KR101474566B1 - 라이팅 장치 및 방법 - Google Patents

라이팅 장치 및 방법 Download PDF

Info

Publication number
KR101474566B1
KR101474566B1 KR1020087010113A KR20087010113A KR101474566B1 KR 101474566 B1 KR101474566 B1 KR 101474566B1 KR 1020087010113 A KR1020087010113 A KR 1020087010113A KR 20087010113 A KR20087010113 A KR 20087010113A KR 101474566 B1 KR101474566 B1 KR 101474566B1
Authority
KR
South Korea
Prior art keywords
optical writing
lighting
units
writing units
rotor scanner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020087010113A
Other languages
English (en)
Korean (ko)
Other versions
KR20080074109A (ko
Inventor
라스 스틸베르트
토르브존 샌드스트롬
자레크 루베레크
토마스 락
Original Assignee
마이크로닉 마이데이터 아베
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 마이크로닉 마이데이터 아베 filed Critical 마이크로닉 마이데이터 아베
Publication of KR20080074109A publication Critical patent/KR20080074109A/ko
Application granted granted Critical
Publication of KR101474566B1 publication Critical patent/KR101474566B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/44—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements
    • B41J2/442—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements using lasers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/47—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D15/00—Component parts of recorders for measuring arrangements not specially adapted for a specific variable
    • G01D15/14—Optical recording elements; Recording elements using X-or nuclear radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/06—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using cylindrical picture-bearing surfaces, i.e. scanning a main-scanning line substantially perpendicular to the axis and lying in a curved cylindrical surface
    • H04N1/0607—Scanning a concave surface, e.g. with internal drum type scanners
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/06—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using cylindrical picture-bearing surfaces, i.e. scanning a main-scanning line substantially perpendicular to the axis and lying in a curved cylindrical surface
    • H04N1/0607—Scanning a concave surface, e.g. with internal drum type scanners
    • H04N1/0621—Scanning a concave surface, e.g. with internal drum type scanners using a picture-bearing surface stationary in the main-scanning direction
    • H04N1/0628—Scanning a concave surface, e.g. with internal drum type scanners using a picture-bearing surface stationary in the main-scanning direction using several scanning heads circumferentially spaced from one another and circumferentially aligned, e.g. mounted on a rotating disk
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/06—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using cylindrical picture-bearing surfaces, i.e. scanning a main-scanning line substantially perpendicular to the axis and lying in a curved cylindrical surface
    • H04N1/0664—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using cylindrical picture-bearing surfaces, i.e. scanning a main-scanning line substantially perpendicular to the axis and lying in a curved cylindrical surface with sub-scanning by translational movement of the picture-bearing surface
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/06—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using cylindrical picture-bearing surfaces, i.e. scanning a main-scanning line substantially perpendicular to the axis and lying in a curved cylindrical surface
    • H04N1/0671—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using cylindrical picture-bearing surfaces, i.e. scanning a main-scanning line substantially perpendicular to the axis and lying in a curved cylindrical surface with sub-scanning by translational movement of the main-scanning components
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/06—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using cylindrical picture-bearing surfaces, i.e. scanning a main-scanning line substantially perpendicular to the axis and lying in a curved cylindrical surface
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0393—Flexible materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
KR1020087010113A 2005-10-26 2006-10-26 라이팅 장치 및 방법 Active KR101474566B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US73000905P 2005-10-26 2005-10-26
US60/730,009 2005-10-26
US77691906P 2006-02-28 2006-02-28
US60/776,919 2006-02-28
PCT/SE2006/001213 WO2007050022A2 (en) 2005-10-26 2006-10-26 Writing apparatuses and methods

Publications (2)

Publication Number Publication Date
KR20080074109A KR20080074109A (ko) 2008-08-12
KR101474566B1 true KR101474566B1 (ko) 2014-12-18

Family

ID=37968057

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020087010113A Active KR101474566B1 (ko) 2005-10-26 2006-10-26 라이팅 장치 및 방법
KR1020087010115A Active KR101407754B1 (ko) 2005-10-26 2006-10-26 라이팅 장치 및 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020087010115A Active KR101407754B1 (ko) 2005-10-26 2006-10-26 라이팅 장치 및 방법

Country Status (5)

