-11-15 Zygo Corp INTERFEROMETRIC DEVICE AND INTERFEROMETRIC PROCEDURE
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
JP3738178B2 (ja) 2000-09-21 2006-01-25 パナソニック コミュニケーションズ株式会社 画像記録方法
US6625181B1 (en) * 2000-10-23 2003-09-23 U.C. Laser Ltd. Method and apparatus for multi-beam laser machining
TW556044B (en) 2001-02-15 2003-10-01 Sipix Imaging Inc Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
JP2002351086A (ja) 2001-03-22 2002-12-04 Fuji Photo Film Co Ltd 露光装置
US6772854B2 (en) 2001-03-27 2004-08-10 Shure Incorporated Device and method for inserting acoustic dampers into earphones
JP2002311597A (ja) * 2001-04-13 2002-10-23 Mitsubishi Heavy Ind Ltd 製版装置
US6847433B2 (en) * 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
JP3714894B2 (ja) 2001-09-13 2005-11-09 大日本スクリーン製造株式会社 画像記録装置および画像記録装置を含む画像記録システム
WO2003033271A1 (fr) 2001-10-12 2003-04-24 Dainippon Screen Mfg. Co., Ltd. Appareil d'enregistrement d'images
JP2006502558A (ja) * 2001-11-07 2006-01-19 アプライド　マテリアルズ　インコーポレイテッド 光学式スポット格子アレイ印刷装置
SE0104131D0 (sv) * 2001-12-10 2001-12-10 Micronic Laser Systems Ab Improved method and apparatus for image formation
JP4083427B2 (ja) * 2001-12-27 2008-04-30 旭化成ケミカルズ株式会社 高精細グリッド線パターン作成プログラム
JP4064676B2 (ja) 2002-01-31 2008-03-19 株式会社 液晶先端技術開発センター 露光装置及び露光方法
US6900826B2 (en) * 2002-02-19 2005-05-31 Presstek, Inc. Multiple resolution helical imaging system and method
JP2003241395A (ja) 2002-02-21 2003-08-27 Konica Corp 画像露光装置
US6709962B2 (en) 2002-03-19 2004-03-23 N. Edward Berg Process for manufacturing printed circuit boards
DE10238420B4 (de) * 2002-08-22 2005-04-07 Heidelberger Druckmaschinen Ag Vorrichtung zur Qualitätssteigerung einer Druckformbelichtung
JP2004098559A (ja) 2002-09-11 2004-04-02 Fuji Photo Film Co Ltd 画像記録方法と画像記録装置
JP2004175078A (ja) * 2002-11-29 2004-06-24 Fuji Photo Film Co Ltd 画像露光方法および画像露光装置
CA2448193A1 (en) * 2002-12-09 2004-06-09 Heidelberger Druckmaschinen Aktiengesellschaft Method and device for imaging a printing form
JP2004317545A (ja) 2003-04-11 2004-11-11 Fuji Photo Film Co Ltd 画像露光装置における光量設定方法
JP4343586B2 (ja) 2003-05-28 2009-10-14 パナソニック株式会社 画像記録装置
CN1573414A (zh) * 2003-06-10 2005-02-02 富士胶片株式会社 像素位置特定方法、图像偏移修正方法、及图像形成装置
EP1645657A4 (en) 2003-07-16 2008-10-08 Konica Minolta Holdings Inc THIN FILM FORMING METHOD AND BASE WITH THIN FILM FORMED ACCORDING TO SAID METHOD
JP2005055881A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 描画方法および描画装置
JP4348476B2 (ja) * 2003-07-25 2009-10-21 株式会社オーク製作所 パターン描画装置
JP4312535B2 (ja) 2003-08-06 2009-08-12 シャープ株式会社 パターン露光装置
JP4203649B2 (ja) * 2003-09-05 2009-01-07 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
US20050104953A1 (en) * 2003-09-16 2005-05-19 Fuji Photo Film Co., Ltd. Image exposure method and image exposure apparatus
US20050088664A1 (en) * 2003-10-27 2005-04-28 Lars Stiblert Method for writing a pattern on a surface intended for use in exposure equipment and for measuring the physical properties of the surface
DE10353029B3 (de) * 2003-11-13 2004-08-19 Heidelberger Druckmaschinen Ag Vorrichtung und Verfahren zur Messung der Längenänderung der Vorschubspindel in einem Belichter für Druckvorlagen
KR100550560B1 (ko) 2003-12-16 2006-02-10 전자부품연구원 패턴 제작 장치 및 그 방법
DE102004008074A1 (de) * 2004-02-19 2005-09-15 Heidelberger Druckmaschinen Ag Verfahren und Testform zum Abgleichen der Belichtungsköpfe in einem Belichter für Druckvorlagen
US7561251B2 (en) 2004-03-29 2009-07-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005292214A (ja) 2004-03-31 2005-10-20 Choshu Sangyo Kk 円筒面露光装置とそのシステム
US6822192B1 (en) * 2004-04-19 2004-11-23 Acme Services Company, Llp Laser engraving of ceramic articles
JP2004351938A (ja) * 2004-07-20 2004-12-16 Mitsubishi Heavy Ind Ltd 製版装置
US7556334B2 (en) * 2004-11-04 2009-07-07 Applied Materials, Inc. Methods and apparatus for aligning print heads
JP4501798B2 (ja) 2005-07-08 2010-07-14 王子製紙株式会社 インクジェット記録体
KR101474566B1 (ko) 2005-10-26 2014-12-18 마이크로닉 마이데이터 아베 라이팅 장치 및 방법
US7806731B2 (en) 2005-12-29 2010-10-05 Sandisk Corporation Rounded contact fingers on substrate/PCB for crack prevention

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