JP2008513196A - 水素気体分離用パラジウム合金複合膜の製造方法 - Google Patents
水素気体分離用パラジウム合金複合膜の製造方法 Download PDFInfo
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- JP2008513196A JP2008513196A JP2007532244A JP2007532244A JP2008513196A JP 2008513196 A JP2008513196 A JP 2008513196A JP 2007532244 A JP2007532244 A JP 2007532244A JP 2007532244 A JP2007532244 A JP 2007532244A JP 2008513196 A JP2008513196 A JP 2008513196A
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- palladium
- coating layer
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- copper
- metal coating
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- 239000012528 membrane Substances 0.000 title claims abstract description 43
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 38
- 239000002131 composite material Substances 0.000 title claims abstract description 38
- 238000000926 separation method Methods 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 24
- 229910001252 Pd alloy Inorganic materials 0.000 title claims abstract description 16
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 108
- 229910052751 metal Inorganic materials 0.000 claims abstract description 65
- 239000002184 metal Substances 0.000 claims abstract description 65
- 239000011247 coating layer Substances 0.000 claims abstract description 61
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 54
- 239000010410 layer Substances 0.000 claims abstract description 32
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 27
- 239000000956 alloy Substances 0.000 claims abstract description 27
- 238000009713 electroplating Methods 0.000 claims abstract description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 62
- 238000000034 method Methods 0.000 claims description 45
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 33
- 239000010949 copper Substances 0.000 claims description 33
- 229910052802 copper Inorganic materials 0.000 claims description 32
- 229910052759 nickel Inorganic materials 0.000 claims description 30
- 238000010438 heat treatment Methods 0.000 claims description 16
- 239000000919 ceramic Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- 238000007747 plating Methods 0.000 abstract description 22
- 238000000576 coating method Methods 0.000 abstract description 15
- 239000011248 coating agent Substances 0.000 abstract description 14
- 239000001257 hydrogen Substances 0.000 description 26
- 229910052739 hydrogen Inorganic materials 0.000 description 26
- 230000008569 process Effects 0.000 description 26
- 229910000881 Cu alloy Inorganic materials 0.000 description 20
- 238000004544 sputter deposition Methods 0.000 description 17
- 239000011148 porous material Substances 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000010924 continuous production Methods 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 230000035699 permeability Effects 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 229910000570 Cupronickel Inorganic materials 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 231100000572 poisoning Toxicity 0.000 description 2
- 230000000607 poisoning effect Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000001651 catalytic steam reforming of methanol Methods 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0223—Group 8, 9 or 10 metals
- B01D71/02231—Palladium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0039—Inorganic membrane manufacture