Country Link
US (3) US20070182808A1 (enExample)
EP (1) EP1987397A4 (enExample)
JP (2) JP4938783B2 (enExample)
KR (2) KR101474566B1 (enExample)
WO (2) WO2007050022A2 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101474566B1 (ko) 2005-10-26 2014-12-18 마이크로닉 마이데이터 아베 라이팅 장치 및 방법
US8049695B2 (en) * 2007-10-15 2011-11-01 Sharp Laboratories Of America, Inc. Correction of visible mura distortions in displays by use of flexible system for memory resources and mura characteristics
TWI427431B (zh) * 2008-09-22 2014-02-21 Ａｓｍｌ荷蘭公司 微影裝置、可程式化圖案化器件及微影方法
JP5722786B2 (ja) 2008-12-05 2015-05-27 コーニンクレッカ フィリップス エヌ ヴェ パターニングされたｌｅｄデバイス、パターニングを発生させるための方法、パターニングのためのシステム、及びシステムを較正するための方法
JP5469674B2 (ja) 2008-12-05 2014-04-16 マイクロニック マイデータ アーベー 被加工物に書き込む方法およびシステム
US8127628B2 (en) 2009-02-10 2012-03-06 Consolidated Edison Company Of New York, Inc. Gas meter reading system
WO2010093391A1 (en) 2009-02-10 2010-08-19 Consolidated Edison Company Of New York, Inc. Optical reading system and method of operation
US8570613B2 (en) 2009-03-06 2013-10-29 Micronic Laser Systems Ab Lithographic printing system with placement corrections
IL198719A0 (en) * 2009-05-12 2010-02-17 Orbotech Ltd Optical imaging system
EP2267534A1 (en) * 2009-06-22 2010-12-29 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Illumination system
CN102713759B (zh) * 2009-09-01 2015-04-29 麦克罗尼克迈达塔有限责任公司 图案产生系统
JP2011090055A (ja) 2009-10-20 2011-05-06 Sony Corp 露光装置及び露光方法
JP5219982B2 (ja) * 2009-11-20 2013-06-26 株式会社日立ハイテクノロジーズ 露光装置、露光方法、及び表示用パネル基板の製造方法
TWI448830B (zh) 2010-02-09 2014-08-11 Ａｓｍｌ荷蘭公司 微影裝置及元件製造方法
NL2006256A (en) 2010-02-23 2011-08-24 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2006261A (en) 2010-02-25 2011-08-29 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5778703B2 (ja) * 2010-03-03 2015-09-16 マイクロニック アーベーＭｙｃｒｏｎｉｃ Ａｂ 校正システムを有するパターン発生器
US9696633B2 (en) 2010-04-12 2017-07-04 Asml Netherlands B.V. Substrate handling apparatus and lithographic apparatus
US9316926B2 (en) 2010-12-08 2016-04-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG193240A1 (en) 2011-03-29 2013-10-30 Asml Netherlands Bv Measurement of the position of a radiation beam spot in lithography
WO2012136434A2 (en) 2011-04-08 2012-10-11 Asml Netherlands B.V. Lithographic apparatus, programmable patterning device and lithographic method
KR101579916B1 (ko) 2011-04-21 2015-12-23 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 리소그래피 장치를 유지하는 방법, 및 디바이스 제조 방법
EP2541323B1 (en) * 2011-06-27 2013-06-05 National Formosa University Manufacturing-process equipment
KR101633744B1 (ko) 2011-08-18 2016-06-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조 방법
FR2980859B1 (fr) * 2011-09-30 2013-10-11 Commissariat Energie Atomique Procede et dispositif de lithographie
NL2009342A (en) 2011-10-31 2013-05-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US10346729B2 (en) 2011-11-29 2019-07-09 Asml Netherlands B.V. Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
CN103946750B (zh) 2011-11-29 2019-03-29 Asml荷兰有限公司 光刻设备、器件制造方法和计算机程序
NL2009806A (en) 2011-12-05 2013-06-10 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2009817A (en) 2011-12-06 2013-06-10 Asml Netherlands Bv A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program.
NL2009902A (en) * 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2009979A (en) 2012-01-12 2013-07-15 Asml Netherlands Bv A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program.
JP5905126B2 (ja) 2012-01-17 2016-04-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
US9715183B2 (en) 2012-02-23 2017-07-25 Asml Netherlands B.V. Device, lithographic apparatus, method for guiding radiation and device manufacturing method
TWI638241B (zh) 2012-03-26 2018-10-11 日商尼康股份有限公司 基板處理裝置、處理裝置及元件製造方法
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
WO2014140047A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
WO2014140046A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Mechanically produced alignment fiducial method and device
DE102014207866A1 (de) * 2014-04-25 2015-10-29 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Regelung der Positionierung einer Vielzahl von verstellbaren Spiegel-Elementen einer Vielspiegel-Anordnung
WO2017040639A1 (en) 2015-08-31 2017-03-09 Lithoptek LLC Apparatus and method for using scanning light beam for film or surface modification
JP6327305B2 (ja) * 2016-09-01 2018-05-23 株式会社ニコン パターン露光装置及びデバイス製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004524760A (ja) 2001-03-27 2004-08-12 シュアー インコーポレイテッド 音響ダンパーをイヤホンに差し込むためのデバイスおよび方法
JP2005043555A (ja) 2003-07-25 2005-02-17 Pentax Corp パターン描画装置
JP2005055524A (ja) 2003-08-06 2005-03-03 Sharp Corp パターン露光装置およびパターン露光方法

