JP2008521220A - 機能が向上された厚い超伝導フィルム - Google Patents
機能が向上された厚い超伝導フィルム Download PDFInfo
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Abstract
【選択図】図16
Description
(a)支持構造に取着された半導体構造を部分的に形成する。この部分的に形成された半導体構造は、複数の部分的に形成された素子で構成され、部分的に形成された素子は、少なくとも1つの結合層によって互いに取着されている。
(b)少なくとも部分的に形成された素子の一部に部分的にマスク層を形成する。
(c)素子を分離するために結合層をエッチングする。
(d)部分的にマスク層を除去する。
(a)部分的に、支持構造に取着された半導体構造を形成し、部分的に形成された半導体構造は、複数の部分的に形成された素子を含む。
(b)部分的に形成された半導体構造の表面にマスク層を形成し、該マスク層はそれぞれの素子が形成されるように開口を残してグリッドパターンに形成される。
(c)表面がマスク層によって覆われていない開口内の部分的に形成された半導体構造の上に金属層を積層する。(d)半導体構造を形成し、仕上げる。
(e)マスク層を除去する。マスク層が除去された近傍で素子を分離する。
・総流量 : 100 sccm
・磁界強度 : 15 gauss
・基材温度 : 70℃
・ガス混合 : 100%Cl2
・電力/バイアス 電圧: 600W/−300V
・動作圧力 : 30mTorr
・総流量 : 100 sccm
・磁界強度 : 15 gauss
・基材温度 : 70℃
・ガス混合 : 30%BCl3/60%Cl2/10%Ar
・電力/バイアス 電圧: 600W/−300V
・動作圧力 : 30mTorr
・総流量 : 100 sccm
・磁界強度 : 15 gauss
・基材温度 : 70℃
・ガス混合 : 40%BCl3/40%Cl2/20%Ar
・電力/バイアス 電圧: 600W/−300V
・動作圧力 : 30mTorr
・エッチング深さ:3.5μm
・エッチングマスク:フォトレジスト(AZ9262)(厚さ:24μm)
Claims (27)
- 以下のステップからなる半導体構造を加工し、分離する方法。
(a)支持構造に取着された半導体構造を部分的に形成するステップで、この部分的に形成された半導体構造は、複数の部分的に形成された素子で構成され、部分的に形成された素子は、少なくとも1つの結合層によって互いに取着されており、
(b)少なくとも部分的に形成された素子の一部に部分的にマスク層を形成するステップ、
(c)素子を分離するために結合層にエッチングするステップ、
(d)部分的にマスク層を除去するステップ。 - さらに、ステップ(a)とステップ(b)の間に、少なくとも部分的に形成された素子に酸化物安定化処理層を積層するステップを含む請求項1記載の方法。
- ステップ(a)は、素子の上に素子マスク層を形成し、少なくとも1つの結合層まで素子の間の半導体構造を部分的にエッチングし、そして、素子マスクを除去するステップを含む請求項1記載の方法。
- さらに、凹凸を形成するために素子のGaN層を処理するステップを含む請求項1記載の方法。
- さらに、ベースエッチング化学薬品に挿入し、ダイ膨張及び連続パッケージング工程のために最適化するポリマーベースの支持フィルムに素子を別々に取着するステップを含む請求項1記載の方法。
- 半導体素子は、化学的に挿入した酸化物層および化学的エッチングの前のポリマー層によって保護される請求項5記載の方法。
- 素子分離工程後のポリマー保護層が剥離される間に、酸化層は素子表面に残っている請求項6記載の方法。
- エッチング化学薬品は塩素を含む溶液である請求項5記載の方法。
- エッチング方法は、化学ジェットスプレー又は、エッチング溶液への浸漬である請求項6記載の方法。
- Au層は、塩化カリウムのような、金エッチング液を用いてエッチング除去される請求項6記載の方法。
- 以下のステップからなる半導体構造を加工する方法。
(a)支持構造に取着された半導体構造を部分的に形成するステップで、この部分的に形成された半導体構造は、複数の部分的に形成された素子で構成されており、
(b)部分的に形成された半導体構造に金属層を積層するステップ、
(c)半導体を形成し最終処理をするステップ、
(d)金属層の表面にマスク層を形成するステップで、マスク層は、素子のそれぞれが互いから分離される複数の矩形のラインに形成されており、
(e)ラインが配置された金属層を除去するステップで、マスク層は矩形の下の金属層を保護し、
(f)金属層が除去される近傍の素子を分離するステップ、
(f)素子からマスク層を除去するステップ。 - さらに、ステップ(b)と(c)の間に金属層をウェハキャリアに固定するステップ、ステップ(c)と(d)の間にウェハキャリアから金属層を除去するステップを含む請求項11記載の方法。
