JP2008515240A5 - - Google Patents

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Publication number
JP2008515240A5
JP2008515240A5 JP2007534850A JP2007534850A JP2008515240A5 JP 2008515240 A5 JP2008515240 A5 JP 2008515240A5 JP 2007534850 A JP2007534850 A JP 2007534850A JP 2007534850 A JP2007534850 A JP 2007534850A JP 2008515240 A5 JP2008515240 A5 JP 2008515240A5
Authority
JP
Japan
Prior art keywords
region
gate
diffusion barrier
spacer oxide
gate stack
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007534850A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008515240A (ja
Filing date
Publication date
Priority claimed from US10/711,742 external-priority patent/US7157341B2/en
Application filed filed Critical
Publication of JP2008515240A publication Critical patent/JP2008515240A/ja
Publication of JP2008515240A5 publication Critical patent/JP2008515240A5/ja
Pending legal-status Critical Current

Links

JP2007534850A 2004-10-01 2005-09-30 ゲート・スタック Pending JP2008515240A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/711,742 US7157341B2 (en) 2004-10-01 2004-10-01 Gate stacks
PCT/US2005/035455 WO2006039632A2 (en) 2004-10-01 2005-09-30 Gate stacks

Publications (2)

Publication Number Publication Date
JP2008515240A JP2008515240A (ja) 2008-05-08
JP2008515240A5 true JP2008515240A5 (enExample) 2008-08-28

Family

ID=36126115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007534850A Pending JP2008515240A (ja) 2004-10-01 2005-09-30 ゲート・スタック

Country Status (6)

Country Link
US (2) US7157341B2 (enExample)
EP (1) EP1805798B1 (enExample)
JP (1) JP2008515240A (enExample)
CN (1) CN101032024B (enExample)
TW (1) TW200623270A (enExample)
WO (1) WO2006039632A2 (enExample)

Families Citing this family (9)

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Publication number Priority date Publication date Assignee Title
US8486487B2 (en) 2005-02-17 2013-07-16 Konica Minolta Holdings, Inc. Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film
US8062707B2 (en) * 2005-02-17 2011-11-22 Konica Minolta Holdings, Inc. Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film
US7271079B2 (en) * 2005-04-06 2007-09-18 International Business Machines Corporation Method of doping a gate electrode of a field effect transistor
KR100633988B1 (ko) * 2005-06-23 2006-10-13 동부일렉트로닉스 주식회사 반도체 소자 및 그 제조 방법
JP2009026777A (ja) * 2007-07-17 2009-02-05 Renesas Technology Corp 半導体装置の製造方法
US8173532B2 (en) 2007-07-30 2012-05-08 International Business Machines Corporation Semiconductor transistors having reduced distances between gate electrode regions
CN101728255B (zh) * 2008-10-21 2011-07-20 中芯国际集成电路制造(北京)有限公司 在晶圆上制造栅极的方法
JP2020035789A (ja) 2018-08-27 2020-03-05 キオクシア株式会社 半導体装置
CN118055613A (zh) * 2022-11-08 2024-05-17 长鑫存储技术有限公司 半导体结构及其形成方法

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JPS61190981A (ja) * 1985-02-20 1986-08-25 Casio Comput Co Ltd 半導体装置
JPH04142777A (ja) * 1990-10-03 1992-05-15 Kawasaki Steel Corp ゲート電極又は配線の形成方法
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JP2536413B2 (ja) * 1993-06-28 1996-09-18 日本電気株式会社 半導体集積回路装置の製造方法
US5459091A (en) * 1993-10-12 1995-10-17 Goldstar Electron Co., Ltd. Method for fabricating a non-volatile memory device
FR2711275B1 (fr) * 1993-10-15 1996-10-31 Intel Corp Procédé automatiquement aligné de contact en fabrication de semi-conducteurs et dispositifs produits.
US5545581A (en) * 1994-12-06 1996-08-13 International Business Machines Corporation Plug strap process utilizing selective nitride and oxide etches
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