Family Cites Families (90)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4131782A (en) * 1976-05-03 1978-12-26 Lasag Ag Method of and apparatus for machining large numbers of holes of precisely controlled size by coherent radiation
LU80792A1 (fr) * 1979-01-15 1980-08-08 Ntre De Rech Metallurg Ct Voor Dispsitif et procede pour effectuer des perforations a la surface des cylindres de laminoirs
US4322260A (en) 1979-04-04 1982-03-30 Monsanto Company Process for the continuous extrusion forming of a plastic double-walled foam-core conduit
US4377736A (en) * 1981-08-14 1983-03-22 General Electric Company Method and apparatus for removing material from a surface
US4429211A (en) * 1982-08-02 1984-01-31 United Technologies Corporation Laser pipe welding system for nonstationary pipe
LU84687A1 (fr) * 1983-03-11 1984-11-14 Centre Rech Metallurgique Procede pour ameliorer l'etat de surface d'un cylindre
US4533813A (en) * 1983-09-06 1985-08-06 Illinois Tool Works Inc. Optical selective demetallization apparatus
US4652722A (en) * 1984-04-05 1987-03-24 Videojet Systems International, Inc. Laser marking apparatus
US4758705A (en) * 1985-08-06 1988-07-19 Eastman Kodak Company Method and apparatus for texturing a roller
DE3881906T2 (de) * 1987-02-23 1994-01-20 Centre Rech Metallurgique Verfahren zur Oberflächenmarkierung von Walzwerkswalzen.
US4905025A (en) * 1988-06-20 1990-02-27 Dainippon Screen Mfg. Co., Ltd. Method of and apparatus for recording image on photosensitive material with a plurality of photobeams
JPH02125417A (ja) * 1988-07-20 1990-05-14 Matsushita Electric Ind Co Ltd 電子ビーム露光方法
US4977458A (en) 1988-11-16 1990-12-11 Eastman Kodak Company Apparatus for addressing a font to suppress Moire patterns occurring thereby and a method for use therein
JPH02308291A (ja) * 1989-05-24 1990-12-21 Onoda Cement Co Ltd 複写機用熱定着ロール及びその製造方法
FR2657219B1 (fr) * 1990-01-11 1994-02-18 Gim Industrie Sa Procede de fabrication de circuits imprimes souples, circuit imprime fabrique par ce procede, et dispositif pour la mise en óoeuvre de ce procede.
GB2246733A (en) * 1990-08-09 1992-02-12 Cmb Foodcan Plc Apparatus and method for monitoring laser material processing
US5147680A (en) * 1990-11-13 1992-09-15 Paul Slysh Laser assisted masking process
JP2810532B2 (ja) * 1990-11-29 1998-10-15 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
JPH04322891A (ja) * 1991-04-24 1992-11-12 Brother Ind Ltd レーザ加工装置
JP2918366B2 (ja) * 1991-09-04 1999-07-12 大日本スクリーン製造株式会社 円筒内面走査型画像記録装置
DE69226511T2 (de) * 1992-03-05 1999-01-28 Micronic Laser Systems Ab, Taeby Verfahren und Vorrichtung zur Belichtung von Substraten
US5668588A (en) * 1993-04-01 1997-09-16 Dainippon Screen Mfg. Co., Ltd. Spiral scanning image recording apparatus and image recording method
IL106188A (en) * 1993-06-30 1996-10-31 Scitex Corp Ltd Internal drum indicator
JPH07101032A (ja) * 1993-09-30 1995-04-18 Sony Corp レーザ製版装置及び刷版
JPH0927447A (ja) * 1995-07-11 1997-01-28 Nikon Corp ステージ駆動制御装置
JPH0952186A (ja) * 1995-08-09 1997-02-25 Mitsubishi Heavy Ind Ltd レーザオービタル溶接装置
JP3220634B2 (ja) 1996-01-08 2001-10-22 松下電送システム株式会社 画像記録装置
US5868075A (en) * 1997-02-26 1999-02-09 Presstek, Inc. Method and apparatus for imaging a seamless print medium
