JP2011091241A - 光半導体素子、光半導体素子の製造方法及び光半導体装置の製造方法 - Google Patents
光半導体素子、光半導体素子の製造方法及び光半導体装置の製造方法 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 259
- 230000003287 optical effect Effects 0.000 title claims abstract description 148
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 46
- 239000002184 metal Substances 0.000 claims abstract description 117
- 229910052751 metal Inorganic materials 0.000 claims abstract description 117
- 239000013078 crystal Substances 0.000 claims abstract description 79
- 238000000034 method Methods 0.000 claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 60
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 49
- 229910052802 copper Inorganic materials 0.000 claims abstract description 49
- 239000010949 copper Substances 0.000 claims abstract description 49
- 238000007747 plating Methods 0.000 claims abstract description 34
- 238000009826 distribution Methods 0.000 claims abstract description 22
- 238000010438 heat treatment Methods 0.000 claims description 47
- 230000008569 process Effects 0.000 claims description 44
- 229910000679 solder Inorganic materials 0.000 claims description 23
- 229910052594 sapphire Inorganic materials 0.000 claims description 20
- 239000010980 sapphire Substances 0.000 claims description 20
- 230000005496 eutectics Effects 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 17
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 230000000052 comparative effect Effects 0.000 description 33
- 239000010931 gold Substances 0.000 description 29
- 230000015572 biosynthetic process Effects 0.000 description 24
- 238000005755 formation reaction Methods 0.000 description 24
- 238000001878 scanning electron micrograph Methods 0.000 description 20
- 238000010586 diagram Methods 0.000 description 15
- 238000001953 recrystallisation Methods 0.000 description 14
- 230000008859 change Effects 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 238000007789 sealing Methods 0.000 description 10
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 8
- 238000001816 cooling Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000011362 coarse particle Substances 0.000 description 6
- 239000003822 epoxy resin Substances 0.000 description 5
- 230000005012 migration Effects 0.000 description 5
- 238000013508 migration Methods 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- 238000005476 soldering Methods 0.000 description 5
- 230000007547 defect Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000005566 electron beam evaporation Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 2
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910002704 AlGaN Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- MHYQBXJRURFKIN-UHFFFAOYSA-N C1(C=CC=C1)[Mg] Chemical compound C1(C=CC=C1)[Mg] MHYQBXJRURFKIN-UHFFFAOYSA-N 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H—ELECTRICITY
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- H01L33/005—Processes
- H01L33/0095—Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
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- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
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- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
- H01L2224/9222—Sequential connecting processes
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Abstract
【解決手段】 (a)成長基板を準備する工程と、(b)成長基板上に半導体層を形成する工程と、(c)半導体層上に、メッキ法を用いて銅で形成される金属支持体を形成する工程と、(d)成長基板を半導体層から分離し除去する工程と、(e)金属支持体を形成する銅の結晶粒と空孔の密度分布を均一化する熱処理工程とを有する光半導体素子の製造方法を提供する。
【選択図】 図1
Description
20 半導体膜
21 n型半導体層
22 活性層
23 p型半導体層
30 金属支持体
31 金属下地層
40 n電極
50、50a、50b ステム
60 AuSnはんだ
70 Auワイヤ
80 エポキシ樹脂
Claims (12)
- (a)成長基板を準備する工程と、
(b)前記成長基板上に半導体層を形成する工程と、
(c)前記半導体層上に、メッキ法を用いて銅で形成される金属支持体を形成する工程と、
(d)前記成長基板を、前記半導体層から分離し除去する工程と、
(e)前記金属支持体を形成する銅の結晶粒と空孔の密度分布を均一化する熱処理工程と
を有する光半導体素子の製造方法。 - 前記工程(e)において、前記金属支持体を、100〜140℃に昇温した後、50℃以下に降温する請求項1に記載の光半導体素子の製造方法。
- 前記工程(e)において、前記金属支持体を昇温する速度が、15〜35℃/秒である請求項2に記載の光半導体素子の製造方法。
- 前記工程(e)において、前記金属支持体を降温する速度が、15〜35℃/秒である請求項2または3に記載の光半導体素子の製造方法。
- 前記工程(e)において、前記金属支持体を100〜140℃に昇温した後、該温度範囲で5分以下の時間保持し、その後50℃以下に降温する請求項2〜4のいずれか1項に記載の光半導体素子の製造方法。
- 前記工程(e)において、前記金属支持体を100〜140℃に昇温した後、該温度範囲で1〜3分間保持し、その後50℃以下に降温する請求項5に記載の光半導体素子の製造方法。
- 前記工程(e)において、前記金属支持体を100〜140℃に昇温した後、50℃以下に降温する過程を複数回繰り返す請求項2〜6のいずれか1項に記載の光半導体素子の製造方法。
- 前記工程(a)で準備する成長基板がサファイア基板である請求項1〜7のいずれか1項に記載の光半導体素子の製造方法。
- 前記工程(b)において、AlxInyGazN(0≦x≦1、0≦y≦1、0≦z≦1、x+y+z=1)で表されるIII族窒化物半導体で、前記半導体層を形成する請求項1〜8のいずれか1項に記載の光半導体素子の製造方法。
- 前記工程(d)と(e)との間、前記工程(e)の後のいずれかに、
(f)前記工程(d)で前記成長基板の除去された面の半導体層上に、電極を形成する工程
を有する請求項1〜9のいずれか1項に記載の光半導体素子の製造方法。 - (a)成長基板を準備する工程と、
(b)前記成長基板上に半導体層を形成する工程と、
(c)前記半導体層上に、メッキ法を用いて銅で形成される金属支持体を形成する工程と、
(d)前記成長基板を、前記半導体層から分離し除去する工程と、
(e)前記金属支持体を形成する銅の結晶粒と空孔の密度分布を均一化する熱処理工程と、
(f)Au組成が78〜80wt%のAuSnはんだを用い、導電部材上に前記金属支持体を共晶接合する工程と
を有する光半導体装置の製造方法。 - メッキ法で形成された銅からなる金属支持体と、
前記金属支持体上に形成された半導体層と
を有し、
前記金属支持体と前記半導体層との界面から厚さ方向に5μmの範囲における、前記金属支持体の結晶粒の粒径が3μm以下である光半導体素子。
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JP2009244320A JP5507197B2 (ja) | 2009-10-23 | 2009-10-23 | 光半導体素子、光半導体素子の製造方法及び光半導体装置の製造方法 |
US12/911,022 US8460957B2 (en) | 2009-10-23 | 2010-10-25 | Optical semiconductor device, method for manufacturing optical semiconductor device, and method for manufacturing optical semiconductor apparatus |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013122978A (ja) * | 2011-12-09 | 2013-06-20 | Toshiba Corp | 半導体発光素子の製造方法 |
CN113380928A (zh) * | 2014-10-22 | 2021-09-10 | 安相贞 | 半导体装置的制造方法 |
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US8460957B2 (en) | 2013-06-11 |
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