- B01D67/0069—Inorganic membrane manufacture by deposition from the liquid phase, e.g. electrochemical deposition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0039—Inorganic membrane manufacture
- B01D67/0072—Inorganic membrane manufacture by deposition from the gaseous phase, e.g. sputtering, CVD, PVD
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0083—Thermal after-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/009—After-treatment of organic or inorganic membranes with wave-energy, particle-radiation or plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/108—Inorganic support material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1216—Three or more layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0223—Group 8, 9 or 10 metals
- B01D71/02232—Nickel
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
- C01B3/501—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
- C01B3/503—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion characterised by the membrane
- C01B3/505—Membranes containing palladium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2256/00—Main component in the product gas stream after treatment
- B01D2256/16—Hydrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/40—Details relating to membrane preparation in-situ membrane formation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electrochemistry (AREA)
- Combustion & Propulsion (AREA)
- Plasma & Fusion (AREA)
- Thermal Sciences (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
【選択図】図5
Description
先ず、多孔性ニッケル支持体上に水素プラズマを利用して表面処理を施した。水素プラズマを利用する表面処理は、RFパワーを100W、水素の量は40sccm、工程圧力は50mTorr、時間は5分にそれぞれ設定して進行された。その後、支持体表面の気孔を埋め込むために前記表面処理された支持体上に塩化ニッケルメッキ液を使用して電流密度1A/dm2、メッキ時間2分間、常温においてニッケル電解メッキ工程を進行した。ニッケル電解メッキを実施した後、さらに、真空乾燥炉の60℃下で前記支持体を乾燥させた後、支持体内に存在する不純物及び異物質を除去するために、200℃、10−3torrの真空雰囲気において1時間の間維持した。
Claims (8)
- (a)多孔性支持体の上部にパラジウムコーティング層を形成する段階;
(b)パラジウムコーティング層の上部に金属コーティング層を形成する段階;
(c)前記金属コーティング層をリフローして合金層を形成する段階とを包含する水素気体分離用パラジウム合金複合膜の製造方法。 - (a)多孔性支持体の上部に電解メッキ法により第1次金属コーティング層を形成する段階;
(b)前記第1次金属コーティング層の上部にパラジウムコーティング層を形成する段階;
(c)パラジウムコーティング層の上部に第2次金属コーティング層を形成する段階;
(d)前記第2次金属コーティング層をリフローして合金層を形成する段階とを包含する水素気体分離用パラジウム合金複合膜の製造方法。 - 前記多孔性支持体は、金属支持体又はセラミックス支持体であることを特徴とする請求項1又は2に記載の製造方法。
- 前記多孔性支持体は、多孔性ニッケル支持体であることを特徴とする請求項3に記載の製造方法。
- 前記段階(a)において、前記電解メッキ法によって第1次金属コーティング層を形成した後、熱処理によって異物質を除去する段階をさらに追加することを特徴とする請求項2に記載の製造方法。
- 前記第1次金属コーティング層は、銀、ニッケル、銅、ルテニウム(Ruthenium)、モリブデン(molybdenum)から選択される少なくとも1種の金属を包含してなることを特徴とする請求項2に記載の製造方法。
- 前記金属コーティング層は銅であることを特徴とする請求項1に記載の製造方法。
- 前記第2次金属コーティング層は銅であることを特徴とする請求項2に記載の製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040073902A KR100679341B1 (ko) | 2004-09-15 | 2004-09-15 | 수소기체분리용 팔라듐 합금복합막의 제조방법 |
PCT/KR2005/003078 WO2006031080A1 (en) | 2004-09-15 | 2005-09-15 | Preparation method of palladium alloy composite membrane for hydrogen separation |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2010278982A Division JP5199332B2 (ja) | 2004-09-15 | 2010-12-15 | 水素気体分離用パラジウム合金複合膜の製造方法 |
Publications (1)
Publication Number | Publication Date |
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JP2008513196A true JP2008513196A (ja) | 2008-05-01 |
Family
ID=36060282
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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JP2007532244A Pending JP2008513196A (ja) | 2004-09-15 | 2005-09-15 | 水素気体分離用パラジウム合金複合膜の製造方法 |
JP2010278982A Active JP5199332B2 (ja) | 2004-09-15 | 2010-12-15 | 水素気体分離用パラジウム合金複合膜の製造方法 |
Family Applications After (1)