JPH10256476A (ja) 1997-03-12 1998-09-25 Canon Inc 柱状デバイス及び露光装置及びデバイス製造方法
US5982795A (en) * 1997-12-22 1999-11-09 Cymer, Inc. Excimer laser having power supply with fine digital regulation
SE508228C2 (sv) * 1997-05-07 1998-09-14 Inst Verkstadstek Forsk Ivf Anordning för detektering och beräkning av en laserstråles fokusläge, form och effektfördelning
DK0981895T3 (da) * 1997-05-14 2002-05-27 Luescher Ursula System til belysning af trykplader og dettes anvendelse
US6018383A (en) * 1997-08-20 2000-01-25 Anvik Corporation Very large area patterning system for flexible substrates
US6586702B2 (en) * 1997-09-25 2003-07-01 Laser Electro Optic Application Technology Company High density pixel array and laser micro-milling method for fabricating array
JP3040372B2 (ja) * 1998-03-10 2000-05-15 ファナック株式会社 加工ツール付ロボット及び加工方法
US6066830A (en) * 1998-06-04 2000-05-23 Astronics Corporation Laser etching of electroluminescent lamp electrode structures, and electroluminescent lamps produced thereby
EP0968833B1 (en) * 1998-07-03 2004-11-10 Fuji Photo Film Co., Ltd. Image recording apparatus
US6130405A (en) * 1998-09-10 2000-10-10 Chromalloy Gas Turbine Corporation Laser drilling holes in a cylindrical workpiece
US6424879B1 (en) 1999-04-13 2002-07-23 Applied Materials, Inc. System and method to correct for distortion caused by bulk heating in a substrate
EP1135789A2 (en) 1999-05-03 2001-09-26 Etec Systems, Inc. Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
US6765945B2 (en) 1999-09-27 2004-07-20 Cymer, Inc. Injection seeded F2 laser with pre-injection filter
DE19923679C1 (de) * 1999-05-22 2001-03-08 Krause Biagosch Gmbh Belichtungsvorrichtung
IL130340A0 (en) * 1999-06-07 2000-06-01 Scitex Corp Ltd Multibeam multi-wavelength internal drum recording apparatus
DE19926479A1 (de) * 1999-06-10 2000-12-14 Heidelberger Druckmasch Ag Innentrommelbelichter
US6180325B1 (en) * 1999-06-23 2001-01-30 Creo Srl Method for masking and exposing photosensitive printing plates
US6441908B1 (en) * 1999-08-06 2002-08-27 Metron Systems, Inc. Profiling of a component having reduced sensitivity to anomalous off-axis reflections
US6262825B1 (en) * 1999-08-24 2001-07-17 Napp Systems, Inc. Apparatus and method for the enhanced imagewise exposure of a photosensitive material
JP3854761B2 (ja) 1999-09-17 2006-12-06 天龍工業株式会社 ドラム及びその製造方法並びにドラム端壁部材の形成方法
JP4493134B2 (ja) 1999-12-28 2010-06-30 旭化成イーマテリアルズ株式会社 シームレスシリンダー印刷版の製造方法、及び製造装置
US6985261B2 (en) 2000-03-08 2006-01-10 Esko-Graphics A/S Method and apparatus for seamless imaging of sleeves as used in flexography
EP1285222A4 (en) * 2000-05-17 2006-11-15 Zygo Corp INTERFEROMETRIC DEVICE AND INTERFEROMETRIC PROCEDURE
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
JP3738178B2 (ja) 2000-09-21 2006-01-25 パナソニック コミュニケーションズ株式会社 画像記録方法
US6625181B1 (en) * 2000-10-23 2003-09-23 U.C. Laser Ltd. Method and apparatus for multi-beam laser machining
TW556044B (en) 2001-02-15 2003-10-01 Sipix Imaging Inc Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
JP2002351086A (ja) 2001-03-22 2002-12-04 Fuji Photo Film Co Ltd 露光装置
JP2002311597A (ja) * 2001-04-13 2002-10-23 Mitsubishi Heavy Ind Ltd 製版装置
US6847433B2 (en) * 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