- 以下のステップからなる半導体構造を加工し、分離する方法。
(a)部分的に、支持構造に取着された半導体構造を形成するステップで、部分的に形成された半導体構造は、複数の部分的に形成された素子で構成され、
(b)部分的に形成された半導体構造の表面に部分的なマスク層を形成するステップで、それぞれの素子が形成される開口の残るグリッドパターンに形成され、
(c)表面が部分的なマスク層によって覆われていない開口に部分的に形成された半導体構造の上の金属層を積層するステップ、
(d)半導体構造を形成し、表面処理をするステップ、
(e)部分的なマスク層を除去するステップ、
(f)部分的なマスク層が除去された近傍の素子を分離するステップ。 - さらに、ステップ(c)と(d)の間に金属層をウェハキャリアに固定するステップと、ステップ(d)と(e)の間にウェハキャリアから金属層を除去するステップを含む請求項13記載の方法。
- さらに、ステップ(d)と(e)との間に、少なくとも部分的に形成された素子の一部に酸化表面安定化層を積層するステップを含む請求項13の方法。
- ステップ(d)が、素子の上に素子マスク層を形成し、部分的マスク層まで素子の間の半導体構造を部分的にエッチングし、素子マスクを除去するステップを含む請求項13記載の方法。
- さらに、凹凸を形成するため素子のGaN層を処理するステップを含む請求項13記載の方法。
- さらに、ベース剥離化学薬品に挿入し、ダイ膨張及び連続パッケージング工程のために最適化するポリマーベースの支持フィルムに素子を別々に取着するステップを含む請求項13記載の方法。
- 半導体素子が、化学的エッチングの前に化学的に挿入された酸化物層によって保護されている請求項17記載の方法。
- 剥離化学薬品は、(OH)−を含む化学薬品のような塩素ベースの酸化化学薬品を含む溶液である請求項17記載の方法。
- エッチング方法が、化学的ジェットスプレー又はエッチング溶液への浸漬である請求項18記載の方法。
- Au層は、塩化カリウムのような金エッチング溶液によりエッチング除去される請求項18記載の方法。
- 請求項1記載の方法によって作成される半導体素子。
- 請求項11記載の方法によって作成される半導体素子。
- 請求項13記載の方法によって作成される半導体素子。
- 以下のステップで構成される方法によって作製される半導体素子。
(a)支持構造に取着された半導体構造を部分的に形成するステップで、この部分的に形成された半導体構造は、複数の部分的に形成された素子で構成され、部分的に形成された素子は、少なくとも1つの結合層によって互いに取着されており、
(b)少なくとも部分的に形成された素子の一部に部分的にマスク層を形成するステップ、
(c)素子を分離するために結合層をエッチングするステップ、
(d)部分的にマスク層を除去するステップ。 - 以下のステップで構成される方法によって作製される半導体素子。
(a)支持構造に取着された半導体構造を部分的に形成するステップで、部分的に形成された半導体構造は、複数の部分的に形成された素子で構成され、
(b)部分的に形成された半導体構造の表面に部分的なマスク層を形成するステップで、部分的なマスク層は、それぞれの素子が形成される開口が残されたグリッドパターンに形成され、
(c)表面が部分的なマスク層によって覆われていない開口に部分的に形成された半導体構造の上に金属層を積層するステップ、
(d)半導体構造を形成し、表面処理をするステップ、
(e)部分的なマスク層を除去するステップ、
(f)部分的なマスク層が除去された近傍の素子を分離するステップ。
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Also Published As
Publication number | Publication date |
---|---|
CN101371338A (zh) | 2009-02-18 |
TW200633263A (en) | 2006-09-16 |
EP1815503A2 (en) | 2007-08-08 |
WO2006055601B1 (en) | 2008-09-04 |
EP1815503A4 (en) | 2012-08-01 |
WO2006055601A3 (en) | 2008-07-24 |
KR101192598B1 (ko) | 2012-10-18 |
US20060105542A1 (en) | 2006-05-18 |
CN101371338B (zh) | 2010-07-21 |
WO2006055601A2 (en) | 2006-05-26 |
KR20070085374A (ko) | 2007-08-27 |
TWI389334B (zh) | 2013-03-11 |
US7459373B2 (en) | 2008-12-02 |
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