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JP2010278982A Active JP5199332B2 (ja) | 2004-09-15 | 2010-12-15 | 水素気体分離用パラジウム合金複合膜の製造方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7875154B2 (ja) |
EP (1) | EP1807185B1 (ja) |
JP (2) | JP2008513196A (ja) |
KR (1) | KR100679341B1 (ja) |
CN (1) | CN100594055C (ja) |
WO (1) | WO2006031080A1 (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8101243B2 (en) * | 2002-04-03 | 2012-01-24 | Colorado School Of Mines | Method of making sulfur-resistant composite metal membranes |
KR100679341B1 (ko) * | 2004-09-15 | 2007-02-07 | 한국에너지기술연구원 | 수소기체분리용 팔라듐 합금복합막의 제조방법 |
KR100832302B1 (ko) | 2006-12-21 | 2008-05-26 | 한국에너지기술연구원 | 인-시투 건식 진공 방식을 사용한 수소기체분리용 팔라듐합금분리막의 제조방법 |
US8048199B2 (en) * | 2007-02-20 | 2011-11-01 | Shell Oil Company | Method of making a leak stable gas separation membrane system |
TWI354716B (en) * | 2007-04-13 | 2011-12-21 | Green Hydrotec Inc | Palladium-containing plating solution and its uses |
EP3034155A1 (en) * | 2007-06-11 | 2016-06-22 | NGK Insulators, Ltd. | Hydrogen separation membrane and selectively permeable membrane reactor |
US9044715B2 (en) | 2007-08-22 | 2015-06-02 | Colorado School Of Mines | Unsupported palladium alloy membranes and methods of making same |
DE102009039149A1 (de) * | 2009-08-31 | 2011-03-03 | Uhde Gmbh | Katalytische Membranmaterial-Beschichtung |
US8778058B2 (en) | 2010-07-16 | 2014-07-15 | Colorado School Of Mines | Multilayer sulfur-resistant composite metal membranes and methods of making and repairing the same |
JP6046039B2 (ja) * | 2010-08-30 | 2016-12-14 | シュティヒティン・エネルギーオンデルツォイク・セントラム・ネーデルランド | 選択性薄膜層の析出のための新しいシーディング方法 |
KR101336768B1 (ko) | 2011-07-22 | 2013-12-16 | 한국에너지기술연구원 | 수소 분리막 보호층 및 이의 코팅방법 |
KR101471616B1 (ko) * | 2012-12-21 | 2014-12-11 | 한국에너지기술연구원 | 이산화탄소 포집 및 저장 장치 |
CN103007361B (zh) * | 2012-12-21 | 2015-07-01 | 先健科技(深圳)有限公司 | 一种医疗器械涂层及其制备方法与含有该涂层的医疗器械 |
US9636639B2 (en) * | 2012-12-21 | 2017-05-02 | Agency For Science, Technology And Research | Porous metallic membrane |
KR101775025B1 (ko) | 2013-02-28 | 2017-09-20 | 경기대학교 산학협력단 | 스퍼터에 의한 치밀 수소분리막의 제조방법 |
RU2555283C2 (ru) * | 2013-10-18 | 2015-07-10 | Общество с Ограниченной Ответственностью "Мембраны-НЦ" | Способ нанесения палладиевого покрытия на подложку |
CN104307382A (zh) * | 2014-11-04 | 2015-01-28 | 华文蔚 | 一种制造氢分离膜的方法 |
KR101715875B1 (ko) | 2015-05-04 | 2017-03-15 | 경기대학교 산학협력단 | 지지체 일체화 수소분리막 및 이의 제조방법 |
CN106555212A (zh) * | 2015-09-25 | 2017-04-05 | 中国科学院大连化学物理研究所 | 一种厚度可控的超薄钯膜的制备方法 |
CN105195030B (zh) * | 2015-10-25 | 2017-11-10 | 天津工业大学 | 镍合金中空纤维膜及其制备方法和应用 |
CN105498551A (zh) * | 2015-12-16 | 2016-04-20 | 西安工程大学 | 一种金属钯负载型SiO2复合膜的制备方法 |
CN115069093A (zh) * | 2016-06-06 | 2022-09-20 | 联邦科学和工业研究组织 | 在基材上形成Pd-Au合金层的方法 |
CN109957772A (zh) * | 2017-12-26 | 2019-07-02 | 北京有色金属研究总院 | 一种钯/陶瓷复合薄膜 |
CN108097065B (zh) * | 2018-01-02 | 2020-11-17 | 兰州理工大学 | 一种抗硫钯合金复合膜的制备方法 |
GB2602332B (en) * | 2020-12-23 | 2023-08-30 | Hydrogen Mem Tech As | Membrane attachment technique |
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Publication number | Publication date |
---|---|
CN101039742A (zh) | 2007-09-19 |
US20080116078A1 (en) | 2008-05-22 |
JP5199332B2 (ja) | 2013-05-15 |
KR100679341B1 (ko) | 2007-02-07 |
US7875154B2 (en) | 2011-01-25 |
US20120055784A1 (en) | 2012-03-08 |
JP2011062699A (ja) | 2011-03-31 |
WO2006031080A1 (en) | 2006-03-23 |
KR20060025010A (ko) | 2006-03-20 |
EP1807185A1 (en) | 2007-07-18 |
EP1807185A4 (en) | 2009-04-29 |
CN100594055C (zh) | 2010-03-17 |
EP1807185B1 (en) | 2014-12-03 |
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