JP3714894B2 (ja) 2001-09-13 2005-11-09 大日本スクリーン製造株式会社 画像記録装置および画像記録装置を含む画像記録システム
WO2003033271A1 (fr) 2001-10-12 2003-04-24 Dainippon Screen Mfg. Co., Ltd. Appareil d'enregistrement d'images
JP2006502558A (ja) * 2001-11-07 2006-01-19 アプライド　マテリアルズ　インコーポレイテッド 光学式スポット格子アレイ印刷装置
SE0104131D0 (sv) * 2001-12-10 2001-12-10 Micronic Laser Systems Ab Improved method and apparatus for image formation
JP4083427B2 (ja) * 2001-12-27 2008-04-30 旭化成ケミカルズ株式会社 高精細グリッド線パターン作成プログラム
JP4064676B2 (ja) 2002-01-31 2008-03-19 株式会社 液晶先端技術開発センター 露光装置及び露光方法
US6900826B2 (en) * 2002-02-19 2005-05-31 Presstek, Inc. Multiple resolution helical imaging system and method
JP2003241395A (ja) 2002-02-21 2003-08-27 Konica Corp 画像露光装置
US6709962B2 (en) 2002-03-19 2004-03-23 N. Edward Berg Process for manufacturing printed circuit boards
DE10238420B4 (de) * 2002-08-22 2005-04-07 Heidelberger Druckmaschinen Ag Vorrichtung zur Qualitätssteigerung einer Druckformbelichtung
JP2004098559A (ja) 2002-09-11 2004-04-02 Fuji Photo Film Co Ltd 画像記録方法と画像記録装置
JP2004175078A (ja) * 2002-11-29 2004-06-24 Fuji Photo Film Co Ltd 画像露光方法および画像露光装置
CA2448193A1 (en) * 2002-12-09 2004-06-09 Heidelberger Druckmaschinen Aktiengesellschaft Method and device for imaging a printing form
JP2004317545A (ja) 2003-04-11 2004-11-11 Fuji Photo Film Co Ltd 画像露光装置における光量設定方法
JP4343586B2 (ja) 2003-05-28 2009-10-14 パナソニック株式会社 画像記録装置
CN1573414A (zh) * 2003-06-10 2005-02-02 富士胶片株式会社 像素位置特定方法、图像偏移修正方法、及图像形成装置
EP1645657A4 (en) 2003-07-16 2008-10-08 Konica Minolta Holdings Inc THIN FILM FORMING METHOD AND BASE WITH THIN FILM FORMED ACCORDING TO SAID METHOD
JP2005055881A (ja) * 2003-07-22 2005-03-03 Fuji Photo Film Co Ltd 描画方法および描画装置
JP4203649B2 (ja) * 2003-09-05 2009-01-07 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
US20050104953A1 (en) * 2003-09-16 2005-05-19 Fuji Photo Film Co., Ltd. Image exposure method and image exposure apparatus
US20050088664A1 (en) * 2003-10-27 2005-04-28 Lars Stiblert Method for writing a pattern on a surface intended for use in exposure equipment and for measuring the physical properties of the surface
DE10353029B3 (de) * 2003-11-13 2004-08-19 Heidelberger Druckmaschinen Ag Vorrichtung und Verfahren zur Messung der Längenänderung der Vorschubspindel in einem Belichter für Druckvorlagen
KR100550560B1 (ko) 2003-12-16 2006-02-10 전자부품연구원 패턴 제작 장치 및 그 방법
DE102004008074A1 (de) * 2004-02-19 2005-09-15 Heidelberger Druckmaschinen Ag Verfahren und Testform zum Abgleichen der Belichtungsköpfe in einem Belichter für Druckvorlagen
US7561251B2 (en) 2004-03-29 2009-07-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005292214A (ja) 2004-03-31 2005-10-20 Choshu Sangyo Kk 円筒面露光装置とそのシステム
US6822192B1 (en) * 2004-04-19 2004-11-23 Acme Services Company, Llp Laser engraving of ceramic articles
JP2004351938A (ja) * 2004-07-20 2004-12-16 Mitsubishi Heavy Ind Ltd 製版装置
US7556334B2 (en) * 2004-11-04 2009-07-07 Applied Materials, Inc. Methods and apparatus for aligning print heads
JP4501798B2 (ja) 2005-07-08 2010-07-14 王子製紙株式会社 インクジェット記録体
KR101474566B1 (ko) 2005-10-26 2014-12-18 마이크로닉 마이데이터 아베 라이팅 장치 및 방법
US7806731B2 (en) 2005-12-29 2010-10-05 Sandisk Corporation Rounded contact fingers on substrate/PCB for crack prevention

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004524760A (ja) 2001-03-27 2004-08-12 シュアー インコーポレイテッド 音響ダンパーをイヤホンに差し込むためのデバイスおよび方法
JP2005043555A (ja) 2003-07-25 2005-02-17 Pentax Corp パターン描画装置
JP2005055524A (ja) 2003-08-06 2005-03-03 Sharp Corp パターン露光装置およびパターン露光方法

Also Published As

Publication number Publication date
KR20080074109A (ko) 2008-08-12
JP4938783B2 (ja) 2012-05-23
US20070188591A1 (en) 2007-08-16
US8102410B2 (en) 2012-01-24
WO2007050022A2 (en) 2007-05-03
JP2009514012A (ja) 2009-04-02
EP1987397A4 (en) 2015-08-19
KR20080074110A (ko) 2008-08-12
EP1987397A1 (en) 2008-11-05
JP2009514011A (ja) 2009-04-02
US20100308024A1 (en) 2010-12-09
US8822879B2 (en) 2014-09-02
US20070182808A1 (en) 2007-08-09
WO2007050022A3 (en) 2007-07-26
KR101407754B1 (ko) 2014-06-16
WO2007050023A1 (en) 2007-05-03
JP4938784B2 (ja) 2012-05-23

Similar Documents

Publication Publication Date Title
KR101407754B1 (ko) 라이팅 장치 및 방법
JP6849119B2 (ja) 直描露光装置
US8472089B2 (en) Rotor imaging system and method with variable-rate pixel clock
KR101415313B1 (ko) 기판 처리 및 분석용 플랫폼, 장치, 시스템, 그리고 방법
US12226850B2 (en) Automatic calibration of a laser processing system using an integrated telecentric optical detector with limited degrees of freedom
CN101142534A (zh) 曝光设备和曝光方法
JPWO2015152218A1 (ja) 基板処理装置、デバイス製造方法及び基板処理方法
JP2020194167A (ja) パターン描画装置
CN101194208B (zh) 用于多曝光射束光刻装置的方法
JP6648798B2 (ja) パターン描画装置
CN101346668B (zh) 写入装置和方法
JP2005294373A (ja) マルチビーム露光装置
JP2006030966A (ja) 描画方法および装置
JP2006337873A (ja) 露光装置及び露光方法
JP6540406B2 (ja) ビーム走査装置並びにパターン描画装置
JP6950787B2 (ja) パターン形成装置
CA2382209A1 (en) Redundancy for individually-addressable laser diode arrays based systems

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20080428

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20111020

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20130522

Patent event code: PE09021S01D

E90F Notification of reason for final refusal
PE0902 Notice of grounds for rejection

Comment text: Final Notice of Reason for Refusal

Patent event date: 20140305

Patent event code: PE09021S02D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20140926

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20141212

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20141212

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
FPAY Annual fee payment

Payment date: 20171207

Year of fee payment: 4

PR1001 Payment of annual fee

Payment date: 20171207

Start annual number: 4

End annual number: 4

PR1001 Payment of annual fee

Payment date: 20201201

Start annual number: 7

End annual number: 7

PR1001 Payment of annual fee

Payment date: 20211122

Start annual number: 8

End annual number: 8

PR1001 Payment of annual fee

Payment date: 20221123

Start annual number: 9

End annual number: 9

PR1001 Payment of annual fee

Payment date: 20231128

Start annual number: 10

End annual number: 10